Methods and devices for aesthetic treatment of biological structures by radiofrequency and magnetic energy

ABSTRACT

A device for providing a magnetic treatment by evoking muscle contraction by a time-varying magnetic field and providing a RF treatment by heating biological structure. The device may provide a pressure treatment. The device includes an applicator having an RF electrode and a magnetic field generating device. The device may also include a main unit, a human machine interface, and a control unit. The control unit adjusts a signal provided to the RF electrode and creates an RF circuit, and also adjusts the signal provided to the magnetic field generating device and creates a magnetic circuit electrically insulated from the RF circuit. The RF circuit may include a power source and a power amplifier, and the magnetic circuit may include an energy storage to supply the magnetic field generating device with electric current.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of International ApplicationPCT/IB2022/059794, filed Oct. 12, 2022, which claims priority to U.S.patent application Ser. No. 17/500,612, filed Oct. 13, 2021, and U.S.Patent Application No. 63/316,758, filed Mar. 4, 2022. Each of theseapplications is herein incorporated by reference in its entirety.

BACKGROUND

Aesthetic medicine includes all treatments resulting in enhancing avisual appearance according to a patient's criteria. Patients want tominimize all imperfections including, for example, unwanted body fat inspecific body areas, improve body shape, and remove effects of naturalaging. Patients require quick, non-invasive procedures that providesatisfactory results with minimal health risks.

The most common methods used for non-invasive aesthetic applications arebased on application of mechanical waves, such as ultrasound or shockwave therapy, or electromagnetic waves, such as radiofrequency treatmentor light treatment including laser treatment. The effect of mechanicalwaves on tissue is based on cavitation, vibration, and/or heat-inducingeffects. The effect of applications using electromagnetic waves is basedon heat production in the biological structure.

A mechanical treatment using mechanical waves and/or pressure can beused for treatment of cellulite or adipose cells. However, suchmechanical treatments have several drawbacks, such as a risk ofpanniculitis, destruction of untargeted tissues, and/or non-homogenousresults.

A thermal treatment including heating is applied to a patient forenhancing a visual appearance of the skin and body by, for example,increasing production of collagen and/or elastin, smoothing the skin,reducing cellulite, and/or removing adipose cells. However, thermaltreatment has several drawbacks, such as risk of overheating a patientor even causing thermal damage of unwanted biological structures. A riskof a panniculitis and/or non-homogenous results may be a very commonside effect of existing thermal treatments. Further, insufficient bloodand/or lymph flow during and/or after the treatment may lead topanniculitis and other health complications after the treatment.Further, the treatment may be uncomfortable, and may be painful.

Muscle stimulation by time-varying magnetic field provides severalbenefits over known methods for treating biological structures, andallows for non-invasive stimulation of muscles located beneath othermuscles. Further, time-varying magnetic fields may be used to providemuscle stimulation to cause muscle contraction through thick layer ofadipose tissue. Electrostimulation in order to provide a musclecontraction needs to deliver an electric current from an electrode,through an adipose tissue, to a nerve and/or neuromuscular plate linkedwith the muscle. The adipose tissue has resistivity higher than themuscle tissue and delivery of electric current from the electrodethrough insulating adipose tissue to muscle tissue may be lessefficient. Targeting of the electric current to an exact muscle may notbe precise and stimulating muscle may be very difficult nearlyimpossible. Additionally, with thicker adipose tissue, electric currentdelivered by electrotherapy has to be higher and such high amount ofelectric current propagating and dissipating during long distance may bevery uncomfortable for a patient. On the other hand, time-varyingmagnetic fields induce electric current in the muscle, neuromuscularplate and/or in the nerve, so targeting and muscle stimulation bytime-varying magnetic field is easier, more precise, comfortable andmore effective. Time-varying magnetic field also enable comfortablestimulation or large number of muscles and/or muscle groups andapplicator may not be in direct contact with the patient's body that mayalso improve hygiene and other parameters of a treatment.

Combination of a radiofrequency (RF) treatment that provides heating upof patient's soft tissue and a magnetic treatment that providesstimulation of patient's muscle tissue may have outstanding synergiceffect. Combined treatment may provide improved treatment, may result inshorter treatment periods, increase of patient's comfort during thetreatment, enable to combine different treatment effects with a synergicresult, improve patient safety and others deeply described later in thisdocument.

To reach the best synergic effect it is preferred to target magnetictreatment providing muscle stimulation and RF treatment to one body area(e.g. same body area) wherein at least one RF electrode providing the RFtreatment should be flat and/or correspond with patient's skin to ensurehomogenous heating of the patient's soft tissue. To target the RFtreatment and the magnetic treatment to the same body area requires toposition a magnetic field generating device and an RF electrode nearbyeach other, e.g. with at least partial overlay of the magnetic fieldgenerating device and RF electrode. However, arranging an RF electrodeand the magnetic field generating device in close proximity may beproblematic, because the time-varying magnetic field generated by themagnetic field generating device may induce unwanted physical effects,such as eddy currents, skin effect and/or other physical effects in theRF electrode. Unwanted physical effects may cause significant energyloss, inefficiency of such device arrangement and also heating of the RFelectrode, influencing of the device function, such as incorrect tuningof the device, inaccurate targeting of produced energies, degenerationof produced magnetic, electromagnetic fields and/or other. The RFelectrode may be influenced by the magnetic field generating device andvice versa.

A device and method described in this document presents a solution forproviding the RF and magnetic treatment with maximized synergic effectand also preserve safety and efficiency of the delivered magnetic and RF(electromagnetic) fields.

BRIEF SUMMARY

The disclosure provides a treatment devices and methods for providingone or more treatment effects to at least one biological structure in atleast one body area. The treatment device provides a unique opportunityhow to shape human or animal bodies, improve visual appearance, restoremuscle functionality, increase muscle strength, change (e.g. increase)muscle volume, change (e.g. increase) muscle tonus, cause muscle fibrehypertrophy, cause muscle fibre hyperplasia, decrease number and volumeof adipose cells and adipose tissue, remove cellulite and/or other. Thetreatment device and the method may use the application of aradiofrequency (RF) treatment and a magnetic treatment to cause heatingof at least one target biological structure within the body area andcause muscle stimulation including muscle contraction, within theproximate or same body area. The treatment device may use an RFelectrode as a treatment energy source to produce RF energy (which maybe referred as RF field) to provide RF treatment, and a magnetic fieldgenerating device as a treatment energy source for generating atime-varying magnetic field to provide magnetic treatment.

The treatment effect provided by the treatment device and method mayinclude muscle stimulation, wherein muscle stimulation may includemuscle contraction, e.g., a supramaximal muscle contraction. Thetreatment effect may include heating of the body area. The treatmentdevice and method may provide a combination of treatment effects, suchas muscle stimulation and heating of a body area. The treatment deviceand method may provide muscle contraction and heating at same time or atdifferent times during the treatment. The treatment device and methodmay provide muscle contraction and heating of the adipose tissue of thebody at the same time or at different times during the treatment. Also,the treatment device and method may provide muscle contraction andheating of the adipose tissue of the same body area at same time or atdifferent times during the treatment. Further, the treatment device andmethod may provide muscle contraction and heating of the same muscle ofthe body at the same time or at different times during the treatment.Furthermore, the treatment device and method may provide musclecontraction and heating of the same muscle of the same body area at thesame time or at different times during the treatment.

Further, the treatment device and method may provide muscle contractionand heating of skin of the body at the same time or at different timesduring the treatment. Furthermore, the treatment device and method mayprovide muscle contraction and heating of the skin of the same body areaat the same time or at different times during the treatment.

In order to enhance efficiency and safety of the treatment, to minimizeenergy loss and unwanted physical effect induced in at least one RFelectrode and/or magnetic field generating device, the device may usethe one or more segmented RF electrodes, wherein the segmented RFelectrode means RF electrode with e.g. one or more apertures, cutoutsand/or protrusions to minimize the effects of a nearby time-varyingmagnetic field produced by the magnetic field generating device.Aperture may be an opening in the body of the RF electrode. The cutoutmay be an opening in the body of the RF electrode along the border ofthe RF electrode. Openings in the body of the RF electrode may bedefined by view from floor projection, which shows a view of the RFelectrode from above. The apertures, cutouts and/or areas outside ofprotrusions may be filed by air, dielectric and/or other electricallyinsulating material. The apertures, cutouts and/or protrusions of the RFelectrode may minimize induction of eddy currents in the RF electrode,minimize energy loss, and inhibit overheating of the treatment device.Further, the apertures, cutouts and/or protrusions may minimize theinfluence of the magnetic treatment on the produced RF treatment. Theproposed design of the RF electrode enables the same applicator toinclude a magnetic field generating device and the RF electrode with atleast partial overlay, according to the applicator's floor projection,while enabling targeting of RF treatment and magnetic treatment to thesame area of the patient's body with the parameters described herein.Incorporation of an RF electrode and a magnetic field generating devicein one applicator enables enhanced treatment targeting and positivetreatment results with minimal negative effects mentioned above.

Also mutual insulation of at least one RF circuit and at least onemagnet circuit prevent interaction between electric and/orelectromagnetic signals.

The magnetic field generating device in combination with an energystorage device enables production of a magnetic field with an intensity(which may be magnetic flux density) which evokes a muscle contraction.Energy storage device may be used to store electrical energy enablingaccumulation of an electric field having a voltage in a range from 500 Vto 15 kV. The energy storage device may supply the magnetic fieldgenerating device with the stored electrical energy in an impulse ofseveral microseconds to several milliseconds.

The method of treatment enables heating of at least one body area whereis also evoked a muscle contraction that minimizes muscle and/orligament injury, such as tearing or inflammation. Heating of a skin, acontracted muscle, a contracting muscle, a relaxed muscle, adiposetissue, adipose tissue, and/or adjacent biological structure of thetreated body area may shift the threshold when a patient may considertreatment to be uncomfortable.

Therefore, heating may allow a higher amount of electromagnetic energy,(e.g. RF and/or magnetic field) to be delivered to the patient's body inorder to provide more muscle work through muscle contractions andsubsequent relaxation. Another benefit of application of the RFtreatment and the magnetic treatment in the same body area is that themuscle work (provided e.g. by repetitive muscle contractions andrelaxations) accelerates blood and lymph flow in the targeted area andso improves dissipation of thermal energy created by the RF treatment.Application of the RF treatment and the magnetic treatment also improveshomogeneity of biological structure heating that prevents creation ofhot spots, edge effects and/or other undesirable effects. The method oftreatment causing muscle stimulation and heating to the same body areamay result in hyperacidity of extracellular matrix that leads toapoptosis or necrosis of the adipose tissue. The RF treatment mayprovide selective heating of adipose tissue that leads to at least oneof apoptosis, necrosis, decrease of volume of adipose cells, andcellulite removal.

A treatment device is able to provide muscle contraction and/or heatingto a body area of a patient. The muscle contraction may be provided by amagnetic treatment, and heating may be provided by a radiofrequencytreatment.

A treatment device providing muscle contraction and/or heating mayinclude at least one magnetic field generating device and/or at leastone radiofrequency electrode.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, andoptionally a radiofrequency electrode having a plurality of openings.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, andoptionally a radiofrequency electrode having a plurality of cutouts.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, andoptionally a radiofrequency electrode having a plurality of protrusions.

A treatment device for providing a magnetic treatment and aradiofrequency treatment to a body area of a patient may include anenergy storage device, a magnetic field generating device, a switchingdevice, and optionally a radiofrequency electrode, wherein theradiofrequency electrode may be positioned between the magnetic fieldgenerating device and a body area of a patient. The radiofrequencyelectrode may be arranged in overlay with the magnetic field generatingdevice according to a floor projection of an applicator that includesthe magnetic field generating device and the radiofrequency electrode.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, andoptionally a radiofrequency electrode, wherein the radiofrequencyelectrode includes at least one layer of a substrate covered by at leastone conductive layer.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, aplurality of radiofrequency electrodes, and optionally an impedanceelement.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include an energy storagedevice, a magnetic field generating device, a switching device, and/or aradiofrequency electrode that includes a metal foam.

A treatment device providing a muscle contraction and/or heating to abody area of a patient may include an applicator including a temperaturesensor. A positioning of the temperature sensor and/or wire connectionbetween the temperature sensor and the rest of the treatment device maybe designed to minimize the influence of the operation of theapplicator. The position of the temperature sensor may include thepresence of the temperature sensor in a protrusion of the applicator.The design of the wire connection may include a material and/or itsthickness as further disclosed herein.

A treatment device providing a magnetic treatment and a radiofrequencytreatment to a body area of a patient may include a main unit and anapplicator including at least one magnetic field generating device andat least one radiofrequency electrode. The applicator may be connectedto the main unit by a connecting attachment including male contactsand/or female contacts. One or more contacts of the connectingattachment may be used for transfer of signals to and from at least onemagnetic field generating device, at least one radiofrequency electrode,or a temperature sensor. Further, the one or more contacts of theconnecting attachment may be used for identification of the type of theapplicator, transfer of cooling fluid, providing a safety loop, orcontrol of durability of the applicator, as described within thisapplication.

In some aspects, there is provided a device providing a magnetictreatment and a radiofrequency treatment to a patient, the deviceincluding a magnetic field generating device and an RF electrode,wherein the magnetic field generating device provides a musclecontraction, and wherein the RF electrode provides heating of thepatient's tissue.

In some aspects, there is provided a device providing a magnetictreatment, a radiofrequency treatment and a pressure treatment to apatient, the device including a magnetic field generating device, one ormore RF electrodes and a pressure outlet, wherein the magnetic fieldgenerating device provides a muscle contraction, wherein the one or moreRF electrodes provide heating of the patient's tissue, and wherein thepressure treatment provides mechanical impulses.

In some aspects, there is provided a device providing a magnetictreatment, a radiofrequency treatment and a pressure treatment to apatient, the device including an applicator, a magnetic field generatingdevice, one or more RF electrodes, and a pressure outlet, wherein themagnetic field generating device provides a muscle contraction, whereinthe one or more RF electrodes provide heating of the patient's tissue,wherein the pressure treatment provides mechanical impulses, and whereinthe applicator includes the magnetic field generating device, one ormore RF electrodes and the pressure outlet.

In some aspects, there is provided an applicator that may have more thanone portion for applying a treatment. In some aspects, the applicatormay comprise first and second portions that are moveable with respect toone another. In some aspects, the first and second applicator portionsmay be defined by first and second planes, and the applicator portionsmay be positions so that the planes are not parallel to one another. Asdescribed herein, treatment may be applied in a similar manner as withapplicators that are configured with a single portion. In someinstances, treatment can be provided by multiple applicator portions,positioned in more than one plane, which may be beneficial for body areaor portions of a body area that include curves or are otherwiseirregularly shaped (for example, such as a flank, latus, lumbar region,shoulder, or knee). In some instances, treatment of body areas that aremore difficult to reach or effectively treat with a single portionapplicator may experience improved treatment by using a multi-portionapplicator.

In some aspects, the treatment device provides a magnetic treatment, amassage, and a radiofrequency treatment. In some aspects, the treatmentdevice comprises an applicator that provides a magnetic treatment, amassage, and a radiofrequency treatment.

In some aspects, there is provided a treatment device for providing amagnetic treatment, a pressure treatment and a radiofrequency treatmentto a body area of a patient, the device comprising: a magnetic fieldgenerating device configured to provide a time-varying magnetic field tothe body area of the patient such that a muscle in the body area of thepatient is contracted; wherein the time-varying magnetic field has amagnetic flux density in a range of 0.1 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz; a radiofrequencyelectrode configured to generate a radiofrequency field to heat tissuein the body area of the patient, and a pressure outlet configured toprovide the pressure treatment of a skin in the body area of thepatient.

In some aspects, there is provided a treatment device for providing amagnetic treatment, a massage and a radiofrequency treatment to a bodyarea of a patient, the device comprising: a magnetic field generatingdevice configured to provide a time-varying magnetic field to the bodyarea of the patient such that a muscle in the body area of the patientis contracted; wherein the time-varying magnetic field has a magneticflux density in a range of 0.1 Tesla to 7 Tesla and a repetition rate ina range of 0.1 Hz to 700 Hz; a radiofrequency electrode configured togenerate a radiofrequency field to heat tissue in the body area of thepatient, and a pressure outlet configured to provide the massage of askin in the body area of the patient.

In some aspects, there is provided a treatment device for providing amagnetic treatment, pressure treatment, and a radiofrequency treatmentto a body area of a patient, the device comprising: a magnetic fieldgenerating device configured to provide a time-varying magnetic field tothe body area of the patient such that a muscle in the body area of thepatient is contracted; wherein the time-varying magnetic field has amagnetic flux density in a range of 0.1 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz; and a radiofrequencyelectrode configured to generate a radiofrequency field to heat tissuein the body area of the patient, a pressure outlet configured to providea pressure treatment comprising a pressure impulse to a skin in the bodyarea of the patient.

In some aspects, there is provided a treatment device for providing amagnetic treatment, vibration, and a radiofrequency treatment to a bodyarea of a patient, the device comprising: a magnetic field generatingdevice configured to provide a time-varying magnetic field to the bodyarea of the patient such that a muscle in the body area of the patientis contracted; wherein the time-varying magnetic field has a magneticflux density in a range of 0.1 Tesla to 7 Tesla and a repetition rate ina range of 0.1 Hz to 700 Hz; and a radiofrequency electrode configuredto generate a radiofrequency field to heat tissue in the body area ofthe patient, a pressure outlet configured to provide a vibration to askin in the body area of the patient.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising:an applicator comprising: a first portion comprising a first magneticfield generating device; a second portion comprising a second magneticfield generating device; wherein the first magnetic field generatingdevice and the second magnetic field generating device are configured toprovide a time-varying magnetic field to the body area of the patientsuch that a muscle in the body area of the patient is contracted;wherein the time-varying magnetic field has a magnetic flux density in arange of 0.5 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hzto 700 Hz; a movement structure configured to provide free movement ofthe first portion, wherein the movement structure comprises a gearand/or joint.

A movement structure may comprise a joint, a gear, a rotor, a cam, or acombination thereof.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising:an applicator comprising: a first portion comprising a first magneticfield generating device; a second portion comprising a second magneticfield generating device; wherein the first magnetic field generatingdevice and the second magnetic field generating device are configured toprovide a time-varying magnetic field to the body area of the patientsuch that a muscle in the body area of the patient is contracted;wherein the time-varying magnetic field has a magnetic flux density in arange of 0.5 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hzto 700 Hz; a movement structure configured to provide free movement ofthe first portion, wherein the movement structure comprises a gear traincomprising two gears.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising:an applicator comprising: a first portion comprising a first magneticfield generating device; a second portion comprising a second magneticfield generating device; wherein the first magnetic field generatingdevice and the second magnetic field generating device are configured toprovide a time-varying magnetic field to the body area of the patientsuch that a muscle in the body area of the patient is contracted;wherein the time-varying magnetic field has a magnetic flux density in arange of 0.5 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hzto 700 Hz; a movement structure configured to provide free movement ofthe first portion and second portion, wherein the movement structurecomprises a gear train comprising two gears.

In some aspects, there is provided a treatment device for providing amagnetic treatment, and a pressure treatment to a body area of apatient, the device comprising: an applicator comprising: a magneticfield generating device configured to provide a time-varying magneticfield to the body area of the patient such that a muscle in the bodyarea of the patient is contracted; and a pressure outlet; a positioningmechanism configured to provide movement of the magnetic fieldgenerating device within the applicator and wherein the time-varyingmagnetic field has a magnetic flux density in a range of 0.5 Tesla to 7Tesla and a repetition rate in a range of 0.1 Hz to 700 Hz, and whereinthe pressure outlet is configured to provide the pressure treatmentcomprising a pressure impulse to tissue in the body area of the patient.

In some aspects, there is provided a treatment device for providing amagnetic treatment, and a pressure treatment to a body area of apatient, the device comprising: an applicator comprising: a magneticfield generating device configured to provide a time-varying magneticfield to the body area of the patient such that a muscle in the bodyarea of the patient is contracted; and a pressure outlet; a positioningmechanism configured to provide movement of the pressure outlet withinthe applicator and wherein the time-varying magnetic field has amagnetic flux density in a range of 0.5 Tesla to 7 Tesla and arepetition rate in a range of 0.1 Hz to 700 Hz, and wherein the pressureoutlet is configured to provide the pressure treatment comprising apressure impulse to tissue in the body area of the patient.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising: afirst applicator comprising: a first magnetic field generating device; aapplicator comprising a second magnetic field generating device; whereinthe first magnetic field generating device and the second magnetic fieldgenerating device are configured to provide a time-varying magneticfield to the body area of the patient such that a muscle in the bodyarea of the patient is contracted; wherein the time-varying magneticfield has a magnetic flux density in a range of 0.5 Tesla to 7 Tesla anda repetition rate in a range of 0.1 Hz to 700 Hz; a movement structureconfigured to provide free movement of the first applicator and secondapplicator, wherein the movement structure comprises a gear traincomprising two gears.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising: afirst applicator comprising: a first magnetic field generating device; aapplicator comprising a second magnetic field generating device; whereinthe first magnetic field generating device and the second magnetic fieldgenerating device are configured to provide a time-varying magneticfield to the body area of the patient such that a muscle in the bodyarea of the patient is contracted; wherein the time-varying magneticfield has a magnetic flux density in a range of 0.5 Tesla to 7 Tesla anda repetition rate in a range of 0.1 Hz to 700 Hz; wherein the movementstructure is configured to provide movement between the first applicatorand movement structure in an angle having a range of 100 to 175°.

In some aspects, there is provided a treatment device for providing amagnetic treatment to a body area of a patient, the device comprising:an applicator comprising: a first portion comprising a first magneticfield generating device; a second portion comprising a second magneticfield generating device; wherein the first magnetic field generatingdevice and the second magnetic field generating device are configured toprovide a time-varying magnetic field to the body area of the patientsuch that a muscle in the body area of the patient is contracted;wherein the time-varying magnetic field has a magnetic flux density in arange of 0.5 Tesla to 7 Tesla and a repetition rate in a range of 0.1 Hzto 700 Hz; a movement structure configured to provide free movement ofthe first portion and second portion, wherein the movement structure isconfigured to provide movement between the first portion and movementstructure in an angle having a range of 100 to 175°.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated herein and form a partof the specification, illustrate the present disclosure and, togetherwith the description, further serve to explain the principles thereofand to enable a person skilled in the pertinent art to make and use thesame.

FIGS. 1 a-1 e illustrate exemplary diagrams of a treatment device.

FIG. 1 f illustrates exemplary individual parts of a treatment device.

FIG. 2 illustrates an exemplary communication diagram between parts ofthe treatment device such as an applicator, a remote control, anadditional treatment device and a communication device.

FIG. 3 illustrates an exemplary communication diagram between a serverand part of the treatment device such as applicators, remote control andadditional treatment devices.

FIG. 4 illustrates an exemplary communication diagram between acommunication medium, a therapy generator and a master unit of thetreatment device.

FIG. 5 illustrates a communication between a communication medium and atherapy generator of the treatment device.

FIG. 6 illustrates different views of an exemplary main unit of thetreatment device.

FIG. 7 illustrates an exemplary human machine interface (HMI).

FIGS. 8 a-8 e illustrate parts of an exemplary applicator from the outerview.

FIG. 9 a illustrates an exemplary magnetic field generating device fromthe applicator's floor projection.

FIG. 9 b illustrates a thickness of exemplary magnetic field generatingdevice.

FIGS. 10 a-10 u illustrate possible locations of an exemplary RFelectrode with regard to an exemplary magnetic field generating device.

FIGS. 11 a-11 i illustrate cross sectional views of a location of anexemplary RF electrode located with regard to an exemplary magneticfield generating device.

FIG. 12 illustrates a floor projection of an applicator including RFelectrodes and a magnetic field generating device with partial overlayaccording to the applicator's floor projection.

FIGS. 13 a-13 b illustrate exemplary RF electrodes with apertures.

FIG. 13 c illustrates an exemplary RF electrode with apertures,protrusions and cutouts.

FIG. 13 d illustrates an exemplary RF electrode with apertures andcutouts.

FIG. 13 e illustrates an exemplary RF electrode with protrusions.

FIGS. 14 a-14 e illustrate parallel pairs of bipolar RF electrodes withprotrusions.

FIGS. 15 a-15 c illustrate bipolar RF electrode pairs with protrusions,wherein a first RF electrode at least partially encircles a second RFelectrode of RF electrodes pair.

FIG. 16 illustrates one exemplary protrusion intersecting magnetic fieldlines with a difference higher than 0.1 T.

FIG. 17 illustrates an exemplary schema of a magnetic circuit.

FIG. 18 a illustrates an exemplary schema of electrical elements of atreatment device.

FIG. 18 b illustrates an exemplary schema of a RF circuit.

FIGS. 18 c-18 i illustrate exemplary schemas of electrical elements of atreatment device.

FIG. 19 a illustrates an exemplary composition of magnetic fieldincluding impulses or pulses.

FIG. 19 b illustrates an exemplary composition of radiofrequency fieldincluding impulses or pulses.

FIG. 20 illustrates a trapezoidal envelope.

FIG. 21 illustrates different types of muscle stimulation.

FIG. 22 illustrates a supporting matrix for attaching of an applicatorand/or an additional treatment device to a patient's body.

FIG. 23 illustrates a section of exemplary curved applicator's firstside portion.

FIG. 24 illustrates an exemplary symmetrization element SYM.

FIG. 25 a illustrates an exploded view of applicator elements.

FIGS. 25 b-f illustrates a crossection of exemplary applicator.

FIG. 26 illustrates an exemplary spatial arrangement of componentswithin a main unit of a treatment device.

FIGS. 27 a-27 d illustrate an example of synchronous application ofmagnetic fields.

FIG. 27 e illustrates an example of separate application of magneticfields.

FIG. 28 illustrates an exemplary increasing envelope of magnetic field.

FIG. 29 illustrates an exemplary decreasing envelope of magnetic field.

FIG. 30 illustrates an exemplary rectangular envelope of magnetic field.

FIG. 31 illustrates an exemplary combined envelope of magnetic field.

FIG. 32 illustrates an exemplary combined envelope of magnetic field.

FIG. 33 illustrates an exemplary triangular envelope of magnetic field.

FIG. 34 illustrates an exemplary trapezoidal envelope of magnetic field.

FIG. 35 illustrates an exemplary trapezoidal envelope of magnetic field.

FIG. 36 illustrates an exemplary trapezoidal envelope of magnetic field.

FIG. 37 illustrates an exemplary step envelope of magnetic field.

FIG. 38 illustrates an exemplary step envelope of magnetic field.

FIG. 39 illustrates an exemplary trapezoidal envelope of magnetic field.

FIG. 40 illustrates an example of envelope of magnetic field includingmodulation in domain of repetition rate.

FIG. 41 illustrates an exemplary trapezoidal envelope formed from trainsof magnetic field.

FIG. 42 illustrates an exemplary combined envelope of magnetic field.

FIG. 43 illustrates an exemplary combined envelope of magnetic field.

FIG. 44 illustrates two exemplary envelopes of magnetic field with anexample of inter-envelope period.

FIG. 45 a illustrates a front perspective view of a main unit of atreatment device according to an embodiment.

FIG. 45 b illustrates a rear perspective view of the main unit of thetreatment device of FIG. 45 a.

FIG. 46 illustrates a top view of the main unit of the treatment deviceof FIG. 45 a.

FIG. 47 illustrates a left side view of the main unit of the treatmentdevice of FIG. 45 a.

FIG. 48 illustrates a bottom view of the main unit of the treatmentdevice of FIG. 45 a.

FIG. 49 illustrates a rear view of the main unit of the treatment deviceof FIG. 45 a.

FIG. 50 illustrates a front view of the main unit of the treatmentdevice of FIG. 45 a.

FIG. 51 illustrates a right side view of the main unit of the treatmentdevice of FIG. 45 a.

FIG. 52 a illustrates a connecting attachment between the applicator andthe main unit.

FIG. 52 b illustrates an applicator connector.

FIGS. 52 c-52 d illustrate a connecting attachment between theapplicator connector and tube connector in connected and disconnectedpositions.

FIGS. 53 a-53 c illustrate exemplary RF electrodes according to someaspects of the disclosure.

FIGS. 54 a-54 f illustrate exemplary applicators comprising an RFelectrode including a substrate.

FIG. 54 g illustrates an RF electrode including sutures.

FIGS. 54 h-54 j illustrate an exemplary applicator including a pluralityof RF electrodes.

FIGS. 54 k-54 o illustrate exemplary positions of a plurality of RFelectrodes within and/or on the applicator.

FIG. 54 p illustrate an exemplary applicator including a plurality of RFelectrodes.

FIGS. 55 a-55 b illustrate an impedance element.

FIGS. 56 a-56 e illustrate exemplary schemas of electrical elements formechanical treatment.

FIG. 56 f illustrates an exemplary schema of electrical elements of atreatment device.

FIGS. 57 a-57 g illustrate exemplary applicators including a pressureoutlet.

FIGS. 58 a-58 b illustrate exemplary applicators comprising a pressureoutlet and a rim.

FIG. 59 illustrates an exemplary applicator comprising multiple pressureoutlets.

FIGS. 60 a-60 e illustrate exemplary applicators comprising anultrasound transducer.

FIGS. 61 a-61 t illustrate a floor projection of exemplary applicators.

FIGS. 61 u-61 x illustrate a cross sectional view from the front ofexemplary applicators.

FIG. 62 a illustrates a cross sectional view from the side of anexemplary applicator.

FIG. 62 b illustrates a cross sectional view from the side of anexemplary applicator.

FIG. 62 c illustrates a floor projection of a location of an exemplaryRF electrode with regard to an exemplary magnetic field generatingdevice within an exemplary applicator.

FIG. 62 d illustrates a floor projection of a location of an exemplaryRF electrode with regard to an exemplary magnetic field generatingdevice within an exemplary applicator.

FIG. 62 e illustrates a cross sectional view from the side of anexemplary applicator.

FIGS. 62 f and 62 g illustrate an exemplary applicator.

FIG. 63 illustrates an exploded view of applicator elements.

FIG. 64 illustrates a cross sectional view of an exemplary magneticfield generating device.

FIG. 65 illustrates the exemplary magnetic field generating device ofFIG. 64 .

FIG. 66 a illustrates a top view of an exemplary magnetic fieldgenerating device.

FIG. 66 b illustrates a bottom view of the exemplary magnetic fieldgenerating device of FIG. 66 a.

FIG. 66 c illustrates an isometric view of the exemplary magnetic fieldgenerating device of FIGS. 66 a and 66 b.

FIG. 67 illustrates an exemplary magnetic field generating device.

FIG. 68 illustrates an exemplary schema of electrical elements of atreatment device.

FIG. 69 a-69 d illustrate a cross sectional view from the side of anexemplary applicator.

FIGS. 70 a-70 e illustrate a cross sectional view from the front ofexemplary applicators.

FIGS. 70 f -701 illustrates a cross sectional view from the side ofexemplary applicators.

FIGS. 70 j-70 n illustrate a cross sectional view from the front ofexemplary applicators.

FIGS. 70 m-70 r illustrates a cross sectional view from the side ofexemplary applicators.

DETAILED DESCRIPTION

The present treatment device and method of use provide new physiotherapyand/or aesthetic treatment by combination of RF treatment and treatmentproviding muscle stimulation targeted to various treatment effects, suchas rejuvenate, heal and/or provide remodeling at least part of at leastone biological structure of patient's tissue in at least one body area.

The biological structure may be any tissue in a human and/or animal bodywhich may have of identical function, structure and/or composition. Thebiological structure may include or be at least part of any type oftissue like: connective tissue (e.g. tendons, ligaments, collagen,elastin fibres), adipose tissue (e.g. adipose cells of subcutaneousadipose tissue and/or visceral adipose tissue), bones, dermis and/orother tissue, such as at least one neuron, neuromuscular plate(neuromuscular junction), muscle cell, one or more individual muscles,muscle group, at least part of a muscle fibre, volume of extracellularmatrix, endocrine gland, neural tissue (e.g. peripheral neural tissue,neuron, neuroglia, neuromuscular plate) and/or joint or part of joint.For the purpose of this application, the biological structure may becalled target biological structure.

A treatment effect provided to at least part of at least one targetbiological structure may include muscle contraction (includingsupramaximal contractions and/or tetanic contractions), muscle twitch,muscle relaxation and heating of biological structure. The musclecontraction and heating may be provided at the same time. Also, thetreatment effect may include e.g. remodeling of the biologicalstructure, reducing a number and/or a volume of adipose cells byapoptosis and/or necrosis, muscle strengthening, muscle volume increase,causing of a muscle fibre hypertrophy, muscle fibre hyperplasia,restoration of muscle functionality, myosatellite cells proliferationand/or differentiation into muscle cells, improvement of muscle shape,improving of muscle endurance, muscle definition, muscle relaxation,muscle volume decrease, restructuring of collagen fibre,neocollagenesis, elastogenesis, collagen treatment, improving of bloodand lymph flow, accelerate of at least part of at least one targetbiological structure and/or other functions or benefits. Duringtreatment of body area by the treatment device, more than one treatmenteffect may be provided and variable treatment effects may be combined.

The treatment effect provided to target biological structure may resultsin body shaping, improving contour of the body, body toning, muscletoning, muscle shaping, body shaping, breast lifting, buttock lifting,buttock rounding and/or buttock firming. Further, providing a treatmenteffect may result in body rejuvenation, such as wrinkle reduction, skinrejuvenation, skin tightening, unification of skin colour, reduction ofsagging flesh, lip enhancement, cellulite removing, reduction of stretchmarks and/or removing of scars. The treatment effect may also lead toaccelerating of healing process, anti-edematic effect and/or otherphysiotherapeutic and treatment result.

The treatment device and method may be used at hospitals, beautyclinics, fitness centers, and/or at a home of the patient.

The treatment device and method may be used for physiotherapeutictreatments including treatment of pain, atrophy, and/or rehabilitationafter stroke. The other physiotherapeutic treatments may includetreatment of Achilles tendonitis, ankle distortion, anterior tibialsyndrome, arthritis of the hand, arthrosis, bursitits, carpal tunnelsyndrome, cervical pain, dorsalgia, epicondylitis, facial nerveparalysis, herpes labialis, hip joint arthrosis, impingementsyndrome/frozen shoulder, knee arthrosis, knee distortion, lumbosacralpain, nerve repair, onychomycosis, Osgood-Schlatter syndrome, painrelief, painful shoulders, patellar tendinopathy, plantar fasciitis/heelspur, tarsal tunnel syndrome, tendinopathy, and/or tendovaginitis.

The treatment device and method may be used for treatments of pelvicfloor tissues including urinary incontinence, fecal incontinence,bladder dysfunction, sexual dysfunction, erectile dysfunction, fertilityissues, pelvic pain, vulvodynia, dysmenorrhea, menopausal disordersand/or postmenopausal disorders.

The treatment device and method may provide prevention and/or treatmentof lifestyle diseases including atheroscelosis, hypertension, risk ofheart attack, risk of stroke, impaired glucose tolerance, gestationalimpaired glucose tolerance and/or diabetes. The term “diabetes” mayencompass diabetes type 1, diabetes type 2, protein-deficient pancreaticdiabetes, malnutrition-related diabetes mellitus, fibrocalculouspancreatic diabetes and/or gestational diabetes mellitus. The use of thetreatment device and providing muscle stimulation (e.g. musclecontraction) and/or heating to the patient's body may lead to preventionof glucose tolerance or insulin decrease. The use of the treatmentdevice and providing muscle stimulation (e.g. muscle contraction) and/orheating to the patient's body may lead to increase of release of insulinand/or glycogen. The use of the treatment device may lead to balance ofglucose blood level by changing the concentration of the glucose inblood. The use of treatment device may lead to balance of triglycerideblood level by changing the concentration of the triglyceride in blood.The use of the treatment device may lead to balance of cholesterol bloodlevel by changing the concentration of the cholesterol in blood. Thechange of concentration may be achieved by exercise provided by musclecontraction and/or by heating of the patient's body. The use of thedevice may improve glucose metabolism and/or improve transport of theglucose into the cells. Improvement of glucose transport into cells maylower the concentration of glucose in blood. Such effect may provideimprovement of insulin secretion.

The treatment device and method may be used for improvement of sportperformance by selective treatment of correct muscle groups. Further,the treatment device and method may be used for recovering of theathletes after exercise and/or injury. Further, the treatment device andmethod may be used for regeneration of at least one muscle afterexercise and/or injury. Further, the treatment device and method may beused for providing the exercise of the muscles and other parts of thepatient's body. For such treatment, the device may be used not only inhospitals or beauty clinics, but also in fitness studios and or at home.

The treatment device may provide one or more types of treatment energywherein treatment energy may include magnetic field (also referred asmagnetic energy) and RF field (also referred as RF energy) and/ormagnetic field (also referred as magnetic energy). The magnetic field isprovided during magnetic treatment. The RF field provided during RFtreatment may include electrical component of RF field and magneticcomponent of RF field. The electrical component of RF field may bereferred as RF wave or RF waves. The RF electrode may generate RF field,RF waves and/or other components of RF field. The RF electrode may be anelement generating an RF field, RF waves and/or other components of RFfield causing heating of biological structure and/or body area.

The magnetic field and/or RF field may be characterized by intensity. Incase of magnetic field, the intensity may include magnetic flux densityor amplitude of magnetic flux density. In case of RF field, theintensity may include energy flux density of the RF field or RF waves.

A body area may include at least part of patient's body including atleast a muscle or a muscle group covered by other soft tissue structurelike adipose tissue, skin and/or other. The body area may be treated bythe treatment device. The body area may be body part, such as a buttock,saddlebag, love handle, abdominal area, hip, leg, calf, thigh, arm,torso, shoulder, knee, neck, limb, bra fat, face or chin, forehead,back, lower back, chest, flank, pelvic floor and/or any other tissue.For the purpose of the description the term “body area” may beinterchangeable with the term “body region”.

Skin tissue is composed of three basic elements: epidermis, dermis andhypodermis so called subcutis. The outer and also the thinnest layer ofskin is the epidermis. The dermis consists of collagen, elastic tissueand reticular fibres. The hypodermis is the lowest layer of the skin andcontains hair follicle roots, lymphatic vessels, collagen tissue, nervesand also fat forming a subcutaneous white adipose tissue (SWAT). Adiposetissue may refer to at least one lipid rich cell, e.g. adipose cell likeadipocyte. The adipose cells create lobules which are bounded byconnective tissue or fibrous septa (retinaculum cutis).

Another part of adipose tissue, so called visceral adipose tissue, islocated in the peritoneal cavity and forms visceral white adipose tissue(VWAT) located between parietal peritoneum and visceral peritoneum,closely below muscle fibres adjoining the hypodermis layer.

A muscle may include at least part of a muscle fibre, whole muscle,muscle group, neuromuscular plate, peripheral nerve and/or nerveinnervating of at least one muscle.

Deep muscle may refer to a muscle that is at least partially covered bysuperficial muscles and/or to a muscle covered by a thick layer of othertissue, such as adipose tissue wherein the thickness of the coveringlayer may be at least 4, 5, 7, 10 cm and up to 15 cm thick.

Individual muscles may be abdominal muscles including rectusabdominalis, obliquus abdominalis, transversus abdominis, and/orquadratus lumborum. Individual muscles may be muscle of the buttocksincluding gluteus maximus, gluteus medius and/or gluteus minimus.Individual muscles may be muscles of lower limb including quadricepsfemoris, Sartorius, gracilis, biceps femori, adductor magnuslongus/brevis, tibialis anterior, extensor digitorum longus, extensorhallucis longus, triceps surae, gastroenemiis lateralis/medialis,soleus, flexor hallucis longus, flexor digitorum longus, extensordigitorum brevis, extensor hallucis brevis, adductor hallucis, abductorhalluces, ab/adductor digiti minimi, abductor digiti minimi and/orinterossei plantares). Ligament may be Cooper's ligament of breast.

One example may be application of the treatment device and method topatient's abdomen that may provide (or where the treatment mayeventually result in) treatment effect such as reducing a number andvolume of adipose cells, muscle strengthening, fat removal,restructuring of collagen fibres, accelerate of neocollagenesis andelastogenesis, muscle strengthening, improving of muscle functionality,muscle endurance and muscle shape. These treatment effects may causecircumferential reduction of the abdominal area, removing of saggy bellyand/or firming of abdominal area, cellulite reduction, scar reductionand also improving of the body posture by strengthening of the abdominalmuscles that may also improve contour of the body, body look andpatient's health.

One other example may be application of the treatment device and methodto body area comprising buttock that may provide (or where the treatmentmay eventually result in) treatment effect such as reducing a number andvolume of adipose cells, restructuring of collagen fibres, accelerate ofneocollagenesis and elastogenesis, muscle strengthening, muscle toningand muscle shaping. These treatment effects may cause waist or buttockcircumferential reduction, buttock lifting, buttock rounding, buttockfirming and/or cellulite reduction.

Another example may be application of the treatment device and method tobody area comprising thighs that may provide (or where the treatment mayeventually result in) reduction of a number and volume of adipose cells,muscle strengthening, muscle shaping and muscle toning. The applicationof the treatment device and method to body area comprising thigh maycause circumferential reduction of the thigh, removing of saggy bellyand cellulite reduction.

Still another example may be application of the treatment device andmethod to body area comprising arm that may provide (or where thetreatment may eventually result in) reduction of a number and volume ofadipose cells, muscle strengthening, muscle shaping and muscle toning.The application of the treatment device and method to body areacomprising arm may cause circumferential reduction of the abdomen,removing of saggy belly and cellulite reduction.

The one or more treatment effects provided to one or more targetbiological structures may be based on selective targeting of a RF fieldinto one or more biological structures and providing heating togetherwith application of magnetic field causing muscle stimulation (includingmuscle contraction). The RF treatment may cause selective heating of oneor more biological structures, polarizing of extracellular matrix and/orchange of cell membrane potential in a patient's body. The magneticfield may be time-varying magnetic field or static magnetic field. Whenthe time-varying magnetic field is used, the magnetic treatment may bereferred as time-varying magnetic treatment. The magnetic treatment maycause muscle contraction, muscle relaxation, cell membrane polarization,eddy currents induction and/or other treatment effects caused bygenerating time-varying magnetic field in at least part of one or moretarget biological structures. The time-varying magnetic field may induceelectric current in a biological structure. The induced electric currentmay lead to muscle contraction. The muscle contractions may berepetitive. Muscle contraction provided by magnetic field may includesupramaximal contraction, tetanic contraction and/or incomplete tetaniccontraction. In addition, magnetic field may provide muscle twitches.

The treatment effect provided by using of the treatment device and byapplication of magnetic treatment and RF treatment may be combined. Forexample, reduction of a number and volume of adipose cells may beachieved together with muscle strengthening, muscle shaping and/ormuscle toning during actual treatment or during a time (e.g. three orsix months) after treatment. Furthermore, the effect provided by usingof the treatment device by application of magnetic treatment and RFtreatment may be cumulative. For example, the muscle toning may beachieved by combined reduction of a number and volume of adipose cellswhich may be achieved together with muscle strengthening.

The method of treatment may provide the treatment effect to at least oneof target biological structure by thermal treatment provided by RF fieldin combination with applied magnetic treatment. The treatment effect toa target biological structure may be provided by heating at least onebiological structure and evoking at least a partial muscle contractionor muscle contraction of a muscle by magnetic treatment.

The method of treatment may enable heating of the body area where themuscle contraction by the magnetic field is evoked. The heating mayminimize muscle injury and/or ligament injury including tearing orinflammation. Heating of a contracting muscle and/or adjacent biologicalstructure may also shift the threshold of uncomfortable treatment.Therefore, heating caused by the RF field may allow a higher amount ofmagnetic energy to be delivered into patient's biological structure todo more muscle work. Heating of the muscle and/or adjacent biologicalstructure may also improve the quality of and/or level of musclecontraction. Because of heating provided by RF field, more muscle fibresand/or longer part of the muscle fibre may be able to contract duringthe magnetic treatment. Heating may also improve penetration of musclestimuli generated by the magnetic treatment. Additionally, when at leastpartial muscle contraction or muscle contraction is repeatedly evoked,the patient's threshold of uncomfortable heating may also be shiftedhigher. Such shifting of the threshold may allow more RF energy to bedelivered to the patient's body.

Repeated muscle contraction followed by muscle relaxation in combinationwith heating may suppress the uncomfortable feeling caused by musclestimulation (e.g. muscle contraction). Muscle stimulation in combinationwith heating may provide better regeneration after treatment and/orbetter prevention of panniculitis and other tissue injury.

Repeated muscle contraction followed by muscle relaxation in combinationwith RF heating (according to preliminary testing) may have positiveresults in treatment and/or suppressing symptoms of diabetes. Therepetitive muscle contraction induced by provided magnetic fieldtogether with heating of the biological structure by RF field may alsoimprove the outcome of diabetes symptoms or positively influence resultsof diabetes symptoms drug treatment. Success of treatment of diabetessymptoms may be caused by penetration of high amount of radiofrequencyenergy deep to patient's abdomen area. Such penetration may be caused bysimultaneous application of magnet treatment that may cause suppressingof patient's uncomfortable feelings related to high amount of RF energyflux density and increased temperature in the tissue. Also, magnettreatment may cause polarization and depolarization of patient's tissuethat may also increase RF energy penetration to patient's body. The RFtreatment and/or magnetic treatment may influence glucose metabolism orhelp with weight loss that may suppress diabetes symptoms. It isbelieved that weight loss and exercise of patients with diabetessymptoms may help suppress diabetes symptoms.

Application of RF treatment by RF field combined with magnetic treatmentby magnetic field may also positively influence proliferation anddifferentiation of myosatellite cells into muscle cells. Tests suggestthat magnet treatment including time periods with different duration,repetition rate and magnetic flux density (e.g. pulses or trains asdefined below) may provide a stimulation needed to start proliferationand differentiation of myosatellite cells.

Testing also suggest that method of treatment providing magnetic fieldincluding at least two or at least three successive time periods withdifferent duration, repetition rate and magnetic flux density (e.g.pulses, bursts or trains as defined below) may provide a shock to themuscle. As a consequence, the regeneration process resulting inproliferation and differentiation of myosatellite cells may be startedand further accelerated by delivered RF field. Proliferation anddifferentiation of myosatellite cells may result in musclestrengthening, restoration of muscle functionality, increasing musclevolume and improvement of muscle shape, body tone or muscle tone.

The method of application of at least partial muscle stimulation ormuscle contraction together with heating to the same body area mayresult in hyperacidity of the extracellular matrix. Hyperacidity maylead to apoptosis of adipose tissue and acceleration of weight loss andbody volume loss. Hyperacidity may be caused by release of fatty acidsinto the extracellular matrix, wherein the release of fatty acids may becaused by concentrated high intensity muscle work. Concentrated highintensity muscle work may be provided by high number of repetitivemuscle contractions causes by application of time-varying magnetic fieldgenerated by described magnetic field generating device and treatmentdevice.

The treatment effect of the RF treatment may be enhanced by magnetictreatment, such as by reducing or eliminating the risk of panniculitisor local skin inflammation since any clustering of the treatedadipocytes may be prevented by the improved metabolism. The improvedblood and/or lymph flow may contribute to removing adipocytes. Theremoval of adipocytes may be promoted by a higher number of cellsphagocytosing the adipocytes as well. Synergic effects of magnetictreatment and radiofrequency (RF) treatment significantly improvesmetabolism. Therefore, the possibility of adverse event occurrence islimited, and treatment results induced by the present device and methodare reached in shorter time period.

The treatment device and the method of a treatment may provide treatmentof the same patient's body area, wherein the magnetic treatment and theRF treatment may be targeted into at least part of one or morebiological structures. One or more volumes of patient's body tissueaffected by targeted RF and/or magnetic treatment may be in proximity.The volume of at least part of at least one or more affected biologicalstructures of patient's body tissue may be defined as an affected tissuevolume wherein the treatment effect provided by treatment device and/ormethod of treatment described above takes place. The treatment effectmay be caused by repeated muscle contraction (provided e.g. magnetictreatment) changing of a tissue temperature (provided e.g. RFtreatment), and/or by at least partial polarization and acceleration ofmolecules in the patient's tissue (preferably provided by RF treatmentand magnetic treatment). Changing of a tissue temperature may includee.g. an increasing tissue temperature of at least 3° C. or 4° C. or 5°C. or 6° C. or 7° C. or 10° C. with reference to normal tissuetemperature. Further, changing of a tissue temperature may include anincrease or decrease of tissue temperature in the range of 1° C. to 50°C. or 2° C. to 30° C. or 2° C. to 25° C. as compared to the untreatedtissue located in the same or different body area. Changed tissuetemperature may be interpreted as change of temperature in any volume orany area of the biological tissue.

Proximity of affected tissue volumes by at least one RF treatment and/orby at least one magnetic treatment has meaning of a distance between twoaffected tissue volumes. At least two proximate affected tissue volumesmay have at least partial overlay wherein 2% to 15% or 5% to 30% or 2%to 100% or 30% to 60% or 80% to 100% or 40% to 85% of smaller affectedtissue volume may be overlaid by larger affected tissue volume. Also thedistance between volumes of affected tissue may be in a range of 0.01 cmto 10 cm or in the range of 0.01 cm to 5 cm, 0.01 cm to 3 cm, or 0.01 cmto 1 cm. Alternatively, the overlay in the ranges mentioned above mayapply for two or more affected tissue volumes having an identical volumewithout any differentiation between smaller or larger tissue volumes.

FIGS. 1 a-1 e show exemplary schematic diagrams of the treatment device.The diagrams may apply only to main unit and applicator. The treatmentdevice may include input interface 103, control system 104, power source105, power network 106, one or more treatment clusters 107 and one ormore treatment energy sources 108.

Plurality of treatment energy sources 108 may be coupled to orcommunicate with at least one treatment cluster 107. Control system 104may be coupled to and communicate with each treatment cluster.

Shown parts of treatment device in FIGS. 1 a-1 e may be electricalelements of circuitry. Also, one or more shown parts of diagrams inFIGS. 1 a-1 e may include plurality of individual electrical elements.Electrical elements may generate, transfer, modify, receive or transmitelectromagnetic signal (e.g. electrical) signal between individualelectrical elements. The electromagnetic signal may be characterized bycurrent, voltage, phase, frequency, envelope, value of the current,amplitude of the signal and/or their combination. When theelectromagnetic signal reaches the treatment energy source, therespective treatment energy source may generate treatment energy and/orfield.

Input interface 103 may receive input from a user. Input interface mayinclude human machine interface (HMI). The HMI may include one or moredisplays, such as a liquid crystal display (LCD), a light emitting diode(LED) display, an organic LED (OLED) display, which may also include atouch-screen display. HMI may include one or more controlling elementsfor adjustment or controlling treatment device. Controlling element maybe at least one button, lever, dial, switch, knob, slide control,pointer, touchpad and/or keyboard. The input interface may communicateor be coupled to control system or power network.

The user may be an operator (e.g. medical doctor, technician, nurse) orpatient himself, however the treatment device may be operated by patientonly. In most cases, the treatment device may be operated by the userhaving an appropriate training. The user may be any person influencingtreatment parameters before or during the treatment in most cases withexception of the patient.

Control system 104 may include a master unit or one or more controlunits. Control system may be an integral part of the input interface103. Control system 104 may be controlled through the input interface103. Control system may include one or more controlling elements foradjustment or controlling any part or electrical elements of treatmentdevice. Master unit is a part of treatment device (e.g. applicatorand/or main unit) or electrical element of circuitry that may beselected by the user and/or treatment device in order to providemaster-slave communication including high priority instructions to otherparts of the treatment device. For example, master unit may be a controlunit or part of input interface providing high priority instructions toother parts of the treatment device. The treatment device may include achain of master-slave communications. For example, treatment cluster 107may include one control unit providing instructions for electricalelements of the treatment cluster 107, while the control unit oftreatment cluster 107 is slave to master unit. Control system 104 may becoupled or communicate with input interface 103, one or all power source105, power network 106, and/or with one or all treatment clusterspresent in the treatment device. The control system 104 may include oneor more processors (e.g. a microprocessors) or process control blocks(PCBs).

The power source 105 may provide electrical energy including electricalsignal to one or more treatment clusters. The power source may includemodule converting AC voltage to DC voltage.

The power network 106 may represent a plug. The power network mayrepresent a connection to power grid. However, the power network mayrepresent a battery for operation of the treatment device without needof a power grid. The power network may provide electrical energy neededto operation to whole treatment device and/or its parts. As shown onexemplary diagrams in FIGS. 1 a-1 e , the power network provideselectrical energy to input interface 103, control system 104 and powersource 105.

The treatment cluster 107 may include one or more electrical elementsrelated to generation of respective treatment energy. For example, thetreatment cluster for magnetic treatment (referred as HIFEM) may includee.g. an energy storage element and switching device. For anotherexample, the treatment cluster for RF treatment (referred as RF cluster)may include e.g. power amplifier and/or filter.

The treatment energy source 108 may include a specific source oftreatment energy. In case of magnetic treatment, the treatment energysource of magnetic field may be a magnetic field generating device e.g.a magnetic coil. In case of RF treatment, the treatment energy source ofRF energy (including RF waves) may be RF electrode.

The treatment device may include one or more treatment circuits. Onetreatment circuit may include a power source, electrical elements of onetreatment cluster and one respective treatment energy source. In case ofmagnetic treatment, the magnetic circuit may include a power source,HIFEM cluster and magnetic field generating device. In case of RFtreatment, the RF circuit may include a power source, RF cluster andmagnetic field generating device. The RF circuit may include a powersource, RF cluster and at least one RF electrode. The electromagneticsignal generated and/or transmitted within a treatment circuit for RFtreatment (also referred as RF circuit) may be referred as RF signal.The wiring connecting respective electrical elements of the onetreatment cluster may also be included in the respective cluster. Eachof the treatment clusters in FIGS. 1 a-1 e described in the detail belowmay be any of HIFEM, RF or combination.

The one or more treatment circuits and/or their parts may beindependently controlled or regulated by any part of control system 104.For example, the speed of operation of HIFEM cluster of one treatmentcircuit may be regulated independently on the operation of HIFEM clusterof another treatment circuit. In some aspects, the amount of energy fluxdensity of delivered by operation of RF electrode of one treatmentcircuit may be set independently from the operation of RF electrode ofanother treatment circuit.

FIG. 1 a shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, two treatment clusters including treatment cluster A 107 a,treatment cluster B 107 b, treatment energy source A 108 a and treatmentenergy source B 108 b. In such case, treatment device may include twotreatment circuits. One treatment circuit may include a power source105, treatment cluster A 107 a and/or treatment energy source A 108 a.Another treatment circuit may include a power source 105, treatmentcluster B 107 b and/or treatment energy source B 108 b. Treatmentclusters 107 a and 107 b may communicate with each other.

FIG. 1 b shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, two power sources including apower source A 105 a and a power source B 105 b, power network 106, twotreatment clusters including treatment cluster A 107 a and treatmentcluster B 107 b, treatment energy source A 108 a and treatment energysource B 108 b. In such case, treatment device may include two treatmentcircuits. One treatment circuit may include a power source 105 a,treatment cluster A 107 a and/or treatment energy source A 108 a.Another treatment circuit may include a power source B 105 b, treatmentcluster B 107 b and/or treatment energy source B 108 b. Treatmentclusters 107 a and 107 b may communicate with each other.

FIG. 1 c shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, two treatment clusters including treatment cluster A 107 a andtreatment cluster B 107 b and one treatment energy source 108. In suchcase, treatment device may include two treatment circuits. One treatmentcircuit may include a power source 105, treatment cluster A 107 a and/ortreatment energy source 108. Another treatment circuit may include thepower source 105, treatment cluster B 107 b and/or treatment energysource 108. Treatment clusters 107 a and 107 b may communicate with eachother. The shown diagram may include a magnetic field generating deviceproviding both RF treatment and magnetic treatment.

FIG. 1 d shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, power source 105, power network106, four treatment clusters including treatment cluster A1 107 a,treatment cluster A2 107 aa, treatment cluster B1 107 b, treatmentcluster B2 107 bb and four treatment energy sources including treatmentenergy source A1 108 a, treatment energy source A2 108 aa, treatmentenergy source B1 108 b and treatment energy source B2 108 bb. In suchcase, treatment device may include four treatment circuits. Firsttreatment circuit may include a power source 105, treatment cluster A1107 a and/or treatment energy source 108 a. Second treatment circuit mayinclude the power source 105, treatment cluster A2 107 aa and/ortreatment energy source A2 108 aa. Third treatment circuit may include apower source 105, treatment cluster B1 107 b and/or treatment energysource B1 108 b. Fourth treatment circuit may include a power source105, treatment cluster B2 107 bb and/or treatment energy source B2 108bb. The treatment energy sources of the first treatment circuit andsecond treatment circuit may be positioned in one applicator, and thetreatment energy sources of the third treatment circuit and fourthtreatment circuit may be positioned in another applicator.

FIG. 1 e shows an exemplary diagram of the treatment device includinginput interface 103, control system 104, two power sources includingpower source A 105 a and power source B 105 b, power network 106, fourtreatment clusters including treatment cluster A1 107 a, treatmentcluster A2 107 aa, treatment cluster B1 107 b, treatment cluster B2 107bb and four treatment energy sources including treatment energy sourceA1 108 a, treatment energy source A2 108 aa, treatment energy source B1108 b and treatment energy source B2 108 bb. In such case, treatmentdevice may include four treatment circuits. First treatment circuit mayinclude a power source A 105 a, treatment cluster A1 107 a and/ortreatment energy source 108 a. Second treatment circuit may include apower source A 105 a, treatment cluster A2 107 aa and/or treatmentenergy source A2 108 aa. Third treatment circuit may include a powersource B 105 b, treatment cluster B1 107 b and/or treatment energysource B1 108 b. Fourth treatment circuit may include a power source B105 b, treatment cluster B2 107 bb and/or treatment energy source B2 108bb. The treatment energy sources of the first treatment circuit andsecond treatment circuit may be positioned in one applicator, and thetreatment energy sources of the third treatment circuit and fourthtreatment circuit may be positioned in another applicator.

FIG. 1 f illustrates individual parts of the treatment device, includinga main unit 11 connected or coupled to at least one applicator 12, aremote control 13, an additional or additional treatment device 14,and/or a communication device 15. The additional treatment device may beon the same level of independency as the whole treatment device.

The treatment device may include a remote control 13. Remote control 13may include a discomfort button for safety purposes so that when apatient feels any discomfort during the treatment, the user may pressthe discomfort button. When the discomfort button is pressed, remotecontrol 13 may send a signal to a main unit and stop treatment. Also,the remote control 13 may inform the user through a human machineinterface (HMI). In order to stop treatment during discomfort, theoperation of the discomfort button may override the instructions frommaster unit. Alternatively, the discomfort button may be coupled to orbe part of the main unit 11.

The main unit 11 may be coupled or connected to one or more additionaltreatment devices 14 that may be powered by the main unit 11. However,the treatment device including main unit 11 may be paired by softwarewith the one or more additional treatment devices 14. Also, one or moreadditional treatment devices 14 may be also powered by their own sourceor sources of energy. The communication device 15, additional treatmentdevice 14, remote control 13 and at least one applicator 12 may eachcommunicate with the main unit 11. Communication may include sendingand/or receiving information. Communication may be provided by wireand/or wirelessly, such as by internet network, local network, RF waves,acoustic waves, optical waves, 3G, 4G, 5G, GSM, HUB switch, LTE network,GSM network, Bluetooth and/or other communication methods or protocols.

The additional treatment device 14 may be any device that is able toprovide at least one type of treatment energy (e.g.: RF field, magneticfield, ultrasound, light, time-varied mechanical pressure, shock wave,or electric current) to a patient's body to cause treatment effect to atleast one target biological structure. The additional treatment device14 may include at least one electrical element generating treatmentenergy for at least one treatment, e.g. magnetic, radiofrequency, light,ultrasound, heating, cooling, massage, plasma and/or electrotherapy. Theadditional treatment device 14 may be able to provide at least onetreatment without instructions from the main unit 11. The additionaltreatment device 14 may communicate with the main unit 11, communicationdevice 15 and/or other additional treatment devices 14. The additionaltreatment devices 14 may be any other device of the same or othercompany wherein the device may be able to provide specific one or moretype of treatment energy. The additional treatment device 14 may be anextension of the treatment device, wherein the additional treatmentdevice 14 may provide treatment energy with parameters defined by theHMI of the main unit 11.

The communication device 15 may be connected by wire and/or wirelesslyto the main unit 11. The communication device 15 may be a computer, suchas a laptop or desktop computer, or a mobile electronic device, such asa smartphone, or an electronic tablet. The communication device may sendand/or receive information linked with a treatment, functionality of thetreatment device, and/or other information. The additional treatmentdevice 14 and/or the communication device 15 may communicate directlywith the main unit 11 or indirectly with the main unit 11 through one ormore additional or communication devices. In order to providecommunication the communication device may include receiver, transmitterand a control unit to process sent and/or received information.

Sent and/or received information from or to an individual part of thetreatment device may include data from communication betweencommunication device 15 and the main unit 11, data from communicationbetween applicator 12 and the main unit 11, data from communicationbetween additional treatment device 14 and the main unit 11 and/or datafrom communication between the remote control 13 and the main unit 11.Sent and/or received information may be stored in a black box, cloudstorage space and/or other storage devices. The black box may be part ofthe main unit 11 or any other part of the treatment device. Otherstorage device may be USB, other memory device and/or also communicationdevice with internal memory. At least part of sent and/or receivedinformation may be also displayed by HMI. Sent and/or receivedinformation may be displayed, evaluated and/or changed by the userthrough the HMI and/or automatically by control system. One type of thesent and/or received information may be predetermined or current valueor selection of one or more treatment parameters or patient information.Patient information may include e.g. gender of a patient, age and/orbody type of the patient.

Sent and/or received information may also inform external authorities,like a support centre, e.g. a service and/or a sale department, that arealso subset of communication devices. Sent and/or received informationto external authorities may include information about the condition ofthe treatment device, history of one or more provided treatments,operational history of the treatment device, software updateinformation, wear out information, durability of the RF electrode,durability of the magnetic field generating device, treatment warnings,treatment credit/billing information, such as information of number ofpaid treatments or credits, and/or other operation and usageinformation.

One possible type of sent and/or received information may be recognitionof connection of one or more applicators 12, the remote control 13,additional treatment devices 14, and/or communication devices 15,According to information the treatment device may manually orautomatically recognize type of connected additional treatment device 14and/or applicator 12. Automatic recognition may be provided by controlsystem. Based on information about connection of one or more applicators12, connection of additional treatment devices 14 and/or communicationdevices 15, the treatment device may provide actualization of HMI, shownotification about the connection to applicators and/or possibleoptimization of new treatment options. Possible optimization of newtreatment options may include e.g. adjusting of at least one treatmentparameter, implementing additional treatment energy source, change ofparameters of new treatment energy source and/or other. The treatmentdevice (e.g. control system) may automatically adjust or offeradjustment of treatment parameters based on newly connected applicator12 and/or additional treatment devices 14. Recognition of connectedapplicator 12, additional treatment device 14 and/or communicationdevice 15 may be based on by specific connectors (e.g., a specific pinconnector). Also, the recognition of connection may be provided by aspecific physical characteristic like an impedance of connected part orby a specific signal provided by the applicator or its connected part tothe main unit 11. Connection between individual parts of the treatmentdevice such as the main unit 11, the applicator 12, the remote control13, the additional treatment device 14 and/or the communication device15 may be provided by wire and/or wirelessly (e.g. by RFID tag, RF,Bluetooth, and/or light electromagnetic pulses). The applicator 12 mayby connected to the main unit 11 by a wire to be powered sufficiently.Alternatively, the application may be connected through a wirelessconnection in order to communicate with the main unit 11 and/or withcommunication device 15. Connected applicator 12, additional treatmentdevice 14 and/or communication device 15 may be recognized by softwarerecognition, specific binary ID, manual recognition of the partsselected from the list implemented in the treatment device, and/or by apairing application.

The connector side in the main unit 11 may include a unit able to readand/or recognize information included in the connector side of theapplicator and/or connector side of the additional treatment device.Based on read and/or recognized information, the applicator and/or theadditional treatment device may be recognized by main unit 11. Theconnector side of the main unit 11 may serve as a first side connectorof the connection, wherein the connection of the applicator oradditional treatment device may serve as a second side connector of theconnection. Sending of the information, receiving of the informationand/or recognition of the second side connector by the first sideconnector may be based on binary information received by conductivecontact between these two connector sides, by optical reading and/or byrecognition provided by the first side connector. Optical recognitionmay be based on, for example, reading of specific QR codes, barcodes andthe like for the specific applicators 12.

The first side connector located in the main unit 11 may include a unitable to read/recognize binary information implemented in the second sideconnector of a cable from the applicator 12 and/or additional treatmentdevice 14. Implemented information in the second side connector may bestored in an SD card. Based on such implemented information any part ofthe treatment device may be recognized by the main unit 11.

Communication between individual parts of the treatment device(including e.g. the main unit 11, the remote control, one or moreapplicators, one or more additional treatment devices and/orcommunication devices) may be based on peer-to-peer (referred as P2P)and/or master-slave communication. During P2P communication, theindividual parts of the treatment device have the same priority of itscommands and/or may communicate directly between each other. P2Pcommunication may be used during initial recognition of connectedindividual parts of the treatment device. P2P communication may be usedbetween some parts of the treatment device during a treatment, such asbetween communication devices.

Master-slave communication may be used between individual parts of thetreatment device for at least a short time during, before and/or aftereach treatment of individual patient. During master-slave communication,one part of the treatment device may provide commands with the highestpriority. The individual part of the treatment device, e.g. as the mainunit 11 may provide commands with the highest priority and is referredas master unit. The treatment device may include at least onemaster-slave communication between an individual electrical element,such as a power source and or one or more control units, where the oneor more control units act as master.

The master unit may be selected by a user before, after and/or duringthe treatment. The user may select master unit from available individualparts or electrical elements of the treatment device. Therefore, theuser may select the main unit 11, the applicator 12, the remote control13, the additional treatment device 14 or the communication device 15 asthe master unit. The master unit may be a control unit in selectedpresent in individual part of the treatment device e.g. a control unitin the main unit 11. The user may select the master unit in order tofacilitate adjusting of treatment parameters. The user may also selectthe communication device 15 as a master unit, wherein the communicationdevice selected as master device may provide control of more than onetreatment device. The main unit 11 may include a control unit as amaster unit that monitor and evaluate at least one parameter of thetreatment, such as patient's temperature, voltage on individual elementsof the treatment device and/or other, that enable to provide safetreatment even if the connection between. Also, the master unit may beindependent electrical element outside of human machine interface. Themaster unit may be controlled by user through human machine interface.

Alternatively, the master unit may be selected automatically based on apredetermined priority value of the connected parts of the treatmentdevice. Selected master unit may remain unchanged and already selectedpart of the treatment device may act as the master unit during the wholetreatment. However, the selection of master unit may be changed duringthe treatment based on command priority and/or choice of the user. Themaster unit may be also determined according to manufacturingconfiguration or being dependent on factory reset. For example, theremote control 13 may provide command with the highest priority to stopthe treatment when patient feels discomfort and the treatment will bestopped without relevance of which individual part of the treatmentdevice was set as the master unit and set parameters of the treatment.

FIGS. 2-5 illustrate several possible master-slave communication schemesthat may be used in communication between the main unit 11 and one ormore applicators 12, remote controls 13, additional treatment devices14, and/or communication devices 15. According to FIG. 2 , one or moretherapy generators 201 generate a modified electrical signal in order toprovide a signal to a treatment energy source, such as the RF electrodeand/or the magnetic field generating device. The therapy generators 201may include a group of electrical elements or at least two members ofthe group of electrical elements present in the circuitry of thetreatment device and/or main unit. The group of electrical elements mayinclude a control unit, power source, system of coaxial cables, one ormore switches, one or more energy storage devices, one or more pindiodes, one or more LC circuits, one or more LRC circuits, one or morepower amplifiers and/or other part of the treatment device activelymodifying electrical signal in controlled manner. The therapy generatormay provide modifying of electrical signal in controlled manner.

Modifying electrical signal in controlled manner may include e.g.providing and/or controlling impedance adjustment of provided RFtreatment based on impedance matching measured across patient's tissueand/or RF electrodes. Actively modified electrical signal may beinterpreted such that electrical signal may have different parameters,such as frequency, symmetrization, amplitude, voltage, phase, intensity,etc. The parameters of electrical signal may be based on requirements oftreatment including the type of the patient, treatment parameters. Inaddition, the parameters of electrical signal may be modified onfeedback information, such as measured standing wave ratio of RF energy,temperature of tissue, temperature of RF electrode, temperature of theinside of the applicator, temperature of the surface of the applicator,electric current and voltage of individual elements of the treatmentdevice and/or other.

The diagram of FIG. 2 shows a security 203 that prevent any unauthorizedintrusion to the treatment device communication and protects personaluser data and/or account. The security 203 may protect the treatmentdevice from computer viruses, unauthorized access and/or protect thecommunication between individual parts of the treatment device fromreading or change by unauthorized medium or person. The security 203 mayprovide coding of the information used in communication and/or antivirusservices preventing intrusion of unwanted binary code into the treatmentdevice and/or communication. The security 203 may correct mistakescreated during the communication. The security 203 may block connectionof unauthorized/unwanted external device to the treatment device.

The security 203 in FIG. 2 may be located in the communication diagrambetween the master unit 202 and a communication interface 204. Thesecurity 203 may also be part of an element user 208, a service 207,and/or a sale 206. The security 203 may be located also between thecommunication interface 204 and a communication medium 205, the therapygenerator 201, and/or may be part of them.

The communication interface 204 may include hardware and/or softwarecomponents that enables to translate electric, electromagnetic, infraredand/or other signal into readable form to enable communication betweenat least two parts of the treatment device and/or other communicatingsides or medium. The communication interface 204 may providecommunication and/or coding of the information and/or data. Thecommunication interface 204 may be, for example, a modem or GSM moduleproviding communication between the treatment device and online networkor server. The communication interface 204 may be part of the masterunit 202, the therapy generator 201, and/or other part of the treatmentdevice.

The communication medium 205 may be medium transferring communicationdata. The communication medium 205 may be used in communication betweenthe treatment device and the user 208, the service 207 and/or the sale206. The communication medium 205 may be a wire, SD card, flash memory,coaxial wire, any conductive connection, server, some kind of network onprinciple, such as RF waves, acoustic waves, optic waves, GSM, 3G, 4G,5G, HUB switch, Bluetooth, Wi-Fi and/or other medium which may includeone or more servers.

Communication data/information may be redirected to the individual partsof the treatment device and/or to individual users or services, such asthe user 208, the service 207 and/or the sale 206. Communicationdata/information may be redirected by the master unit 202, thecommunication medium 205 and/or the therapy generator 201. For example,server may filter data for the user 208 and filter other communicationinformation that will be redirecting to the service 207, control unitand/or other part of the treatment device.

The element called “user 208” of FIG. 2 may be a representation of theHMI controlled by a user. Alternatively, the element called “user 208”of FIG. 2 may a representation of the other communication device(personal computer, laptop, mobile, tablet, etc.) controlled by user,wherein the communication device may send information to at least onepart of the treatment device and/or receive information from at leastone part of the treatment device. Information provided by thiscommunication channel may be a type of a treatment protocol, informationabout treatment effect, actual value and/or predetermined value of oneor more treatment parameters, feedback information, selection of treatedbody area, recommendations of behaviour before and after the treatmentand/or other information. At least part of the information may be sentto the user controlling the treatment device and also to the patient,such as by a software application for mobile phone, tablet or laptop.

The service 207 in FIG. 2 may represent a service department that hasauthorized access to information about the treatment device. The service207 may be the service department of the company providing ormanufacturing the treatment device wherein the communication between theservice department of the company and the user may be provided throughthe HMI, a communication device and/or automatically throughpre-programmed software interface. Information provided by thiscommunication channel may include wear of individual electrical elementof the treatment device, durability of any RF electrode and/or magneticfield generating device, malfunction of an individual electricalelement, possible software optimization and/or actualization of thedevice, providing applications for connection of another additionaltreatment device and/or other. Optimization and/or actualization of thetreatment device may include e.g. a remote access to the treatmentdevice software and/or fixing errors.

The sale 206 in FIG. 2 may be a sales department with authorized accessto information about the treatment device. The sale 206 may inform theuser about a type of accessories which may be added to the treatmentdevice. Further the sale 206 may mediate sales of the plug-in modulesand/or mediate sales of accessories of the treatment device.Furthermore, the sale 206 may provide an offer linked with billing andrenting system. Information exchanged by communication to or from sale206 may be, for example, the number of treatments, time of treatments,and/or type of applied treatment, information about applicators and/orothers.

The treatment device may include a black box for storing a dataregarding the treatment history, operational history, communicationbetween individual parts of the treatment device, data from or for abilling and renting system, operational errors, and/or otherinformation. The data may be accessible to the sale 206, to the service207 and/or to the user 208 via the communication medium (e.g., a storagecloud and/or server). The treatment device may include a billing andrenting system to manage charges for using of the treatment deviceand/or respective additional treatment devices. The billing and rentingsystem may send such information to a provider in order to prepare thebilling invoice. Data from the black box may be downloaded by verifiedauthorized personnel, such as a service technician, accountant and/orother person with administrator access. Verification of the authorizedperson may be provided by specific key, password, software code ofseveral bits and/or by specific interconnecting cable.

The billing and renting system may be based on credits subtracted from auser account. Credits may be predefined by the provider of the treatmentdevice, e.g. a producer of the treatment device. Credits may berecharged during the time when the treatment device is in operationand/or may be recharged to online account linked with one or moretreatment devices of the user and/or provider. Credits may be subtractedaccording to the selected treatment protocol or body area. Credit valuefor individual one or more treatments and/or part of the treatment maybe displayed to the user before treatment starts, during the treatmentand/or after the treatment. If the credit in the user's account runsout, the treatment device may not enable any further treatment untilcredits are recharged. Credits may be used as a currency changed forindividual treatment wherein different treatment may cost a differentamount of credits based on the type of the treatment, the duration ofthe treatment, the number of used applicators, and/or other factors.Credits may be also used for renting or buying individual part of thetreatment device, whole treatment device, hardware or softwareextensions of the treatment device and/or other consumables and spareparts belonging to the treatment device. Interface where the creditsystem may be recharged may be part of the treatment device, HIMI and/oronline accessible through website interface.

One or more software extension (e.g. software applications) may belinked with the treatment device and method of treatment. One or moresoftware extensions may be downloaded to any communication device, suchas a smartphone, tablet, computer and/or other electronic device. Thesoftware extension may communicate with the main unit and/or other partof the treatment device. The communication device with installedsoftware extension may be used for displaying or adjusting of one ormore treatment parameters or information associated to the treatment.Such displayable treatment parameters and information associated to thetreatment may include e.g. time progress of the treatment, measured sizeof treated body area before and/or after individual treatments,schematic illustrations of applied bursts or trains, remaining time ofthe treatment, heart rate of the patient, temperature of patient's bodye.g. temperature of the body surface, provided types of treatment, typeof the treatment protocol, comparison of patient's body parametersagainst previous treatment (e.g., body fat percentage) and/or actualtreatment effect of the treatment (e.g. muscle contraction or musclerelaxation). The software extension may be also provided to the patientin order to inform them about the schedule of treatments, mappingprogress between individual treatments, percentile of treatment resultscompared to other people and/or recommendations of behaviour beforeand/or after the treatment. Recommendations of behaviour may includee.g. recommendation what volume of water should patient drink during theday, how should patient's diet look like, what type and volume ofexercise should patient provide before and/or after treatment and/orother information that may improve results of treatment.

Communication between individual elements of the communication diagram,such as the therapy generator 201, the master unit 202, the security203, the communication interface 204, the communication medium 205, theuser 208, the service 207 and/or the sale 206 may be bidirectional ormultidirectional.

Connection between the user 208, the service 207, the sale 206,communication medium 205 and/or connection between the therapy generator201 and the master unit 202 may be secured by the security 203 toprovide safe communication and eliminate errors. The security 203 may belocated between the master unit 202 and the communication interface 204and/or between the communication medium 205 and the communicationinterface 204.

As shown on FIG. 3 , another option of remote access communicationbetween the user 208, the service 207, and/or the sale 206 and thetreatment device may be provided by a server 301. The server 301 mayinclude the security 203. The security 203 may be implemented inindividual access of the user 208, the service 207, and/or the sale 206.

As shown in FIG. 4 , the communication medium 205 may communicate withone or more therapy generators 201. One or more therapy generator 201may communicate with the master unit 202. The information from thecommunication medium 205 may be verified by the security 203 before thetherapy generator 201 sends information to the master unit 202.

FIG. 5 shows a schematic diagram of communication between thecommunication medium 205 and one or more therapy generators 201A-201D.The therapy generator A 201A may communicate with at least one or moretherapy generator 201B-201D. Another therapy generator B 201B may alsocommunicate with one or more therapy generators 201A, 201C, 201D.Therapy generator C 201C may not directly communicate with the therapygenerator A 201A and may communicate through therapy generator B 201B.The security 203 may be in the communication pathway between eachtherapy generator 201A-201D and/or between the therapy generator 201Aand the communication medium 205.

FIG. 6 show the main unit 11 of the treatment device. The main unit 11may include a HMI 61, a ventilator grid 62, at least one applicatorholders 63 a and 63 b, at least one device control 64, applicatorconnectors 65 a and 65 b, at least one main power supply input 66, acurved cover 67 of the main unit 11, wheels 68, a main unit coveropening 69, a main unit handle 70, and/or a logo area 71. The main powersupply input 66 may provide coupling or connection to the power grid orpower network.

The ventilator grid 62 of the treatment device may be designed as onepiece and/or may be divided into multiple ventilator grids 62 to provideheat dissipation. The ventilator grid 62 may be facing toward a personoperating the main unit 11, facing the floor and not being visibleand/or ventilator grid 62 may be on the sides of the main unit 11. Thefloor-facing location of the ventilator grid may be used to minimizedisturbing noise for the patient, because processes like cooling of themain unit 11 and/or electrical elements powered by electric energy mayproduce noise. Surface area of all ventilator grids 62 on the surface ofthe main unit 11 may be in a range from 100 cm² to 15000 cm², or from200 cm² to 1000 cm², or from 300 cm² to 800 cm².

Manipulation with the main unit 11 may be provided by rotating wheels 68on the bottom of the main unit 11 and/or by the main unit handle 70. Thelogo area 71 of the company providing the treatment device may belocated below the main unit handle 70 and/or anywhere on the curvedcover 67 and HMI 61.

As shown in FIG. 6 , the front side of the main unit 11 facing thepatient may be designed as a curved cover 67 of the main unit. The frontside of the main unit 11 facing the patient may have no right anglesaccording to floor projection of the main unit 11. The front side of themain unit 11 facing the patient may be designed as one, two or morepieces covering the inside of the main unit 11. The main unit 11 withcurved facing side may improve manipulation of the main unit 11 itselfnearby patient's support wherein the risk of collision main unit 11 andvarious sensitive body parts of the patient (e.g. fingers) is minimized.Facing side of the main unit 11 may also include the main unit coveropening 69. The main unit cover opening 69 may include a thermal camerafor monitoring the temperature of the patient or treated body area, acamera for monitoring the location of one or more applicators, movementof the patient and/or other. The main unit cover opening 69 may berepresented by opening in the curved cover 67 of the main unit. The mainunit cover opening 69 may include one or more connectors for connectingadditional treatment devices. Further, the main unit cover opening 69may include one or more sensors, such as camera, infrared sensor to scanpatient's movement, heating of treated body area and/or biologicalstructure. Based on information from such sensors, actual value and/orpredetermined value of one or more treatment parameters may be optimizedwhen patient moves, skin surface reach temperature threshold limit,determine treated body area and/or other. The front side of the mainunit 11 may also include one or more applicator connectors 65 a and/or65 b.

FIG. 52 a illustrates a connecting attachment 521 between a main unitand an applicator. One applicator may be connected to the main unit by aconnecting attachment 521, wherein the connecting attachment 521 mayinclude at least one applicator connector 65 and at least one tubeconnector 522. One applicator may be disconnected from the main unit andreplaced by another applicator. The applicator may be connected to themain unit by connecting tube including a tube connector 522 which may beconnected to the applicator connector (e.g. applicator connector 65)located on the main unit. The tube connector 522 may be a plug, and theapplicator connector 65 may be a socket, or vice versa. The tubeconnector 522 may be an integral part of the connecting tube. Tubeconnector 522 and/or applicator connector 65 may include male contacts(e.g. pins) and/or female contacts. In one example, tube connector 522may include female contacts and/or male contacts.

FIG. 52 b shows an applicator connector 65 having a variety of contacts.In FIG. 52 b , a colored circle inside another circle represents acontact comprising a pin. The one or more contacts in tube connector 522and/or applicator connector 65 may be used for transfer of electricalsignals used for RF treatment and/or magnetic treatment. For example,two or four pairs of male contacts and female contacts may be used fortransfer of electrical signals used for RF treatment. A plurality ofpins of contacts 525 (e.g. two or four pins) of applicator connector 65may be used for transfer of electrical signals for RF treatment. In someaspects, two pairs of male contacts and female contacts may be used fortransfer of electrical signals used for magnetic treatment. The pair ofcontacts 523 and pair of contacts 527 of applicator connector 65 may beused for transfer of electrical signal for magnetic treatment. The pairof contacts 523 may be used for transfer of electrical signals in theform of high power impulses from the main unit (e.g. from the energystorage device) to the magnetic field generating device of theapplicator. The pair of contacts 527 may be used for transfer ofelectrical signals from the magnetic field generating device back to themain unit (e.g. to the energy storage device).

Further, the one or more contacts in tube connector 522 and/orapplicator connector 65 may be used for transfer of electrical signalsto or from other electronic elements being part of the applicator,wherein such electronic elements may include a fan (in case of coolingby air), computer memory, a feedback sensor (e.g. temperature sensor) orhuman machine interface present on the applicator or the connectingtube. The signals from electronic elements may be multiplexed, i.e.transferred by one wire or by a group of wires arranged in oneprotective shielding. A plurality of pins of contacts 526 of applicatorconnector 65 may be used for transfer of electrical signals to or fromother electronic elements present in the applicator.

Further, the one or more contacts in tube connector and/or applicatorconnector may be used as a safety loop. For example, the connectionbetween the contacts of applicator connector 65 and tube connector 522may provide information about safe connection of the connecting tubeand/or the applicator with the main unit. When the wires in the tubeconnector 522 meet the selected pins of the applicator connector 65, thecontrol unit may be informed about closing the safety loop by change ofresistance of the selected pins.

Alternatively, the safety loop may be represented by a safety circuit,whose operation is illustrated at FIGS. 52 c-d . FIG. 52 c illustratesan applicator connector 65 having pins 551 and safety wiring 552 of themain unit. The tube connector 522 includes safety wiring 553 of the tubeconnector 522 and sockets 554 for receiving the pins 551. The conductivepins 551 represent the open ends of safety wiring 552, and the sockets554 represent the open ends of safety wiring 553. FIG. 52 d illustratesconnecting attachment of applicator connector 65 and tube connector 522where the pins 551 are connected to sockets 554. By this connection, thesafety wiring 552 and 553 are interconnected. The created safety circuitmay include safety wiring 552, safety wiring 553, pins 551 and sockets554. By closing and/or electrical activation of the safety circuit, thecontrol unit may be informed about the connection of the applicator tothe main unit. Alternatively, the pins for closing the safety circuitmay be located on the tube connector, and the safety wiring 553 may belocated in the main unit. When the connectors are not connected and thesafety loop is not closed, the control unit may not allow start of thetreatment and/or use of treatment energy source. Regarding the FIG. 52 b, plurality of pins of contacts 526 of applicator connector 65 may beused for closing the safety loop.

Further, the connecting attachment including tube connector and/orapplicator connector (e.g. hose) may be used for transfer of coolingfluid between the applicator and the main unit. In such case, theconnection attachment may include fluid couplings. Regarding FIG. 52 b ,plurality of fluid couplings 528 of applicator connector 65 may be usedfor transfer of cooling fluid.

Further, the one or more contacts in tube connector 522 may be used foridentification of the applicator by the control unit and/or main unit.For example, the one or more contacts in tube connector 522 may beconnected to an electrical element (e.g. an identifying resistor or RFIDelement), which may be of a type and/or provide a value of resistanceassigned to the specific type of the applicator. By this identification,the main unit and/or control unit may identify the type of connectedapplicator to the applicator connector 65 and then allow the treatment.Different applicators may include applicators for different body areas,such as applicators for a patient's arms, buttocks or abdomen, amongother body areas, and/or applicators having different components, suchas an applicator having one or more magnetic field generating devices,one or more radiofrequency electrodes, or a combination thereof. If theconnected applicator is not identified, the main unit or control unitmay not allow treatment. Further, depending on the type of applicatoridentified, the main unit or control unit may allow only certaintreatment protocols based on the type of the applicator identified.

Further, the one or more contacts in tube connector 522 may be used fortracking the total use of the applicator. The applicator may include acomputer memory (e.g. a RAM, ROM PROM, EPROM or memory) storing a presetmaximum number of working minutes or a preset maximum number of magneticimpulses that the applicator may be used to administer. The control unitand/or main unit may set or recognize the maximum number of workingminutes or magnetic impulses according to the type of the applicator.The information transferred to the main unit from the applicator via theconnectors may include a number of used working minutes or magneticimpulses. When the number of used working minutes or impulses reaches orequals the preset maximum number stored in the applicator, the humanmachine interface may display a message and/or the control unit mayprevent further treatment by the applicator. Alternatively, the controlunit may subtract the number of working minutes or magnetic impulsesfrom the preset number stored in the memory of the applicator. When thenumber of working minutes or impulses counted by the main unit (e.g.control unit) reaches or equals zero, the human machine interface maydisplay a message and/or the control unit may prevent further treatmentby the applicator. Regarding the FIG. 52 b , the plurality of contacts529 of applicator connector 65 may be used for tracking the total use ofthe applicator.

The connection of the tube connector 522 to the applicator connector 65,providing connection of the applicator to the main unit, may be securedor locked by a locking mechanism, such as a bayonet closure, among otherremovable or temporary connections. The connection of the tube connectorto the applicator connector may be secured by at least one lockingmechanism, e.g., a locking element connected to a spring. The lockingelement may include plastic connected to the spring element, wherein theapplicator connector and tube connector may each include one lockingmechanism.

As shown in FIG. 6 , applicator connectors 65 a and 65 b facing thepatient may be closer to the patient's body than applicators connectedto the side facing the operator (e.g. doctor or technician).Accordingly, the length of the connecting tube 814 connecting theapplicator with the main unit 11 may be minimized. Manipulation with theapplicator and/or plurality of applicators connected by a shorterconnecting tube 814 may be easier than with the applicator connectedwith a longer connecting tube 814.

The front side of the main unit 11 may have no corners and/or angles andmay include at least partially elliptical and/or circular curvature. Thecurvature may have a radius of curvature in a range of 20 cm to 150 cm,30 cm to 100 cm, 30 cm to 70 cm, or 40 to 60 cm. An angle of the mainunit 11 front side curvature may be in a range of 30° to 200°, or of 50°to 180°, or of 90° to 180°. The angle of the curvature may be definedwith the same principle as it is defined an angle 30 of a section 26 inFIG. 23 as discussed in further detail below.

The device may further include a remote control for use by the patientand/or operator to signal discomfort during treatment. The remotecontrol may include at least one button in communication with the mainunit 11, e.g., by wired or wireless connection. The remote control maybe located adjacent to the patient during the treatment. The patient maykeep the button in his or her hand and press the button when anydiscomfort occurs. By pressing the button on the remote control fordiscomfort, the patient may stop the treatment, and may stop theapplication of magnetic field and/or radiofrequency energy.

The main unit may include a slot for receiving a card, e.g. SD card. Thecard may include a counter of working minutes. After inserting the SDcard into the slot, the device may recognize the number of workingminutes. The device may allow the treatment only for a recognized numberof working minutes.

The card may also be used for calibration of the device and/or theapplicator. The device may provide a calibration of the applicator,wherein the calibration may include calibration data of the temperatureof the applicator, cooling of the RF electrode, cooling of the magneticfield generating device, or calibration of the temperature sensor. Afterthe calibration, the device may save the calibration data to the card.The calibration may be executed by the service, during manufactureand/or by the user.

The main unit 11 may include one or more an applicator holder e.g. 63 aand 63 b. Alternatively, one or more applicator holders may be coupledto the main unit 11. Each applicator holder 63 a and 63 b may havespecific design for different types of the applicator. The applicatorholder 63 a and 63 b may each hold a single applicator 12 a or 12 b.Each applicator holder 63 a, 63 b may have several functions. Forexample, the applicator holders 63 a and 63 b may be used forpre-heating or pre-cooling of at least part of the applicator. Further,the applicator holders 63 a and 63 b may include another HMI and be usedfor displaying information about selected treatment, actual value and/orpredetermined value of one or more treatment parameters. Also, theapplicator holder 63 a and/or 63 b may provide indication whether anapplicator is ready to use. Furthermore, the applicator holder 63 aand/or 63 b may indicate a current value temperature of at least part ofthe applicator. The indication may be provided by color flashing orvibration. The applicator holder 63 a and/or 63 b may be used to setactual value and/or predetermined value of one or more treatmentparameters and/or applicator parameters, such as a temperature ofapplicator's part contacting the patient.

The main unit 11 may include device control 64 for switching on and offthe main unit 11, manual setting of power input parameters and/or otherfunctions. The applicator connectors 65 a and 65 b may be used fortransfer of electrical and/or electromagnetic signal from the main unit11 and applicators. The applicator connectors 65 a and 65 b may be usedfor connecting of one or more applicators (via the connecting tube 814),the communication device, the additional treatment device and/or memorystorage devices such as USB, SSD disc, diagnostic devices, and/or othermemory storage devices known in the state of art. The applicatorconnectors 65 (e.g. 65 a and/or 65 b) for connecting of one, two or moreapplicators may be located in the main unit 11 or on the side of themain unit 11. The length of coaxial cables may be linked with afrequency of transmitted electrical signal. In order to provide easiermanipulation with one or more applicators 12 a and/or 12 b, the lengthof connection from the main unit 11 to e.g. applicator 12 a (andtherefore connecting tube 814) should be as long as possible. However,length of at least one coaxial cable between electrical elements in themain unit 11 may be linked with a frequency of transmitted electricalsignal (e.g. RF signal) sent to at least treatment energy source (e.g.RF electrode to provide RF energy). Therefore the length of at least onecoaxial cable inside the main unit (e.g. between a power source and theapplicator connector 65 a and/or 65 b) may be as short as possible. Thelength of coaxial cable located in the main unit 11 may be in a range of3 cm to 40 cm, or 7 cm to 30 cm, or 10 cm to 20 cm. In order to optimizemanipulation with one or more applicators 12 a or 12 b connected to themain unit 11, the applicator connectors 65 a and 65 b may be located onthe curved front side of the main unit 11.

The HMI 61 may include a touch screen display showing actual valueand/or predetermined value of one or more treatment parameters. Thetouch screen may provide option to choose the displayed treatmentparameters and/or adjust them. The HMI 61 may be divided into twodisplay sections 61 a and selection section 61 b. The display section 61a may display actual value and/or predetermined value of one or moretreatment parameters and other information for the user. The selectionsection 61 b of the HMI 61 may be used for selection of treatmentparameters and/or other adjustment of the treatment. HMI may be includedin, coupled to or be part of one or more applicators 12, main unit 11,an additional treatment device 14 and/or in other one or morecommunication devices 15.

The HMI may be included in the main unit 11. The HMI may be fixed in ahorizontal orientation on the main unit 11 or the HMI 61 may be orientedor tilted between 0° to 90° degrees with respect to a floor or otherhorizontal support surface. The angle between the HMI 61 plane and afloor may be adjusted by at least one joint or may be rotated around atleast one Cartesian coordinates. The HMI 61 may be in form of detachableHMI, e.g. a tablet. The HMI 61 may be telescopically and/or rotationallyadjusted according to one two or three Cartesian coordinates by a holderthat may adjust distance of HMI 61 from the main unit 11 and/ororientation of the HMI 61 with regard to the main unit 11 and the user.The holder may include at least one, two or three implemented jointmembers.

One HMI 61 may be used for more than one type of the treatment deviceprovided by the provider. The HMI software interface may be part of themain unit software or part of the software included in one or moreadditional treatment devices and/or communication devices. The softwareinterface may be downloaded and/or actualized by connection with thecommunication device, the additional treatment device, flash memorydevice, the remote connection with sales, the service and/or theinternet.

FIG. 26 shows exemplary layout of the interior of the main unit 11. Theinterior of the main unit 11 may include multiple electrical elements,control system, one or more control units of RF circuits, magnetcircuits and/or other elements needed for correct function of thetreatment device. Location of individual elements in the main unit 11may be described by Cartesian coordinates with the zero values at thebottom edge of the front side facing the patient. The main unit 11 mayinclude one or more struts 74. At least two struts 74 may create anX-shape that may be fixed at its ends to other vertical struts 74 tocreate construction for the main unit 11. The main unit 11 may includeat least one cooling system 78 configured to cool electrical elementsuch as one or more control units, PCBs, power sources, switches, energystorage devices and/or other electrical element of the treatment device.The cooling system 78 may be used for providing and/or cooling thecooling fluid provided to the applicator. The SYM element 79 may belocated in the upper third of Z coordinate and at the first third of theX coordinate nonmatter of Y coordinate. Function of the SYM is explainedbelow. The main unit 11 may also include one or more cases 72 formedfrom aluminum or other metal materials. The one or more cases 72 mayprovide electrical, electromagnetic and/or radiation insulation (lateronly as insulation) of one or more internal parts of the main unit 11from other part of the main unit 11. For example, at least part of a RFcircuit 73 may be located in the last third of X and Z coordinates inone of the cases. The power source 75, powering at least part of RFcircuit and/or magnet circuit, may be located in the last third of Xcoordinate and in the first third of Z coordinate. An energy storagedevice 76 may be at least partially insulated from one or more RFcircuit. When plurality of magnetic circuits is used, the plurality ofmagnet circuits may be at least partially insulated from each. In orderto ensure short length of coaxial cable leading from the energy storagedevice 76 to applicator connector 65 as mentioned earlier, both elements(energy storage device 76 and applicator connector 65, e.g. 65 a) may belocated in the same half of the X and Z coordinate, such as at the firsthalf of X and Z coordinate. Other electrical elements represented by box77 of magnet circuit may be located in the first half of X coordinateand second third of Z coordinate.

FIG. 7 shows exemplary display interface 700 of the HMI 61. The HMI 61may display one or more applicator symbols 701. One or more applicatorsymbols 701 and their colors may represent connection quality, numberand/or type of available or connected applicators, additional treatmentdevices connected to the main unit 11 and/or involved in the treatment.The list 702 may redirect to a page or different display layout where alist of treatment protocols may be recorded or adjusted. The list 702 oftreatment protocols may include one or more predetermined values of atone or more treatment parameter (e.g., intensity of magnetic field,intensity of RF field, intensity of magnetic impulses, intensity ofmagnetic pulses, pulse duration, burst duration, composition ofindividual burst, duty cycles, shape of envelope, time of treatment,composition of treatment parts, threshold temperature of the biologicalstructure during the treatment, and/or other parameters). The list oftreatment parameters may include one or more saved treatment protocolsoptimized for individual patients or body area. After choosing thetreatment protocol, treatment parameters may be additionally optimizedby user. Also, the treatment parameters may be adjusted by choosingadditional patient's parameters, such as patient body type (e.g. skinny,slim, average weight, overweight, or obese), or a patient's BMI, gender,age group (e.g., younger than 30, 30-39, 40-49, 50-59, 60 and older).Also, the treatment parameters may be additionally optimized byselecting only of a part of treatment protocol.

The HMI 61 may include one or more sliders which may have severalfunctions. For example, the slider 703 may be used as a navigator forselecting which page of the interface is being used, such as the list702, a therapy icon 704, or a records 707. Also, the slider 703 may beused to indicate how much time is remaining to the end of the treatment.

The therapy icon 704 may represent the interface illustrated in FIG. 7 .A timer 705 may represent treatment duration, remaining time of thetreatment, and/or lapsed time of the treatment. The “Protocol 1” icon706 may illustrate the type of number of a protocol selected and/orcurrently applied or prepared to be applied. The “records” 707 mayredirect to another page of the interface with recorded history oftreatments, information regarding treated patients, informationregarding billing and renting system, information regarding billinginformation and/or credit cost of the treatment. The “records” 707 maydisplay how many credits are left on the credit account, how manycredits were spent, how long the treatment device was used, and/or otherbilling information. An icon illustrated by a symbol “setting” 708 mayredirect user to a setting of the treatment device including the settingof e.g. a melody and/or intensity of the sound produced by the deviceand/or brightness of the display. The sound produced by the treatmentdevice and/or brightness of the display may be different before and/orduring the treatment. The “setting 708” interface may also enable tochange date, time, language, type and/or parameters of connectionbetween the main unit and the applicator, the additional treatmentdevice, and/or the communication device. The “setting” 708 interface mayinclude icons for starting a calibration and functionality scan of thetreatment device and its connected parts. The “setting” 708 interfacemay provide software information, software history and/or softwareactualization, a button for contacting service and/or sending errorprotocol, type of operation mode (e.g. “basic” or “expert” with allowedadditional setting of the treatment device), possibility to rechargecredits for treatments, restoring to factory setting, and/or othersettings.

Intensity signs 709 may be as illustrated in the form of percentile,number, power and/or in another format. The intensity signs 709 may belocated adjacent to an icon that may adjust intensity of the treatmentenergy source. The intensity signs 709 may be located under, over and/orin an icon (e.g. as a number in an intensity bar 710) and/or as anothervisualization that may adjust the intensity of the treatment energysource. Each intensity bar 710 representing one treatment energy sourceof provided energy (e.g. RF field or magnetic field) may have its ownintensity signs 709. The treatment device may include multipleapplicators 714, for example, a first applicator A and a secondapplicator B may be connected to the main unit of the treatment device.In this way, applicators A and B may be applied to different muscles inthe same muscle group or to pair muscles, such as a left and rightbuttock, left and right sides of an abdomen, a left and right thigh,among other paired muscles or cooperating muscles. Number of connectedapplicators and/or additional treatment devices providing the treatmentenergy may be lower or higher than two.

As shown in FIG. 7 , each applicator may provide magnetic treatment 718(left HMI part marked as HIFEM A and HIFEM B for the purpose of FIG. 7and showed in exemplary interface human machine interface) and/or an RFtreatment 712 (right HMI part marked as RF A and RF B for the purpose ofFIG. 7 and showed in exemplary HMI).

The intensity of each RF field and/or magnetic field may beindependently regulated e.g. by scrolling of individual magneticintensity scroller 719 and/or RF intensity scroller 711 throughintensity bars 710. One or more scrollers or intensity bars may be movedindependently or may be moved together with another scroller orintensity bar in order to regulate plurality of magnetic fields,plurality of RF fields together and/or plurality of RF and magneticfields provided by the one applicator together. Also, one or morescrollers or intensity bars may be controlled independently or may bemoved together with another scroller or intensity bar in order toregulated plurality of magnetic fields, plurality of RF fields togetherand/or plurality of RF and magnetic fields provided by two applicatorstogether. One or more intensity bars 710 may be distinguished by a colorand may be adjusted by intensity scroller 719 or 711 and/or by anintensity buttons 720. The intensity buttons 720 may change (e.g.increase or decrease) RF field and/or magnetic field intensity by afixed increment, such as 1% or 2% or 5% or 10% or in a range from 1% to10% or in a range from 1% to 5% of maximal possible field intensity.Intensity of the magnetic field and/or the RF field may be adjustedindependently for each treatment energy source. Also, intensity of themagnetic field and/or RF field may be adjusted by selection and/orconnection of one or more applicators, additional treatment devicesand/or treatment energy sources.

The operation of one or more RF electrodes and/or magnetic fieldgenerating devices may be synchronized and may be controlled by one, twoor more intensity scrollers 719 and/or intensity buttons 720. Thetreatment may be started by a button start 713 that may be automatically(e.g. after starting the treatment) changed into a button pause. Thetreatment may be restarted and/or stopped by button stop 716 during thetreatment. The interface may also show an indicator of a discomfortbutton 717 that may be activated by patient through a remote controlwhen the treatment is uncomfortable. When the discomfort button 717 isactivated treatment may be automatically and immediately interrupted(e.g. paused or stopped). When the discomfort button 717 is activatedthe treatment device may provide an human perceptible signal includingan audible alert, including a sound signal. Further, the humanperceptible signal may include a visual alert, including e.g. a flashingcolor. Based on the discomfort of the patient, the user may adjust e.g.the treatment parameters or treatment protocol, attachment or couplingof the applicator. The interface may also include a software powerswitch 715 to switch the treatment device on or off.

As shown in FIG. 7 , the HMI may include two intensity bars (e.g. 710)for RF treatment and two intensity bars for magnetic treatment. Further,the HMI may include two intensity scrollers (e.g. 711) for RF treatmentand two intensity bars (e.g. 719) for magnetic treatment. Furthermore,the HMI may include four intensity buttons for RF treatment and fourintensity buttons (e.g. 720 for magnetic treatment. One intensityscroller, one intensity bar and/or two intensity buttons may be providedfor one treatment circuit. Therefore, the FIG. 7 may show the HMI oftreatment device including two treatment circuits for RF treatment andtwo treatment circuits for magnetic treatment.

The treatment device may include one or more applicators. The treatmentdevice may include two, three, four, five or more applicators. Eachapplicator may include at least one, two or more different treatmentenergy sources, such as one or more RF electrodes providing the RFtreatment and one or more magnetic field generating devices providingthe magnetic treatment. For example, first applicator may include one RFelectrode and one magnetic field generating device, and the secondapplicator may include another RF electrode and another magnetic fieldgenerating device. The RF electrode may not contact the skin of thepatient. The RF electrode may be positioned inside the applicatortogether with the magnetic field generating device. One applicator maybe coupled to the main unit by one connecting tube. The connecting tubesof different applicator may be interconnected or separated for eachapplicator. Alternatively a plurality of applicators may be coupled tothe main unit by one common connecting tube. At least one treatmentparameter of at least one applicator may be changed independently fromthe other one or more applicators and/or additional treatment device.

One or more applicators, additional treatment devices and/orcommunication devices may be mechanically connected with the main unitby one or more wires and/or by the fluid conduits. One or more wiresand/or fluid conduits may be located and lead through the connectingtube. The one or more wires coupled between main unit and the applicatormay be used for transfer of electric signal (representing e.g. RFsignal) to RF electrode positioned in an applicator in order to generateRF energy. The one or more wires may be used for providing electriccurrent to magnetic field generating device positioned in the applicatorin order to generate impulses of the magnetic field. Same wire and/ordifferent wires coupling the applicator and the main unit 11 may be usedfor communication between the main unit 11 and the applicator 12 and/orfor collecting feedback information. Feedback application may includee.g. measured signal parameters and/or impedimetric characteristics ofthe wire before and/or during the treatment. The fluid conduit betweenthe main unit 11 and the applicator 12 may guide liquid, oil, water,vapors, gas and/or other temperature regulating cooling fluid.

One or more applicators may be coupled to patient's body and/or bodyarea by one or more straps, one or more belts, or by creating vacuumunder the applicator. Also, applicator may be coupled to the body areaby a supporting matrix or by an adhesive layer located on at least partof the applicator's surface and contacting the patient's body orclothing. The applicator may be coupled to the body area by pushing theapplicator to the patient's body area or clothing by an adjustablemechanical positioning arm wherein the applicator may be detachablycoupled to the positioning arm including at least one, two or morejoints. The belt may be at least partially elastic and may create aclosed loop, such as by hook and loop fasteners (by Velcro), buckles,studs, and/or other fastening mechanisms may be used for adjusting alength. The belt may be coupled to body area and may include a fasteningmechanism for coupling the applicator to the belt and/or patient's skinor clothing. Such fastening mechanism may be for example, a belt withpockets for the applicator. Coupling the applicator to the body area mayinclude attaching or positioning of the applicator to the proximity ofor in contact with the body area. Alternatively, the applicator may notcontact the body area. One or more applicators may be coupled to thebody area before or during the application of one or more types oftreatment, (e.g. RF treatment or magnetic treatment). Also, theapplicator may be coupled to the body area, skin or clothing by a coverfrom soft material, which may be folded around the applicator and/or thepart of the body area. Furthermore, the applicator may be covered insoft material cover providing other coupling points for attachment ofbelt, folding soft material or any other coupling option mentionedherein.

The belt may be a length adjustable belt which may be at least partiallyflexible. One or more belts may couple or fix and/or attach one, two ormore applicators to the patient's body or body area. The belt may becoupled to one applicator 800 or one belt may couple two or moreapplicators to the patient's body. When the plurality of applicators(e.g. two, three or more) are used, one applicator may be coupled to thebody area of the patient by one belt while another applicator may becoupled to the body area by different belt. Alternatively, a pluralityof applicators (e.g. two, three or more) may be coupled to the body areaof the patient by one same belt. At least one applicator coupled by thebelt may be fixed statically with regard to patient's body for at leastpart of the treatment. The at least one applicator that is coupled bythe belt to patient's body may be repositioned once or more times duringthe treatment either manually by the operator or automatically to ensureoptimal treatment effect and treatment comfort for the patient.

Coupling the applicator and/or additional treatment device to apatient's body may include placing the applicator in proximity of thepatient's body and/or body area. In case of proximate coupling, theshortest distance between the applicator and the patient's skin may bein a range of 0.01 cm to 10 cm, or 0.01 cm to 5 cm, or 0.01 to 2 cm, or0.01 to 1 cm, or 0.01 to 5 mm, or 0.01 to 2 mm. However, the applicatormay be also placed in direct contact with the patient's skin. In case ofdirect contact, there may be no meaningful distance between theapplication and the patient's skin. In case of proximate or directcontact, the intervening material may be positioned between theapplicator and patient's skin or clothing or body area. The interveningmaterial may be an air gap, bolus, supporting matrix, part of the belt,textile, other clothing, gel, liquid absorbing material or metal.

FIG. 22 depicts an exemplary attachment of the applicator and/oradditionally treatment device 21 to a patient's body with use of asupporting matrix 22. The supporting matrix 22, as illustrated in FIG.22 , may be shaped as a grid and/or scaffold. The grid and/or scaffoldis at least partially flexible and attached to patient's body. Thesupporting matrix may be used for coupling the applicator and/oradditional treatment device 21 in proximity to the patient's body indefined location referred as an applicator's spot 24 by a fasteningmember 23. The supporting matrix may be polymeric scaffold-like in FIG.22 , substrate like a textile/polymeric sheet and or other. Thefastening member may be one or more elements such a locking mechanism,hinge, bayonet like system, Velcro for fastening the applicator and/oradditional treatment device 21.

As shown in FIG. 25 a , the applicator 800 may include one or more partsdefining casing of the applicator, which can be connected to the mainunit by connecting tube 814. Also, the applicator may include one ormore parts hidden in the applicator further defining function andfunctionality of the applicator. Casing of the applicator may includedifferent parts e.g. a handle cover 512, a handle 514, a top cover 516,a second side portion 802 creating bottom cover 517 of the applicator.Handle cover 512 may include a marker 813 and/or HMI 508 for e.g.displaying and/or adjusting actual value and/or predetermined value ofone or more treatment parameters. The handle 514 may be used formanipulation with the applicator 800 and/or for coupling the applicator800 to patient's body area. The top cover 516 may define interior of theapplicator. The top cover 516 may include an air opening 504 enablingair flowing to or from the interior of the applicator to cool electricalelements located in the interior of the applicator. The electricalelements located inside the interior of the applicator may include e.g.RF electrode, magnetic field generating device and/or temperature sensor510. The RF electrode may be positioned on the substrate 113 a. The RFelectrode may be positioned on a side of the substrate 113 a closer tothe patient. The second side portion 802 creates a bottom cover 517 ofthe applicator. The bottom cover 517 may be positioned closer to thepatient than the top cover 516 of the applicator 800. Therefore, the RFelectrode may be positioned between the substrate 113 a and the bottomcover 517. The second side portion 802 may include one or moreprotruding shapes, grooves and/or other. Power, energy, one or moreelectromagnetic signal and/or cooling fluid may be delivered toapplicator via connecting tube 814. In addition, cooling of one or moreelectrically powered element in the applicator (e.g. a magnetic fieldgenerating device 900 and/or substrate 113 a with at least one RFelectrode) may be provided by a fan 524 fixed to the top cover 516and/or to the second side portion 802. The RF electrode substrate 113 amay include a temperature sensor 510 configured to determine atemperature in the applicator, of at least part of bottom cover 517, ofa body area and/or of a biological structure of a patient. The RFelectrode located on the substrate may be connected to pairing element136 reconnecting coaxial cables. The pairing element 136 is furtherdescribed with regard to the FIG. 24 . FIG. 25 also illustrates a frame506 that may be used to fix the magnetic field generating device to thetop cover 516 and/or to the second side portion 802. The frame 506 maybe configured to eliminate noises and vibrations during magnetictreatment. The magnetic field generating device 900 may be housed withinthe casing of the applicator 800. Also, the radiofrequency electrode maybe housed within the casing of the applicator 800. Further, a pluralityof radiofrequency electrodes may be housed within the casing of theapplicator 800. By housing the magnetic field generating device 900within the casing of the applicator 800, the magnetic field generatingdevice 900 may not be in contact with the body of the patient. Also, byhousing the radiofrequency electrode within the casing of the applicator800, the radiofrequency electrode may not be in contact with the body ofthe patient. Further, by housing the magnetic field generating device900 and radiofrequency electrode within the casing of the applicator800, the magnetic field generating device 900 and radiofrequencyelectrode may not be in contact with the body of the patient.

The fan 524 may be an axial fan or a radial fan. The applicator maycomprise one, two or more fans configured to provide cooling of themagnetic field generating device 900 and/or RF electrode. The coolingmay be provided by pulling the fluid to the fan or by pushing the fluidfrom the fan. As shown in FIG. 25 b , when two fans are positionedwithin the applicator 800, the first fan 524 a may be configured toprovide cooling the upper side 251 a of the magnetic field generatingdevice 900, and the second fan 524 b may be configured to providecooling of a lower side 251 b of the magnetic field generating device900. A first gap 252 a between the upper side of the magnetic fieldgenerating device and the top cover 516 may be in a range 0.1 mm to 80mm or 0.1 mm to 50 mm or 0.5 mm to 25 mm or 1 mm to 10 mm. A second gap252 b between the lower side of the magnetic field generating device andthe bottom cover 517 may be in a range 0.1 mm to 75 mm or 0.1 mm to 50mm or 0.5 mm to 25 mm or 1 mm to 10 mm. The gap between the magneticfield generating device and the casing (top cover 516 and/or lowerbottom cover 517) may have dimension around 4 mm, which may be optimalto keep the sufficient speed of fluid flow between the magnetic fieldgenerating device and the casing, Therefore, when the first gap andsecond gap have about same dimension, the speed of fluid flow may beabout same on both sides of the magnetic field generating device. Inthis case, the term “around” should be interpreted as in the range of 5%of the recited value.

The operation of one or more fans may be monitored by a sensor (e.g. apressure sensor, temperature sensor, current sensor and/or a flowsensor). The one or more fans and/or sensor may be connected to thecontrol unit and/or control system. Further, the sensor may detect oneor more parameters of the fluid processed by the fan. Furthermore, thesensor (e.g. temperature sensor) may measure the temperature of themagnetic field generating device and/or its vicinity. The input and/oroutput of one or more fans may be monitored its operation can becontrolled by the control system. For example, when sensor detects lowspeed of the fluid flow, the control system may increase the output ofthe fan. For another example, when the temperature sensor measurestemperature of the magnetic field generating device and/or its vicinityin higher value than considered safe, the control system may increasethe output of the fan. In yet another example, when the sensor measuresmalfunction of one fan, the control system may increase the output ofthe remaining fan or the control system may stop operation of the deviceand the treatment.

Design of the applicator may comprise first gap larger than the secondgap. In such design, the air may flow through the first gap withdifferent speed than in the second gap. For the sufficient cooling, itmay be beneficial to have same or similar speed of fluid flow close toboth sides of the magnetic field generating device. Therefore, when theapplicator has two different gaps, the applicator may comprise one ormore barriers. The barriers may direct fluid flow closer to the magneticfield generating device, induce creation of vortex and/or provideturbulent fluid flow. In some aspects, barriers may be formed fromplastic. In some aspects, barriers may have the form of ribs. Thebarrier may be part of the cover (e.g. top cover 516 or bottom cover517). The barrier may be perpendicular to the direction of the air flow.The distance between the edge of the barrier and the magnetic fieldgenerating device may be in a range 1 mm to 10 mm or 1 mm to 8 mm. Theheight of the barrier may be in a range of 1 mm to 100 mm or 2 mm to 50mm. As shown in FIG. 25 c , the exemplary applicator 800, which may notcomprise RF electrode 101, comprises three barriers 518 on the side ofthe top cover 516. Distance between the edge of the barrier and magneticdevice is depicted as 519. As depicted in FIG. 25 d , the exemplaryapplicator 800 comprises three barriers on the side of the bottom cover517 and three barriers on the side of the top cover 516. FIG. 25 e showsan exemplary applicator comprising barriers, magnetic field generatingdevice 900 and RF electrode 101, as positioned close to the body area541. In this configuration, the barriers may be positioned close to theupper side of the magnetic field generating device 900. In FIG. 25 f ,the bottom view of the top cover 516 shows barriers 518 a placedperpendicular to the direction of the fluid flow and barriers 518 bplaced in the direction of the fluid flow. The barriers 518 b may bebeneficial to guide the fluid to the perpendicular barriers 518 a.

The applicator may be designed as shown in exemplary FIGS. 8 a-8 d . Theapplicator 800 as illustrated in FIGS. 8 a-8 d may be used for treatmentof body area.

One or more RF electrodes may be located in the applicator 800 betweenthe magnetic field generating device and patient's body area. The RFelectrode may be shaped to at least partially match a curvature of thefirst side portion 801, a second side portion 802, and/or a curvature ofthe patient's body area. The magnetic field generating device may atleast partially match a curvature of the first side portion 801, thesecond side portion 802 and/or a curvature of the patient's body area.The RF electrode and/or the magnetic field generating device may becurved in order to focus and/or provide better targeting of the RFtreatment and/or magnetic treatment. The first side portion 801 may beconfigured to maintain the position of the limb within the first sideportion 801 during the treatment. The first side portion 801 may providea stable position and/or equilibrium for the treated body area. Theposition of the limb of the patient may be maintained in the first sideportion 801 even though the limb may move by the muscle contractions.The lateral movement and/or rotation of a limb may be limited due to thefirst side portion 801 and/or belt 817 in such way that the limb may bein stable position. The rotational movement with respect to theapplicator 800 may be limited by coupling the applicator 800 to the bodyarea, at least part the treated body limb by a belt. In addition, whenpart of the arm is treated by magnetic and/or RF treatment, at leastpart of the limb may be also attached to patient's trunk to minimizemovement of the limb.

The second side portion 802 may be located on the opposite side of theapplicator 800 with respect to the first side portion 801. The secondside portion 802 may be substantially planar, or the second side portion802 may be at least partially concave and/or convex. The applicator 800may be coupled to the patient by a positioning mechanism, such as a belt817, as illustrated in FIGS. 8 a and 8 b.

FIG. 8 a describes an applicator including the positioning mechanismwhich may be fixed in a recess 803 at a first end 804 of the first sideportion 801 and a recess 806 at a second end 805 of the first sideportion 801. The positioning mechanism, such as a belt or strap, may befastened or its length may be adjusted by a clip 807. The clip 807 maymove around the pin 808 in a clockwise or counter-clockwise direction.The clip 807 may be biased by a spring. Alternatively, the clip 807 maybe locked by a suitable locking mechanism, or by any other movementrestraining manner. The clip 807 may include a fastener 809 on lowerside of the clip 807 for fixing a correct length of the positioningmechanism. The fastener 809 may be a hook-and-loop fastener, Velcrofastener, pin type fastener, among other mechanical fasteners. Couplingthe applicator 800 to the patient's body as described above may bemostly used when the patient's body area is attached to the first sideportion 801 of the applicator 800. The RF electrode and/or magneticfield generating device may be shaped to at least partially match acurvature of the first side portion 801. The RF electrode and/or themagnetic field generating device may be curved in order to focus and/orprovide better targeting of the RF treatment and/or magnetic treatment.

FIGS. 8 b and 8 c show an applicator including the positioning mechanismwhich may be guided perpendicularly to a curvature of the first sideportion 801 and/or perpendicularly to an axis 810 of the applicator. Thepositioning mechanism may be positioned or guided through a concavity815 of the handle 812. Also, the positioning mechanism (e.g. belt) maybe positioned or guided below the handle 812 and above the magneticfield generating device. Further, the positioning mechanism (e.g. belt)may be positioned on the handle 812 by e.g. a clip. Belt 817 may also beguided in any direction through and/or on the applicator 800 to hold theapplicator 800 to the patient's skin. Coupling the applicator 800 to thepatient's body as described above may be mostly used when the patient'sbody area is attached to the second side portion 802 of the applicator800. The RF electrode and/or magnetic field generating device may beshaped to at least partially match the first side portion 801. The RFelectrode and/or the magnetic field generating device may be flat orcurved in order to focus and/or provide better targeting of the RFtreatment and/or magnetic treatment.

FIG. 8 b illustrates a top view of an applicator 800. Applicator 800 mayinclude a marker 813 corresponding with the location of magnetic fieldgenerating device within the applicator 800. The marker 813 may belocated above the centre of the magnetic field generating device. Themarker 813 may enable easy and comfortable positioning of the applicator800 by the user. A recess in a surface of the applicator 800 may be usedas the marker 813. Alternatively, the marker 813 may be a differentsurface modification of a part of the applicator's cover, such as adifferent color, different roughness, presence of one or one lightsource (e.g. light emitting diode LED), a specific curvature of thecasing of the applicator, logo of the manufacturing or distributingcompany and/or other. The casing of the applicator may include at leasttwo colors. A first color may be on applicator's casing over themagnetic field generating device to enable correct positioning of theapplicator, and the rest of the applicator may have a second color thatdiffers from the first color. The color may be interpreted as a paintreflecting and/or absorbing specific wavelengths of light. Similar tomarker 813, applicator may include a second marker to show a location ofthe at least one RF electrode.

As shown in in FIGS. 8 b and 8 c , applicator may include an outlet 811.The outlet 811 may enable circulation of the air in the applicator 800and heat dissipation of heat generated by at one or more magnetic fieldgenerating devices and/or RF electrodes positioned in applicator andsupplied by energy through one or more wire inside of a connecting tube814. The connecting tube 814 may also include the fluid conduit that mayprovide or guide cooling fluid from the main unit 11 to the applicator800.

The applicator 800 may further include one or more temperature sensors816 as shown for example in FIG. 8 c . The temperature sensor 816 mayprotrude from the casing of the applicator 800 e.g. such as from thesurface of the second side portion 802 and/or from the first sideportion 801. The temperature sensor 816 may protrude from the casing ofthe applicator 800 in order to create higher pressure to part of thetreated body area by the applicator 800 and to provide bettermeasurement of the temperature in the biological structure, of the bodyarea and/or on the patient's body.

FIG. 8 e shows exemplary placement of the temperature sensor 816 withinthe applicator 800. The temperature sensor 816 may be located in aprotruding part 821 of the applicator. Protruding part 821 of theapplicator 800 may protrude from the surface of the applicator being incontact with the patient, such that the protruding part 821 with thetemperature sensor is pressed into the patient's skin and is kept closerto the surface of the patient than the other electrical elements of theapplicator.

The second side portion 802 and/or the first side portion 801 may beheated and/or cooled. Heating of the second side portion 802 and/or thefirst side portion 801 may be used e.g. at the beginning of thetreatment to reach treatment temperature sooner. Treatment temperaturemay include temperature of body area and/or biological structureincreased by application of RF waves which may be appropriate forapplication of magnetic field. Cooling or heating by portions of theapplicator may be used for maintaining constant temperature on thepatient's skin. Also, cooling or heating by portions of the applicatormay be used to achieve higher treatment temperatures in the patient'sbiological structure deeper than 0.5 cm under the patient's skin.Cooling a part of an applicator that is in contact with the patient(e.g., the second side portion 802 and/or the first side portion 801 ofthe applicator) may be used for minimizing a patient's sweating. Thepatient's skin may be cooled by cooling fluid (e.g. air) flowing and/orblowing from the applicator and/or other part of the treatment device.Cooling of the patient's skin may be provided by thermal diffusionbetween a cooled part of the applicator contacting patient's skin andthe patient's skin. The cooled part of the applicator may be cooled bycooling fluid flowing in the applicator and/or by Peltier element usingPeltier's effect.

Patient's sweating may be uncomfortable for the patient and mayadversely affect feedback information collection, contact with theapplicator and patient's skin, and/or lead to lower adhesion of theapplicator to the patient's skin. To prevent sweating of the patient'sskin, cooling of contact applicator's area (e.g. first side portion 801and/or second side portion 802) may be used. The second side portion 802and/or the first side portion 801 may include grooves 819 that may besupplied by cooling fluid through applicator's apertures 820 whereliquid and/or gas, (e.g. air, oil or water) may flow as illustrated inFIG. 8 d . The first side portion or second side portion of theapplicator may include applicator's holes or applicator's apertures 820where air from the applicator 800 may be guided to remove heat, moistureand/or sweat from the patient's skin. The holes or apertures may bepresented in the grooves 819. The holes may be used for providing anactive substance on the patient. The contacting part of the applicatorbeing in contact with the body area may include a fluid absorbingmaterial, such as sponge, hydrophilic material, non-woven organic and/orpolymeric textile, which may at least partially remove sweat from thepatient's skin and/or improve conductivity between the patient andapplicator 800. Reduction of patient's sweating in at least part oftreated body area may be provided by reduction of sweat gland activity.Reduction of activity of sweat gland may be provided by application of apulsed magnetic field, intensive light, heat shock provided by periodichypothermia of patient's skin by applied active substance on and/or tothe patient, such as glycopyrronium tosylate, and/or by othermechanisms.

FIG. 23 illustrates an exemplary applicator including a concavity. Theapplicator may be designed with the first side portion 801 being atleast partially convex. The first side portion 801 may alternatively beV-shaped or U-shaped. The curvature radius may correspond with a size ofthe patient's limb. The second side portion 802 may alternatively oradditionally be at least partially convex.

The patient may lay in a supine position or sit on a patient supportsuch as a bed, a couch or a chair. An arm of the patient may be set onthe first side portion 801 of the applicator 800. The first side portion801 may be in direct contact with the patient and RF treatment incombination with magnetic treatment may be applied. Also, a strap orbelt may be guided through the concavity 815 to attach the applicator tothe patient's body.

The first side portion 801 may have at least partial elliptical orcircular shape according to a vertical cross section, wherein the totalcurvature 25 according to FIG. 23 may be defined as part of an ellipseor circle fitted to a curvature of at least part of the first sideportion 801. A section where curvature of the first side portion 801matches the fitted ellipse or circle may be called the section 26. Thesection 26 is defined as an angle 30 between two the line 28 and line29. The line 28 and the line 29 cross a centre of symmetry 27 and points31 and 33 located in the section 26 with the longest distance accordingto fitted part of an ellipse or circle copying curvature of theapplicator 800. The centre of symmetry 27 is a centre of fitted ellipseand/or fitted circle. The angle 30 defining section 26 of the first sideportion 801 may be at least 5° or in a range from 100 to 270°, 300 to235°, 450 to 180°, or 600 to 135°. A curvature radius of at least partof fitted circle to the first side portion 801 may be in a range of 50mm to 1250 mm, or in the range of 10 mm to 750 mm, or in the range of 50mm to 500 mm, or in the range of 60 mm to 250 mm. The second sideportion 802 may be curved on at least part of its surface wherein thesection 26 of the second side portion 802 may be at least 5° or in arange from 100 to 270°, 300 to 235°, 450 to 180°, or 600 to 135°.Further a curvature radius of at least part of fitted circle to thesecond side portion 802 may be in a range of 50 mm to 1250 mm, 10 mm to750 mm, 50 mm to 500 mm, or 60 mm to 250 mm.

One or more applicators and/or additional treatment devices may includea bolus 32, as shown for example in FIG. 23 . The bolus 32 may refer toa layer of material located between the applicator or RF electrodepositioned on the surface of the applicator and the patient's body areaor skin (including epidermis of patient's skin or clothing). The bolus32 may refer to a layer of material located between the RF electrodepositioned on the surface of the applicator and the patient's body areaor skin. Also, the bolus 32 may be an independent part from theapplicator 800. The bolus 32 may be attached to the first side portion801 and/or to the second side portion 802 of the applicator 800. Thebolus 32 may be removable and detachable from the applicator 800. Thebolus 32 may be mechanically coupled to the first side portion 801and/or to the second side portion 802 of the applicator 800. The bolus32 may be made of a solid, flexible material and/or a composition ofsolid and flexible materials may be used as a bolus. The bolus 32 mayinclude a fluid material, such as water, gel, or fluid solutionincluding ceramic, metal, polymeric and/or other particles enclosed in aflexible sac made of biocompatible material. The bolus 32 may beprofiled, wherein a thickness of the bolus 32 as a layer between RFelectrode and patient's skin may have a different thickness. Thicknessof the bolus 32 may be higher in a location where an energy flux densityof the RF treatment (including RF field) would be high enough to createuncomfortable hot spots and/or non-homogeneous temperature distribution.The bolus 32 allows for more homogenous biological structure heating andminimizes edge effects. Edge effects may also be minimized by differentdielectric properties of the bolus across the bolus volume and/or bolusarea. The bolus 32 may have higher thickness under the at least part ofthe edge of the RF electrode. The thickness of the bolus under the atleast part of the edge of the RF electrode may be at least 5%, 10%, 15%,or 20% greater than a thickness of the bolus 32 under the at least partof a centre of the RF electrode wherein no apertures, cutout and/orprotrusions are taken into account. The bolus 32 may have a higherthickness under at least part of the bipolar RF electrode and/or underat least part of a distance between at least two bipolar RF electrodes.The bolus 32 may be in such locations thicker by about at least 5%, 10%,15%, or 20% than a thickness of the bolus 32 where the distance betweentwo nearest points of two different bipolar RF electrodes is at least5%, 10%, 15%, or 20% more. The bolus 32 may also improve transfer oftreatment energy (e.g. magnetic field and/or RF field) to at least onebiological structure and minimize energy reflection by providing gradualtransition of dielectric properties between two different interfaces ofthe applicator and the biological structure. The bolus 32 may profile orfocus the RF field and/or magnetic field to enhance the effect of thetreatment, and/or provide deeper tissue penetration of the treatment.

The bolus 32 may also be a fluid absorbing material, such as a foammaterial, textile material, or gel material to provide betterconductivity of the environment between the applicator and a patient'sbody. Better conductivity of the contact part of the applicator may beuseful for better adjusting of the RF signal of the applied RF treatmentto the patient's body and/or for better collecting of feedbackinformation. The bolus 32 may mediate conductive contact between the RFelectrode and the patient's skin or body area. Also, the bolus 32 mayserve as a non-conductive or dielectric material modifying energytransfer to the patient's body, providing cooling of the patient's skin,removing sweat from the patient's skin and/or providing heating, such ascapacitive heating of the patient's body. Fluid absorbing materialserving as a bolus 32 may also provide better heat conductivitytherefore temperature of the biological structure and/or the applicatormay be faster, easier and more precisely regulated. The bolus 32 mayalso include additional RF electrode to provide the RF treatment.

As mentioned previously, the treatment device may include one, two,three, four, six or more applicators and/or additional treatment devicesproviding the magnetic treatment and/or the RF treatment. Eachapplicator, additional treatment device and/or treatment energy source(e.g. magnetic field generating device and/or the RF electrode) may haveits own treatment circuit for energy transfer, wherein each treatmentcircuit may be independently regulated in each parameter of providedtreatment energy by control system. Each applicator, treatment device,or treatment energy source may be adjusted and provide treatmentindependently and/or two or more applicators, treatment energy sources,and/or additional treatment devices may be adjusted as a group, and maybe adjusted simultaneously, synchronously and/or may cooperate betweeneach other.

When the treatment device includes two or more applicators, they may becoupled to contact or to be proximate to different parts of the body. Inone example the first applicator may be coupled to contact or to beproximate to left buttock while the second applicator may be coupled tocontact or to be proximate to right buttock. In some aspects, the firstapplicator may be coupled to contact or to be proximate to left side ofabdominal area while the second applicator may be coupled to contact orto be proximate to right side of abdominal area. In still anotherexample the first applicator may be coupled to contact or to beproximate to left thigh while the second applicator may be coupled tocontact or to be proximate to right thigh. In still another example thefirst applicator may be coupled to contact or to be proximate to leftcalf while the second applicator may be coupled to contact or to beproximate to right calf. The plurality of applicators may be beneficialfor treatment of cooperating muscles and/or pair muscles.

One or more applicators and/or the additional treatment devices mayinclude the magnetic field generating device (e.g. a magnetic coil)generating magnetic field for a magnetic treatment. The magnetic fieldgenerating device may generate the RF field for the RF treatment. Theessence is that the produced frequencies of the electromagnetic fieldhas far different values. The magnetic field generating device mayproduce a dominant magnetic field vector for the magnetic treatmentduring lower frequencies of produced electromagnetic field. However, themagnetic field generating device may produce a dominant electromagneticfield vector for the magnetic treatment during higher frequencies ofelectromagnetic field which may be used for the RF treatment. Themagnetic field generating device in the high frequency electromagneticfield domain may provide RF field similar to the RF field provided bythe RF electrode. When one magnetic field generating device may be usedfor providing both the RF treatment and the magnetic treatment, thedifference between frequencies for the RF treatment and the magnetictreatment production may be in a range from 500 kHz to 5 GHz, or from500 kHz to 2.5 GHz, or from 400 kHz to 800 kHz, or from 2 GHz to 2.5GHz. Also, when one magnetic field generating device is used forproviding both the RF treatment and the magnetic treatment, thefrequencies for the RF treatment may correspond with frequencies in therange of 100 kHz to 3 GHz, 400 kHz to 900 MHz, or 500 kHz to 3 GHz.

One or more applicators and/or additional treatment devices may includeone or more RF electrodes and one or more magnetic field generatingdevices, wherein the RF electrodes have different characteristics,structure and/or design than the magnetic field generating device. Theone or more RF electrodes may not contact the surface of the patient.The one or more RF electrodes may be located inside of the applicatortogether with the magnetic field generating device. The RF electrode mayoperate as a unipolar electrode, monopolar electrode, bipolar electrode,and/or as a multipolar electrode. One or more RF electrodes may be usedfor capacitive, inductive, or resistive heating of biological structureor body area. Also, the inductive RF electrode may be coiled.

The applicator may include two bipolar RF electrodes. The bipolarelectrodes may transfer the RF field between two bipolar RF electrodeslocated in at least one applicator. Bipolar electrodes may increasesafety and targeting of provided RF treatment, as compared to electrodesof monopolar type. Bipolar electrodes may provide electromagnetic fieldpassing through a patient's tissue located around and between RFelectrodes, wherein due to impedance matching, it is possible to preventcreation of standing electromagnetic waves in the patient's tissue andprevent unwanted thermal injury of non-targeted tissue. Also, thedistance between bipolar electrodes influences the depth of RF wavepenetration allowing for enhanced targeting of the RF treatment. Thebipolar RF electrodes include a positive RF electrode and a negative RFelectrode, wherein the mutual polarity of the bipolar RF electrodes ischanging because the polarity of the RF signal is changing from positiveto negative phase of the RF signal, as given by frequency of the RFsignal and resulting RF waves. The bipolar RF electrodes are powered,e.g., by wiring 100 a and 100 b as shown in FIGS. 14 a-14 e , which areconnected to the rest of elements of the RF circuit (e.g. poweramplifier and/or symmetrization element).

The applicator may include one or more multipolar RF electrodes, whereinthe respective electrodes are charged on a different charge (valueand/or polarity e.g. in a phase shift of RF signal or RF signals).

The applicator may include a monopolar RF electrode or more monopolarelectrodes. Monopolar electrodes may transfer radiofrequency energybetween an active electrode and a passive electrode, wherein the activeelectrode may be part of the applicator and the passive electrode havinglarger surface area may be located at least 5 cm, 10 cm, or 20 cm fromthe applicator. A grounded electrode may be used as the passiveelectrode. The grounded electrode may be on the opposite side of thepatient's body than the applicator is attached.

The magnetic treatment may be provided by the magnetic field generatingdevice may be made from a conductive material, such as a metal,including for example copper. The magnetic field generating device maybe formed as a coil of different size and shape. The magnetic fieldgenerating device may be a coil of multiple windings wherein one loop ofthe coil may include one or multiple wires. An individual loop of one ormore wires may be insulated from the other turns or loops of one or morewires. Regarding the magnetic coil, each loop of wiring may be called aturn. Further, individual wires in one turn or loop may be insulatedfrom each other. The shape of the magnetic field generating device maybe optimized with regard to the applicator size and design. The coil maybe wound in order to match at least part of the applicator's shapeaccording to the applicator's floor projection. The coil winding may beat least partially circular, oval and/or may have any other shapes thatmatch to a shape of the applicator or a portion thereof. The loops ofwinding may be stacked on top of each other, may be arranged side byside, or stacking of the winding may be combined side by side and on topof other windings. The coil may be flat. The magnetic field generatingdevice may include a magnetic coil and an impregnation material whichmay prevent the wire motion during operation of the magnetic coil. Theimpregnation material may be an electrically insulating materialpreventing the current passing between the turns or loops. Theimpregnation material may be positioned on the surface of and/or withinthe magnetic coil. The impregnation material may include a resin (e.g.epoxy resin).

FIG. 9 illustrates a floor projection of an exemplary magnetic fieldgenerating device 900. The magnetic field generating device may becircular, ellipsoidal, rectangular or it may have other shapes. Themagnetic field generating device may be planar. The magnetic fieldgenerating device may be curved e.g. in order to fit the applicatorand/or curve of body. The magnetic field generating device 900 may becharacterized by dimensions including an outer diameter D, an innerdiameter d, an inner radius r and an outer radius R. The magnetic fieldgenerating device 900 may be further characterized by areas A1 and A2.Area A2 may represent a winding area of the coil while A1 may representa magnetic core or area without any magnetic core or windings.

The area A1 is associated with dimensions r and d. The area A1 mayinclude no windings of the coil, and may be filled by air, oil,polymeric material. The area A1 may represent a magnetic core whereinthe magnetic core may be an air core. Alternatively, the magnetic coremay be a permeable material having high field saturation, such as asolid core from soft iron, iron alloys, laminated silicon steel, siliconalloys, vitreous metal, permendur, permalloy, powdered metals orceramics and/or other materials.

The area A2 is associated with dimensions of outer radius R and outerdiameter D.

The dimension of inner radius r may be in the range from 1% to 90% ofthe dimension of outer radius R, or in the range from 2% to 80% or from3% to 60% or from 4% to 50%, from 8% to 30%, or from 20% to 40% or from30% to 50% of the dimension of outer radius R. The dimensions of innerradius r and outer radius R may be used for achieving a convenient shapeof the generated magnetic field.

The outer diameter D of the magnetic device may be in a range of 30 mmto 250 mm, or of 40 mm to 150 mm, or of 50 mm to 135 mm or of 90 mm to125 mm, and the dimension of inner radius r may be in a range of 1% to70% or 1% to 50% or 30% to 50%, 5% to 25%, or 8% to 16% of the dimensionof outer radius R. For example, the dimension of outer radius R may be50 mm and the dimension r may be 5 mm. The area A1 may be omitted andthe magnetic field generating device may include only area A2 with thecoil winding.

As discussed, the area A2 may include a plurality of windings. Onewinding may include one or more wires. The windings may be tightlyarranged, and one winding may be touching the adjacent winding toprovide magnetic field with high magnetic flux density. The winding areaA2 may be in the range from 4 cm² to 790 cm², from 15 cm² to 600 cm²,from 45 cm² to 450 cm² or from 80 cm² to 300 cm² or from 80 cm² to 150cm² or from 80 cm² to 130 cm².

Alternatively, the windings may include a gap between each winding. Thegap may be between 0.01% to 50%, or 0.1% to 25%, or 0.1% to 10%, or 0.1%to 5%, or 0.001% to 1% of the dimension R-r. Such construction mayfacilitate cooling and insulation of individual winding of the magneticfield generating device. Further, the shape of the generated magneticfield may be modified by such construction of the magnetic fieldgenerating device.

The wire of the coil winding may have a different cross-section area.The cross-sectional area of the winding wire may be larger at the centreof the winding where the coil winding radius is smaller. Suchcross-section area of the wire may be from 2% to 50%, from 5% to 30%, orfrom 10% to 20% larger than the cross-sectional area of the same wiremeasured on the outer winding turn of the magnetic field generatingdevice, wherein the coil winding radius is larger. The cross-sectionalarea of the winding wire of the magnetic field generating device may belarger on the outer coil winding turn of the magnetic field generatingdevice where the coil winding radius is larger. Such cross-sectionalarea of the wire may be from 2% to 50%, from 5% to 30%, or from 10% to20% larger than the cross-section area of the same wire measured on theinner turn of the magnetic field generating device wherein the coilwinding radius is smaller.

The principles and parameters described above may be used in order tomodify the shape of the provided magnetic field to the patient's body,provide a more homogenous and/or targeted muscle stimulation (e.g.muscle contraction), reduce expansion of the magnetic field generatingdevice during the treatment and/or increase durability of the magneticfield generating device. The magnetic field generating device may expandand shrink during generation of time-varying magnetic field and thiscould cause damage of the magnetic field generating device. Differentcross-sectional areas of used conductive material (e.g. wire, metallicstripe or creating winding of the magnetic field generating device) mayminimize the destructive effect of expanding and shrinking the magneticfield generating device.

As discussed above, the cross-sectional area of the used conductivematerial, (e.g. wire, metallic stripe and/or creating winding of themagnetic field generating device) may vary between individual loops ofwiring in a range of 2% to 50%, or of 5% to 30%, or of 10% to 20% inorder to improve focus of the provided magnetic treatment, to increasedurability of the magnetic field generating device, to minimize heatingof the magnetic field generating device, and/or for other reasons.

Further, stacking of the wiring and/or isolating and/or dilatation layerbetween individual conductive windings of the magnetic field generatingdevice may not be constant and may be different based on the wirecross-sectional area, radius of the winding, required shape of providedmagnetic field and/or other parameters.

A thickness 901 of the magnetic field generating device 900 shown onFIG. 9 b may be in a range of 0.3 cm to 6 cm, or of 0.5 cm to 5 cm, orof 1 cm to 3 cm from the applicator's side view.

A total surface of the magnetic field generating device surfaceaccording to the applicator's floor projection, i.e. area A1+A2, may bein a range from 5 cm² to 800 cm², 10 cm² to 400 cm², 20 cm² to 300 cm²or 50 cm² to 150 cm².

The ratio of the area A1 and winding area A2 may be in a range of 0.01to 0.8, or 0.02 to 0.5 or 0.1 to 0.3 according to the applicator's floorprojection. The ratio between the winding area A2 of the magnetic fieldgenerating device and the area of RF electrodes located in sameapplicator according to the applicator's floor projection may be in arange of 0.01 to 4, or 0.5 to 3, or 0.5 to 2, 0.3 to 1, or 0.2 to 0.5,or 0.6 to 1.7, or 0.8 to 1.5, or 0.9 to 1.2.

FIGS. 10 a-10 g show the location of one or more RF electrodes 101 withregard to at least one magnetic field generating device 900 in anapplicator 800. The location of the RF electrodes 101, 102 and/or themagnetic field generating device 900 may crucially influence theeffectiveness and targeting of the treatment energy sources. The RFelectrodes and magnetic field generating device may be located withinthe applicator.

One or more RF electrodes 101, 102 may be located inside of theapplicator 800, as illustrated in the FIGS. 10 a, 10 b, 10 d, 10 e, 10f, 10 g and/or outside of the applicator 800, as illustrated in the FIG.10 c.

As shown in FIGS. 10 a-10 e and 10 g , at least one RF electrode may bein at least partial overlay with the area A2 or A1 of at least onemagnetic field generating device according to applicator's floorprojection. Such arrangement may enable the best synergic effect of themagnetic and RF treatments, improve homogeneity of tissue heating by theRF treatment, improve targeting of the magnetic and RF treatment, andalso minimize the health risk.

FIG. 10 a illustrates a side view of the applicator including at leastone RF electrode and magnetic field generating device. Shown applicatormay include the at least one RF electrode 101 which may be located underthe magnetic field generating device 900 in the applicator 800. The RFelectrode 101 may be positioned between bottom cover 517 of theapplicator 800 and magnetic field generating device 900. FIG. 10 billustrates an upper view of the same type of applicator including RFelectrode and magnetic field generating device. As shown in FIGS. 10 aand 10 b , the at least one RF electrode 101 may be very thin in orderto reduce unwanted physical effects caused by the time-varying magneticfield. FIG. 10 b illustrates that the at least one RF electrode 101 maybe almost completely in overlay with the magnetic field generatingdevice 900.

FIG. 10 c illustrates another exemplary applicator including at leastone RF electrode and magnetic field generating device. According to FIG.10 c , the at least one RF electrode 101 may be located outside of theapplicator 800, such as on or adjacent to an exterior surface of theapplicator 800. RF electrode outside of the applicator may have betterinsulation from the magnetic field generating device and/or from otherconductive elements radiating electromagnetic field from the applicator.Better insulation may decrease the influence of unwanted physicaleffects induced in the at least one RF electrode 101 by radiatingelectromagnetic field and/or time-varying magnetic field. One or more RFelectrodes 101 located outside of the applicator as illustrated in FIG.10 c may also have better contact with the patient's body and sooperation of tuning electrical element of an RF circuit may be improved.Further, transferring of the RF treatment to at least one patient'starget biological structure may be enhanced.

FIG. 10 d illustrates another exemplary applicator including at leastone RF electrode and magnetic field generating device. The at least oneRF electrode 101 may be positioned below the magnetic field generatingdevice 900. Applicator 800 may also include another at least one RFelectrode 102 located above the magnetic field generating device 900,wherein both RF electrode and magnetic field generating device may bepositioned in one applicator 800. The first side portion 801 havingcurved at least one RF electrode 102 in proximity or on its surface maybe used for treating a curved body area (e.g. at least part of thighs,hips, neck and/or arms). The second side portion 802 with a flat atleast one RF electrode 101 in proximity or on its surface may be usedfor treating body area where flat or nearly flat side of the applicatorwill be more suitable, such as an abdomen area or buttock.

FIG. 10 e shows a front side view of a similar applicator 800 as in FIG.10 d . FIG. 10 e illustrates that the RF electrode 101 may be in facttwo electrodes 101 a and 101 b. The electrodes 101 a and 101 b may bebipolar electrodes. Therefore, the applicator may include two bipolarelectrodes 101 a and 101 b below the magnetic field generating device900. When the applicator 800 includes two bipolar RF electrodes, thebipolar RF electrodes may be positioned between the bottom cover andmagnetic field generating device 900. Further, FIG. 10 e shows anotherRF electrode 102 positioned above the magnetic field generating device900.

FIG. 10 f illustrates another exemplary applicator 800 including RFelectrode and magnetic field generating device. The applicator mayinclude one or more RF electrodes 101 which may have minimal or nooverlay with at least one magnetic field generating device 900 accordingto applicator's floor projection. The applicator may include two RFelectrodes 101 having no or minimal overlay with magnetic fieldgenerating device.

At least one radiofrequency electrode 101 may be located in theapplicator 800 under the magnetic field generating device 900 asillustrated for example in FIG. 10 a , under the applicator 800 asillustrated in FIG. 10 c , and/or at least one RF electrode 101 may beat least partially located next to the magnetic field generating device900 as illustrated in FIG. 10 f . In addition, at least one RF electrodemay be located above the applicator and/or above the magnetic fieldgenerating device. The RF electrode and/or the applicator may be incontact with the patient.

FIG. 10 g illustrates another exemplary applicator 800 including RFelectrode and magnetic field generating device. The applicator may atleast one RF electrode 101 which may be located above the magnetic fieldgenerating device 900. The magnetic field generating device 900 may bepositioned between a bottom cover 517 of the applicator 800 and the RFelectrode 101. The heating provided by the RF electrode positioned abovethe magnetic field generating device may be provided also to themagnetic field generating device itself.

FIG. 10 h illustrates another exemplary applicator 800 having twomagnetic field generating devices 900 a and 900 b in one applicator, andspecifically having a first RF electrode 101 a, a first magnetic fieldgenerating device 900 a, a second RF electrode 101 b, and a secondmagnetic field generating device 900 b. The first RF electrode 101 a maybe positioned between the patient's body and first magnetic fieldgenerating device 900 a, and the second RF electrode 101 b may bepositioned between the patient's body and the second magnetic fieldgenerating device 900 b. Also, the first RF electrode 101 a may bepositioned between the bottom cover 517 and the first magnetic fieldgenerating device 900 a, and the second RF electrode 101 b may bepositioned between the bottom cover 517 and the second magnetic fieldgenerating device 900 b.

The magnetic field generating device and the one or more RF electrodesmay be positioned differently in relation to the tissue of the patient'sbody and/or body area. Also, the magnetic field generating device andthe one or more RF electrodes may be positioned differently in relationto the bottom cover of the applicator. As mentioned, the RF electrodemay be a monopolar RF electrode, a bipolar RF electrode, or a multipolarRF electrode.

The RF electrode may be coated by a coating material that is configuredto prevent spark discharge or plasma discharge in order to avoid painsensation to the patient. The coating material may include anelectrically insulating material. The coating material may include ametal oxide (e.g. aluminum oxide) and/or a plastic material (e.g., epoxymaterial). The coating may be positioned on the side of the RF electrodethat is arranged closer to the patient when the device is in use.

FIG. 10 i illustrates a cross sectional view of an exemplary applicator800 that includes a magnetic field generating device (MFGD) 900 and anRF electrode (RFE) 101, wherein the RF electrode 101 is positioned inoverlay and/or between the magnetic field generating device 900 and thetissue 601 of the patient. The RF electrode 101 is positioned betweenthe magnetic field generating device 900 and the bottom cover 517 of theapplicator 800.

FIG. 10 j illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the magnetic field generating device 900 ispositioned in overlay and/or between the RF electrode 101 and the tissue601 of the patient. The magnetic field generating device 900 ispositioned between the RF electrode 101 and the bottom cover 517 of theapplicator 800.

FIG. 10 k illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the RF electrode 101 is positioned next tothe magnetic field generating device 900. The magnetic field generatingdevice 900 may be beside the RF electrode 101. The RF electrode 101 maybe arranged in the same plane as the magnetic field generating device900. An upper edge of the RF electrode 101 may be positioned in the samehorizontal plane as an upper edge of the magnetic field generatingdevice 900. The RF electrode 101 may be separated from the magneticfield generating device 900 by air, oil and/or plastic material.

FIG. 10 l illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the RF electrode 101 is not positioned inoverlay with the magnetic field generating device 900. An upper edge ofthe RF electrode 101 may be positioned in a different horizontal planethan an upper edge of the magnetic field generating device 900. Theupper edge of the RF electrode 101 may be positioned in a horizontalplane that is a greater distance from the bottom cover 517 than ahorizontal plane along which the upper edge of the magnetic fieldgenerating device 900 is positioned.

FIG. 10 m illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the RF electrode 101 is not positioned inoverlay with the magnetic field generating device 900. An upper edge ofthe RF electrode 101 may be positioned in a different horizontal planethan an upper edge of the magnetic field generating device 900. Theupper edge of the RF electrode 101 may be positioned in a horizontalplane that is a shorter distance from the bottom cover 517 than ahorizontal plane along which the upper edge of the magnetic fieldgenerating device 900 is positioned. The RF electrode 101 and/or itscoating may be in contact with the bottom cover 517 of the applicator800. Further, the magnetic field generating device 900 may be in contactwith the bottom cover 517. For example, the RF electrode 101 and/ormagnetic field generating device 900 may be glued or fastened to thebottom cover 517.

FIG. 10 n illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the RF electrode 101 protrudes through thebottom cover 517. In this way, the RF electrode 101 and/or its coatingmay be in contact with the patient, and the one or more wirings poweringthe RF electrode 101 may be positioned in the applicator 800. The RFelectrode may be thin enough, so that the bottom cover 517 and the RFelectrode may be in contact with the tissue 601. The RF electrode 101may be detachable from the applicator 800 and may be replaceable.Further, the magnetic field generating device 900 may be in contact withthe bottom cover 517. For example, the RF electrode 101 and/or magneticfield generating device 900 may be glued or fastened to the bottom cover517.

FIG. 10 o illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 andan RF electrode 101, wherein the RF electrode 101 is positioned belowand/or attached to the bottom cover 517 of the applicator 800. The RFelectrode 101 may be in contact with the patient. The one or morewirings powering the RF electrode 101 may lead through e.g. a hole inthe bottom cover 517. The RF electrode may be thin enough, so that thebottom cover 517 and the RF electrode may be in contact with the tissue601. The RF electrode 101 may be detachable from the applicator 800and/or may be replaceable. Further, the magnetic field generating device900 may be in contact with the bottom cover 517. For example, the RFelectrode 101 and/or magnetic field generating device 900 may be gluedor fastened to the bottom cover 517.

FIG. 10 p illustrates a cross sectional view of another exemplaryapplicator 800 that includes the magnetic field generating device 900and a pair of bipolar RF electrodes 101 a, 101 b. The pair of bipolar RFelectrodes 101 a, 101 b may include first RF electrode 101 a and secondRF electrode 101 b, wherein the pair of bipolar RF electrodes 101 a, 101b is positioned in overlay and/or between the magnetic field generatingdevice 900 and the tissue 601 of the patient. Further, the pair ofbipolar RF electrodes 101 a, 101 b is positioned between the magneticfield generating device 900 and the bottom cover 517 of the applicator800.

FIG. 10 q illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 anda pair of bipolar RF electrodes 101 a, 101 b including a first RFelectrode 101 a and a second RF electrode 101 b. The magnetic fieldgenerating device 900 is positioned in overlay and/or between the pairof bipolar RF electrodes 101 a, 101 b and the tissue 601 of the patient.Further, the magnetic field generating device 900 is positioned betweenthe pair of bipolar RF electrodes 101 a, 101 b and the bottom cover 517.

FIG. 10 r illustrates a cross sectional view of another exemplaryapplicator 800 that includes the magnetic field generating device 900and a pair of bipolar RF electrodes 101 a, 101 b including first RFelectrode 101 a and second RF electrode 101 b. The pair of bipolar RFelectrodes 101 a, 101 b is positioned next to the magnetic fieldgenerating device 900. An upper edge of one or both of the RF electrodes101 a, 101 b may be positioned in the same horizontal plane as an upperedge of the magnetic field generating device 900.

FIG. 10 s illustrates a cross sectional view of another exemplaryapplicator 800 that includes the magnetic field generating device 900and a pair of bipolar RF electrodes 101 a, 101 b including first RFelectrode 101 a and a second RF electrode 101 b. The pair of bipolar RFelectrodes 101 a, 101 b is not positioned in overlay with the magneticfield generating device 900. An upper edge of the pair of bipolar RFelectrodes 101 a, 101 b may be positioned in a different horizontalplane than an upper edge of the magnetic field generating device 900.The upper edge of the pair of bipolar RF electrodes 101 a, 101 b may bepositioned in a horizontal plane that is a shorter distance from thebottom cover 517 than a horizontal plane in which the upper edge of themagnetic field generating device 900 is positioned. The pair of bipolarRF electrodes 101 a, 101 b and/or the electrode coatings may be incontact with the bottom cover 517 of the applicator 800. Further, themagnetic field generating device 900 may be in contact with the bottomcover 517. For example, the RF electrodes and/or magnetic fieldgenerating device 900 may be glued or fastened to the bottom cover 517.

FIG. 10 t illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 anda pair of bipolar RF electrodes 101 a, 101 b including first RFelectrode 101 a and second RF electrode 101 b. The pair of bipolar RFelectrodes 101 a, 101 b protrudes through the bottom cover 517 of theapplicator 800. The pair of bipolar RF electrodes 101 a, 101 b and/ortheir coatings may be in contact with the tissue 601 of the patient. TheRF electrodes may be thin enough, so that the bottom cover 517 and theRF electrodes may be in contact with the tissue 601. The RF electrode101 may be detachable from the applicator 800 and may be replaceable.Further, the magnetic field generating device 900 may be in contact withthe bottom cover 517. For example, the RF electrodes and/or magneticfield generating device 900 may be glued or fastened to the bottom cover517.

FIG. 10 u illustrates a cross sectional view of another exemplaryapplicator 800 that includes a magnetic field generating device 900 anda pair of bipolar RF electrodes 101 a, 101 b including first RFelectrode 101 a and second RF electrode 101 b. The pair of bipolar RFelectrodes 101 a, 101 b is positioned below and/or attached to thebottom cover 517 of the applicator 800. The pair of bipolar RFelectrodes 101 a, 101 b may be in contact with the tissue 601 of thepatient. The RF electrodes may be thin enough, so that the bottom cover517 and the RF electrodes may be in contact with the tissue 601. Thepair of bipolar RF electrodes 101 a, 101 b may be detachable from theapplicator 800 and may be replaceable. Further, the magnetic fieldgenerating device 900 may be in contact with the bottom cover 517. Forexample, the RF electrodes and/or magnetic field generating device 900may be glued or fastened to the bottom cover 517.

As described herein, the one or more RF electrodes may be positionedbetween the magnetic field generating device and the patient. Also, theone or more RF electrodes may be positioned between the magnetic fieldgenerating device and the bottom cover of the applicator. Such anarrangement of the RF electrode relative to the magnetic fieldgenerating device and/or bottom cover may be beneficial for transfer ofradiofrequency field to the patient. When one or more RF electrodes arepositioned between the magnetic field generating device and the bottomcover of the applicator such that the one or more RF electrodes arearranged closer to the patient, the provided radiofrequency waves arenot absorbed by the magnetic field generating device to as great of anextent as it would be if the RF electrodes were positioned above themagnetic field generating device. Also, by positioning the one or moreRF electrodes between the magnetic field generating device and thepatient and separated from the magnetic field generating device, theradiofrequency field is not absorbed by the magnetic field generatingdevice and may be provided to the patient. The one or more RF electrodesand the magnetic field generating device may be separated by air,plastic, or dielectric material.

However, the one or more RF electrodes may be in contact with themagnetic field generating device.

One or more RF electrodes positioned on the one applicator and/or morethe applicators 800 may be placed in contact with the patient. Also, oneor more RF electrodes and/or applicators may be separated from thepatient by an air gap, bolus, dielectric material, insulating material,gel, and/or other material.

One or more RF electrodes 101, 102 and/or magnetic field generatingdevices 900 within one applicator may be spaced from each other by anair gap, by material of a printed circuit board, insulator, coolingfluid, and/or other material. The distance between a conductive part ofthe magnetic field generating device and the nearest RF electrode may bein a range of 0.1 mm to 100 mm or 0.5 mm to 50 mm or 1 mm to 50 mm or 2mm to 30 mm or 0.5 mm to 15 mm or 0.5 mm to 5 mm. Spacing between themagnetic field generating device and the RF electrode may be alsoprovided in the form of an insulating barrier that separate a RF circuitfrom a magnetic circuit and prevents affecting one treatment circuit ortreatment energy source by other treatment circuit or other treatmentenergy source. The magnetic field generating device positioned closer topatient's body may be able to stimulate and provide the treatment effectto at least part of at least one target biological structure moreeffectively and deeply than the magnetic field generating device that isin a larger distance from the patient's body.

The magnetic field generating device and/or one or more RF electrodesincluded in or on the applicator may be cooled during the treatment.Cooling of the magnetic field generating device and/or one or more RFelectrodes may be provided by an element based on the Peltier effectand/or by flowing of a cooling fluid, such as air, water, oil and/or afluid within the applicator or in proximity of the applicator. Thecooling fluid may be flowed or guided around one or more magnetic fieldgenerating devices, one or more RF electrodes, between the magneticfield generating device and at least part of at least one RF electrode.Cooling fluid may flow only on the top and/or bottom of the magneticfield generating device. Cooling fluid may be a fluid, such as gas, oil,water and/or liquid. The cooling fluid may be delivered to theapplicator from the main unit where the cooling fluid may be tempered.The cooling fluid may be delivered to applicator and to the proximity ofmagnetic field generating device and/or RF electrode. The cooling fluidmay be delivered to the applicator by connecting tube coupled to themain unit. The connecting tube may include the fluid conduit, which mayserve as path for the cooling fluid between applicator and the mainunit.

The main unit may include one or more cooling tanks where the coolingfluid may be stored and/or cooled. Each cooling tank may include one ormore pumps, wherein one pump may provide flow of the cooling fluid toone applicator. Alternatively, one pump may provide flow of the coolingfluid to plurality of applicators (e.g. two applicators). Further, themain unit may include one cooling tank storing and/or cooling thecooling fluid for one respective applicator or plurality of applicators.For example, when the treatment device includes two applicators, themain unit may include one cooling tank providing the cooling fluid forboth applicators. In some aspects, when the treatment device includestwo applicators, the main unit may include two cooling tanks providingcooling of the cooling fluid. Each cooling tank may provide cooling ofthe cooling fluid to one particular applicator either synchronously orindependently. Cooling tank or fluid conduit may include a temperaturesensor for measuring temperature of cooling fluid.

The fluid conduit may be a plastic tube. The plastic tube may lead fromcooling tank to the applicator and then back to cooling tank. When thetreatment device includes e.g. two applicators, the fluid conduit maylead from the cooling tank to one applicator and then back to coolingtank while the second fluid conduit may lead from the same or differentcooling tank to second applicator and then back to the cooling tank.However, fluid conduit may lead from cooling tank to first applicator,then lead to second applicator and finally to cooling tank.

When the RF electrode is positioned in the proximity of magnetic fieldgenerating device, the time-varying magnetic field generated by themagnetic field generating device may induce unwanted physical effects inthe RF electrode. Unwanted physical effects induced by time-varyingmagnetic field may include e.g. induction of eddy currents, overheatingof RF electrode, skin effect, and/or causing other electric and/orelectromagnetic effects like a phase shift in the RF electrode. Suchunwanted physical effects may lead to treatment device malfunction,energy loss, decreased treatment effect, increased energy consumption,overheating of at least applicator's part, e.g., RF electrode,collecting false feedback information, malfunctioning of signaladjustment provided to the RF electrode and/or other unwanted effects.Also, the unwanted physical effects may be related to the treatmentitself, e.g. to effectiveness of the treatment. The RF electrode mayblock or limit transmissivity of the magnetic field through the RFelectrode. When the magnetic field generated by the magnetic fieldgenerating device is prevented from transmitting through the RFelectrode, the effect of magnetic field (e.g. muscle contraction) maynot be achieved.

The disclosure provides methods or designs how to prevent and/orminimize one or more unwanted physical effects induced in the RFelectrode by the magnetic field. The methods or designs described in theapplication may prevent the unwanted effects related to thetransmissivity of the magnetic field through the RF electrode. The samemethods or designs may help to minimize shielding of the magnetic fieldby the RF electrode. The RF electrode may be arranged in minimal or nooverlay with the magnetic field generating device according to the floorprojection of the applicator. Also, the RF electrode may be speciallydesigned as described below. Further, the RF electrode may have areduced thickness. The RF electrode may be manufactured from aconductive material that reduces induction of unwanted physical effectsand heating of the RF electrode. Other possibilities are describedbelow. One or more RF electrodes providing RF energy during thetreatment by a treatment device as described herein may use at least oneof these possibilities, at least two possibilities, and/or a combinationof all possibilities.

The RF electrode may be arranged in minimal or no overlay with themagnetic field generating device according to the floor projection ofthe applicator.

FIG. 11 illustrates an example in which the RF electrode 101 a may belocated under, next to, and/or above the magnetic field generatingdevice 900 and have no or minimal overlay with the magnetic fieldgenerating device 900 according to the applicator's floor projection. Asshown on FIG. 11 the electrode 101 a may be located outside of area A2.

FIG. 11 b illustrates an example of a transverse cross sectional view ofthe applicator 800, wherein the RF electrode 101 is located next to themagnetic field generating device 900. The RF electrode 101 may be in thesame horizontal plane as the magnetic field generating device andwithout any overlay. The RF electrode 101 may surround the magneticfield generating device 900. The RF electrode 101 and the magnetic fieldgenerating device 900 may be separated from each other by a space 902that may be filled by air and/or insulating material (e.g. plasticmaterial). The distance between the RF electrode 101 and the magneticfield generating device 900 may be in a range of 0.1 mm to 10 cm, toensure the transfer of the radiofrequency waves. In the example shown inFIG. 11 b , the RF electrode 101 may have a form of an open ring. Thus,the RF electrode 101 may have the form of a ring having a gap 904. Inthis example, the RF electrode 101 may be a monopolar or unipolar RFelectrode.

FIG. 11 c illustrates another example of a transverse cross sectionalview of an applicator 800, wherein the RF electrode 101 is located nextto the magnetic field generating device 900. The RF electrode 101 maysurround the magnetic field generating device 900. The RF electrode 101may be in the same horizontal plane as the magnetic field generatingdevice 900 and without any overlay. The RF electrode 101 and themagnetic field generating device 900 may be separated from one anotherby a space 902 that may be filled by air and/or an insulating material(e.g. plastic material). In the example shown in FIG. 11 c , the RFelectrode 101 may have the form of a closed ring around the magneticfield generating device 900. In this example, the RF electrode 101 maybe a monopolar or unipolar RF electrode.

FIG. 11 d illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes theactive RF electrode 101, a grounding plate 120, and the magnetic fieldgenerating device 900. The grounding plate 120 is separated by airand/or an insulating material (e.g. plastic material) from the active RFelectrode 101. The active RF electrode 101 may be a monopolar RFelectrode.

FIG. 11 e illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes aplurality of RF electrodes 101 a, 101 b and a magnetic field generatingdevice 900. The RF electrodes 101 a, 101 b may be bipolar RF electrodessurrounding the magnetic field generating device 900. The RF electrodes101 a, 101 b may be in the form of two closed rings, two open rings, orone ring may be open and the other may be closed. The RF electrodes 101a, 101 b may be spaced from one another and from the magnetic fieldgenerating device 900 by spaces 902 that may be filled by air and/or aninsulating material (e.g. plastic material).

FIG. 11 f illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes aplurality of RF electrodes 101 a, 101 b and a magnetic field generatingdevice 900. A first RF electrode 101 a may be a positive RF electrode,and a second RF electrode 101 b may be a negative RF electrode. Themutual polarity of RF electrodes changes with the frequency of the RFsignal. The RF electrodes 101 a, 101 b may not be in overlay with themagnetic field generating device 900. Two RF electrodes 101 a, 101 b arelocated next to the magnetic field generating device 900. Two RFelectrodes 101 a, 101 b and the magnetic field generating device 900 maybe separated from each other by air and/or an insulating material (e.g.plastic material). The plurality of RF electrodes 101 a, 101 b may becontrolled by the control system to deliver the radiofrequency waves.

FIG. 11 g illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes aplurality of RF electrodes 101 a, 101 b, 101 c, 101 d and a magneticfield generating device 900. The RF electrodes 101 a-101 d may bearranged in the same horizontal plane as the magnetic field generatingdevice 900 and without any overlay. As shown in exemplary FIG. 11 g ,one or more of the plurality of RF electrodes 101 a-101 d are locatednext to the magnetic field generating device 900. The plurality of RFelectrodes 101 a-101 d and the magnetic field generating device 900 maybe separated from each other by air and/or an insulating material (e.g.plastic material). Each of the plurality of RF electrodes 101 a-101 dmay be a monopolar RF electrode or a unipolar RF electrode. However, RFelectrodes 101 a-101 d may operate in a multipolar manner. Further, theactivation of the RF electrodes may be provided by one or more RFswitches 545 providing power to one or more RF electrodes. The RF switchor switches may be positioned in the applicator 800 and/or in the mainunit.

FIG. 11 h illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes aplurality of RF electrodes 101 a, 101 b, 101 aa, 101 bb and a magneticfield generating device 900. The RF electrodes 101 a and 101 aa may bepositive RF electrodes, and the RF electrodes 101 b and 101 bb may benegative RF electrodes. The mutual polarity of the RF electrodes changeswith the frequency of the RF signal. Therefore, two bipolar RF electrodepairs are present in the example of FIG. 11 h . The activation of the RFelectrodes may be controlled by a control system, so the transfer of theRF waves may be influenced by this control. For example, a first pair ofRF electrodes 101 a, 101 b may be active, and a second pair of RFelectrodes 101 aa, 101 bb may be inactive. In some aspects, the twopairs of RF electrodes may be activated in a predetermined order,wherein when the first pair of RF electrodes 101 a, 101 b is active, thesecond pair of RF electrodes 101 aa, 101 bb is inactivated, and when thefirst pair is inactive, the second pair becomes active. Further, theactivation of the RF electrodes may be provided by one or more RFswitches 545 providing power to the one or more RF electrodes. The RFswitch 545 may be positioned in the applicator 800 and/or in the mainunit. Also, the signal leading to the RF electrodes may be split ordivided by a splitter.

FIG. 1 i illustrates another example of a transverse cross sectionalview of the applicator 800, wherein the applicator 800 includes aplurality of RF electrodes 101 a, 101 b and a magnetic field generatingdevice 900. A first RF electrode 101 a may be a positive RF electrode,and the remaining three RF electrodes 101 b may be negative RFelectrodes. The mutual polarity of RF electrodes changes with thefrequency of the RF signal. The RF waves may be transferred between thepositive RF electrode 101 a and one or more of the negative RFelectrodes 101 b. Also, since the mutual polarity of RF electrodes ischanging, the RF waves may be transferred between the RF electrodes 101b and the RF electrode 101 a. Further, the activation of the RFelectrodes may be provided by one or more RF switches 545 providingpower to one or more RF electrodes. The RF switch 545 may be positionedin the applicator 800 and/or in the main unit.

Regarding FIGS. 11 g, 11 h and 11 i , the plurality of RF electrodes maybe controlled by the control system to deliver the radiofrequency waves.The control system may include the control unit, wherein the controlunit may include a microprocessor. In one example, in FIG. 11 g , thepair of RF electrodes 101 a and 101 c may be active, and the RFelectrodes 101 b and 101 d may be inactive. In some aspects, the RFelectrodes may be activated in a predetermined order, where the RFelectrode 101 a is active, then inactivated, and RF electrode 101 b isactivated. In some aspects related to FIG. 11 h , the first pair ofbipolar RF electrodes 101 a and 101 b may be active, and the second pairof bipolar RF electrodes 101 aa and 101 bb is not active. In stillanother example related to FIG. 11 i , the one, two or three negative RFelectrodes 101 b may be active at the same time, so the RF waves maytransfer between the positive RF electrode 101 a and each of thenegative RF electrodes 101 b. In still another example, the activationof the RF electrodes may follow a clockwise or counter-clockwisedirection. The at least two RF electrodes may be active simultaneouslywith the magnetic field generating device. The activation of the RFelectrodes may be provided by one or more RF switches 545 positioned inthe applicator and/or main unit. Also, the signal leading to the RFelectrodes may be split or divided by a splitter.

The activation of one or more RF electrodes, as shown for example inFIGS. 11 g, 11 h and 11 i and elsewhere, may be provided by one or moreRF switches 545 (depicted also as 545 a and/or 545 b). The RF switch 545may be located in the main unit and/or applicator. Each RF electrode maybe connected to one RF switch 545 or more than one RF electrode may beconnected to one RF switch 545, wherein the RF switch may be connectedto one or more electrical elements of the RF circuit. The RF switch 545may include an electrical element providing a switchable connection ofthe output of the RF signal (e.g. any electrical element connected tothe power source of RF treatment and/or power amplifier) to the input ofthe RF signal (e.g. RF electrode). Also, activation or deactivation ofone RF electrode may be controlled by more than one RF switch 545. TheRF switch 545 may include a relay, electrically controlled switch,voltage controlled switch, current controlled switch, mechanical switch,diode, PIN diode, piezo switch, transistor, thyristor and/or vacuumtube, among others. The RF switch may be positioned in the circuitbetween the splitter and the one or more RF electrodes. The RF switchmay have a drain-source capacitance in a range of 0.1 picofarad to 10nanofarad, 0.1 picofarad to 1 nanofarad, or 1 picofarad to 990picofarad.

FIG. 12 illustrates an exemplary applicator including a magnetic fieldgenerating device and one or more RF electrodes. The applicator mayinclude at least one magnetic field generating device and at least oneRF electrode. The applicator 800 may include two RF electrodes 101 a and101 b spaced by a gap 113. Two RF electrodes 101 a and/or 101 b may bein at least partial overlay 112 with the winding area A2 and/or area A1of the magnetic field generating device 900 according to theapplicator's floor projection. The partial overlay 112 is represented bya hatched area in FIG. 12 . When two elements overlay, the upper elementis superimposed on the part of the lower element. When the magneticfield generating device and RF electrode are in overlay, the surface ofthe magnetic field generating device is superimposed above the surfacearea of the RF electrode. The floor projection may be represented by apicture of the applicator 800 taken from the bottom of the applicator byX-ray. Such partial overlay 112 may be in a range from 1% to 100%, orfrom 1% to 99%, or from 1% to 70%, or from 5% to 50%, or from 5% to 40%,or from 10% to 30%, or from 25% to 100%, or from 10% to 100%, or from30% to 95%, or from 40% to 100%, or from 70% to 100%, or from 80% to 95%or from 30% to 70% of the area of one RF electrode area according to thefloor projection of the applicator. Overlay of two areas may refer to aratio between these two different areas.

One or more temperature sensors 816 a may be located between bipolar RFelectrodes 101 a, 101 b as illustrated in FIG. 12 . When the applicator800 includes two bipolar RF electrodes, the bipolar RF electrodes may bepositioned between a bottom cover of the applicator 800 and the magneticfield generating device 900. One or more temperature sensors 816 a maybe at least partially encircled by at least one RF electrode 101 a and101 b according to the applicator's floor projection as illustrated bytemperature sensors 816 a in FIG. 12 . The highest amount of RF energymay flow between bipolar electrodes 101 a and 101 b. Therefore, a volumeof the body area or the treated tissue between or directly below bipolarelectrodes may have the highest temperature and should be measured as anactual temperature or temperature reference to predeterminedtemperature. However, the temperature sensor may be placed insideapplicator or on the surface of the applicator.

A characteristic shape of the RF electrode may create inhomogeneoustemperature distribution of the heat during the treatment. It may beuseful to place the temperature sensor 816 b such that it is not locatedbetween RF bipolar electrodes 101 a, 101 b in such way that thetemperature sensor is not encircled by bipolar electrodes 101 a, 101 b.The temperature sensor may be placed inside applicator or on the surfaceof the applicator. Also, the temperature sensor 816 c may be locatedunder the RF electrode. However, in some aspects, the temperature sensormay be located in different locations of the applicator rather thanunder the RF electrode. The material of the first side portion 801and/or the second side portion 802 covering at least part of thetemperature sensor 816 (e.g. 816 a, 816 b or 816 c) and contacting thepatient's body may be manufactured from the same material as the firstside portion 801 and/or the second side portion 802. However, thematerial of the first side portion 801 or second side portion 802covering the temperature sensor 816 may be from a different materialthan the remainder of the first side portion 801 or second side portion802, such as a material with a higher thermal conductivity, e.g.ceramic, titanium, aluminum, or other metallic material or alloy. Thetemperature sensor 816 may be a thermistor. Specifically, thetemperature sensor 816 may be a negative temperature coefficient (NTC)thermistor. The temperature sensor 816 (e.g. 816 a, 816 b or 816 c) maybe fixed or coupled to the first side portion 801 and/or second sideportion 802 by thermally conductive material, such as a thermal epoxylayer, with good thermal conductivity. The wire connection (see, e.g.,wire connection 822 in FIG. 8 e ) between the temperature sensor 816 andthe rest of the device may be heated by operation of the magnetic fieldgenerating device and/or RF electrode, which is undesirable. The designof the wire connection 822 may prevent influence of the operation of themagnetic field generating device and/or RF electrode on the readingsprovided by the temperature sensor, which is also undesirable. The wireconnection 822 between the temperature sensor 816 and rest of thetreatment device may be represented by one, two or more conductive wireswith diameter in a range of 0.05 mm to 3 mm, or of 0.01 mm to 1 mm, orof 0.1 mm to 0.5 mm. The wire connection 822 including a conductive wirewith described diameter may be advantageous because of minimizing ofthermal transfer between the wire and the temperature sensor 816. Thewire connection 822 to the temperature sensor 816 may have thermalconductivity in a range of 5 W·m⁻¹ K⁻¹ to 320 W·m⁻¹ K⁻¹, or 6 W·m⁻¹ K⁻¹to 230 W·m⁻¹ K⁻¹, or 6 W·m⁻¹ K⁻¹ to 160 W·m⁻¹ K⁻¹, or 20 W·m⁻¹ K⁻¹ to110 W·m⁻¹ K⁻¹, or 45 W·m⁻¹ K⁻¹ to 100 W·m⁻¹ K⁻¹, or 50 W·m⁻¹ K⁻¹ to 95W·m⁻¹ K⁻¹. A material of wire connection 822 may be e.g.: nickel, monel,platinum, osmium, niobium, potassium, steel, germanium, aluminum,cobalt, magnesium copper and/or their alloys. At least part of the wireconnection 822 connected to the temperature sensor 816 may be thermallyinsulated by sheathing or shielding, such as by rubber tubing. Thetemperature sensor 816 may be an optical temperature sensor, such as aninfrared IR thermosensor, which may be part of the applicator and/or inthe main unit. During treatment, the optical temperature sensor may belocated in contact with the patient's skin or in a range of 0.1 cm to 3cm, or 0.2 cm to 2 cm from the patient's skin. The optical temperaturesensor may collect information from the patient's skin through theoptical cable.

One or more RF electrodes located with at least partial overlay underthe magnetic field generating device may provide synergic effect of themagnetic treatment and the RF treatment. Stronger or more intensivetreatment result may be provided with RF electrodes located with atleast partial overlay under the magnetic field generating device. Thegenerated RF field and the magnetic field from treatment energy sourcesin such configuration may be targeted to the same body area and/ortarget biological structures. This may result in better heating ofstimulated muscles and adjacent tissues, better suppressing ofuncomfortable feeling caused by muscle stimulation (e.g. musclecontraction), better regeneration after treatment and/or betterprevention of panniculitis and other tissue injury.

The RF electrode may comprise a special design as described below forminimizing or eliminating unwanted physical effects.

In some aspects, unwanted physical effects induced by a magnetic fieldin the RF electrode positioned in proximity or at least partial overlaywith the magnetic field generating device may be further minimized oreliminated by using a segmented RF electrode. The segmented RF electrodemay comprise apertures, cutouts and/or protrusions. The areas ofapertures and/or cutouts may be created by air, dielectric and/or otherelectrically insulating material. The electrode may comprise variousprotrusions. The plurality of apertures and/or cutouts may be visiblefrom the floor projection of such electrode. Another parameterminimizing or eliminating the presence of the unwanted physical effectsmay be the thickness of the RF electrode. If a conductive material ofthe RF electrode is thin and an area of the RF electrode is at leastpartially separated by an insulator, loops of eddy currents induced bymagnetic field may be very small and so induction in such areas isminimized.

The RF electrode may include one or more apertures or cutouts which maysegment the conductive area of the RF electrode and/or perimeter of theRF electrode. The RF electrode is therefore segmented in comparison to aregular electrode by disruption of the surface area (i.e., an electrodewith no apertures or cutouts). The two or more apertures or cutouts ofthe one RF electrode may be asymmetrical. The one or more aperture andcutout may have e.g. rectangular or circular shape. An aperture may beany hole and/or opening in the electrode area of the RF electrodeaccording to applicator's floor projection. The apertures and/or cutoutsmay have regular, irregular, symmetrical and/or asymmetrical shape. Theapertures and/or cutouts may be filled by e.g. air, dielectric and/orother electrically insulating material (e.g. dielectric material ofprinted circuit board). When the RF electrode includes two or moreapertures or cutouts, the apertures or cutouts may have the same pointof symmetry and/or line of symmetry. The distance between two closestpoints located on the borders of two different apertures and cutouts ofRF electrode may be in a range from 0.1 mm to 50 mm or 0.1 mm to 15 mmor from 0.1 mm to 10 mm or from 0.1 mm to 8 mm. When the RF electrode isin at least partial overlay with magnetic field generating device, theRF electrode may include larger apertures and cutouts in part of theconductive surface, which is closer to the center of the magnetic fieldgenerating device. The RF electrode including a plurality of openings(e.g. apertures or cutouts) and/or protrusions may be positioned belowthe magnetic field generating device. The RF electrode including aplurality of openings (e.g. apertures or cutouts) and/or protrusions maybe positioned between the magnetic field generating device and thepatient.

FIG. 13 a illustrates an exemplary RF electrode wherein the RF electrode101 includes an electrode area 119 a and defines one or more apertures117 in the conductive area of the RF electrode. The apertures 117 may beelongated slots having a rectangular shape. One aperture 117 may beparallel to another apertures.

FIG. 13 b illustrates another exemplary of RF electrode wherein the RFelectrode 101 includes an electrode area 119 a and one or more apertures117 a and 117 b in the conductive area of the RF electrode. Apertures117 a are not parallel to apertures 117 b.

FIG. 13 c illustrates another exemplary RF electrode wherein the RFelectrode 101 includes an electrode area 119 a and combination of one ormore apertures 117 in the conductive area, cutout 115 in the conductivearea and protrusion 114 of the RF electrode.

FIG. 13 d illustrates another exemplary RF electrode wherein the RFelectrode 101 includes a combination of one or more apertures 117 at theconductive area and the cutouts 115 in the electrode area. The linesrepresent thin line (e.g. single wire) of electrode area 119 a of RFelectrode. The RF electrode may be a grid of conductive wires or a meshof conductive wires. The protrusion 114 may define one or more cutouts115 at a perimeter of the electrode. The distance D between the bordersof individual lines (e.g. wires or grouped wires) may be in a range of0.01 mm to 100 mm, or 0.1 mm to 50 mm, or 0.1 mm to 10 mm.

FIG. 13 e illustrates another exemplary RF electrode includingprotrusions and cutouts. The RF electrode 101 has an electrode area 119a, a border length 119 b, and a plurality of protrusions illustrated asN_(#). The protrusions may define protrusion cutouts (e.g. cutout 115wherein the cutout may be an opening or gap). The protrusions may definecutouts (e.g. cutout 115 wherein the cutout may be an opening or gap).The RF electrode 101 may include at least two, three or five protrusions114 (e.g. 114 a, 114 b) or more. The protrusions 114 may be separatedfrom one another by cutout 115. Similarly, the RF electrode 101 mayinclude one, two, three or more protrusion cutouts. A first protrusion114 a and a second protrusion 114 b of the plurality of protrusions maybe arranged generally parallel to one another. The protrusions 114 maybe spaced at a fixed interval and may be regularly arranged. Protrusions114 a, 114 b may be shaped as rods or pins having a generally linearshape. Protrusions 114 a and 114 b may be made of a conductive material.Cutout 115 may be filled by air, dielectric, or other electricallyinsulating material. The distance between protrusions is such distance,that at least one circle 118 a which may be hypothetically inscribedinto cutout 115 and between two protrusions 114 a and 114 b. The atleast one circle 118 a may have a diameter in a range from 0.001 to 30mmm or 0.005 mm to 15 mm, or from 0.01 mm to 10 mm or 0.01 mm to 8 mm orfrom 0.01 mm to 7 mm, or from 0.01 mm to 5 mm or from 0.01 mm to 3 mm orfrom 0.01 mm to 2 mm, wherein each circle may have at least onetangential point located on the first protrusion 114 a and at least onetangential point located on the second protrusion 114 b. Each circle 118a may have different tangential points. The cutout 115 may besymmetrical and/or asymmetrical along its length. The cutout 115 maycreate a constant distance between protrusions 114 a and 114 b. Thedistance between protrusions 114 a and 114 b may not be constant alongthe length of the protrusions. The smallest distance between two nearestprotrusions 114 a, 114 b may be with increasing length of theprotrusions increasing and/or decreasing.

The protrusions 114 or cutouts 115 may have symmetrical, asymmetrical,irregular and/or regular shape. The size, shape and/or symmetry ofindividual protrusions 114 may be the same and/or different across theRF electrode 101. For example, each protrusion 114 may have the sameshape, the same dimensions, and/or symmetry.

The protrusions 114 may be characterized by the hypothetically inscribedcircle 118 b directly into protrusion. The hypothetically inscribedcircle 118 b to the protrusion 114 may have diameter in a range of 0.001mm to 30 mm, or of 0.01 mm to 15 mm, or of 0.2 mm to 10 mm, or of 0.2 mmto 7 mm or of 0.1 to 3 mm. The hypothetically inscribed circle may notcross the border of the protrusion in which it is inscribed. Themagnetic flux density B measured on at least part of the RF electrodesurface area may be in a range of 0.1 T to 5 T, or in range of 0.2 T to4 T, or in range of 0.3 T to 3 T, or of 0.5 T to 5 T, or in range of 0.7T to 4 T, or in range of 1 T to 3 T. The magnetic flux density Bmeasured on at least part of the RF electrode surface area may bemeasured during the treatment. The RF electrode surface area may includesurface area of conductive surface of the RF electrode.

The magnetic flux density B measured on the at least one protrusion ofthe RF electrode may be in a range of 0.1 T to 5 T, or in range of 0.2 Tto 4 T, or in range of 0.3 T to 3 T, or of 0.5 T to 5 T, or in range of0.7 T to 4 T, or in range of 1 T to 3 T. The magnetic flux density Bmeasured in the at least one aperture of the RF electrode surface areamay be in a range of 0.1 T to 5 T, or in range of 0.2 T to 4 T, or inrange of 0.3 T to 3 T, or of 0.5 T to 5 T, or in range of 0.7 T to 4 T,or in range of 1 T to 3 T. The magnetic flux density B measured in theat least one cutout of the RF electrode surface area may be in a rangeof 0.1 T to 5 T, or in range of 0.2 T to 4 T, or in range of 0.3 T to 3T, or of 0.5 T to 5 T, or in range of 0.7 T to 4 T, or in range of 1 Tto 3 T. The magnetic flux density measured in the cutout and/or theaperture may be measured by fluxmeter and/or its probe positioned in acenter of the cutout and/or opening.

The number of protrusions N #included in one RF electrode means thehighest possible number of conductive areas electrically insulated fromeach other that may be created between and/or by two parallel cuts 111across the surface of the RF electrode. The distance between twoparallel cuts 111 may be in a range of 1 mm to 50 mm or 2 mm to 35 or 5mm to 20 mm. The number of protrusions N_(#) may be in range of 5 to1000, or of 10 to 600, or of 20 to 400, or of 50 to 400, or of 100 to400 or of 15 to 200, or of 30 to 100, or of 40 to 150, or of 25 to 75.

The total number of protrusions in one RF electrode regardless of theparallel cuts 111 may be in the range of 5 to 1000, or of 10 to 600, orof 20 to 400, or of 50 to 400, or of 100 to 400 or of 15 to 200, or of30 to 100, or of 40 to 150, or of 25 to 140.

The total number of apertures or cutouts in one RF electrode regardlessof the parallel cuts 111 may be in the range of 5 to 1000, or of 10 to600, or of 20 to 400, or of 50 to 400, or of 100 to 400 or of 15 to 200,or of 30 to 100, or of 40 to 150, or of 25 to 140.

The number of apertures, cutouts and/or protrusions in one RF electrodelocated below the coil including its core may be in a range 5 to 1000,or of 10 to 600, or of 20 to 400, or of 50 to 400, or of 100 to 400 orof 15 to 200, or of 30 to 100, or of 40 to 150, or of 25 to 140.

Number of an individual protrusions included in one RF electrode may bein range of 1 to 8000 or of 2 to 8000 or of 5 to 8000 or of 3 to 5000 orof 5 to 1000 or of 5 to 500 or of 10 to 500 or of 5 to 220 or of 10 to100 in the area of size 2 cm multiplied 1 cm.

In order to provide a radiofrequency field with a consistent output, theplurality of apertures of the RF electrode may be divided into a firstplurality of apertures and a second plurality of apertures. Firstplurality of apertures may be located below and in overlay with themagnetic field generating device, and the second plurality of aperturesmay be located outside of overlay with the magnetic field generatingdevice, i.e., not below the magnetic field generating device. Thepresence of a second plurality of apertures and surrounding electrodearea of the RF electrode located outside of the overlay with themagnetic field generating device may prevent mechanical and/orelectrical stress of the first plurality of apertures and surroundingelectrode area of the RF electrode, which may result in variation of theradiofrequency field output. Also, the presence of a second plurality ofapertures and surrounding electrode area of the RF electrode locatedoutside of the overlay with the magnetic field generating may improvecooling of the RF electrode. A number of apertures of the firstplurality of apertures may be in a range of 5 to 1000, or of 10 to 600,or of 20 to 400, or of 50 to 400, or of 100 to 400 or of 15 to 200, orof 30 to 100, or of 40 to 150, or of 25 to 140. A number of apertures ofthe second plurality of apertures may be in a range of 5 to 1000, or of10 to 600, or of 20 to 400, or of 50 to 400, or of 100 to 400 or of 15to 200, or of 30 to 100, or of 40 to 150, or of 25 to 140.

FIG. 53 a illustrates an RF electrode 101 having a plurality ofapertures 117 c, 117 d. A magnetic field generating device 531overlaying RF electrode 101 is symbolized by a dashed line. A firstplurality of apertures 117 d may be located below the magnetic fieldgenerating device 531, and apertures 117 c may be located outside theoverlay with the magnetic field generating device 531.

In order to provide radiofrequency field with a consistent output, theplurality of cutouts of the RF electrode may be divided to a firstplurality of cutouts and a second plurality of cutouts. The firstplurality of cutouts may be located below and in overlay with themagnetic field generating device, and the second plurality of cutoutsmay be located outside of the overlay with the magnetic field generatingdevice, therefore not below the magnetic field generating device. Thepresence of a second plurality of cutouts and surrounding electrode areaof the RF electrode located outside of the overlay with the magneticfield generating device may prevent mechanical and/or electrical stressof the first plurality of cutouts and surrounding electrode area of theRF electrode. Also, the presence of a second plurality of cutouts andsurrounding electrode area of the RF electrode located outside of theoverlay with the magnetic field generating may improve cooling of the RFelectrode. A number of the first plurality of cutouts may be in a rangeof 5 to 1000, or of 10 to 600, or of 20 to 400, or of 50 to 400, or of100 to 400 or of 15 to 200, or of 30 to 100, or of 40 to 150, or of 25to 140. A number of the second plurality of cutouts may be in a range of5 to 1000, or of 10 to 600, or of 20 to 400, or of 50 to 400, or of 100to 400 or of 15 to 200, or of 30 to 100, or of 40 to 150, or of 25 to140. FIG. 53 b illustrates the RF electrode 101 having cutouts 115 a,115 b. The magnetic field generating device 531 is symbolized by adashed line. A first plurality of cutouts 115 b is located below themagnetic field generating device. A second plurality of cutouts 115 a islocated outside of the overlay with the magnetic field generatingdevice.

In order to provide radiofrequency field with a consistent output, theplurality of protrusions of the RF electrode may be divided into a firstplurality of protrusions and a second plurality of protrusions. Thefirst plurality of protrusions may be located below and in overlay withthe magnetic field generating device, and the second plurality ofprotrusions may be located outside of the overlay with the magneticfield generating device, i.e., not below the magnetic field generatingdevice. The presence of a second plurality of protrusions of the RFelectrode located outside of the overlay with the magnetic fieldgenerating device may prevent mechanical and/or electrical stress of thefirst plurality of protrusions of the RF electrode. Also, the presenceof a second plurality of protrusions of the RF electrode located outsideof the overlay with the magnetic field generating may improve cooling ofthe RF electrode. A number of the first plurality of protrusions may bein a range of 5 to 1000, or of 10 to 600, or of 20 to 400, or of 50 to400, or of 100 to 400 or of 15 to 200, or of 30 to 100, or of 40 to 150,or of 25 to 140. A number of the second plurality of protrusions may bein a range of 5 to 1000, or of 10 to 600, or of 20 to 400, or of 50 to400, or of 100 to 400 or of 15 to 200, or of 30 to 100, or of 40 to 150,or of 25 to 140. FIG. 53 c illustrates the RF electrode 101 havingprotrusions 114 c, 114 d. The magnetic field generating device 531 issymbolized by a dashed line. A first plurality of protrusions 114 d arelocated below the magnetic field generating device 531. A secondplurality of protrusions 114 c are located outside of the overlay withthe magnetic field generating device 531.

The magnetic flux density B and/or amplitude of magnetic flux density asmeasured on at least part of the RF electrode 101 may be in a range of0.1 T to 5 T, 0.2 T to 4 T, 0.3 T to 3 T, 0.7 T to 5 T, 1 T to 4 T, or1.5 T to 3 T during the treatment. The electrode may be defined by aprotrusion density p_(p) according to Equation 1,

$\begin{matrix}{\rho_{p} = \frac{n}{lB}} & {{Equation}1}\end{matrix}$

wherein n symbolizes a number of a protrusions intersecting a magneticfield line of force of magnetic flux density B[T] and l[cm] symbolizes alength of intersected the magnetic field line of force by theseprotrusions. The length 1 may be at least 1 cm long and magnetic fieldline of force may have a magnetic flux density B[T] of at least 0.3 T or0.7 T. The protrusion density according to the treatment device may bein at least part of the RF electrode in a range of 0.3 cm⁻¹·T⁻¹ to 72cm⁻¹ T⁻¹, or of 0.4 cm⁻¹·T⁻¹ to 10 cm⁻¹·T⁻¹, or of 0.4 cm⁻¹·T⁻¹ to 7cm⁻¹·T⁻¹, or of 0.5 cm⁻¹·T⁻¹ to 6 cm⁻¹·T⁻¹, or of 0.8 cm⁻¹·T⁻¹ to 5.2cm⁻¹·T⁻¹.

Protrusions may be wider (i.e. they may have a greater thickness) wherethe magnetic flux density is lower and thinner where magnetic fluxdensity is higher. Further, protrusion density ρ_(p) may be higher wherethe magnetic flux density is higher.

An electrode area of one or more RF electrodes in one applicator or oneadditional treatment device may be in a range from 1 cm² to 2500 cm², or25 cm² to 800 cm², or 30 cm² to 600 cm², or 30 cm² to 400 cm², or from50 cm² to 300 cm², or from 40 cm² to 200 cm² according to theapplicator's floor projection.

The RF electrode may have a border ratio. Border ratio may be defined asthe ratio between circumference and area of the electrode. An example ofborder ratio is shown in FIG. 13 e , where the circumference may bedepicted as the border length 119 b and area of the RF electrode isdepicted by the electrode area 119 a of the RF electrode according tothe applicator's floor projection. The electrode area 119 a is the areaof the RF electrode without wires supplying the RF electrodes andwithout sum of the circumference of all apertures and/or cutouts. Theborder length 119 b is the sum of electrode's circumference and allcircumferences of apertures inscribed inside the electrode, if thereexist any. The border ratio of the RF electrode may be in a range of 10m⁻¹ to 50 000 m⁻¹ or of 50 m⁻¹ to 40 000 m⁻¹ or of 150 m⁻¹ to 20 000 m⁻¹or of 200 m⁻¹ to 10 000 m⁻¹ or of 200 m⁻¹ to 4000 m⁻¹ or of 300 m⁻¹ to10 000 m⁻¹ or of 300 m⁻¹ to 4000 m⁻¹ or of 500 m⁻¹ to 4000 m⁻¹ or 10 m⁻¹to 20 000 m⁻¹ or 20 m⁻¹ to 10 000 m⁻¹ or 30 m⁻¹ to 5 000 m⁻¹.

According to the applicator's floor projection, at least one RFelectrode may have a border ratio in a range of 10 m⁻¹ to 50 000 m⁻¹ orof 50 m⁻¹ to 40 000 m⁻¹ or of 150 m⁻¹ to 20000 m⁻¹ or of 250 m⁻¹ to10000 m⁻¹ or of 200 m⁻¹ to 4000 m⁻¹ or of 300 m⁻¹ to 1000 m⁻¹ or of 400m⁻¹ to 4000 m⁻¹ or of 400 m⁻¹ to 1200 m⁻¹ or of 500 m⁻¹ to 2000 m⁻¹ or10 m⁻¹ to 20 000 m⁻¹ or 20 m⁻¹ to 10 000 m⁻¹ or 30 m⁻¹ to 5 000 m⁻¹ in alocations where a magnetic flux density B on at least part of the RFelectrode's surface may be in a range of 0.1 T to 7 T, or of 0.3 T to 5T, or of 0.5 to 3 T, or of 0.5 T to 7 T, or in a range of 0.7 T to 5 T,or in range of 1 T to 4 T. With increasing magnetic flux density Bacross the RF electrode area may be an increased border ratio.

The ratio between the border ratio and the magnetic flux density B on RFelectrode surface area may be called a charging ratio. The chargingratio may be related to square surface area of RF electrode of at least1.5 cm² and magnetic flux density in a range of 0.1 T to 7 T, or of 0.3T to 5 T, or of 0.5 to 3 T, or of 1 T to 5 T, or of 1.2 T to 5 T. Thecharging ratio of at least part of the RF electrode may be in a rangefrom 70 m⁻¹ T⁻¹ to 30000 m⁻¹·T⁻¹, or from 100 m⁻¹·T⁻¹ to 5000 m⁻¹·T⁻¹,or from 100 m⁻¹·T⁻¹ to 2000 m⁻¹·T⁻¹, or from 120 m⁻¹·T⁻¹ to 1200m⁻¹·T⁻¹, or from 120 m⁻¹·T⁻¹ to 600 m⁻¹·T⁻¹ or from 230 m⁻¹·T⁻¹ to 600m⁻¹·T⁻¹. Square surface area of RF electrode may include a surface areahaving square shape.

With higher border ratio and/or charging ratio, induced unwantedphysical effects in the RF electrode may be lower because the RFelectrode may include partially insulated protrusions from each other.With higher border ratio and/or charging ratio, possible hypotheticallyinscribed circles into protrusions has to be also smaller and so loopsof induced eddy current has to be smaller. Therefore, induced eddycurrents are smaller and induced unwanted physical effect induced in theRF electrode is lower or minimized.

The ratio between an area of one side of all RF electrodes (floorprojection) and one side of all winding areas of all magnetic fieldgenerating devices (area A2 as shown in FIG. 9 a ) in one applicator andaccording to its floor projection may be in a range of 0.1 to 15, or of0.5 to 8, or of 0.5 to 4, or of 0.5 to 2.

As illustrated in FIG. 16 , if one protrusion 114 is intersected bymagnetic field lines B₁ and B₂ where absolute value of ιB₁ι is higherthan absolute value of ιB₂ι and ιB₁ι-ιB₂0.05<ιT, then the protrusion maybe divided into three areas by lines of forces B₁ and B₂. In otherwords, the protrusion 114, as is illustrated in FIG. 16 , may be dividedinto thirds S₁, S₂, S₃ that have the same length according to directionof magnetic field gradient and S₁ is exposed to higher magnetic fluxdensity than S₃. Area S₁ may be placed in the highest magnetic fluxdensity, S₂ may be placed in middle magnetic flux density and S₃ may beplaced in the lowest magnetic flux density. The maximal hypotheticallyinscribed circle k₁ with diameter d₁ inscribed in the area S₁ may havesmaller diameter than the maximal inscribed circle k₂ with diameter d₂inscribed in the area S₃. The diameter d₂ may be greater than diameterd₁ of 2% to 1500%, or of 5% to 500%, or of 10% to 300%, or of 10% to200%, or of 10% to 100%, or of 5% to 90%, or of 20% to 70%, or 5% to 20%of the diameter d₁. In such case, protrusions may be thinner where themagnetic flux density is higher, such as at least partially pyramidalshape of the protrusion may be created. In addition, protrusions may bethinner where magnetic flux density is higher.

The RF electrode may have different sizes and shapes. The plurality ofRF electrodes may include bipolar electrodes. The bipolar electrodes maybe parallel electrodes, such as shown in FIG. 14 a-14 e , or concentricelectrodes it is shown in FIGS. 15 a-15 c . The same type of RFelectrodes 101 illustrated in FIGS. 14 a-14 e and FIGS. 15 a-15 c thatmay be located close to the second side portion of the applicator may beused as RF electrodes 102 located close to the first side portion and/orfor any other one or more RF electrodes.

Shape and arrangement of RF electrodes of at least one applicator may bebased on size shape and symmetry of body location (anatomy) where atleast one applicator will be attached. Positioning and different shapesof the RF electrode may be beneficial in order to avoid creating of hotspots, provide homogeneous heating of as large treated body area, aspossibility to avoid needs of moving with one or more applicators.

FIG. 14 a illustrates an example of symmetrical positioning of RFelectrodes. FIG. 14 b illustrates another example of symmetricalpositioning of RF electrodes. FIG. 14 c illustrates still anotherexample of symmetrical positioning of RF electrodes. FIG. 14 dillustrates view of an applicator including symmetrical positioning ofRF electrodes. FIG. 14 e illustrates a side view of an applicatorincluding example of symmetrical positioning of RF electrodes.

According to examples of RF electrodes shown in FIGS. 14 a-14 e , theapplicator may include at least one pair of parallel bipolar RFelectrodes 101 a and 101 b spaced by a gap 113. The RF electrodes arepowered by wiring 100 a and 100 b. As illustrated in FIGS. 14 a, 14 band 14 d , RF electrodes 101 a, 101 b may be symmetrical, and may bemirror images. The shape of individual RF electrodes 101 a and 101 b maybe irregular or asymmetrical wherein the length and/or area of at least40%, 50%, 70%, 90%, or 99% of all protrusions in one RF electrode may bedifferent. Body anatomy and testing may prove that such kind of RFelectrodes could provide the most comfortable and efficient treatment ofbody areas, such as abdomen area, buttock, arms and/or thighs.

As illustrated in FIG. 14 c , RF electrodes 101 a, 101 b may be at leastpartially symmetrical according to at least one axis or point ofsymmetry, such as according to linear symmetry, point symmetry, androtational symmetry. For example, each electrode may be semi-circular orC-shaped. Further, the gap 113 between RF electrodes 101 a and 101 b maybe irregular and/or may be designed according to at least one axis ofsymmetry, such as linear axis of symmetry with mirror symmetry. Thus, incase when electrodes 101 a and 101 b may be semi-circular, gap 113 maybe circular. Use of such symmetrical electrode may be beneficial fortreating body area where such symmetry may be required to highlightsymmetry of body area (e.g. buttocks or hips).

The gap 113 between RF electrodes 101 a and 101 b may include air,cooling fluid, oil, water, dielectric material, fluid, and/or any otherelectric insulator, such as a substrate from composite material used inprinted board circuits. The RF electrode 101 a and 101 b may be formedfrom copper foil and/or layer deposited on such substrate. The gap 113may influence a shape of the electromagnetic field (e.g. RF field)produced by RF electrodes and the depth of electromagnetic fieldpenetration into a patient's body tissue. Also, the distance between theat least two RF electrodes 101 a and 101 b may create the gap 113 whichmay have at least partially circular, elliptic and/or parabolic shape,as illustrated in FIG. 14 a . The gap 113 may have regular shape forspacing RF electrodes with constant distance as illustrated in FIG. 14b.

The gap 113 between the RF electrodes 101 a and 101 b may be designed toprovide a passage of amount in the range of 2% to 70% or 5% to 50% or15% to 40% of the magnetic field generated by the magnetic fieldgenerating device. The distance between the nearest parts of at leasttwo different RF electrodes in one applicator may be in a range of 0.1cm to 25 cm, or of 0.2 cm to 15 cm, or of 2 cm to 10 cm, or of 2 cm to 5cm.

The gap 113 between two RF electrodes may be designed in a plane of theRF bipolar electrodes wherein the gap 113 may at least partially overlaya location where the magnetic flux density generated by the magneticfield generating device has the highest absolute value. The gap 113 maybe located in such location in order to optimize treatment efficiencyand minimize energy loss.

It should be noted that strong magnetic field having high derivative ofthe magnetic flux density dB/dt may induce unwanted physical effectseven in the RF electrode with protrusions, apertures and/or cutouts. Thegap 113 may be positioned or located in the location where the absolutevalue of magnetic flux density is highest. As a result, the plurality ofRF electrodes positioned around the gap 113 may be then affected bylower amount of magnetic flux density.

Plurality of RF electrodes (e.g. two RF electrodes 101 a and 101 b) maybe located on a substrate 113 a as shown in the FIG. 14 d . Substrate113 a may be used as filler of the gap 113 between RF electrodes and ofone or more cutouts 115. As shown in FIGS. 14 d and 25, the substrate113 a and one or more RF electrodes may be curved into required shapeand/or radius to fit to patient's body area. RF electrodes 101 a or 101b may be curved along a lower cover 125 of applicator 800, particularlyalong a curved portion 126 of lower cover 125. As shown in FIG. 14 d ,the substrate 113 a may define a substrate gap 113 b for at least onesensor, such as temperature sensor. Substrate gap 113 b may furtherenable passage of one or more wires, cooling fluid, and/or forimplementing another treatment energy source, such as a light treatmentenergy source (e.g. LED, laser diode) providing illumination oradditional heating of the biological structure and/or body area.

FIGS. 15 a, 15 b and 15 c illustrate two RF electrodes 101 a and 101 b,wherein at least one RF electrode 101 a may at least partially surroundanother RF electrode 101 b. The RF electrodes 101 a and 101 b may bespaced by gap 113 including e.g. substrate 113 a with the sameinsulating properties as described above with respect to FIGS. 14 a-14 e. RF electrode 101 b may include a hole 116 in order to minimizeshielding of magnetic field and inducing of unwanted physical effectsinduced in the RF electrode 101 b. The hole 116 may be located in the RFelectrode plane where the magnetic flux density of the magnetic fieldgenerated by magnetic field generating device reaches highest valuesduring the treatment. The hole 116 may be circular, or may have othershapes, such as oval, square, triangle, or rectangle, among others. Thehole 116 may have an area of 0.05 cm² to 1000 cm², or 0.05 cm² to 100cm², or of 3 cm² to 71 cm², or of 3 cm² to 40 cm², or of 3 cm² to 20cm², or of 3 cm² to 15 cm², or of 0.5 cm² to 2.5 cm². The RF electrodesmay be fully or partially concentric.

FIG. 15 a illustrates two RF electrodes 101 a and 101 b may which benoncircular with at least one linear and/or point symmetry. Shownelectrodes 101 a and 101 b may have no centre of symmetry. Shown RFelectrode 101 a may include a hole 116 in its centre where the magneticflux density is the highest in order to minimize induction of unwantedphysical effect in the RF electrode by magnetic field.

FIG. 15 b illustrates two RF electrodes 101 a and 101 b may have acircular shape with rotational symmetry. The RF electrodes 101 a and 101b may have the same centre of symmetry. Shown RF electrode 101 a mayinclude a hole 116 in its centre where the magnetic flux density is thehighest in order to minimize induction of unwanted physical effects inthe RF electrode by magnetic field.

FIG. 15 c illustrates two RF electrodes 101 a and 101 b may have nosymmetry and no centre of symmetry.

In order to minimize or eliminate unwanted physical effects, the RFelectrode may include a reduced thickness. Thickness of the RF electrodemay be in a range of 0.01 mm to 50 mm, or 0.01 mm to 10 mm, or 0.01 mmto 5 mm, or 0.01 mm to 3 mm, or 0.01 mm to 1 mm, or 0.1 mm to 1 mm, or0.005 mm to 0.1 mm, or 0.01 mm to 0.2 mm.

The RF electrode may include one or more layers of substrate covered bya conductive layer, such as by a thin conductive layer. The thinconductive layer may be plated onto the substrate, e.g. byelectroplating. Thickness of the conductive layer of RF electrode may bein a range of 0.01 mm to 50 mm, or 0.01 mm to 10 mm, or 0.01 mm to 5 mm,or 0.01 mm to 3 mm, or 0.01 mm to 1 mm, or 0.1 mm to 1 mm, or 0.005 mmto 0.1 mm, or 0.01 mm to 0.2 mm. One type of the RF electrode may bedesigned by a similar method as printed circuit boards (PCB) areprepared, wherein a thin, conductive layer may be deposited into and/oronto a substrate with insulating properties. However, the substrate mayhave dielectric properties or conductive properties. In other words, theRF electrode may include a conductive layer deposited on the layer ofsubstrate. The substrate material forming the substrate layer of theelectrode may be rigid or flexible. The substrate may include one, twoor more conductive layers from a material such as copper, silver,nickel, aluminum, alloys of nickel and zinc, Mu-metal, austeniticstainless steel and/or other materials, creating the RF electrode. Also,a combination of materials may be used for conductive layer, e.g.nickel-copper combination.

The conductive layer may fully or partially cover the layer ofsubstrate. The substrate may be covered or plated by a conductive layerof the RF electrode on the side of the substrate facing toward thepatient and/or on the side of the substrate facing away from thepatient. The thickness of the substrate material may be in a range of0.01 mm to 45 mm, or 0.01 mm to 10 mm, or 0.01 mm to 5 mm, or 0.01 mm to3 mm, or 0.01 mm to 2 mm, or 0.1 mm to 2 mm, or 0.5 mm to 1.5 mm, or0.05 mm to 1 mm. The substrate material may be polymeric, ceramic,copolymeric sheet, phenol resin layer, epoxy resin layer, fiberglassfabric other textile fabric, polymeric fabric and/or other. Thesubstrate may be at least partially flexible and/or rigid. Also, thesubstrate material may be a foam material, including plastic foam,polyolefin foam, polyurethane foam, or carbon foam. The foam may provideincreased flexibility and protection to the conductive layer duringvibrations, which may occur during treatment. The substrate material maybe a textile. The substrate material may be a nanomaterial, e.g.,nanotubes or nanoparticles.

The conductive layer deposited on the substrate layer may include anydesign of cutouts, protrusions and/or apertures as shown in any of FIGS.13 a, 13 b, 13 c, 13 d, 13 e . Also, it is possible that the conductivelayer may not include any opening or protrusions. The conductive layermay include a sheet of conductive material. Conductive layer may beplated on the substrate layer. Further, the conductive layers plated onboth sides of the substrate layer may be connected through suturing theone or more conducting wires (e.g. by metal loading through thesubstrate layer), such that the conductive layers and the substratelayer can be seen as one RF electrode. Conductive layer may be made ofaluminum, copper, nickel, cobalt, manganese, zinc, iron, titanium,silver, brass, platinum, palladium and/or others from which may createalloys, such as Mu-metal, permalloy, electrical steel, ferritic steel,ferrite, stainless steel. The surface resistance Rs of the RF electrodemay be in a range of 0.00005 Ω/cm² to 15 Ω/cm² or 0.0001 Ω/cm² to 10Ω/cm²n 0.0002 Ω/cm² to 5 Ω/cm². The volume resistance R_(V) of the RFelectrode may be in a range of 0.0001 Ω/mm² to 20 Ω/mm² or 0.0001/mm² to10 Ω/mm² or 0.001 Ω/mm² to 8 Ω/mm².

FIG. 54 a illustrates an applicator 800 including a magnetic fieldgenerating device 540, and a RF electrode 101 positioned adjacent to abody area 541 of a patient. The RF electrode 101 may include a substrate542 covered by a conductive layer 543. As shown in FIG. 54 a , theconductive layer 543 may be positioned between the substrate 542 and thebody area 541 of the patient. The conductive layer 543 may cover theside of the substrate 542 which is closer to the body area 541 of thepatient. Positioning of the conductive layer 543 closer to the patientmay prevent unwanted physical effects by distancing the conductive layer543 from the magnetic field generating device 540.

FIG. 54 b illustrates an applicator 800, where the RF electrode 101includes a substrate 542 covered by a conductive layer 543 on a sidecloser to the magnetic field generating device 540. Positioning of theconductive layer 543 closer to the magnetic field generating device 540may prevent stress provided to the substrate 542.

FIG. 54 c illustrates an applicator 800, where the RF electrode 101includes a substrate 542 covered by conductive layers 543 a and 543 b onboth sides of the substrate 542. Positioning the conductive layers onboth sides of the substrate 542 may prevent stress provided to thesubstrate 542 and lead to the uniform manufacture of the RF electrode.

FIG. 54 d illustrates an applicator 800, wherein the RF electrode 101includes a substrate 542 covered by a conductive layer 543 on a sidecloser to the body area 541, and wherein the conductive layer 543 may beapplied as a discontinuous layer. The discontinuity of the conductivelayer 543 may include any example including protrusions, cutouts orapertures. Similarly, the discontinuity of the conductive layer 543 mayprovide lower generation of the eddy currents in the conductive layer543 of the RF electrode 101.

FIG. 54 e illustrates an applicator 800, where the RF electrode 101includes a substrate 542 covered by conductive layers 543 a and 543 b onboth sides of the substrate 542, wherein the conductive layer 543 a maynot be applied as a continuous layer. The conductive layer 543 a may beapplied discontinuously on the side of the substrate 542 closer to themagnetic field generating device 540. The discontinuity of theconductive layer 543 a may include any example including protrusions,cutouts or apertures. Similarly, the discontinuity of the conductivelayer 543 a may provide lower generation of the eddy currents in theconductive layer 543 a of the RF electrode 101.

FIG. 54 f illustrates an applicator 800, where the RF electrode 101includes a substrate 542 covered by conductive layers 543 a and 543 b onboth sides of the substrate 542, wherein the conductive layer 543 b maynot be applied as a continuous layer. The layer 543 b may be applieddiscontinuously on the side of the substrate 542 closer to the body area541. The discontinuity of the conductive layer 543 b may include anyexample including protrusions, cutouts or apertures. Similarly, thediscontinuity of the conductive layer 543 b may provide lower generationof eddy currents in the conductive layer 543 b of the RF electrode 101.

FIG. 54 g illustrates the RF electrode 101 including a substrate 542with parts 542 a-c, wherein the substrate 542 is covered by conductivelayers 543 a and 543 b. The conductive layers 543 a, 543 b may beconnected through substrate 542 by sutures 544, wherein the sutures 544may be made from conductive or semiconductive material.

The illustrated positions of the RF electrode in FIGS. 54 a-54 g areonly exemplary. One or more RF electrodes may be positioned above themagnetic field generating device or next to the magnetic fieldgenerating device.

The RF electrode may be a system of thin conductive wires, flat stripes,strips, sheets or the like.

The RF electrode may be manufactured from a conductive material thatreduces induction of unwanted physical effects and heating of the RFelectrode.

The RF electrodes may be made of specific conductive materials, reducinginduction of unwanted physical effects in the RF electrode. Suchmaterials may have relative permeability in a range of 4 to 1,000,000,or 20 to 300,000, or 200 to 250,000, or 300 to 100,000, or 300 to18,000, or 1,000 to 8,000. Material of the RF electrode may includecarbon, aluminum, copper, nickel, cobalt, manganese, zinc, iron,titanium, silver, brass, platinum, palladium and/or others from whichmay create alloys, such as Mu-metal, permalloy, electrical steel,ferritic steel, ferrite, stainless steel of the same. In addition, theRF electrode may be made from mixed metal oxides and/or fixed powderfrom metal oxides, metal from m-metal elements to minimize induction ofeddy currents and heating of the RF electrode and also in order tominimize energy loss of time-varying magnetic field.

As mentioned, the RF electrode may include a conductive layer. Theconductive layer may be deposited on a substrate, but the substrate isoptional. The RF electrode may comprise only the conductive layer. Oneor more RF electrodes may be positioned in the same plane or indifferent planes. For example, two RF electrodes may be arranged in onehorizontal plane, and a third RF electrode may be arranged in adifferent horizontal plane, e.g. a parallel horizontal plane. The RFelectrodes arranged in different planes may be in overlay with oneanother. The RF electrodes may be separated by air or an insulatingmaterial (e.g. plastic). For example, the RF electrodes may be separatedby a plastic used in a printed circuit board (PCB). The configuration,distance, and overlay of the RF electrodes may provide different depthsof penetration of the RF waves and therefore different depths of heatingto the body of the patient, e.g., dermis and epidermis, or only theepidermis.

FIG. 54 h illustrates a longitudinal cross sectional view of anapplicator 800, with a magnetic field generating device 540 and RFelectrodes 101 a-101 d. The RF electrodes 101 a, 101 b are positioned ina first plane, and the RF electrodes 101 c, 101 d are positioned in asecond plane that is different from the first plane. Both pairs of RFelectrodes may be positioned between the magnetic field generatingdevice 540 and the tissue 601 of the patient. Also, both pairs of RFelectrodes may be positioned between the magnetic field generatingdevice 540 and the bottom cover 517 of the applicator 800.

FIG. 54 i illustrates a schematic arrangement of four RF electrodes anda related circuit including two wirings 100 a and 100 b, providing theRF signal. Although the wirings 100 a and 100 b are shown with positiveor negative polarity, their mutual polarity is changing with thefrequency of the RF signal. With the changing polarity of the wirings,the mutual polarity of the RF electrodes connected to the wirings isalso changing. The RF electrode 101 a is directly connected to thewiring 100 a, and the RF electrode 101 b is directly connected to thewiring 100 b. Two RF electrodes 101 a and 101 b may establish a firstbipolar electrode pair, when the wirings 100 a and 100 b are active,meaning they are providing the RF signal. The RF electrode 101 d isconnected to the wiring 100 a through RF switch 545 a, and the RFelectrode 101 c is connected to the wiring 100 b through RF switch 545b. The RF switches 545 a, 545 b may be closed or open (as shown in FIG.54 i ). When the wirings 100 a and 100 b are active and the RF switches545 a, 545 b are open, the RF electrodes 101 c and 101 d are not active.When the wirings 100 a and 100 b are active and the RF switches 545 aand 545 b are closed, the RF electrodes 101 c and 101 d establish asecond bipolar electrode pair. When both bipolar electrode pairs areactive, the position of the RF switches 545 a, 545 b and relatedconnection of circuit results in the presence of one RF electrode (e.g.101 a) above an RF electrode of opposite polarity (e.g. 101 c). Whenboth bipolar electrode pairs are active at same time, the second bipolarelectrode pair may absorb at least part of the RF waves generated by thefirst bipolar electrode pair. However, the second bipolar electrode pairmay also generate RF waves. Since the RF waves generated by the firstbipolar electrode pair are partly absorbed by the second bipolarelectrode pair, the RF waves generated by the first bipolar electrodepair may not be able to penetrate the treated tissue to deeper layers.However, the RF waves generated by the second bipolar electrode pair arecloser to the patient and may be able to reach the deeper layers oftissue. Therefore, the illustrated schematic arrangement of four RFelectrodes and the related circuit may be able to provide heating ofdeep tissue layers and shallow tissue layers at the same time during atreatment session. The deep tissue layer(s) may include the hypodermisand/or muscular layer, and the shallow tissue layer(s) may include thedermis and/or epidermis. Further, similar results may be achieved byclosing only one of the RF switches 545 a or 545 b.

FIG. 54 j illustrates another schematic arrangement of four RFelectrodes and a related circuit including two wirings 100 a and 100 bproviding RF signal. Although the wirings 100 a and 100 b are shown withpositive or negative polarity, their mutual polarity is changing withthe frequency of the RF signal. With the changing polarity of thewirings 100 a, 100 b, the mutual polarity of the RF electrodes connectedto the wirings is also changing. The RF electrode 101 a is directlyconnected to the wiring 100 a, and the RF electrode 101 b is directlyconnected to the wiring 100 b. Two RF electrodes 101 a and 101 b mayestablish a first bipolar electrode pair, when the wirings 100 a and 100b are active, meaning they are providing the RF signal. The RF electrode101 c is connected to the wiring 100 a through RF switch 545 a, and theRF electrode 101 d is connected to the wiring 100 b through RF switch545 b. The RF switches 545 a, 545 b may be closed or open (as shown inFIG. 54 j ). When the wirings 100 a, 100 b are active and the RFswitches 545 a, 545 b are open, the RF electrodes 101 c, 101 d are notactive. When the wirings 100 a, 100 b are active and the RF switches 545a, 545 b are closed, the RF electrodes 101 c, 101 d establish a secondbipolar electrode pair. When both bipolar electrode pairs are active atthe same time, the second bipolar electrode pair may absorb at leastpart of the RF waves generated by the first bipolar electrode pair.However, since one RF electrode is positioned below another RF electrodewith the same polarity, the amount of absorbed RF waves may be lowerthan in the example of FIG. 54 i . Further, as shown in FIG. 54 i , whentwo RF electrodes 101 c, 101 d are positioned closer to each other thanthe RF electrodes 101 a and 101 b, the bipolar electrode pair comprisingthe RF electrodes 101 c, 101 d may provide RF waves providing heating ofone or more shallow tissue layers. Therefore, when both bipolarelectrode pairs are active at the same time, the RF waves provided by RFelectrodes 101 c, 101 d may provide heating of one or more shallowtissue layers, and the RF waves provided by RF electrodes 101 a, 101 bmay provide heating of one or more deeper tissue layers of the same bodyarea. It should be noted that the position of the pairs of RF electrodesproviding heating of different tissue layers may be switched, i.e. whenthe RF electrodes 101 a, 101 b are positioned closer to each other thanRF electrodes 101 c, 101 d, the RF waves provided by RF electrodes 101a, 101 b may provide heating of one or more shallow tissue layers, andthe RF waves provided by RF electrodes 101 c, 101 d may provide heatingof one or more deeper tissue layer of the same body area.

FIG. 54 o illustrates a longitudinal cross sectional view of anapplicator 800, with a magnetic field generating device 540 and RFelectrodes 101 a-101 d. The RF electrodes are positioned in a plane. AllRF electrodes may be positioned between the magnetic field generatingdevice 540 and the tissue 601 of the patient. Also, all RF electrodesmay be positioned between the magnetic field generating device 540 andthe bottom cover 517 of the applicator 800.

FIG. 54 p illustrates another schematic arrangement of four RFelectrodes and a related circuit including two wirings 100 a and 100 bproviding RF signal. Although the wirings 100 a and 100 b are shown withpositive or negative polarity, their mutual polarity is changing withthe frequency of the RF signal. With the changing polarity of thewirings 100 a, 100 b, the mutual polarity of the RF electrodes connectedto the wirings is also changing. The wiring 100 a is connected to the RFelectrodes 101 a a 101 c through the RF switch 545 a. The wiring 100 bis connected to the RF electrodes 101 b a 101 d through the RF switch545 b. According to configuration of switches 545 a and 545 b, thebipolar pair may be established either by RF electrodes 101 a and 101 b,101 a and 101 d, 101 c and 101 b and/or 101 c and 101 d. When the RFelectrodes are positioned as shown at FIG. 54 o , such variance ofestablishing the bipolar pair may be beneficial for treatment. Forexample, when the bipolar pair is established by RF electrodes 101 a and101 b, the RF field may provide RF treatment and/or heating to one ormore deeper tissue layers. Since the RF electrodes 101 a and 101 b arepositioned farther from each other, the RF field travels between theelectrodes through deeper tissue. In some aspects, the distance betweenthe RF electrodes 101 a and 101 b may be in a range of 1 cm to 100 cm or1.5 cm to 50 cm or 2 cm to 40 cm. When the bipolar pair is establishedby RF electrodes 101 c and 101 d, the RF field may provide RF treatmentand/or heating to one or more shallow tissue layers. Since the RFelectrodes 101 c and 101 d are positioned closer to each other, the RFfield travels between the electrodes through shallow tissue. In someaspects, the distance between the RF electrodes 101 c and 101 d may bein a range of ratio 0.1 to 0.9 or 0.2 to 0.8 or 0.25 to 0.7 of thedistance between the RF electrodes 101 a and 101 b. In some aspects, thedistance between the RF electrodes 101 c and 101 d may be in a range of0.1 cm to 90 cm or 1.5 cm to 45 cm or 2 cm to 35 cm. When the bipolarpair is established by RF electrodes 101 a and 101 c, the RF field mayprovide RF treatment and/or heating at one area of the body region.Since the RF electrodes 101 a and 101 c are positioned closer to eachother and at one position of the applicator, the RF field travelsbetween the electrodes through shallow tissue and one are of the bodyregion. In some aspects, the distance between the RF electrodes 101 aand 101 c may be in a range of ratio 0.2 to 0.8 or 0.3 to 0.6 or 0.3 to0.5 of the distance between the RF electrodes 101 a and 101 b. In someaspects, the distance between the RF electrodes 101 a and 101 c may bein a range of 0.1 cm to 90 cm or 2 cm to 40 cm or 2.5 cm to 35 cm. Whenthe bipolar pair is established by RF electrodes 101 d and 101 b, the RFfield may provide RF treatment and/or heating at one area of the bodyregion. Since the RF electrodes 101 d and 101 b are positioned closer toeach other and at one position of the applicator, the RF field travelsbetween the electrodes through shallow tissue and one are of the bodyregion. In some aspects, the distance between the RF electrodes 101 dand 101 b may be in a range of ratio 0.2 to 0.8 or 0.3 to 0.6 or 0.3 to0.5 of the distance between the RF electrodes 101 a and 101 b. In someaspects, the distance between the RF electrodes 101 d and 101 b may bein a range of 1 cm to 50 cm or 2 cm to 45 cm or 2.5 cm to 35 cm.

FIG. 54 k illustrates another longitudinal cross sectional view of anapplicator 800, with a magnetic field generating device 540 and RFelectrodes 101 a-101 d. The RF electrodes 101 a, 101 b are positioned ina first plane, and the RF electrodes 101 c, 101 d are positioned in asecond plane that is different from the first plane. Both pairs of RFelectrodes may be positioned between the magnetic field generatingdevice 540 and the tissue 601 of the patient. However, only one pair ofRF electrodes may be present. The following FIGS. 54 i-54 k are viewsfrom below the applicator. Therefore, FIGS. 54 i-54 k may be viewed asfurther examples of the positioning of the RF electrodes.

FIG. 54 l illustrates an example of FIG. 54 i , where four RF electrodes101 a-101 d are RF electrodes with openings, e.g. cutouts andprotrusions. As shown, the RF electrode 101 c being below the RFelectrode 101 a has at least one protrusion 114 c below the RF electrode101 a. The RF electrodes 101 a and 101 d may be connected by anelectrical circuit comprising the RF switch 545 a. When the RF switches545 a and 545 b are open, the RF electrodes 101 c and 101 d are notpowered and only bipolar RF electrodes 101 a and 101 b establishingfirst bipolar electrode pair are active. When the RF switches 545 a and545 b are closed, the RF electrodes 101 c and 101 d are powered and thesecond bipolar electrode pair is active together with the first bipolarelectrode pair. The advantages of this connection of the RF electrodesand RF switches is described in relation to FIG. 54 i.

FIG. 54 m illustrates an example of FIG. 54 j , where four electrodes101 a-101 d are RF electrodes with openings, e.g. cutouts andprotrusions. As shown, the RF electrode 101 c being below the RFelectrode 101 a has at least one protrusion 114 c below the RF electrode101 a. The RF electrodes 101 a and 101 c may be connected by anelectrical circuit comprising an RF switch 545 a, and the RF electrodes101 b and 101 d are connected by an electrical circuit comprising an RFswitch 545 b. The advantages of this connection of the RF electrodes isdescribed in relation to FIG. 54 j . When two RF electrodes 101 c and101 d are positioned closer to each other than the RF electrodes 101 aand 101 b, the bipolar electrode pair comprising the RF electrodes 101 cand 101 d may provide RF waves providing the heating of one or moreshallow tissue layers. In such case, the one or more protrusions of theRF electrode 101 c may be positioned between the protrusions of the RFelectrode 101 d.

FIGS. 54 l and 54 m are exemplary illustrations of the possibleconnection of the RF switch to the RF electrodes. Also, FIGS. 54 l and54 m are exemplary illustrations of possible connections of the wiringto the RF electrodes above the other two bipolar electrodes. It ispossible to connect the wiring 100 a and/or wiring 100 b to the RFelectrodes 101 c and/or 101 d positioned below the RF electrodes 101 aand 101 b. It is also possible to have only one pair of RF electrodes inone plane and another RF electrode in different plane. FIG. 54 nillustrates an example of such different configuration of one bipolarpair and one RF electrode. The three RF electrodes 101 a, 101 c, and 101d are RF electrodes having openings, e.g. cutouts and protrusions. Asshown, the RF electrode 101 c is arranged below the RF electrode 101 aand has one or more protrusions 114 c below the RF electrode 101 a. TheRF electrode 101 c is directly connected to wiring 100 a, and the RFelectrode 101 d is directly connected to wiring 100 b. The RF electrodes101 c and 101 d establish a bipolar electrode pair. RF electrode 101 ais positioned above the RF electrode 101 c and is connected to thewiring 100 b through RF switch 545. When the RF switch 545 is closed,the RF electrode 101 a positioned above the RF electrode 101 c becomesactive and has an opposite polarity relative to RF electrode 101 c. Thedirection of radiofrequency waves traveling between the bipolarelectrode pair (i.e. the RF electrodes 101 c and 101 d) is altered bythe presence of active RF electrode 101 a. As a result, the RF waves mayreach only a shallow depth of the tissue. In this way, theradiofrequency waves may provide a different depth of heating to thebody of the patient.

When one pair of bipolar RF electrodes is housed within the applicator,the applicator may include a motion mechanism configured to allow thedistance between the RF electrodes to be selectively adjusted in orderto change the depth of heating by the RF waves generated by the RFelectrodes. For example, the motion mechanism may include a rotor orshaft configured to move a first RF electrode closer to (or fartherfrom) a second RF electrode or to move both RF electrodes toward (oraway from) a center of the applicator.

Unwanted physical effects may be minimized or eliminated by using acombination of a magnetic field generating device with a plurality of RFelectrodes together with an impedance element. A plurality of RFelectrodes may be connected to at least one impedance element. Asillustrated in FIG. 55 a , the at least one RF electrode of theplurality of RF electrodes 556 and the impedance element 555 may bepositioned below and in at least in partial overlay with the magneticfield generating device 557. The at least one RF electrode of theplurality of RF electrodes 556 and the impedance element 555 may bepositioned between the magnetic field generating device 557 and the bodyof the patient. Alternatively, as shown in FIG. 55 b , the impedanceelement 555 may be positioned in a position other than below themagnetic field generating device 557. The impedance element 555 may bepart of the RF circuit. During the operation of the magnetic fieldgenerating device 557 and/or RF electrodes 556, the impedance element555 may provide and/or spread RF signal in the surface, such that the RFsignal may be delivered to the plurality of RF electrodes 556. Duringthe simultaneous or sequential operation of the magnetic circuit, theimpedance element 555 may be perceived by the line of forces of themagnetic field as a part of the disconnected electric circuit. In suchconfiguration, the impedance element may not significantly influence thetransmissivity of the magnetic field. By using the impedance element,the RF electrodes positioned below and/or in at least partial overlaywith the magnetic field generating device 557 may include RF electrodeswithout openings and/or protrusions.

The impedance element 555 may include one or more electrical elements.The impedance element 555 may be an impedance filter element. Theimpedance element 555 may be a low-pass filter, high-pass filter,band-pass filter, or band-stop filter. The impedance element 555 mayinclude a capacitor, e.g. a film capacitor, electrolytic capacitor,ceramic capacitor, polymer capacitor, Mica capacitor, glass capacitor,super capacitor, and/or tantalum capacitor. The impedance element 555may include a magnetic coil which may have a smaller diameter than themagnetic field generating device used to generate the magnetic field.The impedance element 555 may include a resistor. The impedance element555 may be positioned on the applicator by surface-mount technology. Theimpedance element 555 may be connected by wires to one or more RFelectrodes 556 of the plurality of RF electrodes positioned in at leastpartial overlay with magnetic field generating device 557. The impedanceelement 555 may be positioned in direct contact with the one or more RFelectrodes 556 of the plurality of RF electrodes positioned in at leastpartial overlay with magnetic field generating device 557, e.g. bysurface-mount technology. The impedance element 555 may be a leadlesselement, so the absence of leads may prevent influence of the magneticfield generated by magnetic field generating device.

Unwanted physical effects related to use of a combination of magneticfield with radiofrequency waves may be minimized or eliminated by usingan RF electrode made from a metal foam. The metal foam may be astructure that includes a solid metal body with pores. Pores may befiled by fluid, e.g., a gas. The presence of the plurality of poreswithin the metal foam may provide discontinuity of the solid materialfor presence of eddy currents generated by magnetic field generatingdevice. The metal may be aluminum, steel, zinc, tin, nickel, copper,silver, Mu-metal, and/or others. Also, the alloys based on mentionedmetals may be used. The pore sizes of the pores in the metal foam may bein a range of 50 μm to 5,000 m, or 200 μm to 4,000 m, or 300 μm to 3,000μm. The porosity, defined as percentage of pores in the metal foam, maybe in a range of 10% to 99%, or 25% to 99%, or 50% to 99%.

Unwanted physical effects related to the use of a combination ofmagnetic field with radiofrequency waves may be minimized or eliminatedby using an RF electrode including a textile made from one or moreconductive fibers. Such conductive fibers may be manufactured fromfibers comprising metal, metallic alloys, metal coated with insulatingmaterial, dielectric material coated with metal, and/or insulatingmaterial coated with metal. The dielectric material or insulatingmaterial may provide higher mechanical stability. The metal may includesilver, steel, nickel, gold, copper, aluminum, chromium, tungsten,and/or their alloys. The diameter of the fiber may be in a range of 0.1μm to 2,000 m, or 0.5 μm to 1000 m, or 1 μm to 250 μm. The warp densityof the textile, defined as the number of warp threads per inch of thetextile, may be in a range of 30 ends per inch to 250 ends per inch, or35 ends per inch to 230 ends per inch, or 40 ends per inch to 220 endsper inch. The weft density, defined as the number of weft threads perinch of the textile, may be in a range of 20 picks per inch to 300 picksper inch, or 30 picks per inch to 275 picks per inch, or 40 picks perinch to 200 picks per inch. The use of RF electrode designed as atextile may provide prevention of unwanted physical effects, because thetextile may include openings and/or advantageous positioning of the atleast one fibers.

The RF electrode may include a conductive polymer, e.g., in the form ofa polymer salt. Such conductive polymer may include an aromatic ringand/or at least one double bond. The conductive polymer may include anitrogen and/or sulphur atom. For example, the conductive polymer mayinclude poly(pyrrole)s (PPY), poly(thiophene)s (PT),poly(3,4-ethylendioxythiophene) (PEDOT), poly(p-phenylene sulfide)(PPS), polyanilines (PANI), poly(acetylene)s (PAC), and/orpoly(p-phenylene vinylene) (PPV).

One or more RF electrodes providing RF energy during the treatment bydescribed treatment device may use at least one of the possibilities, atleast two possibilities and or combination of possibilities how tominimize or eliminate unwanted physical effects induced by magneticfield as described above. Also, one or more characterizations of anypossibility may be used for manufacture, design and operation of thetreatment device.

In one example, a combination of designs mentioned above may include theuse of an RF electrode having a substrate plated on at least one sidewith a conductive layer made of a conductive material, e.g., copperand/or nickel, and the RF electrode may include a plurality of openingsin the conductive area of the RF electrode.

In some aspects, an RF electrode may have a substrate plated on at leastone side with a conductive layer, wherein the electrode areas may notinclude any openings. The treatment device combining RF treatment withmagnetic treatment may include one or more treatment circuits. Thetreatment circuit for RF treatment may include power source, RFelectrode and/or all electrical elements described herein for RFcluster. The treatment circuit for magnetic treatment may include powersource, magnetic field generating device, all electrical elementsdescribed herein for magnetic cluster HIFEM. Plurality of treatmentcircuits providing same or different treatment may include common powersource. Alternatively, each treatment circuit may include its own powersource. Operation of all treatment circuits may be regulated by onemaster unit or one or more control units. The HMI, master unit and/orone or more control unit may be used for selection, control and/oradjustment of one or more treatment parameters for each applicatorand/or each treatment energy source (e.g. RF electrode or magnetic fieldgenerating device). Treatment parameters may be selected, controlledand/or adjusted by HMI, master unit, and/or one or more control unitindependently for each applicator.

Further, the RF electrode may include different RF electrode portions,wherein the delivery of the RF signal into the RF electrode portions maybe controlled by the control system. For example, the RF electrode mayinclude two or more RF electrode portions. The temperature of each RFelectrode portion may be detected by one or more temperature sensors,wherein the temperature sensors are positioned in close proximity of theRF electrode portion or in contact with RF electrode portion. The one ormore temperature sensors may communicate with any part of the controlsystem. Based on this feedback, the control system may control andmanipulate the delivery of the RF signal to each RF electrode portion.Control and delivery of the RF signal to portions of the RF electrodemay be based on same principle, as described in FIGS. 54 i, 54 j , 541,54 m and/or 54 n.

FIG. 17 illustrates exemplary electrical elements of a magnetic circuit400. The electrical signal passing through the magnetic circuit 400 maybe transformed into a form of one or more pulses of electrical signal.The electric pulses may be provided to magnetic field generating devicein order to generate impulses of time-varying magnetic field. Individualelectrical elements of the magnetic circuit may be a power source (PS),an energy storage device (ESD), a switch (SW), magnetic field generatingdevice (MFGD) and control unit of magnetic circuit (CUM). The magneticcircuit may include treatment cluster for magnetic treatment called asHIFEM cluster. The HIFEM cluster may include e.g. ESD, SW and/or CUM.Control unit of magnetic circuit CUM may be part of the control system.Control unit of magnetic cluster CUM and/or other electrical element ofmagnetic circuit may be slave of the master unit. The HIFEM cluster,control system and/or CUM may provide or control storage of electricenergy in ESD by controlling the amount of stored electrical energy.HIFEM cluster, control system and/or CUM may provide modification ofelectrical signal, adjustment of parameters of electric signaltransferred through HIFEM cluster, safe operation of the circuit and/orcharging or recharging of the ESD. For example, the HIFEM cluster orcontrol system may provide adjustment of magnetic flux density ofmagnetic field provided by MFGD by adjustment of voltage and/or currentof electrical pulses transferred to MFGD. Modification of the electricalsignal may include a distortion of signal transmitted in magneticcircuit, envelope distortion in shape, amplitude and/or frequencydomain, adding noise to the transferred electrical signal and/or otherdegradation of transmitted original signal entering the magneticcircuit. One CUM may control and/or operate one or more magnetictreatment circuits.

The energy storage device ESD, may accumulate electrical energy, whichmay be provided to magnetic field generating device in the form ofelectric signal (e.g. in form of high power impulses) of energy. The ESDmay include one, two, three or more capacitors. The ESD may also includeone or more other electrical elements such as a safety element, such asa voltage sensor, a high voltage indicator, and/or dischargingresistors, as shown in FIG. 18 a . The voltage sensor and the highvoltage indicator may provide feedback information to the switch SW andor to control unit CUM. The discharging resistor being a part of themagnetic circuit may provide discharging of at least one capacitor incase of hazardous situation. Discharging of one or more ESD may becontrolled by the control unit CUM. Released electrical energy from theESD may be delivered as high power impulse and/or pulse to at least partof the magnetic circuit e.g. to the magnetic field generating deviceMFGD.

A capacitance of energy storage device may be in the range of 5 nF to100 mF, or in the range of 25 nF to 50 mF, or in the range of 100 nF to10 mF, or in the range of 1 μF to 1 mF, or in the range of 5 μF to 500μF or in the range of 10 μF to 180 μF, or in the range of 20 μF to 80μF.

The energy storage device may be charged on a voltage in a range from250 V to 50 kV, 700 V to 5 kV, 700 V to 3 kV, or 1 kV to 1.8 kV.

The energy storage device may provide a current pulse discharge in arange from 100 A to 5 kA, 200 A to 3 kA, 400 A to 3 kA, or 700 A to 2.5kA. The current may correspond with a value of the peak magnetic fluxdensity generated by the magnetic field generating device.

Further, the energy storage device may provide a current pulse dischargein a range from 1000 A to 10,000 A or 2000 A to 8000 A or 2500 or 7500A.

By discharging of the energy storage device, a high power current pulsemay be produced with an energy in a range of 5 J to 300 J, 10 J to 200J, or 30 J to 150 J.

The switch SW may include any switching device, such as a diode, pindiode, MOSFET, JFET, IGBT, BJT, thyristor and/or a combination thereof.The switch may include a pulse filter providing modification of theelectrical signal. The pulse filter may suppress switching voltageripples created by the switch during discharging of the ESD.

The magnetic circuit may be commanded to repetitively switch on/off theswitch SW and discharge the energy storage device ESD to the magneticfield generating device, e.g. the coil in order to generate thetime-varying magnetic field.

An inductance of the magnetic field generating device may be up to 1 H,or in the range of 1 nH to 500 mH, 1 nH to 50 mH, 50 nH to 10 mH, 500 nHto 1 mH, or in the range of 1 μH to 500 μH or in the range of 10 μH to60 μH.

The magnetic field generating device may emit no radiation (e.g. gammaradiation).

The magnet circuit may include a series connection of the switch SW andthe magnetic field generating device. The switch SW and the magneticfield generating device together may be connected in parallel with theenergy storage device ESD. The energy storage device ESD may be chargedby the power source PS. After that, the energy storage device ESD may bedischarged through the switch SW to the magnetic field generating deviceMFGD. During a second half-period of LC resonance, the polarity on theenergy storage device ESD may be reversed in comparison with the powersource PS. As a result, there may be twice the voltage of the powersource. Hence, the power source and all parts connected in the magneticcircuit may be designed for a high voltage load and protective resistorsmay be placed between the power source and the energy storage device.

The magnetic field generating device MFGD and an energy storage deviceESD may be connected in series. The magnetic field generating deviceMFGD may be disposed in parallel to the switch SW. The energy storagedevice ESD may be charged through the magnetic field generating device.To provide an energy impulse to generate a magnetic impulse (or pulse togenerate a magnetic pulse), controlled shorting of the power sourcetakes place through the switch SW. In this way the high voltage load atthe terminals of the power source PS during the second half-period of LCresonance associated with known devices is avoided. The voltage on theterminals of the power source PS during second half-period of LCresonance may have a voltage equal to the voltage drop on the switch SW.

The switch may be any kind of switching device. Depending on the type ofthe switch, the load of the power source may be reduced to a few Volts,e.g., 1-10 volts. Consequently, it is not necessary to protect the powersource from a high voltage load, e.g., thousands of Volts. Accordingly,the use of protective resistors and/or protection circuits may bereduced or eliminated.

FIG. 18 b illustrates exemplary electrical elements of an RF circuit480. The RF circuit may provide an adjusted and/or modifiedelectromagnetic signal (electrical signal) to an RF electrode (RFE). TheRF circuit may include power source (PS), treatment cluster for RFtreatment (area marked as RF), control unit of RF cluster (CURF), poweramplifier (PA), filter, standing wave ratio combined with power meter(SWR+Power meter), tuning element (tuning), splitter, insulator,symmetrization element (SYM), pre-match and RF electrode (RFE).Treatment cluster for RF treatment may include e.g. control unit of RFcluster (CURF), power amplifier (PA), filter, standing wave ratiocombined with power meter (SWR+Power meter) and/or tuning element(tuning). Control unit of RF circuit CURF may be part of the controlsystem. Control unit of RF circuit CURF and/or other electrical elementof RF circuit may be slave of the master unit. One or more electricalelements described as a part of RF circuit may be dismissed, some of theelectrical elements may be merged to one with similar function and/orsome of the electrical elements may be added to improve functionality ofthe circuit.

The power source of the RF circuit may provide an electric signal of avoltage in a range of 1 V to 5 kV, or 5 V to 140 V, or 10 V to 120 V, or15 V to 50 V, or 20 V to 50 V. The power source of the RF circuit andthe power source of the RF treatment may be identical. The power sourceof the RF treatment may also be called the adapter. The adapter mayprovide a voltage in a range of 5 to 100 Volts, 10 to 80 Volts or 15 to45 Volts. For example, the adapted may provide a voltage of 24 Volts.The adapter may include a filter.

The CURF may control operation of any electrical element of RF circuit.The CURF may regulate or modify parameters of the electrical signaltransferred through the RF circuit. Parameters of the signal, e.g.,voltage, phase, frequency, envelope, value of the current, amplitude ofthe signal and/or other may be influenced by individual electricalelements of the RF circuit that may be controlled by CURF, controlsystem and/or electrical properties of individual electrical elements ofRF circuit. Electrical elements influencing signal in the RF circuit maybe, for example, a power source (PS), a power amplifier (PA), a filter,a SWR+Power meter, a tuning, a splitter, an insulator, symmetrizationelement changing unbalanced signal to balanced signal (SYM), pre-matchand/or RF electrode generating RF waves. Modification of the electricalsignal may include a distortion of signal transmitted in RF circuit,envelope distortion in shape, amplitude and/or frequency domain, addingnoise to the transferred electrical signal and/or other degradation oftransmitted original signal entering the RF circuit. One CURF maycontrol and/or operate one or more treatment circuits of RF treatment.

The power amplifier PA may produce RF signal of respective frequency forgeneration of RF waves by RF electrode. The power amplifier may be ormay include unipolar transistor, bipolar transistor, MOSFET, JFET LDMOStransistor, field effect transistor, transistor, gallium nitride fieldeffect transistor or vacuum tube. The PA may be able to increase anamplitude of provided signal and/or modified signal to electric signal(e.g. RF signal). The power amplifier may generate the RF signal of thedesired power and/or frequency. For example, the power amplifier maygenerate an RF signal having a frequency in a range of 100 kHz to 3 GHz,400 kHz to 3 GHz or 400 kHz to 10 MHz. For example, the power amplifiermay generate an RF signal having a frequency of 475 kHz, 1 MHz, 2 MHz, 4MHz, 6 MHz, 13.56 MHz, 40.68 MHz, 27.12 MHz, or 2.45 GHz. The poweramplifier may generate this frequency with deviation in a range of 1% to10%.

The filter may include one or more filters which may suppress unwantedfrequency of signal transmitted from the power amplifier. One or morefilters may filter and provide treatment with defined band offrequencies. One or more filters may be used to filter the electricalsignal such as electric signal in the RF circuit, according to signalfrequency domain to let pass only band of wanted frequencies. The filtermay be able to filter out unsuitable signal frequencies based oninternal software and/or hardware setting of the filter. The filter mayoperate according to communication with other one or more electricalelements e.g. the CURE. The one or more filters may be located between apower source of RF signal PSRF and the RFE. However, the device mayinclude additional filters located between various other electricalelements of the device.

The SWR+Power meter may measure output power of RF energy and evaluatethe quality of impedance matching between the power amplifier andapplicator. The SWR+Power meter may include a SWR meter that may measurethe standing wave ratio in a direction of a wave transmission. TheSWR+Power meter may include a power meter that may measure amplitude ofsuch standing waves. The SWR+Power meter may communicate with the CURFand/or with the tuning element. The SWR+Power meter may provide afeedback information in order to prevent creation of the standing wavein the patient's body, provide better signal adjustment by the tuningelement and to provide safer treatment and energy transfer to biologicalstructure more effectively in more targeted manner. For example, theSWR+Power meter may include a power divider that provides part of thepower to the detector, which informs the control system about theparameters of the transferred electrical signal.

Tuning element may provide improvement of the impedance matching. Thetuning element may include, e.g. capacitor, LC and/or RLC circuit. Thetuning element may provide controlled tuning of the RF circuit systemcapacity, wherein the RF circuit system includes individual electricalelements of the RF circuit and also currently treated tissue of thepatient under the influence of the provided RF waves. Tuning of the RFcircuit may be provided before and/or during the treatment. The tuningelement may also be called a transmatch. The tuning element may includea coil and/or relay, e.g. an electromagnetic relay.

The symmetrization element SYM may convert the signal from unbalancedinput to balanced output. The SYM may be a balun and/or a baluntransformer including wound coaxial cable to balance signal between RFelectrodes. The SYM element may be a balun of any type including coaxialbalun, voltage balun and/or current balun. The SYM element may providesignal symmetrization between the first and the second bipolar RFelectrode e.g. by creating λ/2 phase shift of the RF signal guidedthrough the coaxial cables to the first and the second bipolar RFelectrode. The symmetrization element may be present in the applicatoror in the main unit. The symmetrization element may also include atoroid coil.

The splitter may split the RF signal transferred/delivered in the RFcircuit by a coaxial cable. Divided signal may have the same phase ofeach divided signal part and/or the divided signals may have constantphase shift from each other. For example, the splitter may provide afirst part of the RF signal to a first RF electrode and a second part ofthe RF signal to a second RF electrode of a bipolar electrode system.The splitter may be shared for one, two or more independent RF circuitsor each RF circuit may have its own splitter. Also, the splitter mayprovide a first part of the RF signal to a first RF electrode and asecond part of the RF signal to a second RF electrode of a bipolar RFelectrode system, wherein the first and second RF electrodes are housedin one applicator. Further, the splitter may provide a first part of theRF signal to a first RF electrode and a second part of the RF signal toa second RF electrode of a bipolar RF electrode system, wherein thefirst RF electrode is housed within a first applicator and the second RFelectrode is housed within a second applicator. In case of a monopolarsystem, the splitter may provide a first part of the RF signal to afirst active monopolar RF electrode and a second part of the RF signalto a second active monopolar RF electrode, wherein the first and secondRF electrodes are housed in one applicator. Further, the splitter mayprovide a first part of the RF signal to a first active monopolar RFelectrode and a second part of the RF signal to a second activemonopolar RF electrode, wherein the first RF electrode is housed in afirst applicator and the second RF electrode is housed within a secondapplicator.

The treatment device may include one or more splitters. The one or moresplitters may be positioned within the main unit and/or the applicator.A splitter may comprise any part providing division and/or a split ofthe electrical cable (e.g. transmission line and/or coaxial cable)communicating the RF signal into at least two electrical cables (e.g.transmission lines and/or coaxial cables). Also, the splitter may be anypart that may split and/or divide the power from one output into two ormore outputs. In one example, the splitter may comprise a dividing partmade from plastic. The splitter may comprise a control unit which is apart of control system. The splitter may split and/or divide the powerand/or RF signal equally between two or more outputs. Also, the splittermay split and/or divide the power and/or RF signal to two or moreoutputs not equally, but by a ratio determined or controlled by thecontrol system.

An insulator may be combined with the splitter and/or may be locatedbefore and/or after splitter with regard of transporting RF signal tothe RF electrode. The insulator may be electrical insulation of at leastpart of the RF circuit from the magnetic circuit. The insulator may beused to minimize influence of the magnetic circuit to the RF circuit.

The pre-match may be used in the devices using coaxial cables. Thepre-match may include a small coil, condenser and/or resistor.

The RF electrode (RFE), acting as a treatment energy source, may includeone or more unipolar RF electrodes, one or more monopolar RF electrodesand/or one or more pairs of bipolar RF electrodes.

The power source PS of the RF circuit, power amplifier PA, filter,SWR+Power meter, tuning, SYM, splitter, insulator and/or pre-match maybe at least partially and/or completely replaced by an HF generatorsupplying the rest of the circuit, including the RF electrode, with ahigh frequency electric signal.

FIG. 24 illustrates one of examples of the symmetrization element SYM.Input coaxial cable 130 provides electrical signal (e.g. RF signal) tothe splitter 131 that may split RF signal into two branches. Thesplitter 131 may also include an insulating element, such as at leastone, two, three or more serial connected capacitors creating insulatinglength in a range of 4 mm to 100 mm, or 20 mm to 50 mm. The SYM may beestablished or represented by the different length of the coaxial cablesguided or leading to pair of bipolar RF electrodes. The difference inlength between coaxial cables 132 and 133 in location 1_(i) may be in arange of 0.4 to 0.6, or 0.46 to 0.55 of the X, where, may be wavelengthof the guided RF signal in the coaxial cable 132 and/or coaxial cable133. The length of the coaxial cable 132 may be in a range of 1 cm to 5m, 5 cm to 90 cm or 10 cm to 50 cm. The length of the coaxial cables132+135 b may be in a range of λ/4±10%, or ±5%, or their multiples bypositive integer. The length of the coaxial cable 133 may be in a rangeof 2 μm to 12 m, or 2.2 μm to 8 μm. The length of the coaxial cable 133may be in a range of λ/2±10%, or ±5%, plus the length of cable 132. Thelength of the coaxial cables 133+135 a may be in a range of 3λ/4±10%, or±5%. In a summary the coaxial cables 132+135 b are shifted in relationto the coaxial cables 133+135 a of λ/2±10%, or ±5%. This part of the SYMmay cause phase shift 180° of the RF signal delivered to one RFelectrodes 101 a and 101 b. The RF electrodes 101 a and 101 b may bepart of one applicator or the RF electrode 101 a may be part of firstapplicator and RF electrode 101 b may be part of second applicator. Aconnector 134 may be used for connecting one or more applicators to themain unit. The connector 134 may be the applicator connector 65. Thepart 12 may represent a connecting tube of the applicator. The length ofthe coaxial cables 135 a and 135 b in this connecting tube may be in arange of 1 μm to 6 m, or of 1.1 μm to 4 m or of λ/4±10% or ±5%. Apairing element 136 may be conductive connection of the conductiveshielding part of the coaxial cables 135 a and 135 b. The pairingelement 136 may have a surface area in a range of 0.5 cm² to 100 cm², 1cm² to 80 cm² or 1.5 cm² to 50 cm². The pairing element 136 may includematerial of height electric conductivity, such as copper, silver, gold,nickel, or aluminum, wherein the impedance of the pairing element 136may be near to zero. The pairing element 136 or between pairing elementand electrode may be placed a capacitor, resistor and/or inductor.

The RF circuit and/or the magnetic circuit may be at least partiallylocated in one or more applicators. The wire connection between theapplicator, an additional treatment device and/or the main unit may bealso considered as a part of the RF circuit and/or magnetic circuitelement because of the impedance, resistivity and/or length of the wireconnection. One or more electrical elements of the magnetic circuitshown in FIG. 17 , RF circuit shown in FIGS. 18 b and 18 a may bedismissed, may be sorted in different order and/or two or moreelectrical elements may create one individual combined electricalelement. Adjusting of the signal provided to the RF circuit may be atleast partially provided by or inside another different circuit of thetreatment device e.g.: magnetic circuit and/or other.

FIG. 18 a illustrates an exemplary schema 180 of electrical elements oftreatment device. The exemplary schema include two independent powersources including power source for RF treatment (PSRF) and power sourcefor magnetic treatment (PSM) connected to one power network (PN). ThePSRF may provide electromagnetic signal to two independent treatmentclusters for RF treatment RF A and/or RF B. The PSM may provideelectromagnetic signal to one or more clusters of magnetic treatmentHIFEM A and/or HIFEM B. One or more the power sources may be alsopowering other parts of the treatment device, such as a human machineinterface (HMI), or the master unit, among others. Each magnetic circuitand/or RF circuit may have its own control units (CUM A, CUM B and CURFA and CURF B). CURF A and CURF B may be control units of RF treatmentcluster for RF treatment A (RF A) and treatment cluster for RF treatmentB (RF B) respectively.

Control units may include one or more PCBs or microprocessors. One ormore control units may communicate between each other and/or with themaster unit that may be selected as a master unit for other controlunits in master-slave communication. The master unit may be the first oronly control unit that communicates with the HMI. The master unit maycontrol units CUM A and CUM B. The master unit may be a control unitincluding one or more PCBs and/or microprocessors. Master unit orcontrol unit A (CUM A) or control unit B (CUM B) may be coupled to humanmachine interface. Also, the master unit may be human machine interfaceHMI or be coupled to the human machine interface HMI.

FIG. 18 a illustrates two parts of the treatment device, wherein thefirst part may provide the RF treatment and the second part may providethe magnetic treatment. Two parts of the treatment device may beinsulated from each other. The treatment device may include one or moreinsulated electrical elements and/or parts of the treatment device andindividual circuits from each other in a manner of shielding voltagebarrier, distance barrier and/or radiation barrier. Examples ofinsulated parts may be represented by a dashed line in FIG. 18 a . It isalso possible that individual electrical elements of the treatmentdevice may be insulated from at least one part of the treatment device.Insulation of such parts and/or electrical elements may be provided bymaterial of high dielectric constant, by distance of individual partsand/or electrical elements, by system of capacitors or resistors. Also,any shielding known from electronic, physics, by aluminum boxes and/orby other manner may be used.

The RF treatment and/or magnetic treatment may be provided by at leastone, two, three, four or more treatment circuit (which may be located inthe main unit) and/or applicators wherein one treatment circuit mayinclude RF cluster or magnetic cluster. Each applicator A and B (AP Aand AP B) may include at least one electrical element of one, two ormore treatment circuits. Each applicator may include at least one, twoor more different treatment energy sources, such as one or more RFelectrodes providing the RF treatment and one or more magnetic fieldgenerating devices providing the magnetic treatment. As shown in FIG. 18a , the treatment device may include first applicator (AP A) and secondapplicator (AP B). The first applicator (AP A) may include a first RFelectrode (RFE A) from first RF circuit and a first magnetic fieldgenerating device (MFGD A) from a first magnetic circuit. The secondapplicator (AP B) may include a second RF electrode (RFE B) from asecond RF circuit and a second magnetic field generating device (MFGD B)from a second magnetic circuit. In a different example, a firstapplicator may include a first magnetic field generating device and afirst pair of bipolar RF electrodes, and a second applicator may includea second magnetic field generating device and a second pair of bipolarRF electrodes. In some aspects, a first applicator may include a firstmagnetic field generating device, a second magnetic field generatingdevice, and a first pair of bipolar RF electrodes, and a secondapplicator may include a third magnetic field generating device, afourth magnetic field generating device, and a second pair of bipolar RFelectrodes. Two applicators may be connected to a main unit separatelyand may be individually positioned in proximity of the body area beforeor during the treatment, when they are coupled to the body area and incontact with the body area.

FIG. 18 a also illustrates other individual parts of the treatmentdevice, such as treatment cluster for RF treatment (RF A), treatmentcluster for RF treatment (RF B), treatment cluster for magnetictreatment HIFEM A, treatment cluster for magnetic treatment HIFEM B inthe magnetic circuit, power source for RF treatment (PSRF), power sourcefor magnetic treatment (PSM), applicator A (AP A), applicator B (AP B).All parts, except the applicators, may be located in the main unit.Shown splitter, symmetrization element (SYM A), and symmetrizationelement (SYM B) are parts of two RF circuits. The splitter shown on FIG.18 a may be common for the RF circuits. The power source for RFtreatment (PSRF) may include steady power source of RF circuit (SPSRF),auxiliary power source of RF circuit (APS RF), power network filterPNFLT and/or power unit (PU). Individual electrical elements may not beincluded with other electrical elements in PSRF. The power source formagnetic treatment (PSM) may include auxiliary power source A (APS A),auxiliary power source B (APS B), steady power source of magneticcircuit (SPSM), power pump (PP), board power source A (BPS A) and/orboard power source B (BPS B). Individual electrical elements may not beincluded with other electrical elements in PSM. Treatment cluster formagnetic treatment HIFEM A of the magnetic circuit may include controlunit A (CUM A), energy storage device A (ESD A), switch A (SW A), safetyelement (SE) and/or pulse filter (PF). Treatment cluster for magnetictreatment HIFEM B of the magnetic circuit may include control unit B(CUM B), energy storage device B (ESD B) and/or switch B (SW B).Although not shown on FIG. 18 a , the treatment cluster for magnetictreatment HIFEM B may also include pulse filter (PF) and/or safetyelement (SE). Individual electrical elements may be insulated from eachother. However, individual electrical elements and/or circuit parts maybe merged and/or shared with other circuit parts. As an example, onecontrol unit may be at least partially shared with two or more RFcircuits and/or magnetic circuits, and one control unit may regulatepower or power network or power source providing power for the RFcircuit and also for the magnetic circuit. Another example may be atleast one auxiliary power source and/or steady power source shared withat least two RF and/or magnetic circuits.

FIG. 18 c illustrates another exemplary schema 180 of electricalelements. In FIG. 18 c , both electrical cables outputting from thesplitter are symmetrized by the SYM element.

FIG. 18 d illustrates another exemplary schema 180 of electricalelements. In FIG. 18 d , a first electrical cable outputting from thesplitter is symmetrized by the SYM element, and a second electricalcable leads directly to the corresponding RF electrode. The SYM elementmay include different lengths of this cable to delay the electricalsignal within this cable in order to achieve a phase delay.

FIG. 18 e illustrates another exemplary schema 180 of electricalelements. In FIG. 18 e , two pairs of RF electrodes are powered by oneRF cluster. Therefore, two pairs of RF electrodes may be connected tothe one power amplifier. Similarly, when there is only one RF electrodein each applicator, two RF electrodes may be connected to the one poweramplifier. The FIG. 18 e shows two splitters, one for each pair of RFelectrodes. However, there may only one splitter present, which wouldsplit or divide the signal to all four RF electrodes.

FIG. 18 f illustrates another exemplary schema 180 of electricalelements. As shown in FIG. 18 f , none of the electrical cablesoutputting from the splitter are symmetrized by a SYM element. Thisconfiguration may be useful for a monopolar configuration of the RFelectrode, when the one or more RF electrodes within the applicator aremonopolar and there is another grounding plate placed on the patient.Similarly, this configuration may be useful for a unipolar configurationof the RF electrode, when the one or more RF electrodes within theapplicator are unipolar. However, the splitter may be omitted and eachRF electrode may be directly connected to its own treatment circuit(e.g. RF A). Each RF electrode may be connected to its own PSRF. The RFcircuit may not include all shown elements. For example, the SWR+Powermeter may be omitted in case of use of a lower RF frequency.

FIG. 18 g illustrates another exemplary schema 180 of electricalelements. In FIG. 18 g , two pairs of RF electrodes are powered by oneRF cluster. Therefore, two pairs of RF electrodes may be connected toone power amplifier. Similarly, when there is only one RF electrode ineach applicator, two RF electrodes may be connected to one poweramplifier. FIG. 18 g also shows two splitters, one for each pair of RFelectrodes. However, there may only one splitter present, which wouldsplit or divide the signal to all four RF electrodes. FIG. 18 g furthershows a Selection element, which may be present within the RF circuit.The Selection element may be configured to provide the RF signal to thefirst pair of RF electrodes or to the second pair of RF electrodes inorder to activate them at different times. The Selection element may beconfigured to provide the RF signal to two pairs of RF electrodesthrough one or more splitters at same time or different time during thetreatment session.

FIG. 18 h illustrates another exemplary schema 180 of electricalelements. In FIG. 18 h , two pairs of RF electrodes within oneapplicator are powered by one RF cluster. Therefore, two pairs of RFelectrodes may be connected to one power amplifier. Similarly, whenthere is only one RF electrode in each applicator, two RF electrodes maybe connected to one power amplifier. FIG. 18 h further shows a Selectionelement, which may be present within the RF circuit. The Selectionelement may be configured to provide the RF signal to one or more RFelectrodes in order to activate them at different times. FIG. 18 hdepicts a Selection element and no splitters. By incorporating one ormore Selection elements according to the schema, the Selection elementmay provide RF signal only to one RF electrode. However, the Selectionelement may provide RF signal to a plurality of RF electrodes of thesame applicator and/or different applicators.

FIG. 18 i illustrates another exemplary schema 180 of electricalelements. In FIG. 18 h , two pairs of RF electrodes within oneapplicator are powered by one RF cluster. Therefore, two pairs of RFelectrodes may be connected to one power amplifier. FIG. 18 i furthershows two Selection elements, which may be present within the RFcircuit. A first Selection element may be configured to provide the RFsignal to one or more RF electrodes within a first applicator in orderto activate them at different times. A second Selection element may beconfigured to provide the RF signal to one or more RF electrodes withina second applicator in order to activate them at different times and/orat the same time. FIG. 18 i includes two Selection elements and nosplitters. By incorporating two Selection elements according to theschema, each Selection element may provide RF signal only to the one ormore RF electrodes of one applicator.

The Selection element shown in FIGS. 18 g, 18 h and 18 i may beconfigured to select to which RF electrode, RF electrodes or RFelectrode pair, or plurality of RF electrodes the RF signal isdelivered. One or more Selection elements may be positioned in the mainunit of the device and/or in the applicator. The Selection element mayinclude a pin diode, relay, multiplexer, demultiplexer and/or pair ofmultiplexers and demultiplexers. The Selection element may include amultiple-input and multiple-output switch. The multiplexer may include amultiple-input, single output switch. The demultiplexer may include asingle-input, multiple output switch. The Selection element may includean RF switch. Further, the Selection element may include two or more ofa pin diode, relay, multiplexer, demultiplexer and/or pair ofmultiplexer and demultiplexer connected in parallel. The parallelconfiguration may be useful when activation of a plurality of electrodesis required. Regarding the position of the Selection element within thecircuits shown in FIGS. 18 g, 18 h and 18 i , this position isexemplary. It may be possible to position the Selection element betweenany electrical element of the RF cluster or the RF circuit. Therefore,the Selection element may be positioned between the SWR+Power meter andthe tuning, between the power amplifier and the filter, or between thefilter and the SWR+power meter.

As shown in FIGS. 18 a, 18 c, 18 d and 18 f , two treatment clusters forRF treatment (RF A and RF B) are shown to be connected to one powersource for RF treatment. However, the device may include two powersources for RF treatment and each power source for RF treatment may beconnected to one RF electrode. Further, FIG. 18 c shows one splitter foran electrical cable coming from one treatment cluster, e.g., RF A, andanother splitter for an electrical cable coming from another treatmentcluster, e.g., RF B. As described earlier, the splitter splits and/ordivides the RF signal to two electrical cables. The two electricalcables from each splitter are connected to two RF electrodes within oneapplicator. As shown, the two RF electrodes within one applicator areconnected to the two electrical cables originating from one splitter.However, it may be possible to connect two electrodes within oneapplicator to two electrical cables, wherein a first electrical cableoriginates from one splitter and a second electrical cable originatesfrom another splitter.

Treatment cluster for magnetic treatment HIFEM A may provide magnetictreatment independently on treatment cluster for magnetic treatmentHIFEM B. Alternatively, the treatment device may include just onetreatment cluster for magnetic treatment HIFEM or the treatment devicemay include two or more individual treatment clusters for magnetictreatment HIFEM, wherein some of the treatment cluster for magnetictreatment HIFEM may share individual electrical elements such as acontrol unit, energy storage device, pulse filter and/or other.

As shown in FIG. 18 a , the treatment cluster for magnetic treatmentHIFEM, e.g. HIFEM A, may include the control unit, e.g. CUM A. Thecontrol unit, e.g. CUM A, may control a charging and/or discharging ofthe energy storage device, e.g. ESD A, processing feedback informationand/or adjusting parameters of individual electrical elements and/ortreatment clusters for magnetic treatment HIFEM. In addition, thecontrol unit (e.g. CUM A) may control adjusting parameters or operationof electrical elements, e.g. BPS A from circuit part PSM, switch, PF,ESD A from the treatment cluster for magnetic treatment HIFEM A and/orprocessing information from the sensors in the applicator AP A and/or APB. The control unit (e.g. CUM A) may also communicate with another oneor more magnetic and/or RF circuits and/or including master unit. Thepower source PSM, the energy storage device ESD and/or the switch SW maybe at least partially regulated by the control unit of the magneticcircuit, e.g. CUM A. The control unit (e.g. CUM A) or master unit and/orone or more individual electrical elements of the circuit may beregulated by any other electrical element based on mutual communicationbetween them. The master unit may be able to adjust treatment parametersof the magnetic treatment and/or the RF treatment based on feedbackinformation provided from the sensors and/or based on communication withother control units, e.g. the master unit. One control unit CUM or CURFmay regulate independently one or more circuits providing magneticand/or RF treatment. At least one control unit may use peer-to-peercommunication and/or master-slave communication with other control units(e.g. CUM A may be slave control unit of the master unit).

The treatment device may include one, two, three or more ESD, whereineach ESD may include one, two, three or more capacitors. One ESD mayprovide energy to one, two, three or more treatment energy sources, suchas magnetic field generating devices providing magnetic treatment. Eachcoil may be coupled to its own respective ESD or more than one ESD. TheESD may include one or more other electrical elements such as a safetyelement SE, such as a voltage sensor, a high voltage indicator, and/ordischarging resistors, as shown in FIG. 18 a . The voltage sensor andthe high voltage indicator may provide feedback information to theswitch SW and/or to control unit, e.g., CUM A. The discharging resistoras part of the SE may provide discharging of at least one capacitor incase of hazardous situation. Discharging of one or more ESD may becontrolled by the control unit e.g. CUM A or CUM B. The signal providedfrom the energy storage device ESD through the switch SW to the magneticfield generating device may be modified by a pulse filter (PF). The PFmay be part of the switch SW and/or may be positioned between the switchSW and the magnetic field generating device, e.g., MFGD A. The PF maysuppress switching voltage ripples created by the switch duringdischarging of the ESD. The proposed circuit may repetitively switchon/off the switch SW and discharge the energy storage device ESD to themagnetic field generating device, e.g. the MGFD A in order to generatethe time-varying magnetic field. As shown in FIG. 18 a , one or moreelectrical elements of the magnetic circuit and/or RF circuit may beomitted and/or combined to another. For example, one or more individualelectrical elements of PSRF and/or PSM may be combined to one, butindependency of individual circuits may be decreased. Also electricalelements the PF, the SE and/or other may be independent electricalelement. Also individual treatment circuits, e.g. RF circuits, may bedifferent from each other as can be seen in FIGS. 18 a and 18 b ,wherein electrical elements, such as a filter, a SWR+Power meter, atuning, a splitter, an insulator, a SYM and/or a pre-match may bedismissed and/or combined to one. Dismissing and/or combining ofindividual electrical elements may results in decreased efficiency ofenergy transfer to patients body without tuning, higher energy lossbecause of absence the SYM, pre-match and/or tuning, malfunctioning ofsignal adjusting in the circuit and incorrect feedback informationwithout the SWR+Power meter, the splitter and the insulator and/or thetreatment device may be dangerous to patient without the filter, theSWR+Power meter, the SYM and/or the tuning element.

Control units CUM A and CUM B may serve as slaves of the master unitwhich may command both control units CUM A and CUM B to discharge theelectrical current to respective magnetic field generating devices (e.g.MFGD A and MFGD B). Therefore, the control of each control unit CUM Aand CUM B is independent. Alternatively, CUM B may be slave of the CUMA, while CUM A itself may be slave of master unit. Therefore, whenmaster unit commands the CUM A to discharge electrical current into themagnetic field generating device (e.g. MFGD A), the CUM A may commandthe CUM B to discharge electrical current to another magnetic fieldgenerating device (e.g. MFGD B) positioned in different applicator. Insome aspects, additional control unit may be positioned between masterunit and control units CUM A and CUM B, wherein such additional controlunit may provide e.g. timing of discharges. By both these approaches,the pulses of magnetic field may be applied synchronously orsimultaneously.

When the treatment device includes more than one magnetic fieldgenerating device and method of treatment include using more than onemagnetic field generating device (e.g., a coil), each coil may beconnected to respective magnetic circuit. However, one coil may beconnected to plurality of magnetic circuits. Also, the power source PSMmay be used for at least two magnetic field generating devices.

The power source, e.g. PSM and/or PSRF may provide an electric energy toat least one or at least one individual electrical element of RFcircuit, magnetic circuit, and/or to other part of the treatment devicee.g. to the master unit, HMI, energy storage device (e.g. ESD A and/orESD B), to control unit (e.g. CUM A and/or CUM B) and/or to the switch(e.g. SW A or SW B). The power source may include one or more elementstransforming electric energy from the power network connection PN asillustrated in FIG. 18 a . Several individual electrical elements of thepower source, of the RF circuit and/or magnetic circuit may beconstructed as one common electrical element and do not have to beconstructed as individual electrical elements as illustrated in FIG. 18a . Each RF and/or magnetic circuit may have its own power source and/orat least one electrical element of the power source powering just one ofthe RF and/or the magnetic circuit. Also, at least part of one powersource may be powering at least two different circuits before and/orduring at least part of the treatment. The power source may include oneor more parts shared with individual electrical circuits that may be atleast partially electrically isolated from each other.

One or more electrical elements of the power source for RF treatment(e.g. a steady power source of magnetic circuit (SPSM), an auxiliarypower sources APS A and/or APS B, a power pump PP, board power sourceBPS A and/or BPS B) may provide electric energy to individual electricalelements of the RF circuit and/or magnetic circuit directly and/orindirectly. Directly provided electric energy is provided throughconductive connection between two electrical elements wherein no otherelectrical element of the circuit is in serial connection betweendirectly powered electrical elements. Insulating and/or other electricalelements of the circuits such as resistors, insulating capacitors andthe like may be not considered to be an electrical element. Indirectlypowered electrical elements may be powered by one or more other elementsproviding electric energy through any other element that may changeparameters of provide electric energy, such as current value, frequency,phase, amplitude and/or other.

The power source PSM illustrated in FIG. 18 a in more detail may includeconnection to a power network PN. The PN may provide filtering and/orother adjustment of an input electric signal from the power network,such as the frequency and current value. The PN may also be used as aninsulating element creating a barrier between the treatment device andthe power network. The PN may include a one or more of capacitors,resistors and/or filters filtering signal returning from the treatmentdevice The PN may include a plug or connection to a plug. The PN may becoupled to a plug or power grid. The PSM may include one or more steadypower source (e.g. steady power source of magnetic circuit SPSM),auxiliary power sources (e.g. APS A and/or APS B), one or more powerpumps PP; and/or one or more board power sources (e.g. BPS A and/or BPSB). As illustrated in FIG. 18 a , the treatment device may include atleast two electrically insulated magnetic and/or RF circuits that may becontrolled at least partially independently, e.g. intensity of generatedmagnetic field by the magnetic field generating devices MFGD A and theMFGD B connected to treatment clusters for magnetic treatment HIFEM Aand HIFEM B may be different. Steady power source (SPSM) may providesteady output voltage under different power network conditions. Steadypower source SPSM may be connected to the auxiliary power source (e.g.APS A and/or APS B). Two auxiliary power sources may be combined andcreate one electrical element. Steady output voltage produced by steadypower source and/or by auxiliary power source may be in a range of 1 Vto 1000 V, or 20 V to 140 V, or 50 V to 700 V, or 120 V to 500 V, or 240V to 450 V.

One or more auxiliary power sources may be powering one or more controlunits of the individual circuits. APS may be also powering one or moreboard power source BPS, e.g. BPS A and/or BPS B. APS may be alsopowering master unit HMI and/or other elements of the treatment device.Because of APS, at least one control unit and/or master unit may provideprocessing/adjusting of the electric signal in RF and/or magnet circuitprecisely, independently and/or also individual electrical element ofthe treatment device may be protected from the overload. The board powersource (e.g. element BPS A and/or BPS B) may be used as a source ofelectric energy for at least one element of magnetic circuit (e.g.energy storage device ESD A and/or B). Alternatively, one or moreelements of the power source PSM may be combined and/or dismissed.

The power source may serve as high voltage generator providing voltageto a magnetic circuit and/or RF circuit. The voltage provided by powersource may be in a range from 500 V to 50 kV, or from 700 V to 5 kV, orfrom 700 V to 3 kV, or from 1 kV to 1.8 kV. The power source is able todeliver a sufficient amount of electrical energy to each circuit, suchas to any electrical element (e.g. the energy storage device ESD A) andto the magnetic field generating device (e.g. MFGD A). The magneticfield generating device may repeatedly generate a time-varying magneticfield with parameters sufficient to cause muscle contraction.

According to FIG. 18 a , RF circuits have their own power source PSRFthat may be at least partially different from the PSM. The PSRF mayinclude element electrical PNFLT suppressing electromagnetic emissionfrom the internal parts of the PN and/or from the any part of the RFcircuit. Electrical element PNFLT may represent power network filter.However, PNFLT may be also part of the PN. The PSRF may include SPSRFproviding steady output voltage under different power network conditionsto auxiliary power source of a RF circuit APS RF, control unit of the RFcircuit, a power unit PU and/or other electrical elements using directcurrent supply. As further illustrated in FIG. 18 a , APS RF may includeits own mechanism transforming alternating current to direct currentindependently to SPSRF. The APS RF may be able to power control unit ofthe treatment cluster for RF treatment RF A and/or master unit whileSPSRF may independently power control unit of the treatment cluster forRF treatment RF B. The power unit PU of the RF circuit may be poweringone or more RF circuits or at least one electrical element of the RFcircuit, such as power amplifiers and/or other electrical elements ofthe treatment cluster for RF treatment RF A and/or treatment cluster forRF treatment RF B creating and/or adjusting high frequency signal.

At least one electrical element described as PSM, PSRF, APS, SPSM and/orSPSRF may be shared by at least one RF circuit and magnetic circuit.

Control units CURF may work as slave of the master unit, which maycommand CURF to provide RF signal through RF circuit to RF electrode. Incase of two control units CURF both control units work as slaves of themaster unit which may command both control units CURF to provide RFsignal to respective RF electrodes. Therefore, the control of eachcontrol unit from possible plurality of CURF is independent.Alternatively, first CURF may be slave of second CURF, while first CURFitself may be slave of master unit. Therefore, when master unit commandsthe first CURF to discharge electrical current into the first RFelectrode, the first CURF may command the second CURF to dischargeelectrical current to second RF electrode positioned in differentapplicator. In some aspects, additional control unit may be positionedbetween master unit and plurality of control units CURF, wherein suchadditional control unit may provide e.g. timing of discharges. By bothof these principles, the pulses of the RF field may be appliedcontinuously or in a pulsed manner.

Treatment clusters for magnetic HIFEM A and HIFEM B shown in FIGS. 17,18 a and 18 b may be controlled through one or more sliders or scrollersrelated to HMI parts marked as HIFEM A and HIFEM B 718 shown on FIG. 7 .Through related intensity scrollers, intensity bars and/or intensitysliders shown on human machine interface HMI, the user may control oradjust speed of operation of one or more electrical elements oftreatment clusters for magnetic energy HIFEM A and/or HIFEM B.

Also, treatment cluster for RF treatment RF A and treatment cluster forRF treatment RF B shown in FIGS. 17, 18 a and 18 b may be controlledthrough sliders, bars or intensity scrollers related to HMI parts markedas RF A and RF B 712 shown on FIG. 7 . Through related intensityscrollers, intensity bars and/or intensity sliders shown on humanmachine interface HMI, the user may control or adjust speed of operationof one or more electrical elements of treatment clusters for RFtreatment RF A and/or RF B. Also, by using the related intensityscrollers, intensity bars and/or intensity sliders the user may controlor adjust speed of electrical signal transmission through or between oneor more electrical elements of treatment clusters for RF treatment RF Aor RF B.

The treatment device may include two or more applicator, each applicatormay include one magnetic field generating device and one or two RFelectrodes. Inductance of first magnetic field generating devicepositioned in first applicator may be identical as inductance of secondmagnetic field generating device positioned in the second applicator.Also, number of turns, winding area and/or area without winding of thefirst magnetic field generating device in the first applicator may beidentical as number of turns, winding area and/or area without windingof the second magnetic field generating device in the second applicator.The first magnetic field generating device in the first applicator mayprovide identical magnetic field as the second magnetic field generatingdevice in the second applicator. The identical magnetic fields providedby plurality of magnetic field generating devices during same or anothertreatment sessions may have same treatment parameters e.g. number ofpulses in train, number of pulses in burst, same amplitude of magneticflux density of impulses, same shape of envelope or other. However,reasonable deviation e.g. from amplitude of magnetic flux density may betolerated in the identical magnetic field. The deviation of amplitudesof magnetic flux density or average magnetic flux density as measured byfluxmeter or oscilloscope may be in the range of 0.1% to 10% or 0.1% to5%.

Alternatively, the inductance of magnetic field generating devices inboth applicator may be different. Also, magnetic fields provided byplurality of magnetic field magnetic devices during the same or anothertreatment sessions may have different treatment parameters.

When the treatment device has two or more applicators, each applicatormay include one magnetic field generating device and one or two RFelectrodes. The size or area of one RF electrode positioned in firstapplicator may be identical to another RF electrode positioned in thesecond applicator. First applicator and second applicator may provideidentical RF fields provided during same or another treatment sessions,wherein identical RF fields may have same treatment parameters, e.g.frequency, wavelength, phase, time duration, power and intensity of RFfield. However, first applicator and second applicator may provide twoRF fields during the same or different treatment sessions, wherein twoRF fields may have the different treatment parameters.

Alternatively, the size of area of RF electrodes in both applicators maybe different. Also, magnetic fields provided by plurality of magneticfield generating devices during the same or another treatment sessionsmay have different treatment parameters.

FIG. 19 a shows an exemplary composition of a magnetic field (e.g.time-varying magnetic field) provided by the magnetic field generatingdevice. FIG. 19 a shows an exemplary composition of an RF field. FIG. 19b shows the exemplary composition of the RF field applied in a pulsedmanner, comprising pulses and impulses. Therefore, especially indescription of FIGS. 19 a and 19 b , the term “impulse” may refer to“magnetic impulse” or “RF impulse”. Similarly, the term “pulse” mayrefer to “magnetic pulse” or “RF pulse”. Also, term “train” may refer to“magnetic train”. Term “magnetic train” may include train of magneticpulses wherein the train of magnetic pulses may be understood as aplurality of magnetic pulses wherein one pulse follows another. As themagnetic pulse may include one magnetic impulse, the term “magnetictrain” may include also a train of magnetic impulses. The term “burst”may refer to a “magnetic burst”.

As shown in FIG. 19 a or 19 b, an impulse may refer to a time period ofapplied treatment energy (e.g. magnetic field) with sufficient intensityto cause at least partial treatment effect, such as an at least partialmuscle contraction, muscle contraction, change of temperature of thebiological structure and/or nerve stimulation. The magnetic impulse mayinclude one biphasic shape as shown on FIG. 19 a . The magnetic impulsemay include amplitude of magnetic flux density.

A magnetic pulse may refer to a time period including an impulse and apassive time period of the pulse. The magnetic pulse may refer to a timeperiod of one magnetic impulse and a passive time period, i.e. timeduration between two impulses from rise/fall edge to subsequent offollowing rise/fall edge. The passive time duration of a pulse mayinclude either applying no treatment energy to the patient's body and/orapplication of the treatment energy insufficient to cause at least apartial treatment effect due to insufficient treatment energy intensity(e.g. magnetic flux density) and/or frequency of delivered treatmentenergy. Such time period may be called a pulse duration. As shown onFIG. 19 a , each pulse may include one biphasic shape lasting for a timeperiod called an impulse duration. Alternatively, the impulses or pulsesmay be monophasic.

As further shown on FIG. 19 a or 19 b, the plurality of pulses may formthe train. The train may refer to a plurality of pulses, wherein onetrain may comprise at least two pulses wherein pulses follow one byanother. The train may last time period lasting T₁ shown in FIG. 19 a or19 b.

The magnetic train may include plurality of magnetic pulses in the rangeof 2 magnetic pulses to 200 000 magnetic pulses or 2 magnetic pulses to150 000 magnetic pulses or 2 magnetic pulses to 100 000 magnetic pulses.Magnetic train may cause multiple at least partial muscle contractionsor muscle contractions followed one by one, at least one incompletetetanus muscle contraction, at least one supramaximal contraction or atleast one complete tetanus muscle contraction. During application of onetrain, magnetic field may provide one muscle contraction followed bymuscle relaxation. The muscle relaxation may be followed by anothermuscle contraction during the application of one train. During onetrain, the muscle work cycle (which may include muscle contractionfollowed by muscle relaxation) may be repeated at least twice, three,four or more times.

The burst may refer to one train provided during time period T₁ and atime period T₂ which may represent a time period when no treatmenteffect is caused. The time period T₂ may be a time period providingpassive treatment where no treatment energy is applied to a patient'sbody and/or applied treatment energy is insufficient to cause thetreatment effect. The time period T₃ shown in FIG. 19 a or 19 b mayrepresent the time duration of the burst.

The magnetic train of a time-varying magnetic field may be followed by astatic magnetic field and/or the magnetic train may be followed by atime-varying magnetic field of frequency and/or magnetic flux densityinsufficient to cause at least a partial muscle contraction or musclecontraction. For example, the burst may provide at least one at leastpartial muscle contraction followed by no muscle contraction. In someaspects, the burst may provide at least one muscle contraction followedby no muscle contraction. The treatment may include a number of magneticbursts in a range of 15 to 25,000, or in a range of 40 to 10,000, or ina range of 75 to 2,500, or in a range of 150 to 1,500, or in a range of300 to 750 or up 100,000. The repetition rate in the subsequent burstsmay incrementally increase/decrease with an increment of 1 to 200 Hz, orof 2 to 20 Hz, or of 5 Hz to 15 Hz, or more than 5 Hz. Alternatively,the amplitude of magnetic flux density may vary in the subsequentbursts, such as incrementally increase/decrease with an increment of atleast 1%, 2%, or 5% or more of the previous pulse frequency. Duringapplication of one burst, magnetic field may provide one musclecontraction followed by muscle relaxation. The muscle relaxation may befollowed by another muscle contraction during the application of sameburst. During one burst, the muscle work cycle (which may include musclecontraction followed by muscle relaxation) may be repeated at leasttwice, three, four or more times.

Also, a treatment duty cycle may be associated with an application of apulsed treatment energy of the magnetic field as illustrated in FIG. 19a . The treatment duty cycle may refer to a ratio between time of activetreatment T₁ and sum of time of an active and a passive treatment duringone cycle T₃.

An exemplary treatment duty cycle is illustrated in FIG. 19 a or FIG. 19b . Duty cycle of 10% means that T₁ of active treatment last 2 s andpassive treatment T₂ last 18 s. In this exemplary treatment the periodincluding active and passive treatment period T₃ lasts 20 seconds. Thetreatment duty cycle may be defined as a ratio between T₁ and T₃. Thetreatment duty cycle may be in a range from 1:100 (which means 1%) to24:25 (which means 96%) or 1:50 (which means 2%) to 4:6 (which means67%) or 1:50 (which means 2%) to 1:2 (which means 50%) or 1:50 to 1:3(which means 33%) or 1:50 (which means 2%) to 1:4 (which means 25%) or1:20 (which means 5%) to 1:8 (which means 12.5%) or 1:100 (which means1%) to 1:8 (which means 12.5%) or at least 1:4 (which means at least25%).

An exemplary application of a burst repetition rate of 4 Hz may be thetime-varying magnetic field applied to the patient with a repetitionrate of 200 Hz and with a treatment duty cycle of 50% in trains lasting125 ms, i.e. each train includes 25 pulses. An alternative exemplaryapplication of a burst repetition rate of 6 bursts per minute may be thetime-varying magnetic field applied to the patient with a repetitionrate of 1 Hz and with a treatment duty cycle of 30% in trains lasting 3s; i.e., each train includes 3 pulses.

The FIG. 19 b may also show exemplary composition of magnetic componentprovided by the RF electrode.

When the treatment device uses plurality of applicators (e.g. two), eachapplicator may include one magnetic field generating device. As eachmagnetic field generating device may provide one respective magneticfield, the plurality of applicators may provide different magneticfields. In that case the amplitude of magnetic flux density of magneticimpulses or pulses may be same or different, as specified by userthrough HMI and/or by one or more control units.

The impulses of one magnetic field provided by one magnetic fieldgenerating device (e.g. magnetic coil) may be generated and appliedsynchronously as the impulses of another magnetic field provided byanother magnetic field generating device. During treatment session withthe treatment device including two magnetic field generating device, theimpulses of one magnetic field provided by one magnetic field generatingdevice may be generated synchronously with the impulses of secondmagnetic field provided by second magnetic field generating device.Synchronous generation may include simultaneous generation.

The synchronous generation of magnetic impulses may be provided bysynchronous operation of switches, energy storage devices, magneticfield generating devices and/or other electrical elements of theplurality of magnetic treatment circuit. However, the synchronousoperation of electrical elements of magnetic treatment circuit may becommanded, adjusted or controlled by user through HMI, master unitand/or more control unit.

The FIG. 27 a shows simultaneous type of synchronous generation ofmagnetic impulses on two exemplary magnetic field generating devices.The magnetic field generating device A (MFGD A) may generate firstmagnetic field including plurality of biphasic magnetic impulses 271 a.The magnetic field generating device B (MFGD B) may generate secondmagnetic field including plurality of magnetic impulses 271 b. Themagnetic impulses of both magnetic fields are generated during theimpulse duration 272 of the magnetic impulses 271 a of the firstmagnetic field. Also, the impulse of both magnetic fields are generatedwithin the pulse duration 273 of the first magnetic field. Simultaneousgeneration of magnetic field means that the magnetic impulse 271 a ofthe first time-varying magnetic field is generated at the same the timeas the magnetic impulse 271 b of the second time-varying magnetic field.

The synchronous generation of magnetic fields may include generating afirst pulse of the first time-varying magnetic field such that the firstpulse lasts for a time period, wherein the time period lasts from abeginning of a first impulse of the first time-varying magnetic field toa beginning of a next consecutive impulse of the first time-varyingmagnetic field and generating a second pulse of the second time-varyingmagnetic field by the second magnetic field generating device such thatthe second pulse lasts from a beginning of a first impulse of the secondtime-varying magnetic field to a beginning of a next consecutive impulseof the second time-varying magnetic field. Synchronous generation ofmagnetic field means that the first impulse of the second time-varyingmagnetic field is generated during the time period of the first pulse.

FIG. 27 b shows an example of synchronous generation of magneticimpulses. The magnetic field generating device A (MFGD A) may generatefirst magnetic field including plurality of biphasic magnetic impulses271 a. The magnetic field generating device B (MFGD B) may generatesecond magnetic field including plurality of magnetic impulses 271 b.The magnetic impulses 271 b of second magnetic field may be generatedduring the pulse duration 273 of pulse of the first magnetic field, butoutside of impulse duration 272 of impulse of first magnetic field.

FIG. 27 c shows another example of synchronous generation of magneticimpulses. The magnetic field generating device A (MFGD A) may generatefirst magnetic field including plurality of biphasic magnetic impulses271 a. The magnetic field generating device B (MFGD B) may generatesecond magnetic field including plurality of magnetic impulses 271 b.The magnetic impulse 271 b of second magnetic field may be generatedduring the pulse duration 273 of pulse of the first magnetic field.Also, the magnetic impulse 271 b of second magnetic field may begenerated during the impulse duration 272 of pulse of the first magneticfield. The beginning of the magnetic impulse 271 b of second magneticfield may be distanced from the beginning of the impulse 271 a of thefirst magnetic field by a time period called impulse shift 274. Theimpulse shift may be in a range of 5 μs to 10 ms or 5 μs to 1000 μs or 1μs to 800 μs.

FIG. 27 d shows still another example of synchronous generation ofmagnetic impulses. The magnetic field generating device A (MFGD A) maygenerate first magnetic field including plurality of biphasic magneticimpulses 271 a. The magnetic field generating device B (MFGD B) maygenerate second magnetic field including plurality of magnetic impulses271 b. The magnetic impulse 271 b of second magnetic field may begenerated within the pulse duration 273 of the pulse of the firstmagnetic field. The magnetic impulse 271 b of second magnetic field maybe generated outside of impulse duration 272 of the impulse of the firstmagnetic field. The beginning of the magnetic impulse 271 b of secondmagnetic field may be distanced from the end of the magnetic impulse 271a of the first magnetic field by a time period called impulse distanceperiod 275. The impulse distance period may last in a range of 5 μs to10 ms or 5 μs to 1000 μs or 1 μs to 800 μs.

Beside synchronous generation, the magnetic impulses of plurality ofmagnetic fields may be generated separately. Separated generation ofmagnetic impulses of magnetic fields may include generation of impulsesof one magnetic field are generated outside of pulse duration of anothermagnetic field.

FIG. 27 e shows example of separate generation of magnetic impulses. Themagnetic field generating device A may generate first magnetic fieldincluding train of biphasic magnetic impulses 271 a having impulseduration 272 a. Each magnetic impulse 271 a is part of a pulse havingpulse duration 273 a. The impulse duration 272 a of first magnetic fieldmay be part of pulse duration 273 a of first magnetic field. The trainof first magnetic field may have train duration 276 a. The magneticfield generating device B may generate another magnetic field includinganother train of plurality of magnetic impulses 271 b having impulseduration 272 b. Each magnetic impulse 271 b is part of a pulse havingpulse duration 273 b. The impulse duration 272 b of second magneticfield may be part of pulse duration 273 b of second magnetic field. Thetrain of second magnetic field may have train duration 276 b. The trainhaving train duration 276 a is generated by magnetic field generatingdevice A in different time than train having train duration 276 bgenerated by magnetic field generating device B. Both train may beseparated by separation period 277 may be in the range of 1 ms to 30 s.During separation period 277, no magnetic field generating device may beactive meaning that the energy storage device providing current pulsesmay not store any energy.

All examples of synchronous or separated generation of magnetic impulsesmay be applied during one treatment session. Also, the impulse shiftand/or impulse distance period may be calculated for any magneticimpulse 271 b of second or another magnetic field, which may bepositioned according to any example given by FIGS. 27B-27E. The impulseshift and/or impulse distance period may be measured and calculated fromoscilloscope measurement. The synchronous generation of magneticimpulses may lead and be extrapolated to synchronous generation ofmagnetic pulses and/or trains by two or more magnetic field generatingdevices. Similarly, the separated generation of magnetic impulses maylead and be extrapolated to separated generation of magnetic pulsesand/or trains by two or more magnetic field generating devices.

The adjustment or control provided by master unit and/or one or morecontrol units may be used for creation or shaping of magnetic envelopeor RF envelope. For example, the magnetic impulses or RF impulses may bemodulated in amplitude of each impulse or plurality of impulses toenable assembly of various envelopes. Similarly, the amplitude of RFenergy may be modulated in amplitude to assemble various envelopes. Themaster unit and/or one or more control units may be configured toprovide the assembly of one or more envelopes described herein.Differently shaped magnetic envelopes and/or RF envelopes (referredherein also as envelopes) may be differently perceived by the patient.The envelope or all envelopes as shown on Figures of this applicationmay be fitted curve through amplitude of magnetic flux density ofimpulses, pulses or trains and/or amplitudes of power output of RFimpulses of RF waves.

The envelope may be a magnetic envelope formed from magnetic impulses.The magnetic envelope formed from impulses may include plurality ofimpulses, e.g. at least two, three, four or more subsequent magneticimpulses. The subsequent magnetic impulses of such magnetic envelope mayfollow each other. In case of such envelope, the envelope duration maybegin by first impulse and end with the last impulse of the plurality ofimpulses. The envelope may include one train of magnetic impulses. Theenvelope may be a fitted curve through amplitudes of magnetic fluxdensity of impulses. The envelope formed by magnetic impulses maytherefore define train shape according to modulation in magnetic fluxdensity, repetition rate and/or impulse duration of magnetic impulses.Accordingly, the envelope may be an RF envelope formed by RF impulsesand their modulation of envelope, repetition rate or impulse duration ofRF impulse of RF wave.

The envelope may be a magnetic envelope formed by magnetic pulses. Themagnetic envelope formed by pulses may include plurality of pulses (e.g.at least two, three, four or more subsequent magnetic pulses), whereinpulses follow each other without any missing pulse. In such case, theenvelope duration may begin by impulse of first pulse and end with apassive time duration of last impulse of the plurality of pulses. Theenvelope formed by magnetic pulses may therefore define train shape inaccording to modulation in magnetic flux density, repetition rate and/orimpulse duration. The envelope may include one train of magnetic pulses.The train consists of magnetic pulses in a pattern that repeats at leasttwo times during the protocol. The magnetic envelope may be a fittedcurve through amplitudes of magnetic flux density of pulses.

The envelope may be a magnetic envelope formed from magnetic trains. Themagnetic envelope formed from trains may include plurality of trains(e.g. at least two, three, four or more subsequent magnetic trains),wherein trains follow each other with time duration between the train.In such case, the envelope duration may begin by impulse of first pulseof the first train and end with a passive time duration of the pluralityof pulses. The plurality of trains in one envelope may be separated bymissing pulses including impulses. The number of missing pulses may bein a range of 1 to 20 or 1 to 10.

The envelope may be modulated on various offset values of magnetic fluxdensity. The offset value may be in the range of 0.01 T to 1 T or 0.1 to1 T or 0.2 to 0.9 T. The offset value may correspond to non-zero valueof magnetic flux density.

During one treatment session, treatment device may apply various numberof envelopes. Two or more envelopes of magnetic field may be combined tocreate possible resulting shape.

In examples mentioned above, the envelope may begin by first impulse.Further, the envelope continue through duration of first respectivepulse including first impulse. Further, the envelope may end with apassive time duration of last pulse, wherein the last pulse may followthe first pulse. This option is shown on following figures showingexemplary shapes of envelope of magnetic pulses. As shown on followingfigures, the shape of envelope may be provided by modulation of magneticflux density. The shape of RF envelope may be provided by modulation ofamplitude of power or impulses of RF waves.

FIG. 28 is an exemplary illustration of an increasing envelope 281formed from magnetic impulses 282, wherein one magnetic impulse 282 isfollowed by one passive time period of the magnetic pulse. Amplitude ofmagnetic flux density of subsequent impulses in the increasing envelopeis increasing. The amplitude of magnetic flux density of one impulse ishigher than amplitude of magnetic flux density of preceding impulse.Similarly, the amplitude of magnetic flux density of second impulse ishigher than amplitude of magnetic flux density of the first impulse. Theincreasing amplitude may be used for muscle preparation. The envelopeduration 283 of the increasing envelope 281 begins from first impulse ofthe first pulse to end of the passive time duration of last pulse.Similarly, the amplitude of RF waves may be modulated in amplitude toassemble increasing envelope 281.

FIG. 29 is an exemplary illustration of a decreasing envelope 291 formedfrom magnetic impulses 292. Amplitude of magnetic flux density ofsubsequent impulses in the decreasing envelope is decreasing. Theamplitude of magnetic flux density of one impulse is lower thanamplitude of magnetic flux density of preceding impulse. Similarly, theamplitude of magnetic flux density of second impulse is lower thanamplitude of magnetic flux density of the first impulse. The envelopeduration 293 of the decreasing envelope 291 begins from first impulse ofthe first pulse to end of the passive time duration of last pulse.Similarly, the amplitude of RF waves may be modulated in amplitude toassemble decreasing envelope 291.

FIG. 30 is an exemplary illustration of a rectangular envelope 302formed from magnetic impulses 303. Amplitude of magnetic flux density ofimpulses in the rectangular envelope may be constant. However, theamplitude of magnetic flux density of subsequent impulses may oscillatearound predetermined value of amplitude of magnetic flux density inrange of 0.01% to 5%. The amplitude of magnetic flux density of firstimpulse may be identical as the amplitude of magnetic flux density ofthe second impulse, wherein the second impulse follows the firstimpulse. The envelope duration 304 of the rectangular envelope 302begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The rectangular envelope may be used forinducing of muscle contraction or muscle twitches. Similarly, theamplitude of RF waves may be modulated in amplitude to assemblerectangular envelope 302.

FIG. 31 is an exemplary illustration of a combined envelope 311, whichmay be hypothetically seen as combination of increasing envelope andrectangular envelope. Combined envelope 311 includes magnetic impulses312. Amplitude of magnetic flux density of impulses in the combinedenvelope may be increasing for in a range of 1% to 95% or 5% to 90% or10% to 80% of the time duration of the whole combined envelope. Theamplitude of magnetic flux density of subsequent impulses in therectangular part of the combined envelope may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 313 of the combined envelope 311begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The combined envelope as shown on FIG. 31 may beused for preparation of muscle and inducing of muscle contraction ormuscle twitches. Similarly, the amplitude of RF waves may be modulatedin amplitude to assemble envelope 311.

FIG. 32 is an exemplary illustration of a combined envelope 321, whichmay be hypothetically seen as combination of rectangular envelope anddecreasing envelope. Combined envelope 321 includes magnetic impulses322. Amplitude of magnetic flux density of impulses in the combinedenvelope may be decreasing for in a range of 1% to 95% or 5% to 90% or10% to 80% of the time duration of the whole combined envelope. Theamplitude of magnetic flux density of subsequent impulses in therectangular part of the combined envelope may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 323 of the combined envelope 321begins from first impulse of the first pulse to end of the passive timeduration of last pulse. The combined envelope as shown on FIG. 32 may beused for inducing of muscle contraction or muscle twitches andsubsequent end of the muscle stimulation. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble combined envelope 321.

FIG. 33 is an exemplary illustration of triangular envelope 331, whichcan be understood as a combination of the increasing envelopeimmediately followed by the decreasing envelope. Triangular envelope 331may include magnetic impulses 332. The triangular shape of the envelopemay not be symmetrical. Also, the straightness of one or more lines ofthe triangular shape may be interrupted by another type of envelopementioned herein, e.g. rectangular envelope. One triangular envelope mayclosely follow another triangular envelope or be joined to anothertriangular envelope. By joining two triangular envelopes, the resultingenvelope may have the saw-tooth shape. The envelope duration 333 of thetriangular envelope 331 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves may be modulated in amplitude to assemble triangularenvelope 331.

FIG. 34 is an exemplary illustration of a trapezoidal envelope 341. Thetrapezoidal envelope 341 may include magnetic impulses 342. Thetrapezoidal envelope may include increasing (rising) time period T_(R),hold time period T_(H) and decreasing (fall) time period T_(F). Duringincreasing time period, the amplitude of magnetic flux density ofsubsequent impulses is increasing. Further, during increasing timeperiod the amplitude of magnetic flux density of one impulse is higherthan amplitude of magnetic flux density of preceding impulse. Duringhold time period, the amplitude of magnetic flux density of subsequentimpulses may oscillate around predetermined value of amplitude ofmagnetic flux density in range of 0.01% to 5%. During decreasing timeperiod, the amplitude of magnetic flux density of subsequent impulses isdecreasing. Further, during decreasing time period the amplitude ofmagnetic flux density of one impulse is lower than amplitude of magneticflux density of preceding impulse. Hold period may be interrupted byanother hold time period of having different predetermined value of themagnetic flux density. The envelope duration 343 of the trapezoidalenvelope 341 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble trapezoidal envelope341.

A trapezoidal envelope may be perceived by the patient as the mostcomfortable for muscle tissue stimulation. Trapezoidal envelope respectsnatural course of muscle contraction, i.e. the muscle contraction may betime-varying. Strength of natural muscle contraction increases, holds atthe highest strength and decreases. The trapezoidal envelope correspondswith natural muscle contraction, i.e. the strength of the musclecontraction may correspond with the magnetic flux density. The magneticflux density during the duration of the trapezoidal envelope increases,holds and decreases. Same shape of envelope may have RF field formedfrom RF impulses having appropriate amplitude.

The trapezoidal envelope may be at least once interrupted by one or moreimpulses, pulses, bursts and/or trains that do not fit to thetrapezoidal envelope shape, but after this interruption the trapezoidalenvelope may continue.

Also, the trapezoidal envelope may include plurality of trains, e.g.two, three four or more trains. In case of trapezoidal shape, theenvelope may include three trains. The first train may include impulseswith increasing magnetic flux density. Magnetic flux density of oneimpulse may be higher than magnetic flux density of the second impulsefollowing the first impulse. The second train may include impulses withconstant magnetic flux density. However, the operation of the treatmentdevice may not provide strictly constant magnetic flux density for eachimpulse, therefore the magnetic flux density may oscillate in range of0.1 to 5%. The third train may include impulses with decreasing magneticflux density. Magnetic flux density of one impulse may be lower thanmagnetic flux density of the second impulse following the first impulse.

Furthermore, the trapezoidal envelope may include plurality of bursts,e.g. two, three four or more bursts. In case of trapezoidal shape, theenvelope may include three bursts. The first burst may include impulseswith increasing magnetic flux density. Magnetic flux density of oneimpulse may be higher than magnetic flux density of the second impulsefollowing the first impulse. The second bursts may include impulses withconstant magnetic flux density. However, the operation of the treatmentdevice may not provide strictly constant magnetic flux density for eachimpulse, therefore the magnetic flux density may oscillate in range of0.1 to 5%. The third bursts may include impulses with decreasingmagnetic flux density. Magnetic flux density of one impulse may be lowerthan magnetic flux density of the second impulse following the firstimpulse.

FIG. 20 illustrates another exemplary trapezoidal envelope. The verticalaxis may represent magnetic flux density, and the horizontal axis mayrepresent time. A trapezoidal envelope may be a fitted curve throughamplitudes of magnetic flux density of impulses applied during a train,where T_(R) is time period with increasing magnetic flux density calledincreasing transient time, i.e. the amplitude of the magnetic fluxdensity may increase. T_(H) is time period with maximal magnetic fluxdensity, i.e. the amplitude of the magnetic flux density may beconstant. T_(F) is time period with decreasing magnetic flux density,i.e. the amplitude of the magnetic flux density may decrease. A sum ofT_(R), T_(H) and T_(F) may be trapezoidal envelope duration that maycorresponds with muscle contraction.

The trapezoidal envelope may decrease energy consumption. Due to lowerenergy consumption, the trapezoidal shape may enable improved cooling ofthe magnetic field generating device. Further, the resistive losses maybe reduced due to lower temperature of the magnetic field generatingdevice. Different repetition rates may cause different types of musclecontractions. Each type of muscle contraction may consume differentamounts of energy.

FIG. 35 is an exemplary illustration of a trapezoidal envelope 351including an increasing time period T₁, a first decreasing time periodT₂ and a second decreasing time period T₃. The trapezoidal envelope 351includes magnetic impulses 352. Increasing time period includes impulseswith increasing amplitude of magnetic flux density. First decreasingtime period and second decreasing time period includes impulses withdecreasing amplitude of the magnetic flux density. On the shown example,first decreasing time period follows the increasing time period andprecedes the second decreasing time period. The amplitude of magneticflux density of subsequent impulses is shown to decrease more steeplyduring the second decreasing time period. Alternatively, the amplitudeof magnetic flux density of subsequent impulses may decrease moresteeply during the first decreasing time period. The envelope duration353 of the trapezoidal envelope 351 begins from first impulse of thefirst pulse to end of the passive time duration of last pulse.Accordingly, the envelope may be a magnetic envelopes formed from RFimpulses. Similarly, the amplitude of RF waves may be modulated inamplitude to assemble trapezoidal envelope 351.

FIG. 36 is an exemplary illustration of a trapezoidal envelope 361including a first increasing time period, a second increasing timeperiod and a decreasing time period. The trapezoidal envelope 361includes magnetic impulses 362. First increasing time period and secondincreasing time period include impulses with increasing amplitude ofmagnetic flux density. First increasing time period and secondincreasing time period include impulses with increasing amplitude of themagnetic flux density. On the shown example, second increasing timeperiod follows the first increasing time period and precedes thedecreasing time period. The amplitude of magnetic flux density ofsubsequent impulses is shown to increase more steeply during the firstincreasing time period. Alternatively, the amplitude of magnetic fluxdensity of subsequent impulses may increase more steeply during thesecond increasing time period. The envelope duration 363 of thetrapezoidal envelope 361 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves may be modulated in amplitude to assemble trapezoidalenvelope 361.

FIG. 37 is an exemplary illustration of a step envelope 371 including afirst increasing time period T₁, first hold time period T₂, secondincreasing time period, second hold time period and a decreasing timeperiod. The step envelope 371 includes magnetic impulses 372. Duringfirst and second increasing time periods the amplitude of magnetic fluxdensity of subsequent impulses may increase. During decreasing timeperiod the amplitude of magnetic flux density of subsequent impulses maydecrease. During hold time period the amplitude of magnetic flux densityof subsequent impulses may be constant or may oscillate aroundpredetermined value of amplitude of magnetic flux density in range of0.01% to 5%. The envelope duration 373 of the step envelope 371 beginsfrom first impulse of the first pulse to end of the passive timeduration of last pulse. Similarly, the amplitude of RF waves may bemodulated in amplitude to assemble step envelope 371.

FIG. 38 is an exemplary illustration of a step envelope 381 including afirst increasing time period T₁, first hold time period T₂, firstdecreasing time period T₃, second hold time period T₄ and a seconddecreasing time period T₅. The step envelope 381 includes magneticimpulses 382. During increasing time period the amplitude of magneticflux density of subsequent impulses may increase. During first andsecond decreasing time periods the amplitude of magnetic flux density ofsubsequent impulses may decrease. During hold time period the amplitudeof magnetic flux density of subsequent impulses may be constant or mayoscillate around predetermined value of amplitude of magnetic fluxdensity in range of 0.01% to 5%. The envelope duration 383 of the stepenvelope 381 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves may be modulated in amplitude to assemble envelope 381.

FIG. 39 is an exemplary illustration of another type of trapezoidalenvelope 391 including magnetic impulses 392. The trapezoidal envelopemay include increasing time period T₁, hold time period T₂ anddecreasing time period T₃. During increasing time period, the amplitudeof magnetic flux density of subsequent impulses is increasing. Further,during increasing time period the amplitude of magnetic flux density ofone impulse is higher than amplitude of magnetic flux density ofpreceding impulse. During hold time period, the amplitude of magneticflux density of subsequent impulses may oscillate around predeterminedvalue of amplitude of magnetic flux density in range of 0.01% to 5%.During decreasing time period, the amplitude of magnetic flux density ofsubsequent impulses is decreasing. Further, during decreasing timeperiod the amplitude of magnetic flux density of one impulse is lowerthan amplitude of magnetic flux density of preceding impulse. Holdperiod may include another hold time period T₄ of having differentpredetermined value of the magnetic flux density. The envelope duration393 of the envelope 391 begins from first impulse of the first pulse toend of the passive time duration of last pulse. Similarly, the amplitudeof RF waves and/or RF impulses may be modulated in amplitude to assembleenvelope 391.

The envelope may include combined modulation of magnetic flux densityand repetition rate. FIG. 40 shows exemplary illustration of rectangularenvelope 401 with constant amplitude of magnetic flux density. Therectangular envelope 401 may include magnetic impulses 402. Time periodsT_(RR2) and T_(RR3) shows impulses having higher repetition frequencythan rest of the magnetic impulses during T_(RR1) of shown rectangularenvelope. Shown time periods T_(RR2) and T_(RR3) may provide strongermuscle contraction than the rest of the shown rectangular envelope.However, all shown envelopes may include modulation in repetition ratedomain. The envelope duration 403 of the rectangular envelope 401 beginsfrom first impulse of the first pulse to end of the passive timeduration of last pulse. Accordingly, the envelope may be RF envelopesformed from RF impulses. Their amplitude may also form an amplitude,called RF envelope. Similarly, the amplitude and/or repetition rate ofRF impulses may be modulated in amplitude to assemble envelopes 401.

As mentioned, the envelope may be formed from magnetic trains separatedby one or more missing pulses. FIG. 41 shows the envelope formed frommagnetic trains including magnetic impulses 412. As shown, first trainincluding train of impulses with increasing magnetic flux density hasduration T₁. Second train of including impulses with constant oroscillating magnetic flux density has duration T₂. Third train ofincluding impulses with decreasing magnetic flux density has durationT₃. The envelope 411 including plurality of trains has trapezoidalshape. The time durations between durations T₁ and T₂ or durations T₂and T₃ may represent time gaps where the missing pulses includingmissing impulses would be positioned. The envelope duration 413 of theenvelope 411 begins from first impulse of the first pulse to end of thepassive time duration of last pulse. Similarly, the amplitude of RFwaves or RF impulses may be modulated in amplitude to assemble envelopes411.

During treatment, the magnetic envelopes may be combined. FIG. 42 showsan example of combination of magnetic envelopes. The increasing envelope422 having increasing shape includes train of magnetic impulses 421. Theincreasing envelope 422 may have duration T_(E1). The rectangularenvelope 423 includes train of magnetic impulses 421. The rectangularenvelope may have duration T_(E2). The decreasing envelope 424 includestrain of magnetic impulses 421. The decreasing envelope 424 may haveduration T_(E3). A resulting subperiod of treatment protocol formed bycombination of the first, second and third envelope, may provide same orsimilar treatment effect as trapezoidal envelope shown e.g. on FIG. 34and FIG. 20 . A resulting subperiod of treatment protocol has duration425 from first impulse of the first pulse to end of the passive timeduration of last pulse of the treatment subperiod. Similarly, theamplitude of RF waves and/or RF impulses may be modulated in amplitudeto assemble combination of envelopes.

FIG. 43 illustrates another example of combination of magneticenvelopes, wherein the decreasing period has different magnetic fluxdensity than rectangular envelope. This example may illustrate, thatcombination of magnetic envelopes may include envelopes with differentmagnetic flux density. The increasing envelope 432 having increasingshape includes train of magnetic impulses 431. The increasing envelopemay have duration T_(E1). The rectangular envelope 433 includes train ofmagnetic impulses 431. The rectangular envelope may have durationT_(E2). The decreasing envelope includes train of magnetic impulses 431.The decreasing envelope 434 may have duration T_(E3). A resultingsubperiod of treatment protocol formed by combination of the first,second and third envelope, may provide same or similar treatment effectas trapezoidal envelope shown e.g. on FIGS. 34 and 20 . A resultingsubperiod of treatment protocol has duration 435 from first impulse ofthe first pulse to end of the passive time duration of last pulse of thetreatment subperiod. Similarly, the amplitude of RF waves or RF impulsesmay be modulated in amplitude to assemble combination of envelopes.

FIG. 44 two exemplary envelopes of magnetic field with an example ofinter-envelope period i.e. time period between envelopes. Time periodbetween envelopes may include time of no magnetic stimulation. However,the time period between envelopes may include magnetic impulsesproviding insufficient or unrecognizable muscle stimulation (includinge.g. muscle contraction and muscle relaxation). The magnetic impulsesgenerated during time period between envelopes may also form envelope.The magnetic impulses providing insufficient or unrecognizable musclestimulation may be generated by discharging of energy storage device tomagnetic field generating coil in order to discharge the restingcapacity. The energy storage device may be then charged by power sourceto higher amount of electrical current and/or voltage in order toprovide high power current impulses to magnetic field generating device.Rectangular envelope 442 having duration T₁ may include magneticimpulses 441. Trapezoidal envelope 444 having duration T₂ may includemagnetic impulses 441. The inter-envelope time period having durationT_(EP) may include envelope 443 (e.g. having decreasing shape) given bymagnetic flux density of magnetic impulses 441 within the inter-envelopetime period. Alternatively, the inter-envelope time period may includesingle impulses providing muscle twitches. Accordingly, the envelope maybe a magnetic envelopes formed from RF impulses. Their amplitude mayalso form an amplitude, called RF envelope. The time period between RFenvelopes may include time of no heating.

The RF treatment (RF field) may be generated by treatment energy source(e.g. RF electrode) in continual operation, pulsed operation oroperation including cycles. The continual operation is provided duringcontinual RF treatment. The pulsed operation is provided during pulsedRF treatment.

During the continual operation, RF electrode may generate RF field forthe whole treatment or in one time duration during the treatment, ascommanded by master unit one or more control units. The RF electrode maygenerate RF wave having a sine shape. In other words, the RF electrodemay generate radio frequency waveform having sine shape. Other shapesare possible, e.g. sawtooth, triangle or square according to amplitudesof RF wave.

The continual RF treatment may have one of the highest synergic effectswith provided magnetic treatment due to continual heating of thepatient's target biological structures, highest effect to polarizationof the patient's target biological structures and to ensure deepmagnetic field penetration and high effect of generated magnetic fieldto a patient's tissue, such as to promote muscle contraction.

During the pulsed generation the RF electrode may generate RF field fortwo or more active time periods of the treatment, wherein the timeperiods may be separated by passive time periods. Active time period ofpulsed RF treatment may represent the time period during which the RFelectrode is active and generates RF field. The active time period maybe in the range of 1 s to 15 minutes, or 30 s to 10 minutes, or 5 s to900 s, or 30 s to 300 s, or 60 s to 360 s. The passive time period of RFpulsed treatment may represent the time period during which the RFelectrode is inactive and does not generate RF field. The passive timeperiod of RF pulsed treatment may be in the range of 1 s to 15 minutes,or 10 s to 10 minutes, or 5 s to 600 s, or 5 s to 300 s, or from 10 s to180 s. Pulsed generation and its parameters may vary during thetreatment.

The user may select, control or adjust various treatment protocols ofthe treatment device through the control unit or the master unit of thetreatment device. Also, the master unit and/or control unit may select,control or adjust treatment protocols body area or another optionselected by the user. In addition, the master unit and/or control unitmay select, control or adjust treatment various treatment parametersaccording to feedback provided by any sensor mentioned above.

The treatment protocol may include a selection of one or more treatmentparameters and their predetermined values as assigned to respectiveprotocol. Further, the treatment protocol may include various types ofcombined treatment by magnetic treatment and RF treatment.

Regarding the treatment parameters, the user may control or adjustvarious treatment parameters of the treatment device through the controlsystem including master unit or one or more control units of thetreatment device. The master unit and/or control unit may control oradjust treatment parameters according to treatment protocol, body areaor another option selected by the user. In addition, the master unitand/or control unit may control or adjust treatment various treatmentparameters according to feedback provided by any sensor mentioned above.The master unit or one or more control unit may provide adjustment oftreatment parameters of magnetic field including magnetic flux density,amplitude of magnetic flux density, impulse duration, pulse duration,repetition rate of impulses, repetition rate of pulses, train duration,number of impulses and/or pulses in train, burst duration, compositionof magnetic burst, composition of magnetic train, number of envelopes,duty cycle, shape of envelopes and/or maximal of the magnetic fluxdensity derivative. The master unit or one or more control unit mayprovide adjustment of treatment parameters of RF field includingfrequency of RF field, duty cycle of RF field, intensity of RF field,energy flux provided by RF field, power of RF field, amplitude of powerof RF field and/or amplitude of power of RF waves, wherein the RF wavesmay refer to electrical component of RF field. Treatment parameters maybe controlled or adjusted in following ranges.

In addition, treatment parameters may include, for example, thetreatment time, temperature of magnetic field generating device,temperature of RF electrode, temperature of the applicator, temperatureof the cooling tank, selection of targeted body area, number ofconnected applicator, temperature of cooling fluid (as measured in afluid conduit, connecting tube, applicator or cooling tank by anappropriate temperature sensor), selected body area and/or others.

Different magnetic flux density, pulse duration, composition of trainsand/or bursts may have different influence on muscle tissue. One part ofa magnetic treatment may cause, for example, muscle training in order toincrease muscle strength, muscle volume, muscle toning, and other partsof the magnetic treatment may cause muscle relaxation. The signalprovided to the RF electrode may be modulated with regard to capacity ofthe circuit created by two bipolar RF electrodes and the patient's body,preventing creation of standing radiofrequency waves in the applicatorand/or a patient, or other. The modulation of the radiofrequency fieldmay be provided in the frequency domain, intensity domain, impulseduration, and/or other parameters. The goal of individual radiofrequencytreatment, magnetic treatment and/or their combination is to reach themost complex and/or efficient treatment of the target biologicalstructure. The modulation in the time domain may provide active andpassive periods of stimulation. Passive period may occur when the RFtreatment and/or magnetic treatment includes a period with no musclestimulation and/or no change of temperature or other treatment effectprovided by RF field of target biological structure. During a passiveperiod, there may not be generated a magnetic field and/or RF field.Also, during a passive period, magnetic field and RF field may begenerated but the intensity of the magnetic field and/or the RF fieldmay not be sufficient to provide treatment effect of at least one of thetarget biological structure.

The magnetic flux density of the magnetic field may be in a range from0.1 T to 7 T, or in a range from 0.5 T to 7 T, or in a range from 0.5 Tto 5 T, or in range from 0.5 T to 4 T, or in range from 0.5 T to 2 T.Such definition may include the amplitude of magnetic flux density ofthe magnetic field. Shown ranges of magnetic flux density may be usedfor causing muscle contraction. The magnetic flux density and/oramplitude of the magnetic flux density may be measured by fluxmeter orby oscilloscope. The disclosed ranges of magnetic flux density may bemeasured on the surface of the magnetic field generating device or onthe surface of the applicator being in contact with the patient.

A repetition rate may refer to a frequency of firing the magneticimpulses. The repetition rate may be derived from the time duration ofthe magnetic pulse. The repetition rate of the magnetic impulses may bein the range of 0.1 Hz to 700 Hz, or from 1 Hz to 700 Hz, or from 1 Hzto 500 Hz, or in the range of 1 Hz to 300 Hz, or 1 Hz to 150 Hz. As eachmagnetic pulse includes one magnetic impulse, the repetition rate ofmagnetic pulses is equal to repetition rate of magnetic impulses. Theduration of magnetic impulses may be in a range from 1 μs to 10 ms, orfrom 3 μs to 3 ms, or from 3 μs to 3 ms, or from 3 μs to 1 ms, or 10 μsto 2000 μs, or 50 μs to 1000 μs, or from 100 μs to 800 μs. Therepetition rate of impulses may be measured from recording of theoscilloscope measurement.

The train duration may be in the range of 1 ms to 300 s or from 1 ms to80 s or from 2 ms to 60 s or 4 ms to 30 s, or from 8 ms to 10 s, or from25 ms to 3 s. A time between two subsequent trains may be in a range of5 ms to 100 s, or of 10 ms to 50 s, or of 200 ms to 25 s, or of 500 msto 10 s, or of 750 ms to 5 s or from 300 ms to 20 s. The repetition ratemay be measured from recording of the oscilloscope measurement.

The burst duration may be in a range of 10 ms to 100 seconds, or from100 ms to 15 s, or from 500 ms to 7 s, or from 500 ms to 5 s. Therepetition rate of magnetic bursts may be in a range of 0.01 Hz to 150Hz, or of 0.02 Hz to 100 Hz, or in the range of 0.05 Hz to 50 Hz, or0.05 Hz to 10 Hz, or of 0.05 Hz to 2 Hz. The repetition rate may bemeasured from recording of the oscilloscope measurement.

Another parameter to provide effective magnetic treatment and causingmuscle contraction is a derivative of the magnetic flux density definedby dB dt, where: dB is magnetic flux density derivative [T] and dt istime derivative [s]. The magnetic flux density derivative is related tomagnetic field. The magnetic flux density derivative may be defined asthe amount of induced electric current in the tissue and so it may serveas one of the key parameters to in providing muscle contraction. Thehigher the magnetic flux density derivative, the stronger musclecontraction is. The magnetic flux density derivative may be calculatedfrom the equation mentioned above.

The maximal value of the magnetic flux density derivative may be up to 5MT/s, or in the ranges of 0.3 to 800 kT/s, 0.5 to 400 kT/s, 1 to 300kT/s, 1.5 to 250 kT/s, 2 to 200 kT/s, or 2.5 to 150 kT/s.

The frequency of the RF field (e.g. RF waves) may be in the range ofhundreds of kHz to tens of GHz, e.g. in the range of 100 kHz to 3 GHz,or 500 kHz to 3 GHz, 400 kHz to 900 MHz or 500 kHz to 900 MHz or around13.56 MHz, 40.68 MHz, 27.12 MHz, or 2.45 GHz.

An energy flux provided by RF field (e.g. RF waves) may be in the rangeof 0.001 W/cm² to 1,500 W/cm², or 0.001 W/cm² to 15 W/cm², or 0.01 W/cm²to 1,000 W/cm², or of 0.01 W/cm² to 5 W/cm², or of 0.08 W/cm² to 1 W/cm²or of 0.1 W/cm² to 0.7 W/cm². The term “around” should be interpreted asin the range of 5% of the recited value.

The voltage of electromagnetic signal provided by power source oftreatment circuit for RF treatment may be in the range of 1 V to 5 kV,or 5 V to 140 V, or 10 V to 120 V, or 15 V to 50 V, or 20 V to 50 V.

The power provided by power source or adapter may be in a range of 100 Wto 1000 W, or 150 W to 600 W. The power provided by power source oradapter may be 220 W or 400 W.

The temperature in the biological structure, temperature on the surfaceof treated body area, temperature in the body area, temperature of theinside of the applicator, temperature of the RF electrode and/ortemperature of the magnetic field generating device may be measured e.g.by the temperature sensor 816 implemented in the applicator shown inFIG. 8 c . The temperature of the RF electrode and/or magnetic fieldgenerating device may be maintained in a range from 38° C. to 150° C.,38° C. to 100° C., or from 40° C. to 80° C., 40° C. to 60° C. or 41° C.to 60° C., or 42° C. to 60° C. The temperature on the surface of treatedbody area, temperature in the treated body and/or in the biologicalstructure may be increased to the temperature in a range of 38° C. to60° C., or of 40° C. to 52° C., or of 41° C. to 50° C., or of 41° C. to48° C., or of 42° C. to 48° C., or of 42° C. to 45° C. The values oftemperature described above may be achieved during 5 s to 600 s, 10 s to300 s, or 30 s to 180 s after RF treatment and/or magnetic treatmentstarts. After that, the value temperature may be maintained constantduring the treatment with maximal temperature deviation in a range of 5°C. 3° C., or 2° C., or 1° C.

At the beginning of the treatment a starting temperature on thepatient's skin and/or in the biological structure may be increased tothe starting temperature in range from 42° C. to 60° C., or from 45° C.to 54° C., or from 48° C. to 60° C., or from 48° C. to 52° C. and/or toa temperature 3° C., or 5° C., or 8° C. above the temperature whenapoptotic process begins but not over 60° C. After 45 s to 360 s, orafter 60 s to 300 s, or after 120 s to 400 s, or after 300 s to 500 swhen the starting temperature was reached, the intensity of the RF fieldmay be decreased and a temperature on the patient's skin and/ortemperature in the biological structure may be maintained at thetemperature in a range from 41° C. to 50° C., or from 42° C. to 48° C.According to another method of the treatment, the temperature of thebiological structure may be during the treatment at least two timesdecreased and increased in a range of 2° C. to 10° C., 2° C. to 8° C.,or 3° C. to 6° C. while at least one applicator is attached to the samepatient's body area, such as an abdominal area, buttock, arm, leg and/orother body area.

Temperature in the biological structure may be calculated according tomathematic model, correlation function, in combination with at least oneor more measured characteristic. Such measured characteristic mayinclude temperature on the patient's skin, capacitance between RFelectrodes, Volt-Ampere characteristic of RF bipolar electrodes and/orVolt-Ampere characteristic of connected electrical elements to RFelectrodes.

The treatment duration may be from 5 minutes to 120 minutes, or from 5minutes to 60 minutes, or from 15 minutes to 40 minutes. During oneweek, one, two or three treatments of the same body area may beprovided. Also, one pause between two subsequent treatments may be one,two or three weeks.

The sum of energy flux density of the RF treatment and the magnetictreatment applied to the patient during the treatment, may be in a rangefrom 0.03 mW/mm² to 1.2 W/mm², or in the range from 0.05 mW/mm² to 0.9W/mm², or in the range from 0.01 mW/mm² to 0.65 W/mm². A portion of theenergy flux density of magnetic treatment during the simultaneousapplication of RF treatment and active magnetic treatment may be in arange from 1% to 70%, 3% to 50%, 5% to 30%, or 1% to 20% of treatmenttime.

The power output of RF energy (i.e. RF field) provided by one RFelectrode may be in a range of 0.005 W to 350 W, 0.1 W to 200 W, 0.1 Wto 150 W, 1 W to 100 W, or 3 W to 50 W.

FIG. 21 illustrates different types of muscle contraction, which may beprovided by treatment device and achieved by application of magneticfield or combination of magnetic field and RF field. The musclecontraction may differ in energy consumption and muscle targeting, e.g.,muscle strengthening, muscle volume increase/decrease, muscle endurance,muscle relaxation, warming up of the muscle and/or other effects. Thevertical axis may represent a strength of the muscle contraction, andthe horizontal axis may represent time. The arrows may representmagnetic impulses and/or pulses applied to the muscle of the patient.

Low repetition rate of the time-varying magnetic field pulses, e.g. in arange of 1 Hz to 15 Hz, may cause a twitch. Low repetition rate may besufficiently low to enable the treated muscle to fully relax. The energyconsumption of the treated muscle may be low due to low repetition rate.However, the low repetition rate may cause for active relaxation ofmuscle e.g. between two contractions.

Intermediate repetition rate of the time-varying magnetic field pulsesmay cause incomplete tetanus muscle contraction, intermediate repetitionrate may be in a range of 15 Hz to 29 Hz. Incomplete tetanus musclecontraction may be defined by a repetition rate in a range of 10 Hz to30 Hz. The muscle may not fully relax. The muscle may be partiallyrelaxed. The muscle contraction strength may increase with constantmagnetic flux density applied.

Higher repetition rate of the time-varying magnetic field pulses maycause complete tetanus muscle contraction. Higher repetition rates maybe for example in a range of 30 Hz to 150 Hz, or 30 Hz to 90 Hz, or 30Hz to 60 Hz. The complete tetanus muscle contraction may cause thestrongest supramaximal muscle contraction. The supramaximal musclecontraction may be stronger than volitional muscle contraction. Theenergy consumption may be higher. The strengthening effect may beimproved. Further, it is believed that at repetition rates of at least30 Hz, the adipose cells may be reduced in volume and/or in number.

Even higher repetition rate of the time-varying magnetic field pulsesover 90 Hz may suppress and/or block pain excitement transmission atdifferent levels or neural system and/or pain receptors. The higherrepetition rate may be at least 100 Hz, at least 120 Hz, or at least 140Hz, or in a range of 100 Hz to 230 Hz, or 120 Hz to 200 Hz, or 140 Hz to180 Hz. The application of time-varying magnetic field to the muscle ofthe patient may cause a pain relieving effect.

High repetition rate of the time-varying magnetic field pulses in arange of 120 Hz to 300 Hz, or 150 Hz to 250 Hz, or 180 Hz to 350 Hz, orhigher than 200 Hz may cause a myorelaxation effect.

A quality of the muscle contraction caused by the time-varying magneticfield may be characterized by parameters such as a contractile force ofthe muscle contraction, a muscle-tendon length, a relative shortening ofthe muscle or a shortening velocity of the muscle.

The contractile force of the muscle contraction may reach a contractileforce of at least 0.1 N/cm² and up to 250 N/cm². The contractile forcemay be in a range from 0.5 N/cm² to 200 N/cm², or in the range from 1N/cm² to 150 N/cm², or in the range from 2 N/cm² to 100 N/cm².

The muscle-tendon length may reach up to 65% of a rest muscle-tendonlength. The muscle-tendon length may be in a range of 1 to 65% of therest muscle-tendon length, or in a range of 3 to 55% of the restmuscle-tendon length, or in a range of 5% to 50% of the restmuscle-tendon length.

The muscle may be shortened during the muscle contraction up to 60% of aresting muscle length. The muscle shortening may be in a range of 0.1%to 50% of the resting muscle length, or in the range of 0.5% to 40% ofthe resting muscle length, or in the range of 1% to 25% of the restingmuscle length.

The muscle may shorten at a velocity of up to 10 cm/s. The muscleshortening velocity may be in a range of 0.1 cm/s to 7.5 cm/s, or in therange of 0.2 cm/s to 5 cm/s, or in the range of 0.5 cm/s to 3 cm/s.

A time-varying magnetic field may be applied to the patient in order tocause a muscle shaping effect by muscle contraction. The muscle mayobtain increased tonus and/or volume. Strength of the muscle mayincrease as well.

Regarding the types of combined treatment by RF treatment and magnetictreatment, the treatment device may be configured to provide differenttreatment energies (e.g. RF field and magnetic field) in various timeperiods during one treatment session. The user may control or adjust thetreatment through the HMI. HMI may be coupled to master unit and/or oneor more control units. Also, the master unit and/or control unit maycontrol or adjust application of different treatment energies accordingto treatment protocol, body area or another option selected by the user.In addition, the master unit and/or control unit may control or adjustapplication of different treatment energies according to feedbackprovided by any sensor mentioned above. Therefore, master unit and/orone or more control units may control or adjust the treatment andproviding of treatment energies (e.g. RF treatment and magnetictreatment) in various time periods during one treatment session. Allshown types of applications of magnetic treatment and RF treatment maybe provided by treatment device.

One type of combined application of magnetic treatment with RF treatmentmay be simultaneous application. During simultaneous application bothmagnetic treatment and RF treatment may applied in same time duringwhole or most of treatment session. In one example, simultaneousapplication may be achieved by application of one or more sections ofmagnetic field with application of continuous RF field. In some aspects,pulsed magnetic treatment may be applied during continual RF treatment.In still another example, simultaneous application may be achieved bycontinual application of RF treatment together with e.g. one, or twolong train of magnetic pulses. In such case, long train of magneticpulses should include magnetic pulses having repetition rate of valuesin range of 1 Hz to 15 Hz or 1 Hz to 10 Hz. When only one or two longmagnetic trains are used for the whole treatment session, train durationof such trains may be in the range of 5 s to 90 minutes or 10 s to 80minutes or 15 minutes to 45 minutes.

Muscle contraction caused by the time-varying magnetic field with orduring simultaneous RF treatment may include more affected musclefibres. Also, the targeted biological structure (e.g. muscle) may bemore contracted with applied lower magnetic flux density of magneticfield as compared to situation without simultaneous RF treatment.

Simultaneous application of the RF treatment and the magnetic treatmentinto the same body area may improve dissipation of heat created by theRF treatment. This effect is based on increased blood circulation intreated body area or vicinity of treated area. Also, induced muscle workmay improve homogeneity of heating and dissipation of heat induced andprovided by RF field.

Further, the simultaneous application of the RF treatment and themagnetic treatment into the same body area may be used for treatmentwith blood restriction of the muscle and/or body area. In this example,the magnetic field may keep the body area and/or its surrounding areacontracted and limit the blood flow into the body area. By providingheating, the muscle with constricted blood flow may be better preparedfor regeneration.

Another type of combined application of magnetic treatment with RFtreatment may be separate application. During separate application bothmagnetic treatment and RF treatment may applied in different time duringtreatment session. RF treatment may be provided before, after, and/orbetween magnetic envelopes, bursts, trains, pulses and/or impulses ofmagnetic treatment.

The ratio between a time when the magnetic treatment is applied and atime when the RF treatment is applied may be in a range of 0.2% to 80%,or 2% to 60%, or 5% to 50%, or 20% to 60%. The time of applied magnetictreatment for this calculation is the sum of all pulse durations duringthe treatment.

Another type of combined application of magnetic treatment with RFtreatment may be dependent application. Application of one treatmentenergy may be dependent on start or one or more treatment parameter ofanother treatment energy. Dependent application may be started orregulated according to feedback from one or more sensor. For example,start of application of RF treatment may be dependent on start ofmagnetic treatment or start of train, burst and/or envelope. When thethermal dissipation provided by a muscle work (including musclecontraction and/or relaxation) is not provided, health risk of unwantedtissue damage caused by overheating may occur. In some aspects, start ofapplication of magnetic treatment may be dependent on the start, timeduration or intensity of RF treatment. The magnetic treatment maypreferably start after the biological structure is sufficiently heated.The magnetic treatment providing at least partial muscle contraction ormuscle contraction may improve blood and lymph flow, provide massage ofthe adjacent tissues and provides better redistribution of the heatinduced in the patient's body by the RF treatment.

The device and method may include a combination of magnetic field andmechanical treatment. The device and method may include differentcombinations of radiofrequency treatment and mechanical treatment.

The device and method may provide a combination of magnetic treatment,radiofrequency treatment, and mechanical treatment. The device andmethod may include applying a combination of magnetic treatment,radiofrequency treatment and mechanical treatment to a body area. Thedevice may include an applicator that is configured to provide magnetictreatment, radiofrequency treatment and mechanical treatment to a bodyand/or body area. Also, the treatment device may include a main unithousing the electrical elements configured to provide magnetictreatment, radiofrequency treatment and mechanical treatment to a bodyand/or body area.

Combined application of mechanical treatment with magnetic treatmentand/or radiofrequency treatment may prevent possible drawbacks ofmechanical treatment alone, such as a risk of panniculitis, destructionof untargeted tissues, and/or non-homogenous results by providing musclecontraction and/or heating.

The treatment device may include one or more applicators, wherein eachapplicator may include its own casing. One applicator may include one ormore magnetic field generating devices, one or more RF electrodes,and/or one or more pressure outlets. One applicator may include one ormore magnetic field generating devices, one or more RF electrodes, oneor more pressure outlets, and/or one or more ultrasound transducers. Inone example, one applicator may include one magnetic field generatingdevice, two RF electrodes, and one pressure outlet.

In some aspects, the mechanical treatment may include pressuretreatment. The pressure treatment may include positive pressuretreatment and/or negative pressure treatment to the body and/or bodyarea. The positive pressure treatment may include application ofmechanical impulses (e.g. positive pressure impulses) with an amplitudeof intensity, wherein the mechanical impulses are applied as fluidpulses from the compressor to the tissue. The negative pressuretreatment may include providing mechanical impulses (e.g. negativepressure impulses) by drawing out fluid from the adjacent area of thetissue by the action of the compressor. The mechanical treatment mayalso include constriction. More than one type of mechanical treatmentmay be applied at the same time during the treatment session. Themechanical treatment may include providing of one or more mechanicalimpulses (e.g. pressure impulses) to the body and/or body area.

The pressure treatment may be provided to the same body area that istreated by magnetic treatment and/or radiofrequency treatment during thetreatment session. The pressure treatment may be provided to any tissuewithin the body area, for example skin, epidermis, dermis and/orhypodermis. For example, the positive pressure treatment may be providedto skin (comprising epidermis, dermis and/or hypodermis). The pressuretreatment may comprise massage, kneading and/or friction of the tissue,e.g. skin. Further, the pressure treatment may comprise a vibration tothe tissue.

The positive pressure treatment and/or negative pressure treatment maybe used for massage of the body area, providing pressure waves, skinimprovement, and/or treatment of cellulite. The positive pressuretreatment and/or negative pressure treatment may also providedestruction of fat globuli and/or fibrous septa. The positive pressuretreatment may provide improvement of treatment by RF waves, since thepositive pressure treatment may improve homogenization of heating in thebody area and/or on the surface of the body area. The positive pressuretreatment may include providing positive pressure impulses to the bodyof the patient, body area of the patient, skin of the patient, and/orskin of the body area. The positive pressure treatment and/or negativepressure treatment may not heat the body of the patient.

Further, the pressure treatment may provide cooling to the tissue and/orbody area. When combined with magnetic treatment, the pressure treatment(e.g. positive pressure treatment) may provide more comfortable musclecontractions such that the patient perceives the muscle contraction tobe less intense.

The elements needed for generation of pressure treatment may include asilencer, one or more filters, a compressor, one or more valves, acondensate separator, an air pressure tank, and coupling elements asdescribed in further detail herein. It should be understood that not allelements shown in relation to pressure treatment are electricalelements, since not all of them must be powered by electricity. Forexample, the silencer may not be powered by electricity.

FIG. 56 a illustrates an exemplary schema 500 of a circuit of electricalelements needed for generation of positive pressure treatment and/ornegative pressure treatment. The circuit may include a compressor 561and a pressure outlet 600. The pressure outlet 600 may be part of theapplicator 800.

FIG. 56 b illustrates an exemplary schema 500 of a circuit of elementsneeded for generation of a positive pressure treatment. In thisexemplary schema, the circuit may include one or more of followingelements: a silencing filter 560, a compressor 561, a pressure releasevalve 562, a non-return valve 563, a condensate separator 564, a fluidpressure tank 565, a sensor 566, a circuit safety valve 567, anapplicator valve 568, a valve control unit 569, and a pressure outlet600. The applicator valve 568, valve control unit 569 and pressureoutlet 600 may be parts of the applicator 800. The silencing filter 560and the condensate separator 564 may be parts of the compressor 561.

FIG. 56 c illustrates another exemplary schema 500 of a circuit ofelements needed for generation of a positive pressure treatment. FIG. 56c is similar to the schema 500 of FIG. 56 b , but the non-return valve563 follows, i.e., is downstream of, the condensate separator 564.

FIG. 56 d illustrates another exemplary schema 500 of a circuit ofelements needed for generation of a positive pressure treatment. FIG. 56d is similar to the schema 500 of FIG. 56 c , but the pressure releasevalve 562 is omitted. For example, this architecture may be possible,when the compressor 561 includes a brushless DC electrical motor.

FIG. 56 e illustrates an exemplary schema 500 of a circuit of elementsneeded for generation of a negative pressure treatment. This circuit mayinclude one or more applicators 800 including the valve control unit569, the applicator valve 568 and the pressure outlet 600. In the caseof negative pressure treatment, the pressure outlet 600 may providenegative pressure treatment by drawing the fluid (e.g. air) possiblytogether with the tissue to form a protrusion on the tissue below theapplicator 800. The direction of the fluid in the compressor 561 isreversed as compared to FIGS. 56 b-56 d . The compressor 561 may includeor may act as vacuum pump, evacuating the fluid from the pressure outlet600. When the pressure outlet 600 evacuates the fluid from the pressureoutlet 600, it provides the negative pressure impulses. Since the fluidis evacuated into the device, the frequency of the negative pressureimpulses may influence internal parts of the device. The fluid pressuretank 565 may act as a damper of frequency and/or negative pressureimpulse within the device, in order to protect the compressor 561. Thefluid pressure tank 565 may also damp the amplitude of negative pressurecoming into the device. The fluid pressure tank 565 may or may not bepresent.

The device may include a circuit or combination of circuits thatincludes a combination of a magnetic and RF circuits with a pressuretreatment circuit. For example, a device may include one or moreindividual exemplary circuits and/or electrical elements as shownrespectively any of FIGS. 56 a, 56 b, 56 c and 56 c providing positivepressure treatment and/or FIG. 56 e providing negative pressuretreatment and a circuit and/or electrical elements shown any of FIGS.17, 18 a-18 i, 54 i-54 j and 54 l-54 n. The circuit including the RF,magnetic and pressure treatment circuits and/or electrical elements maybe controlled by one control system a control unit, wherein the controlunit may include a microprocessor. The circuit and/or electricalelements from those Figures may cooperate during providing thetreatment, as commanded by the control system and or one or moresuitable sensors mentioned.

FIG. 56 f illustrates an exemplary schema 180 of a combination ofcircuits of electrical elements for providing magnetic treatment,radiofrequency treatment and positive pressure treatment. Compressor isshown to be connected and powered by the power source for RF treatment.However, the compressor may be directly connected to and powered by thepower network. The circuit of elements needed for positive pressuretreatment may be replaced by any circuit shown on FIG. 56 a -56 e.

With respect to schema 500 of a circuit of elements needed forgeneration of a pressure treatment, the silencing filter 560 isconfigured to silence the compressor 561 and/or to remove unwantedand/or solid particles from the fluid to be compressed by the compressor561. The function of the silencing filter 560 may be divided into twoelements (e.g. a silencer and a fluid filter), which may be also presentin the circuit of the positive pressure treatment. The silencing filter560, fluid filter, and/or silencer may be part of the compressor 561.

The compressor 561 may comprise a fluid compressor. The compressor 561may comprise an element providing compressed fluid (e.g., air) to theapplicator 800. Also, the direction of the fluid may be reversed, so thecompressor 561 may pull the fluid from the applicator 800 and the tissuemay be pulled to the pressure outlet 600 and/or to the vicinity of theapplicator 800. The compressor 561 may comprise an air compressorproviding compressed air. The compressor 561 may comprise a pump and/orone or more pistons. For example, the compressor 561 may includeplurality (e.g. two) pistons. The compressor 561 may be positioned inthe main unit of the device. The compressor 561 may be positioned in thebottom part of the main unit due to vibration and water condensationrelated to compressing fluid (e.g. air). The compressor 561 may compressthe fluid continually or at predetermined intervals as controlled by thecontrol system. In order to prevent vibrations, the compressor 561 maybe positioned within the main unit and may be isolated by a bushing,e.g., a vibration isolator. For example, the compressor 561 may beisolated from the rest of the main unit by synthetic rubber and/orpolyurethane. The compressor may comprise a motor, for example DCelectric motor, AC electric motor, or brushless DC electric motor. Thecompressor may include its own control unit, which may be connected toand/or controlled by the control unit. The control of the compressor maybe part of the control system. The compressor may have a flow rate in arange of 2 litres per minutes to 300 litres per minute, or 4 litres perminute to 200 litres per minutes, or 5 litres per minute to 150 litersper minute, wherein the flow rate is at 6 bar. The power of thecompressor may be in a range of 100 W to 1500 W, 150 W to 1350 W, or 200W to 1000 W.

The pressure release valve 562 may be configured to balance the pressureof the fluid within the circuit. The pressure release valve 562positioned between the compressor 561 and the condensate separator 564may be controlled by the control system according to the pressure in thefluid pressure tank 565. The presence of pressure release valve 562 inthe circuit 500 may also lead to energy savings. When the compressor 561provides compressed fluid to the fluid pressure tank 565, the pressureof the fluid in the circuit part between the compressor 561 and fluidpressure tank 565 remains high. However, when the fluid pressure tank565 includes fluid with sufficient pressure, the compressor 561 may bestopped or set on low power operation. During this operation of thecompressor 561, the pressure release valve 562 may decrease the pressureof the fluid in the part of the circuit between the compressor 561 andthe fluid pressure tank 565. When the compressor 561 then shifts to highpower operation, it may need a lower amount of energy to compress fluidin the part of the circuit having lower pressure.

The non-return valve 563 may allow fluid to flow through it in only onedirection.

The condensate separator 564 may be configured for further filtration ofthe fluid. The condensate separator 564 may be configured to separatemoisture originating from pressurizing the fluid and/or decreasing thepressure in the circuit.

The fluid pressure tank 565 may be configured to store the fluid and toprovide fluid under pressure to the circuit, e.g. in the direction ofthe pressure outlet 600. The fluid pressure tank 565 may be an airpressure tank configured to store the air and provide air under pressureto the circuit, e.g. in the direction of the pressure outlet 600. Thefluid pressure tank 565 is configured to be filled by compressed fluidby the compressor 561. The fluid pressure tank 565 may include a tankpressure sensor and a tank safety valve. When the fluid in the fluidpressure tank 565 has a pressure above a safe value, the tank pressuresensor may detect it, provide information to the control system, and thecontrol system may control the tank safety valve to open and decreasepressure inside the fluid pressure tank 565. The fluid pressure tank 565may be configured to withstand the pressure of the fluid in a range of0.5 bar to 150 bar, 1 bar to 100 bar or 1 bar to 80 bar.

The sensor 566 may communicate with and provide feedback to a controlunit of pressure treatment, which may be part of the control systemand/or may comprise a microprocessor. The control unit of pressuretreatment may be controlled by the master unit. The sensor 566 maydetect pressure of the fluid, duration of mechanical impulse (e.g.pressure impulse), repetition rate of the pressure impulse, or intensityof pressure impulse.

The circuit safety valve 567 may be configured to balance the pressureof the fluid within the circuit. The circuit safety valve 567 may beopened and lower the pressure of the fluid within the circuit in case ofpower loss, change of settings and/or change between the treatmentprotocols. The circuit safety valve 567 may include a regulation valveto prevent complete loss of pressure from the circuit.

As shown in FIGS. 56 b-56 e , the circuit may be divided into aplurality of branches. FIG. 56 b-56 e show examples in which the circuit500 is divided into two branches leading to two applicators. In oneexample, the pressure of the fluid in both branches may be identical orwithin a deviation in a range of 0.01% to 10%, 0.1% to 5%, or 0.1% to3%. In some aspects, the pressure of the fluid in the first applicator800 in the first branch may be different than the pressure of the fluidin the second applicator 800 in the second branch. Such division may beprovided by a dividing pressure element, e.g. a proportional valvecontrolled by the control system.

The applicator valve 568 may be configured to provide control of thepressurized fluid to the pressure outlet 600. The applicator valve 568may include or may be adjacent to the applicator pressure sensormeasuring pressure of the fluid flowing to the pressure outlet 600,wherein the applicator pressure sensor may be located within theapplicator and/or the connecting tube. The applicator valve 568 may beconfigured to provide pressure treatment to the patient. The applicatorvalve 568 may be configured to provide pressure treatment to the bodyarea. The applicator valve 568 may be positioned in the applicator 800.In this configuration, when the pressure impulse is created by openingof the applicator valve 568, the amplitude of the pressure impulse isefficient enough to provide the pressure treatment. In comparison, whenthe applicator valve 568 is positioned in the main unit, the loss ofpower of pressure impulse would be significant. Further, when thecontrol system controls the operation of the application valve 568, thedifferent parameters of the pressure treatment may be influenced. Forexample, by controlling the speed of opening of the applicator valve,the repetition rate of the pressure impulses may be influenced. Foranother example, by controlling the duration of opening of theapplicator valve, the impulse duration of the pressure impulse may beinfluenced. For yet another example, by controlling the opening based onthe pressure in the inner part of the applicator behind the applicatorvalve, the amplitude of the pressure impulse may be influenced.

The valve control unit 569 may be configured to control the applicatorvalve 568. The valve control unit 569 may include a microprocessor. Thevalve control unit 569 may communicate with, be controlled by and/or bea part of the control system. For example, the valve control unit 569may communicate with the master unit comprising a microprocessor, whichmay be positioned in the main unit of the device. The presence of anadditional control unit (i.e. valve control unit 569) for pressuretreatment within the applicator may provide faster control of thepressure treatment with the mechanical impulses without delay betweencommunication from the master unit directly to the applicator valves568. Furthermore, when the device uses multiple applicators (e.g. armapplicator or abdomen applicator), this additional control unit maystore information needed for identification of the applicator. When theapplicator is connected to the main unit, the master unit and/or controlsystem may start to communicate with this control unit positioned withinthe applicator and verify the type of the applicator. Furthermore, thecontrol unit positioned in the applicator may control and/or provideadditional control of the operation of one or more RF electrodes and/ormagnetic field generating devices.

The applicator valve 568, valve control unit 569 and pressure outlet 600may be positioned in the applicator 800. As shown in FIG. 56 b , thedevice may include two applicators 800, wherein each applicator 800includes one pressure outlet 600. However, the applicator 800 mayinclude more than one pressure outlet 600, for example, two or more.Also, one applicator 800 may include a number of applicator valves 568and/or valve control units 569 corresponding to the number of pressureoutlets 600. In some aspects, the applicator 800 may include only onevalve control unit 569 and/or applicator valve 568 with a plurality(e.g. two) of pressure outlets 600.

The pressure outlet 600 may comprise an element providing the positivepressure treatment or negative pressure treatment to the body of thepatient, body area, skin of body area and/or skin of patient's body. Thepressure outlet 600 may comprise a cavity or an orifice through whichthe pressurized fluid flows to or from the body of the patient and/orbody area. The pressure outlet 600 may be made from paramagnetic and/ordiamagnetic material. For example, the pressure outlet 600 may bemanufactured from a plastic material. The pressure outlet 600 mayinclude a tube through which the fluid is applied to or from the tissue.The tube may include a tapering section that tapers or narrows towardthe opening of the pressure outlet, so as to form a relatively smalldiameter opening relative to a diameter of a remainder of the tube.Alternatively, the tube may include an expansion section that widenstoward the opening of the pressure outlet, so as to form a relativelylarge diameter opening relative to a diameter of a remainder of thetube. The tapering section or expansion section may be positioned onand/or within the bottom cover of the applicator. The expansion sectionmay create a cavity, to which the tube enters. However, the expansionsection or tapering section may be part of the tube. The expansionsection may have a generally circular shape on the bottom cover, whereinthe circular shape of the expansion section may have a diameter in arange of 1 mm to 15 cm, 2 mm to 12 cm, or 5 mm to 10 cm. Further, theexpansion section and/or tapering section may be detachable andreplaceable. The pressure outlet may include a fluid directing elementconfigured to allow modification of the direction of the fluid flow.Such fluid direction element may include a solid element (e.g. fromplastic) having a shape of a spiral curve.

The element providing the positive or negative pressure within thepressure output may comprise a membrane. The membrane may oscillateaccording to pressure impulse applied to the inner side of the membrane,which is farther from the treated body area.

The pressure outlet may be configured to provide the pressure treatmentcomprising at least one of massage, pressure impulse and/or vibration.

The one or more pressure outlets 600 may be positioned in differentpositions on the applicator 800. For example, the one or more pressureoutlets 600 may be positioned in the center of the applicator 800. Insome aspects, the one or more pressure outlets 600 may be positioned inthe center of the magnetic field generating device. In yet anotherexample, the one or more pressure outlets 600 may be positioned on thesides of the applicator 800. In yet another example, the one or morepressure outlets 600 may be positioned on the sides of the magneticfield generating device and/or RF electrode.

FIG. 57 a shows a longitudinal cross sectional view of the applicator800 with the pressure outlet 600 positioned in the center of theapplicator 800. The exemplary applicator 800 is shown with two magneticfield generating devices 900 and two RF electrodes 101, wherein both RFelectrode 101 are positioned between the magnetic field generatingdevice 900 and the tissue 601 of the patient. When the pressure outlet600 is positioned in the center of the applicator, the positive ornegative pressure may be applied to the center of the same spot on thebody area, where the muscle contraction by magnetic treatment andheating by radiofrequency treatment is provided.

FIG. 57 b shows a transverse cross sectional view of the applicator 800with the pressure outlet 600 positioned in the center of the applicator800. The exemplary applicator 800 is shown with two magnetic fieldgenerating devices 900 and two RF electrodes 101. When the pressureoutlet 600 is positioned in the center of the applicator and next to themagnetic field generating device 900, the pressure outlet 600 providespressure treatment to the body region directly below the magnetic fieldgenerating device 900.

FIG. 57 c shows a longitudinal cross sectional view of the applicator800 with the pressure outlet 600 positioned in the center of themagnetic field generating device 900. The exemplary applicator 800 isshown with one magnetic field generating device 900 and two RFelectrodes 101, wherein both RF electrodes 101 are positioned betweenthe magnetic field generating device 900 and the tissue 601 of thepatient. The pressure outlet 600 may be surrounded by the magnetic fieldgenerating device 900 of the applicator 800. When the pressure outlet600 is positioned in the center of the magnetic field generating device,the positive or negative pressure is as close as possible to the samespot on the body area, where the muscle contraction by magnetictreatment and heating by radiofrequency treatment is provided.

FIG. 57 d shows a transverse cross sectional view of the applicator 800with the pressure outlet 600 positioned in the center of the magneticfield generating device 900. The exemplary applicator 800 is shown withone magnetic field generating device 900 and two RF electrodes 101. Thepressure outlet 600 may be positioned in a center of the gap 906 of themagnetic field generating device 900, where no winding of the magneticfield generating device 900 may be present. When the pressure outlet 600is positioned in the center of the applicator, the positive or negativepressure may be applied to the center of the same spot on the body area,where the muscle contraction by magnetic treatment and heating byradiofrequency treatment is provided.

FIG. 57 e shows a transverse cross sectional view of the applicator 800with pressure outlets 600 positioned on the sides of the applicator 800.The exemplary applicator 800 is shown with one magnetic field generatingdevice 900 and two RF electrodes 101. When the pressure outlets 600 arepositioned on the sides of the applicator, the applied positive ornegative pressure may provide additional cooling of the tissue from thesides. Also, when the pressure outlets 600 are positioned on the sidesof the applicator 800, the pressure outlets 600 are not influenced bythe magnetic field generating device 900, at they may be influenced whenpositioned closer to the magnetic field generating device 900.

FIG. 57 f shows a transverse cross sectional view of the applicator 800with pressure outlets 600 positioned on the sides of the magnetic fieldgenerating device 900. The exemplary applicator 800 is shown with onemagnetic field generating device 900 and two RF electrodes 101. When thepressure outlets 600 are positioned on the sides of the magnetic fieldgenerating device 900, the applied positive or negative pressure mayprovide different temperature reception. As shown in FIG. 57 f , the RFelectrode provides heating, and the pressure outlets 600 positioned indifferent positions provide pressure treatment.

FIG. 57 g shows a transverse cross sectional view of the applicator 800with the pressure outlet 600 positioned on the sides of the RFelectrodes 101. The exemplary applicator 800 is shown with one magneticfield generating device 900 and two RF electrodes 101. When the pressureoutlets 600 are positioned on the sides of the RF electrodes, theapplied positive or negative pressure may also provide differenttemperature reception. As shown in FIG. 57 g , the RF electrode providesheating, and the pressure outlets 600 positioned in different positionsclose to the RF electrodes provide pressure treatment.

The presence of one or more pressure outlets and delivery of positiveand/or negative pressure to the skin of the body area may influence theoperation of the temperature sensor present on the applicator of thetreatment device. Accordingly, the applicator may include a rim close toand/or around the opening of the pressure outlet on the applicatorsurface close to the body of the patient. The rim may at least partiallysurround the pressure outlet or it may surround the whole pressureoutlet. The rim may also provide recess to the tissue patient, providingthe space for application of the mechanical impulses. When the rimprovides the recess on the surface of the tissue, the mechanicalimpulses are perceived to be more intensive by the treated patient.

FIG. 58 a illustrates a longitudinal cross sectional view of anexemplary applicator 800 that includes one magnetic field generatingdevice 900, two RF electrodes 101, a pressure outlet 600, and atemperature sensor 816. The applicator 800 further includes a rim 602,which is positioned adjacent to the pressure outlet 600 on the bottomcover 517 of the applicator 800 in order to block the flow of thepressurized fluid in the direction of the part of the bottom cover 517of the applicator 800 below the temperature sensor 816.

FIG. 58 b shows a bottom view of the applicator 800 with the pressureoutlet 600 and rim 602. The area 603 represents the surface of theapplicator 800 below the temperature sensor 816. The rim 602 ispositioned to stop the flow of the pressurized fluid from the pressureoutlet 600 in the direction of the surface 603.

As mentioned and further shown in a transverse cross sectional view ofan applicator 800 in FIG. 59 , the applicator 800 may have more than onepressure outlet 600 in the center of the magnetic field generatingdevice 900. The delivery of the pressurized fluid by the plurality ofpressure outlets 600 may be controlled by the control system. Forexample, the control may include delivery of the pressurized fluid fromonly one pressure outlet 600 of the plurality of pressure outlets 600.In some aspects, the activation of the pressure outlets 600 may follow aclockwise or counter-clockwise pattern.

The repetition rate of pressure impulses may be in a range of 0.1 Hz to2000 Hz, 0.2 Hz to 1000 Hz, 0.25 Hz to 500 Hz, 0.3 Hz to 250 Hz, or 0.5Hz to 100 Hz. The positive pressure and/or negative pressure of thefluid in the pressure outlet 600 may be in a range of 0.01 bar to 50bar, 0.05 bar to 25 bar, 0.05 bar to 10 bar, or 0.05 bar to 6 bar,wherein 1 bar equals 100,000 Pascals. The pressure within the circuit ofelectrical elements needed for generation of positive pressure treatmentand/or negative pressure treatment may be in a range of 0.01 bar to 80bar, 0.05 bar to 50 bar, 0.05 bar to 25 bar, or 0.05 bar to 15 bar. Thepressure within the circuit may be measured by a pressure sensorpositioned within the circuit, e.g. in the fluid pressure tank. Theduration of pressure impulse may be in a range of or 0.1 ms to 1000 ms,0.2 ms to 250 ms, or 1 ms to 150 ms. The flow rate of the pressureimpulse, referred also as amplitude of pressure impulse, may be in arange of 0.1 liters per minute to 200 liters per minute, 0.25 liters perminute to 150 liters per minute, or 0.5 liters per minute to 100 litersper minute, as measured in the pressure outlet in the plane of thebottom cover of the applicator. The pressure impulse may provide apressure wave having a velocity of about 340 meters per second. All ofthese parameters may be controlled by the control system of the device,e.g., using feedback from one or more sensors as mentioned herein and/orby the human machine interface (HMI) comprising the display. All ofthese parameters of the pressure treatment may be modulated by thecontrol unit and/or by the HMI during treatment.

The mechanical treatment may include providing acoustic and/orultrasound energy to the body and/or body area.

The ultrasound energy may be generated by one or more ultrasoundsources. The ultrasound source may include an ultrasound transducer. Theultrasound transducer may include a piezoelectric transducer and/orcapacitive transducer. The one or more ultrasound transducers may belocated in the main unit and/or the applicator. The one or moreultrasound transducers may be connected to the power network throughelectrical elements present in the main unit and/or applicator of thedevice.

The ultrasound treatment may be used for massage of the body area, skinimprovement, and/or treatment of cellulite. The ultrasound treatment mayalso provide destruction of fat globuli and/or fibrous septa. Theultrasound may not heat the body of the patient. The ultrasoundtreatment may also provide improvement of treatment by RF waves, sincethe ultrasound treatment may improve homogenization of heating in thebody area and/or on the surface of the body area. The ultrasoundtreatment may include applying ultrasound impulses to the body of thepatient, body area of the patient, skin of the patient and/or skin ofthe body area. The one or more ultrasound transducers may be positionedbetween a bottom cover of the applicator and the magnetic fieldgenerating device. Also, the one or more ultrasound transducers may bepositioned next to and/or above the magnetic field generating device.The one or more ultrasound transducers may be positioned between thebody of the patient and magnetic field generating device.

A plurality of ultrasound transducers may be controlled by the controlsystem to provide ultrasound energy. The plurality of ultrasoundtransducers may provide the ultrasound energy at the same time or atdifferent times. Also, the two or more ultrasound transducers may becontrolled to provide ultrasound energy in such manner, that one or morestanding waves and/or resonance of the ultrasound energy may providevariation in the ultrasound energy perception.

FIG. 60 a illustrates a transverse cross sectional view of an exemplaryapplicator 800 that includes one magnetic field generating device 900and a plurality of ultrasound transducers 604. The ultrasoundtransducers 604 may be positioned around the magnetic field generatingdevice 900.

FIG. 60 b illustrates a transverse cross sectional view of anotherexemplary applicator 800 that includes one magnetic field generatingdevice 900 and a plurality of ultrasound transducers 604, wherein theplurality of ultrasound transducers 604 is located in and/or on thesurface of a vibration element 605, such as a vibration plate. When theplurality of ultrasound transducers 604 are active, the ultrasoundenergy may also generate vibrations, which are then transferred throughthe vibration element 605 to the patient's body and/or body area.

FIG. 60 c illustrates a transverse cross sectional view of anotherexemplary applicator 800 that includes a vibration element 605. The oneor more ultrasound transducers 604 are located in and/or on the surfaceof a vibration element 605. The vibration element 605 or a part of thevibration element 605 may be located between a bottom cover of theapplicator 800 and the magnetic field generating device. Also, thevibration element 605 may be positioned next to and/or above themagnetic field generating device. The vibration element 605 may bepositioned between the body of the patient and the magnetic fieldgenerating device.

Regarding the examples shown in FIGS. 60 b and 60 c , the one or moreultrasound transducers 604 may be located in the vicinity of thevibration element 605, but not in and/or on the vibration element 605.

The vibration element may include a material having a different acousticimpedance than the rest of the applicator, e.g., the casing of theapplicator and/or electrical elements of the applicator. Therefore, thevibration element may be influenced by one or more ultrasoundtransducers to a greater extent than the rest of the applicator. Thevibration material may include a metal or plastic material.

FIG. 60 d illustrates a transverse cross sectional view of an exemplaryapplicator 800 including a plurality of ultrasound transducers 604 andreflecting elements 606. The reflecting elements 606 are shown to beconnected to the ultrasound transducers 604. One reflecting element 606may be located within or on the surface of the applicator 800. Theultrasound energy provided by the ultrasound transducers 604 may bereflected by reflecting element 606 in one direction or in more than onedirection. The reflected ultrasound energy, together with thenon-reflected ultrasound energy may be applied to the patient.

FIG. 60 e illustrates a cross sectional view of an exemplary applicator800 that includes a plurality of ultrasound transducers 604 andreflecting elements 606. The reflecting elements 606 are shown to have apyramidal shape, but may have different shapes. The reflecting elementmay comprise a plastic material.

The ultrasound energy may be in a range of 100 Hz to 5 GHz, 500 Hz to500 MHz, or 800 Hz to 100 MHz. Energy flux provided by ultrasound energymay be in a range of 0.001 W·cm⁻² to 500 W·cm⁻² or 0.005 W·cm⁻² to 350W·cm⁻² or 0.05 W·cm⁻² to 250 W·cm⁻².

The mechanical treatment may include providing mechanical energy to thebody and/or body area by a mechanical element. The mechanical elementmay include a roller. The mechanical element may include a pneumaticmassager, e.g. shockwave generator. The mechanical element may bepositioned within the applicator and/or on the surface of theapplicator. The mechanical element may include a constriction strapand/or constriction cuff. The mechanical element may be part of thetreatment device. The mechanical element may be an integral part of theapplicator. However, the constriction strap and/or constriction cuff maybe a separate part that is added to or secured to the applicator duringthe treatment. In the case the mechanical element is a constrictionstrap or a constriction cuff, the applicator of the device still mayinclude the combinations of magnetic treatment, radiofrequency treatmentand mechanical treatment (e.g. pressure treatment, negative pressuretreatment and/or ultrasound treatment).

The mechanical element may provide constriction by its own weight and/oruse. For example, the constriction strap or constriction cuff mayprovide pressure by securing it around the body. For another example,the constriction strap or constriction cuff may provide pressure bysecuring the one or more applicators to the body, together with thebelt. For another example, the belt used for coupling the applicator tothe body may provide the mechanical treatment, when it is properlysecured with high intensity.

The mechanical element may provide the mechanical treatment comprisingthe constriction of the body, part of a treated body area, treated bodyarea and/or one or more parts of the body surrounding the treated bodyarea, wherein the treated area may include a body area under treatmentby magnetic, radiofrequency and/or mechanical treatment.

The constriction provided by the mechanical element (e.g. constrictionstrap or constriction cuff) may provide blood flow restriction, whichmay lead to enhanced muscle growth as provided by the magnetic treatmentduring or after the treatment session. Further, the blood flowrestriction may lead to enhanced effects of heating provided by theradiofrequency treatment during or after the treatment session.

The mechanical element (e.g. constriction strap or constriction cuff)may be positioned before and/or during the magnetic, radiofrequencyand/or mechanical treatment. The mechanical element may be positioned ondifferent parts of the body. Also, the mechanical element may provideblood restriction in different parts of body. For example, in case oftreatment of the arm, the mechanical element may provide bloodrestriction in the upper part of the arm about 5 cm to 15 cm below theshoulder joint. For another example, in case of treatment of the thigh,the mechanical element may provide blood restriction at the level ofgluteal fold and/or about 5 cm to 15 cm below the gluteal fold. Foranother example, in case of treatment of the calf, the mechanicalelement may provide blood restriction below the knee about 5 cm to 15 cmbelow the fossa poplitea.

The constriction provided by the mechanical element (e.g. constrictionstrap or constriction cuff) may restrict blood flow in one or morearteries or veins. Also, the constriction provided the mechanicalelement may provide enhancement of muscle growth for one or moremuscles. For example, in case of treatment of the arm, the mechanicalelement may restrict blood flow in the brachial artery and/or provideenhancement of muscle growth for biceps brachii and/or triceps brachii.For another example, in case of treatment of the thigh, the mechanicalelement may restrict blood flow in the femoral artery and/or provideenhancement of muscle growth for musculi femoris, hamstring muscles inthe back of the thigh, the quadriceps muscles in the front of the thighand/or the adductor muscles on the inside of the thigh. For anotherexample, in case of treatment of the calf, the mechanical element mayrestrict blood flow in the fibular artery and/or provide enhancement ofmuscle growth for triceps surae muscle, soleus muscle, and/orgastrocnemius muscle.

In some aspects, a device may use a combination of magnetic treatmentand mechanical treatment. In some aspects, the device may compriseelectrical elements configured to provide magnetic treatment andpositive pressure treatment. In some aspects, the device may comprise amain unit and one or more applicators. Further, the applicator may beconnected to the main unit by one or more connecting tubes.

In some aspects, the device may be configured to apply the magnetictreatment and mechanical treatment to the same body area during onetreatment session. In some aspects, the device may be configured toapply the magnetic treatment and mechanical treatment to different bodyareas during one treatment session.

The device may be configured to apply the magnetic impulses andmechanical impulses (e.g. positive pressure impulses). In some aspects,the device may be configured to apply the magnetic impulse at the sametime as mechanical impulse. In some aspects, the device may beconfigured to apply the magnetic impulse at a different time than themechanical impulse,

The treatment by combination of mechanical treatment and magnetictreatment may provide treatment of sexual dysfunction and/or rectaldysfunction. The magnetic treatment may be configured to provide musclecontraction to the muscle within the body area. The mechanical treatmentmay be configured to provide massage of the tissue within the body area,stimulation of nerve within the body area, stimulation of muscle withinthe body area, increase of the blood flow within the body area and/orincrease of angiogenesis within the body area.

The combination of mechanical treatment and magnetic treatment may beapplied to the body area comprising perineum, buttocks and/or genitals.

FIG. 68 illustrates an exemplary schema 181 of a combination of circuitsof electrical elements for providing magnetic treatment and positivepressure treatment. In some aspects, the applicator may comprise anapplicator valve, pressure outlet and magnetic field generating device.In some aspects, the remaining electrical elements may be positionedwithin the main unit and/or the connecting tube.

The device may be configured to deliver positive pressure impulses tothe body of the patient, e.g. skin of the patient. The positive pressureimpulses may comprise impulses of air delivery. The device may comprisea temperature changing element configured to change the temperature ofthe air before delivery to the body of the patient. The temperaturechanging element may be a heater configured to heat of the air beforedelivery to the body of the patient. The temperature changing elementmay be a cooler configured to cool of the air before delivery to thebody of the patient. In case of heating, the heater may be configured toheat the air may in a range of 1° C. to 50° C. or 1.5° C. to 30° C. or2° C. to 25° C. above the ambient temperature of 20° C. Further, theheater may be configured to heat the air may in a range of 20° C. to 60°C. or 21° C. to 50° C. or 21° C. to 48° C. The temperature changingelement may be positioned within the fluid pressure tank and/or anyother electrical element of the circuit for providing the positivepressure treatment.

FIGS. 69 a-69 d illustrate exemplary devices comprising an applicatorcomprising a patient support 830. The patient support 830 may be anapplicator connectable to the main unit, or the patient support 830 mayact as a main unit comprising also a control unit, a HMI, a powernetwork and/or connection to the power network. Further, when thepatient support 830 acts as the main unit, it may comprise all theelectrical elements for providing magnetic treatment and positivepressure. The patient support 830 may be a chair, bed or mattress.

FIG. 69 a illustrates the exemplary device comprising a patient support830, wherein the patient support 830 comprises a magnetic fieldgenerating device 900 and the pressure outlet 600. The pressure outlet600 may be positioned within the patient support 830.

FIG. 69 b illustrates the exemplary device comprising a patient support830, wherein the patient support 830 comprises a magnetic fieldgenerating device 900 and pressure outlet 600. The patient support 830may further comprise a bulge 831, the bulge 831 comprising the pressureoutlet 600. The bulge 831 may be made from flexible material, e.g.polymer, plastic and/or rubber. The bulge 831 may be the placed in aposition, where the patient is seated. The bulge 831 may be configuredto be positioned in the vicinity and/or in the contact to the perineumof the patient.

Since the magnetic field generating device may be fixed in position inlarge area of the patient support, the perception of treatment bymagnetic field may be different from treatment by smaller applicatorsshown on e.g. FIG. 8 a . For example, because of application of positivepressure impulses of the pressure treatment, the muscle contractionprovided magnetic treatment may be perceived by patient with lowerintensity and/or in different body areas than expected.

FIG. 69 c illustrates the exemplary device comprising a patient support830, wherein the patient support 830 comprises a magnetic fieldgenerating device 900, pressure outlet 600 within a bulge 831 and apositioning assembly 832 configured to provide movement to the pressureoutlet 600, which is shown to be moved to the side.

FIG. 69 d illustrates the exemplary device comprising a patient support830, wherein the patient support 830 comprises a magnetic fieldgenerating device 900, pressure outlet 600 within a bulge 831 and apositioning assembly 832 configured to provide movement to the magneticfield generating device 800, which is shown to be moved to the side.

In some aspects, positioning assembly may include one or more of railsand a motor. The magnetic field generating device and/or pressure outletmay be moved on the rails. In one configuration, the magnetic fieldgenerating device may be moved in one line, below the genitals, perineumand intergluteal cleft. The rails may be manufactured from polymer, toavoid influence of the magnetic field on metal rails.

In some aspects, the positioning assembly may be one or more hydraulicpistons. The pistons may comprise an oil.

In some aspects, the positioning assembly may be one or more airpistons. The air pistons may be controlled by the control system tooperate in cooperation with the fan of the applicator. For example, thefan may provide air to operate the piston. In some aspects, the fan maydisplace the air from the air piston.

In some aspects, a method of treatment by the exemplary devicecomprising the patient support may comprise positioning of the patientto the patient support and providing magnetic treatment and/or pressuretreatment. The patient may wear clothes during the treatment. Thepatient may be positioned such that the perineum is in contact with orin vicinity of the pressure outlet.

In some aspects, a method of treatment by the exemplary devicecomprising the patient support and the bulge may comprise positioning ofthe patient to the patient support and providing magnetic treatmentand/or pressure treatment. The patient may wear clothes during thetreatment. The patient may be positioned such that the perineum is incontact with or in vicinity of the bulge comprising the pressuretreatment. In aspects when the patient sits on the positioning support,the bulge may be at least partially immersed to the patient support.

In some aspects, a method of treatment by the exemplary devicecomprising the patient support, the bulge and the positioning assemblyconfigured to provide movement to the pressure outlet may comprisepositioning of the patient to the patient support and providing magnetictreatment and/or pressure treatment. The patient may wear clothes duringthe treatment. The patient may be positioned such that the perineum isin contact with or in vicinity of the bulge comprising the pressuretreatment. In aspects when the patient sits on the patient support, thebulge may be at least partially immersed to the patient support. Inaspects when the patient sits on the patient support, the position ofthe pressure outlet may be changed by the positioning assembly to keepthe pressure outlet as close as possible to the perineum.

In some aspects, a method of treatment by the exemplary devicecomprising the patient support, the bulge and the positioning assemblyconfigured to provide movement to the magnetic field generating devicemay comprise positioning of the patient to the patient support andproviding magnetic treatment and/or pressure treatment. The patient maywear clothes during the treatment. The patient may be positioned suchthat the perineum is in contact with or in vicinity of the bulgecomprising the pressure treatment. In aspects when the patient sits onthe patient support, the bulge may be at least partially immersed to thepatient support. In aspects when the patient sits on the patientsupport, the position of the magnetic field generating device may bechanged by the positioning assembly via HMI and/or control unit.

The control system including the microprocessor may control the deviceto provide different treatment protocols.

The treatment protocol may be divided into two or more treatmentsections. The number of treatment section may be in the range of 2 to50, or 2 to 30, or 2 to 15 for one protocol.

Each treatment section of the treatment protocol may include differenttreatment parameters and/or types of combined treatment of magnetictreatment and RF treatment as described above. Also, one or moretreatment sections of the treatment protocol may include predeterminedtreatment parameters of magnetic treatment, RF treatment, and/ormechanical treatment.

One treatment section may last for a section time, wherein section timemay be in a range of 10 s to 30 minutes, or 15 s to 25 minutes, or 20 sto 20 minutes. Different sections may have different treatment effectsin one or more treated biological structures, e.g., a muscle and adiposetissue. For example, one treatment section may provide high intensitymuscle exercise where muscle contractions are intensive and a highnumber of such contractions is provided, wherein a higher repetitionrate of magnetic pulses with high energy flux density may be used duringone treatment section. Another treatment section may have a musclerelaxation effect, wherein the low and/or the high repetition rate ofmagnetic pulses may be used and/or also lower magnetic flux density ofmagnetic field may be used.

Treatment protocol may include different setting of power output of RFtreatment, as commanded or controlled by control system of the treatmentdevice. One setting may be a constant power output, wherein the poweroutput during the treatment protocol may be same. Another setting may bean oscillating power output of RF treatment. The power output of RFtreatment may oscillate around predetermined value of power output in arange of 0.1% to 5% of predetermined power output. Still another settingmay be a varying power output of RF energy, wherein the power output ofRF treatment is varied during treatment protocol. The variation of poweroutput of RF treatment may be provided in one or more power outputvariation steps, wherein one power output variation step may include onechange of value of power output of RF treatment applied by one or moreRF electrodes. The change of power output of RF treatment from one valueto another value during power output variation step may be in the rangeof 0.1 W to 50 W, or 0.1 W to 30 W, or 0.1 W to 20 W. The power outputvariation step may have time duration in the range of 0.1 s to 10 min or0.1 s to 5 min.

Regarding the variation of power output of RF energy, the power outputof RF energy may have different values during different time period oftreatment protocol. Therefore, RF treatment may have different value ofpower output during first time period followed by power output variationstep followed by second time period having different value of poweroutput of RF treatment. The first time period having one value of poweroutput of RF treatment may be in a range of 1 s to 15 min or 10 s to 10min. The second time period having another value of power output of RFtreatment may be in a range of 1 s to 45 min or 4 s to 59 min or 5 s to35 min. For example, RF treatment may have value of power output about20 W during first time and 10 W during second time period.

First exemplary treatment protocol may include two treatment section.First treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 1 to 10 Hz. Envelopes of first treatment section may haverectangular or trapezoidal shape. Duration of first treatment sectionmay be from 3 minutes to 15 minutes. Second treatment section mayinclude envelopes of magnetic pulses, wherein the envelopes may includepulses having repetition rate in the range of 15 to 45 Hz. Envelopes ofsecond treatment section may have rectangular or trapezoidal shape.Duration of first treatment section may be from 3 minutes to 15 minutes.The treatment sections may be repeated one after another. The RFtreatment may be applied continuously during the whole treatmentprotocol. The RF treatment may include one or two power output variationsteps.

Second exemplary treatment protocol may include three treatment section.First treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 5 to 50 Hz. Envelopes of first treatment section may haverectangular or trapezoidal shape. Duration of first treatment sectionmay be from 3 minutes to 15 minutes. Second treatment section mayinclude envelopes of magnetic pulses, wherein the envelopes may includepulses having repetition rate in the range of 15 to 45 Hz. Envelopes ofsecond treatment section may have rectangular or trapezoidal shape.Duration of first treatment section may be from 3 minutes to 15 minutes.Third treatment section may include envelopes of magnetic pulses,wherein the envelopes may include pulses having repetition rate in therange of 10 to 40 Hz. Envelopes of third treatment section may haverectangular or trapezoidal shape. Duration of third treatment sectionmay be from 3 minutes to 15 minutes. The treatment sections may berepeated one after another. The RF treatment may be applied continuouslyduring the whole treatment protocol. The RF treatment may include one ortwo power output variation steps. The one power output variation stepmay be initiated in a range of 1 or 20 minutes after the start of thetreatment protocol. In one example, the one power output variation stepmay be initiated three minutes after the start of the treatmentprotocol.

The treatment protocol may include a combination of a magnetictreatment, an RF treatment, and a mechanical treatment. The treatmentsmay be applied simultaneously or sequentially. The specific type oftreatment selected may depend on a variety of factors including the ageof the patient and/or treated body part.

Treatment sections describing magnetic treatment parameters mentionedbelow are part of the protocols referred to as the magnetic treatmentprotocols, since they mostly discuss parameters of the magnetictreatment. Generally, the device may provide and/or control themodulation of duration of magnetic impulse, repetition rate of magneticimpulse and/or amplitude of magnetic field density of magnetic impulse,number of magnetic impulses in the magnetic train, duration of themagnetic train, number of magnetic impulses in the magnetic burst,duration of the magnetic burst and/or duration of a time period when notreatment effect is caused. The control of the modulation may beprovided by the control system and/or the human machine interface. Theexemplary magnetic treatment protocols may include one or more treatmentsections. During any treatment section, the repetition rate of magneticimpulses may be changed from a first value to a second value.

One or more treatment sections may comprise magnetic impulses having arepetition rate in a range of 5 Hz to 150 Hz. One or more treatmentsections may comprise one or more trains of magnetic impulses having anamplitude of magnetic flux density to form one or more trapezoidalenvelopes. The treatment section may comprise one train having magneticimpulses with one repetition rate, wherein the magnetic impulses haveamplitude of magnetic flux density to form one trapezoidal envelope,wherein the treatment section may comprise one or more of such trains.The trapezoidal envelope may comprise an increasing time period in arange of 0.1 s to 20 s, 0.15 s to 10 s, or 0.25 to 8 s. The trapezoidalenvelope may further comprise a hold time period in a range of 0.1 s to25 s, 0.15 s to 15 s, or 0.25 s to 10 s. The trapezoidal envelope mayfurther comprise a decreasing time period in a range of 0.1 s to 20 s,0.15 s to 10 s, or 0.25 to 8 s. The train of magnetic impulses may befollowed by the time period of no magnetic stimulation in a range of 1to 60 seconds. The treatment section may have a duration in a range of10 seconds to 5,000 seconds.

First exemplary treatment section of magnetic treatment protocolscomprises magnetic impulses having a repetition rate of 21 Hz to 40 Hz.Further, the first exemplary treatment section comprises one or moretrains of magnetic impulses having amplitude of magnetic flux density toform one or more trapezoidal envelopes, wherein the trapezoidal envelopecomprises increasing time period of 0.25 s to 1.5 s, hold time period of2 s to 5 s, and decrease time period of 0.5 s to 4 μs.

Second exemplary treatment section of magnetic treatment protocolscomprises magnetic impulses having repetition rate of 1 Hz to 20 Hz.Further, the second exemplary treatment section comprises one or moretrains of magnetic impulses having amplitude of magnetic flux density toform one or more trapezoidal envelopes, wherein the trapezoidal envelopecomprises increasing time period of 2 s to 8 s, hold time period of 1 sto 2 s, and decrease time period of 2 s to 8 μs.

Third exemplary treatment section of magnetic treatment protocolcomprises magnetic impulses having repetition rate of 25 Hz to 50 Hz.Further, the third exemplary treatment section comprises one or moretrains of magnetic impulses having an amplitude of magnetic flux densityto form one or more rectangular envelopes,

-   -   One or more magnetic treatment protocols may include one or more        described exemplary treatment sections of magnetic treatment        protocol.

Following exemplary protocols are referred as the radiofrequencytreatment protocols, since they mostly discuss parameters of theradiofrequency treatment. Generally, the device may provide and/orcontrol the modulation of duration of radiofrequency impulse, repetitionrate of radiofrequency impulse, and/or amplitude of intensity (e.g.power output) of radiofrequency impulse. The control of the modulationmay be provided by the control system and/or human machine interface.The exemplary radiofrequency treatment protocols may comprise one ormore treatment sections.

One or more exemplary radiofrequency treatment protocols, including theradiofrequency treatment may be applied in a continual manner during thetreatment session without changing the parameters set at the beginningof the treatment session.

One or more exemplary radiofrequency treatment protocols, including theradiofrequency treatment may be applied in a continual manner during thewhole treatment session with changing the parameters set at thebeginning of the treatment session.

One or more exemplary radiofrequency treatment protocols may be appliedat the same time or different time as the magnetic treatment providingthe muscle contraction. This configuration may lead to provide allbenefits as described within this application for combination ofmagnetic and radiofrequency treatment.

A first exemplary radiofrequency treatment protocol comprises twotreatment sections having different power output of the RF waves. Thefirst treatment section comprises RF waves having a power output in arange of 10 W to 50 W, and the second treatment section comprises RFwaves having a power output in a range of 2 W to 25 W, wherein the firstpower output is different from the second power output. Duration of thefirst treatment section may be in a range of 0.5 minute to 15 minutes,or 1 minute to 7 minutes. In one configuration applied for example tothe abdomen, the first power output is in a range of 20 W to 30 W, andthe second power output is in a range of 15 W to 30 W. In anotherconfiguration applied for example to the buttock, the first power outputis in a range of 15 W to 30 W, and the second power output is in a rangeof 12 W to 30 W. In still another configuration applied for example tothe calf, the first power output is in a range of 10 W to 30 W, and thesecond power output is in a range of 2 W to 30 W. In still anotherconfiguration applied for example to the arm, the first power output isin a range of 10 W to 30 W, and the second power output is in a range of5 W to 30 W. In still another configuration applied for example to theinner thigh, the first power output is in a range of 15 W to 30 W, andthe second power output is in a range of 5 W to 30 W. In still anotherconfiguration applied for example to the abdomen, the first power outputis in a range of 15 W to 30 W, and the second power output is in a rangeof 12 W to 30 W. In still another configuration applied for example to aback of the thigh and/or a front of the thigh, the first power output isin a range of 10 W to 30 W, and the second power output is in a range of5 W to 30 W. In still another configuration applied for example to theouter thigh and/or front part of thigh, the first power output is in arange of 15 W to 30 W, and the second power output is in a range of 10 Wto 30 W. The power output variation step may be located between twotreatment sections. The first treatment section may be used for heatingboost to heat the tissue (e.g. body region and/or biological structure)to the desired temperature, and the second treatment section may be usedfor maintaining of the desired temperature during the rest of thetreatment. The desired temperature may be in a range of 38° C. to 60°C., or of 40° C. to 52° C., or of 41° C. to 50° C., or of 41° C. to 48°C., or of 42° C. to 48° C., or of 42° C. to 45° C.

A second exemplary radiofrequency treatment protocol comprises threetreatment sections having different power output of the RF waves. Thefirst treatment section comprises RF waves having a power output in arange of 10 W to 35 W, the second treatment section comprises RF waveshaving a power output in a range of 2 W to 18 W, and the third treatmentsection comprises RF waves having a power output in a range of 5 W to 50W. The first power output is different from the second power output andthe third power output is different from either of the first and secondpower output. Duration of the first treatment section may be in a rangeof 0.5 minute to 15 minutes or 1 minute to 7 minutes.

The following exemplary protocols are referred to as the mechanicaltreatment protocols, since they mostly discuss parameters of themechanical treatment. Generally, the device may provide and/or controlthe modulation of: the duration of mechanical impulse, repetition rateof mechanical impulse, and/or amplitude of pressure (e.g. positivepressure and/or negative pressure) of fluid in the pressure outlet. Thecontrol of the modulation may be provided by the control system and/orhuman machine interface. The exemplary mechanical treatment protocolsmay comprise one or more treatment sections.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedin a continual manner during the treatment session without changing theparameters set at the beginning of the treatment session.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedin a continual manner during the treatment session with changing theparameters set at the beginning of the treatment session.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedat the same time as the magnetic treatment providing the musclecontraction. This configuration may lead to relief of pain and/or skinmassage during the muscle contraction to better withstand the musclecontraction.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedat a different time than the magnetic treatment providing the musclecontraction. This mechanical treatment protocol may provide mechanicaltreatment (e.g. massage) to the body area and/or muscles during a timewhen the muscle contraction is not present. This configuration may leadto faster relief of the pain, relief of the muscle fatigue, and/orregeneration of the muscle between the muscle contractions and may helpto prepare the muscle for following muscle contractions by decreasing aconcentration of lactic acid within the body area.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedat the same time as the radiofrequency treatment providing heating ofthe body area. This configuration may lead to enhancement ofhomogenization of heating within the body area.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may be appliedat a different time than the radiofrequency treatment providing heatingof the body area. This configuration may lead to regeneration and/orcooling of the muscles and/or body area.

One or more exemplary mechanical treatment protocols, including themechanical treatment (e.g. providing pressure impulses) may comprise atleast one mechanical envelope created by mechanical impulses. Themechanical impulses may be pressure impulses. Mechanical envelopes ofthe mechanical impulses may create a trapezoidal envelope, a rectangularenvelope, a triangular envelope, or a combination thereof. The at leastone mechanical envelope may be created by change of amplitude ofmechanical impulses. When the envelope is created by changing theamplitude of the mechanical impulses, the compressor may operate athigher or lower power according to instructions from the control system.In another aspect, when the envelope is created by changing theamplitude of the mechanical impulses, the fluid pressure tank mayprovide different amount of fluid to the circuit according toinstructions from the control system. store the air and provide airunder pressure to the circuit, The mechanical envelope may be created bychange of repetition rate of mechanical impulses. When the envelope iscreated by changing of the repetition rate of the mechanical impulses,the applicator valve may open and close in different intervals,according to instruction from the control system. This use of mechanicalenvelopes may lead to relief of the muscle fatigue, and/or regenerationof the muscle between the muscle contractions and may help to preparethe muscle for following muscle contractions by decreasing aconcentration of lactic acid within the body area. The first exemplarymechanical treatment protocol includes two treatment sections havingdifferent repetition rates of the pressure impulses. The first treatmentsection comprises mechanical impulses having a repetition rate in arange of 1 Hz to 10 Hz, and the second treatment section comprises arepetition rate in a range of 5 Hz to 25 Hz, wherein the firstrepetition rate is different from the second repetition rate. In oneconfiguration, the first repetition rate is 8 Hz, and the secondtreatment section is 15 Hz.

A second exemplary mechanical treatment protocol comprises threetreatment sections having repetition rates of the pressure impulses. Thefirst treatment section comprises mechanical impulses having arepetition rate in a range of 1 Hz to 10 Hz, the second treatmentsection comprises pressure impulses having a repetition rate in a rangeof 10 Hz to 25 Hz, and the third treatment section comprises mechanicalimpulses having a repetition rate in a range of 5 Hz to 15 Hz, whereinone (e.g. first) repetition rate is different from the other repetitionrates (e.g., second and third). In one configuration, the firstrepetition rate is 8 Hz, the second treatment section is 12 Hz and thethird repetition rate is 12 Hz.

A third exemplary mechanical treatment protocol comprises threetreatment sections having repetition rates of the pressure impulses. Thefirst treatment section comprises mechanical impulses having arepetition rate in a range of 1 Hz to 10 Hz, the second treatmentsection comprises mechanical impulses having a repetition rate in arange of 10 Hz to 25 Hz, and the third treatment section comprisesmechanical impulses having repetition rate in a range of 5 Hz to 20 Hz,wherein the first, second and third repetition rates are different. Inone configuration, the first repetition rate is 5 Hz, the secondtreatment section is 18 Hz, and the third repetition rate is 14 Hz.

The duration of the mechanical impulses may be varied during thetreatment sections of any of the three exemplary mechanical treatmentprotocols. The duration of the pressure impulses may be shorter when therepetition rate is higher, while the duration of the pressure impulsesmay be longer when the repetition rate is lower. For example, theduration of the pressure impulses is in a range of 0.5 ms to 15 ms whenthe repetition rate is in a range of 15 Hz to 100 Hz, while the durationof the pressure impulses is in a range of 15.1 ms to 40 ms when therepetition rate is in a range of 0.1 Hz to 14.9 Hz. Thus, an exemplarytreatment protocol may include a combination of any of the magnetic, RFand mechanical treatment protocols discussed above. The duration of thepressure impulses may be varied in the range of 0.5 ms to 30 ms or 0.5ms to 25 ms.

The FIGS. 45 a, 45 b and 46-51 show different views of a main unit 11 ofa treatment device according to an embodiment.

As mentioned before, the device may comprise one or more applicators.For example, the device may comprise two, four or more applicators. Insome aspects, the applicator may comprise the magnetic field generatingdevice and radiofrequency electrode. In some aspects, the applicator maycomprise the magnetic field generating device and pressure outlet. Insome aspects, the applicator may comprise the magnetic field generatingdevice, the pressure outlet and one or more radiofrequency electrodes.In some aspects, the applicator may comprise the magnetic fieldgenerating device and the ultrasound transducer. In some aspects, theapplicator may comprise the magnetic field generating device,radiofrequency electrode and ultrasound transducer. In some aspects, theapplicator may comprise one magnetic field generating device. In someaspects, the applicator may comprise plurality of magnetic fieldgenerating devices.

The device may be configured to provide free movement of the magneticfield generating devices, RF electrode, pressure outlet and/orultrasound transducer positioned within the applicator in at least oneaxis. The applicator may comprise multiple portions, wherein eachportion may be configured to be moved freely in at least one axis ofmovement.

The device may comprise a movement structure configured to providemovement of the applicator, applicators and/or portion of the applicatoras illustrated at FIGS. 61 a -61 x. Each portion may comprise its owncasing comprising a top cover and a bottom cover. The portion of theapplicator may be a part of the applicator comprising at least onemagnetic field generating device, radiofrequency electrode and/orpressure outlet. In some aspects, the portion may be connected to theconnecting tube. In some aspects, the portion may be positionableindependently from other portions.

The movement structure may comprise a joint, a gear, a rotor, and/or acam. The joint may be for example a revolute joint, a rotator, a flexor,a prismatic joint, a ball joint, a knuckle joint, a turnbuckle, a boltedjoint, an universal joint, a cotter pin and/or a spherical joint. Thegear may be a spur gear, a helical gear, a double helical gear, a bevelgear, a spiral bevel gear, a hypoid gear, a crown gear, a worm drive, agear train, a harmonic gear, a cage gear, a cycloidal gear, a magneticgear and/or rack and pinion. The movement structure may comprise twogears in a gear train.

The movement structure may comprise a spacer and/or a movementconnection. The spacer may comprise at least one gear and/or joint. Themovement connections may comprise at least one gear and/or joint. Themovement connection may be coupled to the spacer.

As mentioned above, the movement structure may comprise the joint and/orthe gear. However, the applicator, portion of the applicator and/orapplicator may be connected to the movement structure by the jointand/or gear.

The movement structure may provide a rotational movement, reciprocatingmovement, oscillating movement and/or linear movement.

The movement structure may comprise a lock configured to keep theapplicators and/or portions of the applicator particular positionsand/or angle. The lock may be represented by a spring, locking mechanismin the gear train and/or brake. The lock may be configured and/orcontrolled by the user and/or the patient. The movement structure maycomprise at least one friction element configured to provide locking inplace. The movement structure may have a degree of stiffness, so themovement structure may hold the position of the applicators and/orportions of the applicator.

FIG. 61 a illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device 900 and RF electrode101. The applicator 800 may comprise a first portion 833 a and a secondportion 833 b. The first portion 833 a may comprise a magnetic fieldgenerating device 900, and the second portion 833 b may comprise an RFelectrode 101. The connecting tube 814 may be divided into twoconnecting tube portions and connect the first portion 833 a and thesecond portion 833 b to the main unit. The first portion 833 a may becoupled to a movement structure 834 a configured to provide movement ofthe first portion 833 a. Furthermore, the second portion 833 b may becoupled a movement structure 834 b configured to provide a movement ofthe second portion 833 b.

FIG. 61 b illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices 900 a and 900 b. Theapplicator 800 may comprise a first portion 833 a and a second portion833 b. The first portion 833 a may comprise a first magnetic fieldgenerating device 900 a, and the second portion 833 b may comprise asecond magnetic field generating device 900 b. The connecting tube 814may be divided into two connecting tube portions and connect the firstportion 833 a and the second portion 833 b to the main unit. The firstportion 833 a may be coupled to a movement structure 834 a configured toprovide movement of the first portion 833 a. Furthermore, the secondportion 833 b may be coupled to a movement structure 834 b configured toprovide a movement of the second portion 833 b.

FIG. 61 c illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device and pair of RFelecrodes The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a and pair of RF electrodes 101 aand 101 b, and the second portion 833 b may comprise a second magneticfield generating device 900 b and pair of RF electrodes 101 c and 101 d.The connecting tube 814 may be divided into two connecting tube portionsand connect the first portion 833 a and the second portion 833 b to themain unit. The first portion 833 a may be coupled to a movementstructure 834 a configured to provide movement of the first portion 833a. Furthermore, the second portion 833 b may be coupled a movementstructure 834 b configured to provide a movement of the second portion833 b.

FIG. 61 d illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices and pair of RFelectrodes. The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a, pair of RF electrodes 101 a and101 b and a pressure outlet 600 a, and the second portion 833 b maycomprise a second magnetic field generating device 900 b, pair of RFelectrodes 101 c and 101 d and a pressure outlet 600 b. The connectingtube 814 may be divided into two connecting tube portions and connectthe first portion 833 a and the second portion 833 b to the main unit.The first portion 833 a may be coupled to a movement structure 834 aconfigured to provide movement of the first portion 833 a. Furthermore,the second portion 833 b may comprise a movement structure 834 bconfigured to provide a movement of the first portion 833 b.

The device may be configured to provide free movement of the magneticfield generating devices, RF electrode, pressure outlet and/orultrasound transducer positioned within the applicator in at least oneaxis. The applicator may comprise multiple portions.

The applicator may comprise a movement structure configured to providemovement of the applicator and/or its portion of the applicator asillustrated at FIGS. 61 e-61 h . Each portion may comprise its owncasing comprising a top cover and a bottom cover. The movement structuremay comprise a spacer and/or at least one movement connection. Thespacer and/or and the movement connection are configured to provideconnection between the portions of the applicator.

FIG. 61 e illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device and RF electrode. Theapplicator 800 may comprise a first portion 833 a and a second portion833 b. The first portion 833 a may comprise a magnetic field generatingdevice 900, and the second portion 833 b may comprise an RF electrode101. The connecting tube 814 may be divided into two connecting tubeportions and connect the first portion 833 a and the second portion 833b to the main unit. The first portion 833 a and second portion 833 b maybe coupled to a movement structure 834 configured to provide movement ofthe first portion 833 a and second portion 833 b.

FIG. 61 f illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices 900 a and 900 b. Theapplicator 800 may comprise a first portion 833 a and a second portion833 b. The first portion 833 a may comprise a first magnetic fieldgenerating device 900 a, and the second portion 833 b may comprise asecond magnetic field generating device 900 b. The connecting tube 814may be divided into two connecting tube portions and connect the firstportion 833 a and the second portion 833 b to the main unit. The firstportion 833 a and second portion 833 b may be coupled to a movementstructure 834 configured to provide movement of the first portion 833 aand second portion 833 b.

FIG. 61 g illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device and pair of RFelectrodes. The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a and pair of RF electrodes 101 aand 101 b, and the second portion 833 b may comprise a second magneticfield generating device 900 b and pair of RF electrodes 101 c and 101 d.The connecting tube 814 may be divided into two connecting tube portionsand connect the first portion 833 a and the second portion 833 b. Thefirst portion 833 a and second portion 833 b may be coupled to amovement structure 834 configured to provide movement of the firstportion 833 a and second portion 833 b.

FIG. 61 h illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices and pair of RFelectrodes. The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a, pair of RF electrodes 101 a and101 b and a pressure outlet 600 a, and the second portion 833 b maycomprise a second magnetic field generating device 900 b, pair of RFelectrodes 101 c and 101 d and a pressure outlet 600 b. The connectingtube 814 may be divided into two connecting tube portions and connectthe first portion 833 a and the second portion 833 b. The first portion833 a and second portion 833 b may be coupled to a movement structure834 configured to provide movement of the first portion 833 a and secondportion 833 b.

The device may be configured to provide free movement of the two or moreapplicators in at least one axis.

The device may comprise plurality of applicators configured to beconnectable to movement structure as illustrated at FIGS. 61 i-61 l .The movement structure may comprise a spacer and at least one movementconnector, wherein the spacer and the movement connection are configuredto provide connection between applicators.

FIG. 61 i illustrates a first applicator 800 a and a second applicator800 b connected to the movement structure 834. The applicator 800 a maycomprise a magnetic field generating device 900, and the secondapplicator 800 b may comprise a RF electrode 101. Each applicator may beconnected to a main unit by a connecting tube 814.

FIG. 61 j illustrates a first applicator 800 a and a second applicator800 b connected to the movement structure 834. The applicator 800 a maycomprise a first magnetic field generating device 900 a, and the secondapplicator 800 b may comprise a second magnetic field generating device900 b. Each applicator may be connected to a main unit by a connectingtube 814.

FIG. 61 k illustrates a first applicator 800 a and a second applicator800 b connected to the movement structure. The first applicator 800 amay comprise a first magnetic field generating device 900 a and firstpair of RF electrodes 101 a and 101 b. The second applicator 800 b maycomprise a second magnetic field generating device 900 b and second pairof RF electrodes 101 a and 101 b. Each applicator may be connected to amain unit by a connecting tube 814.

FIG. 61 l illustrates a first applicator 800 a and a second applicator800 b connected to the movement structure 834. The first applicator 800a may comprise a first magnetic field generating device 900 a, a firstpressure outlet 600 a and first pair of RF electrodes 101 a and 101 b.The second applicator 800 b may comprise a second magnetic fieldgenerating device 900 b, a second pressure outlet 600 b and second pairof RF electrodes 101 a and 101 b. Each applicator may be connected to amain unit by a connecting tube 814.

The movement structure may be coupled to at least one connecting tube ofthe applicator and/or connecting tubes of plurality of the applicators.

FIG. 61 m illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device and RF electrode. Theapplicator 800 may comprise a first portion 833 a and a second portion833 b. The first portion 833 a may comprise a magnetic field generatingdevice 900, and the second portion 833 b may comprise an RF electrode101. The connecting tube 814 may be divided into two connecting tubeportions and connect the first portion 833 a and the second portion 833b to the main unit. The connecting tube 814 may be coupled to a movementstructure 834, which may be configured to provide movement of the firstportion 833 a and second portion 833 b.

FIG. 61 n illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices 900 a and 900 b. Theapplicator 800 may comprise a first portion 833 a and a second portion833 b. The first portion 833 a may comprise a first magnetic fieldgenerating device 900 a, and the second portion 833 b may comprise asecond magnetic field generating device 900 b. The connecting tube 814may be divided into two connecting tube portions and connect the firstportion 833 a and the second portion 833 b to the main unit. Theconnecting tube 814 may be coupled to a movement structure 834, whichmay be configured to provide movement of the first portion 833 a andsecond portion 833 b.

FIG. 61 o illustrates an applicator 800 configured to provide freemovement of the magnetic field generating device and pair of RFelectrodes. The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a and pair of RF electrodes 101 aand 101 b, and the second portion 833 b may comprise a second magneticfield generating device 900 b and pair of RF electrodes 101 c and 101 d.The connecting tube 814 may be divided into two connecting tube portionsand connect the first portion 833 a and the second portion 833 b. Theconnecting tube 814 may be coupled to a movement structure 834, whichmay be configured to provide movement of the first portion 833 a andsecond portion 833 b.

FIG. 61 p illustrates an applicator 800 configured to provide freemovement of the magnetic field generating devices and pair of RFelectrodes. The applicator 800 may comprise a first portion 833 a and asecond portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a, pair of RF electrodes 101 a and101 b and a pressure outlet 600 a, and the second portion 833 b maycomprise a second magnetic field generating device 900 b, pair of RFelectrodes 101 c and 101 d and a pressure outlet 600 b. The connectingtube 814 may be divided into two connecting tube portions and connectthe first portion 833 a and the second portion 833 b. The connectingtube 814 may be coupled to a movement structure 834, which may beconfigured to provide movement of the first portion 833 a and secondportion 833 b.

FIG. 61 q illustrates a first applicator 800 a and a second applicator800 b. The applicator 800 a may comprise a magnetic field generatingdevice 900, and the second applicator 800 b may comprise a RF electrode101. Each applicator may be connected to a main unit by a connectingtube 814. The connecting tubes 814 may be connected by the movementstructure 834.

FIG. 61 r illustrates a first applicator 800 a and a second applicator800 b. The applicator 800 a may comprise a first magnetic fieldgenerating device 900 a, and the second applicator 800 b may comprise asecond magnetic field generating device 900 b. Each applicator may beconnected to a main unit by a connecting tube 814. The connecting tubes814 may be connected by the movement structure 834.

FIG. 61 s illustrates a first applicator 800 a and a second applicator800 b. The first applicator 800 a may comprise a first magnetic fieldgenerating device 900 a and first pair of RF electrodes 101 a and 101 b.The second applicator 800 b may comprise a second magnetic fieldgenerating device 900 b and second pair of RF electrodes 101 a and 101b. Each applicator may be connected to a main unit by a connecting tube814. The connecting tubes 814 may be connected by the movement structure834.

FIG. 61 t illustrates a first applicator 800 a and a second applicator800 b. The first applicator 800 a may comprise a first magnetic fieldgenerating device 900 a, a first pressure outlet 600 a and first pair ofRF electrodes 101 a and 101 b. The second applicator 800 b may comprisea second magnetic field generating device 900 b, a second pressureoutlet 600 b and second pair of RF electrodes 101 a and 101 b. Eachapplicator may be connected to a main unit by a connecting tube 814. Theconnecting tubes 814 may be connected by the movement structure 834.

FIG. 61 u illustrates a cross-section of the front view of the exemplaryapplicator 800. The first portion 833 a and the second portion 833 b maybe connected to the movement structure 834. The movement structure 834may comprise a joint 834 c. Although this configuration is discussedrelated to one applicator, it is to be understood that a similarconfiguration may be used for two independently movable applicators. Forexample, in aspects with two or more independently movable applicators,each applicator may be configured as illustrated in FIG. 61 u.

FIG. 61 v illustrates a cross-section of a front view of two exemplaryapplicators 800 a and 800 b connected to the movement structure. Thefirst applicator 800 a and the second applicator 800 b may be connectedto the movement structure 834, which may include at least one joint 834c.

FIG. 61 w illustrates a front view of two exemplary applicators 800 aand 800 b connected to the movement structure represented by the spacer834 d and movement connections 834 e. The applicators 800 a and 800 bare connected to the movement connections 834 e by joints 834 f. Themovement connections 834 d are connected to the spacer 834 c by joints834 g.

FIG. 61 x illustrates a front view of the exemplary applicator 800. Thefirst portion 833 a and the second portion 833 b may be connected to themovement structure represented by movement connections 834 e joints 834f. Presence of additional joints 834 g between the movement connections834 e and spacer 834 d may provide additional free movement of themovement structure itself.

The movement structure may be coupled to at least one connecting tube,as illustrated at FIGS. 61 q -61 x.

FIG. 61 q illustrates an applicator 800 comprising a first portion 833 aand a second portion 833 b. The first portion 833 a may comprise amagnetic field generating device 900, and the second portion 833 b maycomprise a radiofrequency applicator 101. The connecting tube 814 may bedivided into two connecting tube portions and connect the first portion833 a and the second portion 833 b. The first portion 833 a and secondportion 833 b may be coupled to a movement structure 834 configured toprovide movement of the first portion 833 a and second portion 833 b.

FIG. 61 r illustrates an applicator 800 comprising a first portion 833 aand a second portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a, and the second portion 833 b maycomprise a second magnetic field generating device 900 b. The connectingtube 814 may be divided into two connecting tube portions and connectthe first portion 833 a and the second portion 833 b. The first portion833 a and second portion 833 b may be coupled to a movement structure834 configured to provide movement of the first portion 833 a and secondportion 833 b.

FIG. 61 s illustrates an applicator 800 comprising a first portion 833 aand a second portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a and pair of radiofrequencyelectrodes 101 a and 101 b. The second portion 833 b may comprise asecond magnetic field generating device 900 b and pair of radiofrequencyelectrodes 101 c and 101 d. The connecting tube 814 may be divided intotwo connecting tube portions and connect the first portion 833 a and thesecond portion 833 b. The first portion 833 a and second portion 833 bmay be coupled to a movement structure 834 configured to providemovement of the first portion 833 a and second portion 833 b.

FIG. 61 t illustrates an applicator 800 comprising a first portion 833 aand a second portion 833 b. The first portion 833 a may comprise a firstmagnetic field generating device 900 a, first pressure outlet 600 a andpair of radiofrequency electrodes 101 a and 101 b. The second portion833 b may comprise a second magnetic field generating device 900 b,second outlet 600 b and pair of radiofrequency electrodes 101 c and 101d. The connecting tube 814 may be divided into two connecting tubeportions and connect the first portion 833 a and the second portion 833b. The first portion 833 a and second portion 833 b may be coupled to amovement structure 834 configured to provide movement of the firstportion 833 a and second portion 833 b.

FIG. 61 u illustrates a first applicator 800 a and a second applicator800 b connected to the movement structure, which may be connected to thespacer 834 c. The applicator 800 a may comprise a magnetic fieldgenerating device 900, and the second applicator 800 b may comprise a RFelectrode 101. Each applicator may comprise a connecting tube 814.

In some aspects, the movement structure may be configured to providemovement of one or more portions of the applicator in selecteddirections. FIGS. 70 a-70 r illustrate exemplary configurations ofmovement structure.

FIG. 70 a illustrates an exemplary applicator 800 comprising firstportion 833 a, second portion 833 b, and movement structure. In someaspects, the first portion 833 a comprises a first magnetic fieldgenerating device 900 a, and the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the portion of the applicatorin axis Y of the Cartesian system, wherein the axis X is pointingtowards the observer. The position between the portion 833 a and themovement connection 834 may be characterized by an angle 731. In someaspects, angle 731 may be in a range of 10 to 180°, 100 to 175°, 200 to180°, or 300 to 175°.

FIG. 70 b illustrates an exemplary applicator 800 comprising firstportion 833 a, second portion 833 b, and movement structure. In someaspects, the first portion 833 a comprises a first magnetic fieldgenerating device 900 a, and the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the portion of the applicatorin axis Y of the Cartesian system, wherein the axis X is pointingtowards the observer. The position between the portion 833 a and themovement connection 834 may be characterized by an angle 731. The firstportion 833 a is bended towards the movement connection 834 e. In someaspects, the angle 731 may be in a range of 1° to 180°, 100 to 175°, 200to 180°, or 300 to 175°.

FIG. 70 c illustrates an exemplary applicator 800 comprising firstportion 833 a, second portion 833 b, and movement structure. In someaspects, the first portion 833 a comprises a first magnetic fieldgenerating device 900 a, and the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the portion of the applicatorin axis Y of the Cartesian system, wherein the axis X is pointingtowards the observer. The position between the first portion 833 a andthe movement connection 834 may be characterized by an angle 731 a. Theposition between the second portion 833 b and the movement connection834 may be characterized by an angle 731 b. In some aspects, the angle731 a may be different than the angle 731 b. In some aspects, angle 731a and 731 b are the same. Further, the position of the portions to eachother may be defined by angles 732 a and 732 b. The angle 732 a may bedefined by bottom casing of the first portion 833 a and the line 733.The angle 732 b may be defined by bottom casing of the first portion 833b and the line 733. The line 733 may be drawn between the centers of theportions. In another aspect, the line 733 may be drawn between thecenters of the magnetic field generating devices 900 a and 900 b. Insome aspects, the angle 732 a may be different than the angle 732 b. Insome aspects, angle 732 a and 732 b are the same. In some aspects, angle732 a may be in a range of 1° to 180°, 100 to 175°, 200 to 180°, or 300to 175°. In some aspects, angle 732 b may be in a range of 1° to 180°,100 to 175°, 200 to 180°, or 300 to 175°. In some aspects, angle 731 amay be in a range of 1° to 180°, 100 to 175°, 200 to 180°, or 300 to175°. In some aspects, angle 731 b may be in a range of 1° to 180°, 100to 175°, 200 to 180°, or 300 to 175°.

FIG. 70 d illustrates an exemplary applicator 800 comprising firstportion 833 a, second portion 833 b, and movement structure. In someaspects, the first portion 833 a comprises a first magnetic fieldgenerating device 900 a, and the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the portion of the applicatorin axis Y of the Cartesian system, wherein the axis X is pointingtowards the observer. The position of the portions to each other may bedefined by angles 732 a and 732 b. The angle 732 a may be defined bybottom casing of the first portion 833 a and the line 733. The angle 732b may be defined by bottom casing of the first portion 833 b and theline 733. The line 733 may be drawn between the centers of the portions.In another aspect, the line 733 may be drawn between the centers of themagnetic field generating devices 900 a and 900 b. As shown at thisFigure, in some aspects, the angles 732 a and 732 b are about 90°. Themovement structure is configured to position the bottom casings ofportions 833 a and 833 b against each other.

FIG. 70 e illustrates an exemplary applicator 800 comprising firstportion 833 a, second portion 833 b, and movement structure. In someaspects, the first portion 833 a comprises a first magnetic fieldgenerating device 900 a, and the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the portion of the applicatorin axis Y of the Cartesian system, wherein the axis X is pointingtowards the observer. The movement of the portions may be provided bythe movement of the parts of the movement structure. The position of themovement connection 834 e and the spacer 834 d may be defined by angle734. In some aspects, angle 734 may be in a range of 10 to 180°, 10° to175°, 200 to 180°, or 300 to 175°.

FIG. 70 f illustrates an exemplary applicator 800 (as shown on previousFIG. 70 a ) from the side direction. The applicator is shown in axis Yof the Cartesian system, wherein the axis Y is pointing towards theobserver. In some aspects, the second portion 833 b comprises a secondmagnetic field generating device 900 b, and in the view of the observerin this FIG. 70 f , the first portion is behind the second portion 833b. In some aspects, each portion may also comprise at least oneradiofrequency electrode and/or pressure outlet. In some aspects, themovement structure as shown comprises movement connections 834 e andjoints 834 f and 834 g. In some aspects, joints 834 f and 834 g includeat least one gear. The movement structure may be configured to providemovement of the portion of the applicator in axis X of the Cartesiansystem, wherein the axis Y is pointing towards the observer.

FIG. 70 g illustrates an exemplary applicator 800 (as shown on previousFIG. 70 a ) from the side direction. The applicator is shown in axis Yof the Cartesian system, wherein the axis Y is pointing towards theobserver. In some aspects, the second portion 833 b comprises a secondmagnetic field generating device 900 b, and in the view of the observerin this FIG. 70 g , the first portion is behind the second portion 833b. In some aspects, each portion may also comprise at least oneradiofrequency electrode and/or pressure outlet. In some aspects, themovement structure as shown comprises movement connections 834 e andjoints 834 f and 834 g. In some aspects, joints 834 f and 834 g includeat least one gear. The movement structure may be configured to providemovement of the portions of the applicator in axis X of the Cartesiansystem, wherein the axis Y is pointing towards the observer. The firstportion 833 b is shown to be positioned towards the movement connection834 e. The position of the first portion 833 b and the movementconnection 834 e may be defined by angle 735. The angle may be definedbetween the top casing of the second portion 833 b and the movementconnection 834 e. In some aspects, the angle 735 may be in a range of 1°to 180°, 100 to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 h illustrates an exemplary applicator 800 (as shown on previousFIG. 70 a ) from the side direction. The applicator is shown in axis Yof the Cartesian system, wherein the axis Y is pointing towards theobserver. In some aspects, the second portion 833 b comprises a secondmagnetic field generating device 900 b. The first portion 833 a is shownin FIG. 70 h in dashed lines behind the second portion 833 b. In someaspects, each portion may also comprise at least one radiofrequencyelectrode and/or pressure outlet. In some aspects, the movementstructure as shown comprises movement connections 834 e and joints 834 fand 834 g. In some aspects, joints 834 f and 834 g include at least onegear. The movement structure may be configured to provide movement ofthe portions of the applicator in axis X of the Cartesian system,wherein the axis Y is pointing towards the observer. The second portion833 b is shown to be positioned towards the movement connection 834 e,and the first portion 833 a is shown to be positioned in an differentposition. The position of the second portion 833 b and the first portion833 a may be defined by angle 736. The angle 736 may be defined betweenthe bottom casing of the second portion 833 b and the top casing of thefirst portion 833 a. In some aspects, the angle 736 may be in a range of1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 i illustrates an exemplary applicator 800 (as shown on previousFIG. 70 ) from the side direction. The applicator is shown in axis Y ofthe Cartesian system, wherein the axis Y is pointing towards theobserver. In some aspects, the second portion 833 b comprises a secondmagnetic field generating device 900 b. In some aspects, each portionmay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure as shown comprisesspacer 834 d, movement connections 834 e and joints 834 f and 834 g. Insome aspects, joints 834 f and 834 g include at least one gear. Themovement structure may be configured to provide movement of the portionsof the applicator in axis X of the Cartesian system, wherein the axis Yis pointing towards the observer. The movement of the portions may beprovided by the movement of the parts of the movement structure. Theposition of the movement connection 834 e and the spacer 834 d may bedefined by angle 737. In some aspects, the angle 737 may be in a rangeof 1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175°.

All examples of the movements of various directions as shown at FIGS. 70a-70 i may be combined.

The movement structure may be configured to provide movement pluralityof the applicators in selected directions. FIGS. 70 j-70 r illustratesexemplary configuration of movement.

FIG. 70 j illustrates two exemplary applicators 800 a and 800 b, twoconnecting tubes 814 a and 814 b, and movement structure. In someaspects, the first applicator 800 a comprises a first magnetic fieldgenerating device 900 a, and the second applicator 800 b comprises asecond magnetic field generating device 900 b. In some aspects, theapplicators 800 a and 800 b may also comprise at least oneradiofrequency electrode and/or pressure outlet. In some aspects, themovement structure comprises a spacer 834 d, movement connections 834 e,joints 834 f and 834 g. In some aspects, joints 834 f and 834 g includeat least one gear. The movement structure may be configured to providemovement of the applicator in axis Y of the Cartesian coordinate system,wherein the axis X is pointing towards the observer. The positionbetween the applicator 800 a and the movement connection may becharacterized by an angle 738. In some aspects, the angle 738 may be ina range of 1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 k illustrates two exemplary applicators, two connecting tubes814 a and 814 b, and movement structure. The first applicator 800 acomprises a first magnetic field generating device 900 a, and the secondapplicator 800 b comprises a second magnetic field generating device 900b. In some aspects, each the applicator may also comprise at least oneradiofrequency electrode and/or pressure outlet. In some aspects, themovement structure comprises a spacer 834 d, movement connections 834 e,joints 834 f and 834 g. In some aspects, joints 834 f and 834 g includeat least one gear. The movement structure may be configured to providemovement of the applicator in axis Y of the Cartesian system, whereinthe axis X is pointing towards the observer. The position between thefirst applicator 800 a and the movement connection may be characterizedby an angle 738. The first applicator 800 a is bended towards themovement connection 834 e. In some aspects, the angle 738 may be in arange of 1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 l illustrates two applicator 800 a and 800 b, two connectingtubes 814 a and 814 b, and movement structure. In some aspects, thefirst applicator 800 a comprises a first magnetic field generatingdevice 900 a, and the second applicator 800 b comprises a secondmagnetic field generating device 900 b. In some aspects, each applicatormay also comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure comprises a spacer 834d, movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the applicator in axis Y of theCartesian system, wherein the axis X is pointing towards the observer.The position between the first applicator 800 a and the movementconnection may be characterized by an angle 738 a. The position betweenthe second applicator 800 b and the movement connection may becharacterized by an angle 738 b. In some aspects, the angle 738 a may bedifferent than the angle 738 b. In some aspects, angle 738 a and 738 bare the same. Further, the position of the applicators to each other maybe defined by angles 739 a and 739 b. The angle 739 a may be defined bybottom casing of the first applicator 800 a and the line 740. The angle739 b may be defined by bottom casing of the first applicator 800 b andthe line 740. The line 740 may be drawn between the centers of theapplicator. In another aspect, the line 740 may be drawn between thecenters of the magnetic field generating devices 900 a and 900 b. Insome aspects, the angle 739 a may be different than the angle 739 b. Insome aspects, angle 739 a and 739 b are the same. The angle 739 a and/or739 b may be in a range of 1° to 180°, 10° to 175°, 20° to 180°, or 30°to 175°. The angle 738 a and/or 738 b may be in a range of 1° to 180°,10° to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 m illustrates two exemplary applicators, two connecting tubes814 a and 814 b, and movement structure. In some aspects, the firstapplicator 800 a comprises a first magnetic field generating device 900a, and the second applicator 800 b comprises a second magnetic fieldgenerating device 900 b. In some aspects, the applicator may alsocomprise at least one radiofrequency electrode and/or pressure outlet.In some aspects, the movement structure comprises a spacer 834 d,movement connections 834 e, joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the applicator in axis Y of theCartesian system, wherein the axis X is pointing towards the observer.The position of applicators to each other may be defined by angles 739 aand 739 b. The angle 739 a may be defined by bottom casing of the firstapplicator 800 a and the line 740. The angle 739 b may be defined bybottom casing of the first applicator 800 b and the line 740. The line740 may be drawn between the centers of the applicators. In anotheraspect, the line 740 may be drawn between the centers of the magneticfield generating devices 900 a and 900 b. As shown at this Figure, insome aspects, the angles 739 a and 739 b are about 90°. The movementstructure is configured to position the bottom casings of applicatory800 a and 800 b against each other.

FIG. 70 n illustrates an two exemplary applicators 800 a and 800 b, twoconnecting tubes 814 a and 814 b, and movement structure. In someaspects, the first applicator 800 a comprises a first magnetic fieldgenerating device 900 a, and the second applicator 800 b comprises asecond magnetic field generating device 900 b. In some aspects, eachapplicator may also comprise at least one radiofrequency electrodeand/or pressure outlet. In some aspects, the movement structurecomprises a spacer 834 d, movement connections 834 e, joints 834 f and834 g. In some aspects, joints 834 f and 834 g include at least onegear. The movement structure may be configured to provide movement ofthe applicator in axis Y of the Cartesian system, wherein the axis X ispointing towards the observer. The movement of the applicators may beprovided by the movement of the parts of the movement structure. Theposition of the movement connection 834 e and the spacer 834 d may bedefined by angle 741. In some aspects, the angle 741 may be in a rangeof 1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175°.

FIG. 70 o illustrates two exemplary applicators 800 a and 800 b (asshown on previous FIG. 70 j ) from the side direction. The applicator isshown in axis Y of the Cartesian system, wherein the axis Y is pointingtowards the observer. In some aspects, the second applicator 800 bcomprises a second magnetic field generating device 900 b, and the firstapplicator, in the view of the observer in this FIG. 70 o , is behindthe second applicator 800 b. In some aspects, the applicator may alsocomprise at least one radiofrequency electrode and/or pressure outlet.In some aspects, the movement structure as shown comprises movementconnections 834 e and joints 834 f and 834 g. In some aspects, joints834 f and 834 g include at least one gear. The movement structure may beconfigured to provide movement of the applicator in axis X of theCartesian system, wherein the axis Y is pointing towards the observer.

FIG. 70 p illustrates two exemplary applicator 800 a and 800 b (as shownon previous FIG. 70 j ) from the side direction. The second applicator800 b is shown in axis Y of the Cartesian system, wherein the axis Y ispointing towards the observer. In some aspects, the second applicator800 b comprises a second magnetic field generating device 900 b, and thefirst applicator, in the view of the observer in this FIG. 70 p , isbehind the second applicator 800 b. In some aspects, each applicator mayalso comprise at least one radiofrequency electrode and/or pressureoutlet. In some aspects, the movement structure as shown comprisesmovement connections 834 e and joints 834 f and 834 g. In some aspects,joints 834 f and 834 g include at least one gear. The movement structuremay be configured to provide movement of the applicators of theapplicator in axis X of the Cartesian system, wherein the axis Y ispointing towards the observer. The first applicator 800 b is shown to bepositioned towards the movement connection 834 e. The position of thefirst applicator 800 b and the movement connection 834 e may be definedby angle 742. The angle 742 may be defined between the top casing of thesecond applicator 800 b and the movement connection 834 e. In someaspects, the angle 742 may be in a range of 1° to 180°, 100 to 175°, 200to 180°, or 300 to 175°.

FIG. 70 q illustrates two exemplary applicators 800 a and 800 b (asshown on previous FIG. 70 j ) from the side direction. The applicator isshown in axis Y of the Cartesian system, wherein the axis Y is pointingtowards the observer. In some aspects, the second applicator 800 bcomprises a second magnetic field generating device 900 b. The firstapplicator 800 a is shown in FIG. 70 q in dashed lines behind the secondapplicator 800 b. In some aspects, each applicator may also comprise atleast one radiofrequency electrode and/or pressure outlet. In someaspects, the movement structure as shown comprises movement connections834 e and joints 834 f and 834 g. In some aspects, joints 834 f and 834g include at least one gear. The movement structure may be configured toprovide movement of the applicator in axis X of the Cartesian system,wherein the axis Y is pointing towards the observer. The secondapplicator 800 b is shown to be positioned towards the movementconnection 834 e, and the first applicator 800 is shown to be positionedin an different position. The position of the second applicator 800 band the first applicator 800 a may be defined by angle 743. The angle743 may be defined between the bottom casing of the second applicator800 b and the top casing of the first applicator 800 a. In some aspects,the angle 743 may be in a range of 1° to 180° 100 to 175°, 200 to 180°,or 300 to 175°.

FIG. 70 r illustrates an exemplary applicator 800 b (as shown onprevious FIG. 70 j ) from the side direction. The applicator is shown inaxis Y of the Cartesian system, wherein the axis Y is pointing towardsthe observer. In some aspects, the second applicator 800 b comprises asecond magnetic field generating device 900 b. In some aspects, eachapplicator may also comprise at least one radiofrequency electrodeand/or pressure outlet. In some aspects, the movement structure as showncomprises spacer 834 d, movement connections 834 e, and joints 834 f and834 g. In some aspects, joints 834 f and 834 g include at least onegear. The movement structure may be configured to provide movement ofthe applicator in axis X of the Cartesian system, wherein the axis Y ispointing towards the observer. The movement of the applicators may beprovided by the movement of the parts of the movement structure. Theposition of the movement connection 834 e and the spacer 834 d may bedefined by angle 744. In some aspects, the angle 744 may be in a rangeof 1° to 180°, 10° to 175°, 20° to 180°, or 30° to 175⁰.

All examples of the movements of various directions as shown at FIGS. 70j-70 r may be combined.

As described above, applicators described herein may have more than oneportion for applying a treatment. In some aspects, the applicator maycomprise first and second portions that are moveable with respect to oneanother. In some aspects, the first and second applicator portions maybe defined by first and second planes, and the applicator portions maybe positions so that the planes are not parallel to one another. Asdescribed herein, treatment may be applied in a similar manner as withapplicators that are configured with a single portion. In someinstances, treatment can be provided by multiple applicator portions,positioned in more than one plane, which may be beneficial for body areaor portions of a body area that include curves or are otherwiseirregularly shaped (for example, such as a flank, latus, lumbar region,shoulder, or knee). In some instances, treatment of body areas that aremore difficult to reach or effectively treat with a single portionapplicator may experience improved treatment by using a multi-portionapplicator.

Thus, the treatment device with the multi-portion applicator and methodof use may provide treatment of an uneven, curved, or irregularly shapedpart of a body area. Examples of uneven, curved, or irregularly shapedbody areas may include a leg, an arm, a shoulder, a flank (also known aslatus or lumbar region), a hip, a breast, or an ankle of the treatedhuman or animal, in some aspects. The applicator and/or at least one ofits parts may bend, curve, or be positioned in multiple locations, or inmultiple planes, e.g., around the treated body area that is curved orirregularly shaped. In some instances, such treatment may be analternative to treatment with the applicator having a single planarsurface (e.g. shown on FIG. 25 ). As one example, in treating a flank ofthe patient, the position of the magnetic field generating device withina multi-portion applicator that may be positioned in multiple positionsrelative to the flank provides more targeted time-varying magneticfields sufficient to provide muscle contractions in the flank. By usingsuch applicators that are configured to bend, curve, or be positioned inplural positions or planes, around a treated body area, the magneticfield generating device may be positioned into advantageous position anddistance to provide targeted time-varying magnetic field. The featuresdescribed with reference to these aspects may be used with featuresdescribed in other aspects described herein, and vice versa (e.g., FIGS.1 a through 60 e ).

The device and/or applicator may provide time-varying magnetic field tothe body area of the patient, wherein the time-varying magnetic fieldmay cause a muscle contraction and/or a series of repetitive musclecontraction. The provided muscle contractions may lead to enhancement ofvisual appearance.

The device and/or applicator may provide radiofrequency waves (via oneor more radiofrequency electrodes) to the body area of the patient,wherein the radiofrequency waves may cause a heating of the tissue. Theprovided radiofrequency waves in ranges mentioned herein may causeheating of adipose tissue within the treated body area, which may leadto removal of adipose tissue and/or enhancement of visual appearance.

The applicator, which may treat an uneven, curved, or irregularly shapedpart of body area, may comprise a casing, a first portion, a secondportion, a movement structure (e.g. a joint), a connecting tube, and atube connector. The first portion and/or second portion may comprise oneor more magnetic field generating devices. Further, the first portionand/or second portion may comprise one or more radiofrequencyelectrodes. The one or more magnetic field generating device and one ormore radiofrequency electrodes may be located within the casing of theapplicator. The movement structure may ensure bending of the firstportion relative to the second portion. The applicator may be coupled tothe body area. The applicator may be positioned in contact with the bodyarea. Alternatively, the applicator may be adjacent to the body area.Also, only one portion of the applicator may be in contact, whileanother portion may not in contact with the body area. However, theapplicator may be positioned not in contact with the body area, but fewcentimeters above the skin of the body area. Both portions may include atemperature sensor. Both portions may include protruding part of casing,e.g., where the temperature sensor is positioned.

FIG. 62 a illustrates a cross section of an exemplary applicator 610 a,which may treat an uneven, curved, or irregular part of a body area. Theapplicator 610 a may comprise a first portion 611 comprising the firstmagnetic field generating device 900 a and the first radiofrequencyelectrode 101 a. Further, the applicator 610 a may further comprise asecond portion 614 comprising the second magnetic field generatingdevice 900 b and the second radiofrequency electrode 101 b. Furthermore,the applicator 610 a may comprise a movement structure 615, a connectingtube 616, and a tube connector 617. The first portion 611 and the secondportion 614 may be moved or positioned relative to each other at themovement structure 615. The movement structure 615 may have a degree ofstiffness, so the movement structure 615 may hold the position of thefirst portion 611 and the second portion 614. In some instances, themovement structure 615 may comprise a lock, that lock the first portion611 and the second portion 614 in particular angle. The connecting tube616 may connect the applicator 610 a to the main unit of the device. Thetube connector 617 may connect the connecting tube to the applicatorconnector located on the main unit. The applicator is shown to bepositioned in open position in relation to the body area 618, forexample a flank.

FIG. 62 b illustrates a cross section of another exemplary applicator610 b, which may treat an uneven, curved, or irregularly shaped part ofa body area. The applicator 610 b may comprise a first portion 611comprising the magnetic field generating device 900 and firstradiofrequency electrode 101 a. Further, the applicator may furthercomprise a second portion 614 comprising the second radiofrequencyelectrode 101 b. Furthermore, the applicator 610 b may comprise amovement structure 615, a connecting tube 616, and a tube connector 617.The first portion 611 and the second portion 614 may be moved relativeto each other at the movement structure 615. The connecting tube 616 mayconnect the applicator 610 b to the main unit of the device. The tubeconnector 617 may connect the connecting tube to the applicatorconnector located on the main unit. The applicator 610 b is shown to bepositioned in open position in relation to the body area 618.

FIG. 62 c illustrates a floor projection of a location of an exemplaryRF electrode with regard to an exemplary magnetic field generatingdevice within an exemplary applicator 610 c. The applicator 610 c maycomprise a movement structure 615, first portion 611, and second portion614. The first portion 611 may comprise a first magnetic fieldgenerating device 900 a and two radiofrequency electrodes 101 a and 101aa, wherein the two radiofrequency electrodes 101 a and 101 aa may beoverlaid with the magnetic field generating device 900 a when viewed ina floor projection as shown in FIG. 62 c . Further, the tworadiofrequency electrodes 101 a and 101 aa may be positioned between themagnetic field generating device 900 a and the treated body area. Thesecond portion 614 may comprise magnetic field generating device 900 band two radiofrequency electrodes 101 b and 101 bb, wherein the tworadiofrequency electrodes 101 b and 101 bb may be overlaid with themagnetic field generating device 900 b when viewed in a floor projectionas shown in FIG. 62 c . Further, the two radiofrequency electrodes 101 band 101 bb may be positioned between the magnetic field generatingdevice 900 b and treated body area.

FIG. 62 d illustrates a floor projection of a location of an exemplaryRF electrode with regard to an exemplary magnetic field generatingdevice within an exemplary applicator 610 d. The applicator 610 d maycomprise a movement structure 615, first portion 611 and second portion614. The first portion 611 may comprise magnetic field generating device900 and two radiofrequency electrodes 101 a and 101 aa, wherein the tworadiofrequency electrodes 101 a and 101 aa may be overlaid with themagnetic field generating device 900 when viewed in a floor projectionas shown in FIG. 62 d . Further, the two radiofrequency electrodes 101 aand 101 aa may be positioned between the magnetic field generatingdevice 900 and treated body area. The second portion 614 may compriseonly two radiofrequency electrodes 101 b and 101 bb. This configurationof the applicator with only one magnetic field generating device may besufficient, for example, when the magnetic field generating device ofnew construction as described below is used. Also, the presence of onlyone magnetic field generating device may decrease the weight dimensionsand cooling requirement of the applicator.

FIG. 62 e illustrates a cross section of an exemplary applicator 610 e,which may treat an uneven, or curved, part of a body area. Theapplicator 610 e may comprise a first portion 611 comprising the firstmagnetic field generating device 900. Further, the applicator 610 e maycomprise a second portion 614 comprising the second radiofrequencyelectrode 101. Furthermore, the applicator 610 e may comprise a movementstructure 615, a connecting tube 616, and a tube connector 617. Thefirst portion 611 and the second portion 614 may be moved in relation toeach other at the movement structure 615. The connecting tube 616 mayconnect the applicator 610 a to the main unit of the device. The tubeconnector 617 may connect the connecting tube to the applicatorconnector located on the main unit. The applicator is shown to bepositioned in open position in relation to the body area 618, forexample a flank.

The first portions of the applicators discussed herein may be positionedin relation to the second portions of the respective applicator, forexample, in order to bend around an uneven, curved, or irregularlyshaped part of a body area. The positioning of the first and secondportion through the movement structure may be useful for increasinghomogeneity of the treatment in certain situations (e.g. homogeneity ofheating and/or muscle contraction). The position between the firstportion and the second portion may be characterized by an angle asdescribed below.

FIG. 62 f illustrates an exemplary applicator 620 comprising firstportion 621, second portion 622 and movement structure 623. The FIG. 62f shows a first hypothetical line 627 a between the centre of themovement structure 629 and the side 628 a of the first portion 621.Further FIG. 62 f shows a second hypothetical line 627 b between thecentre of the movement structure 629 and the side 628 b of the secondportion 622. The angle, defined between the first hypothetical line 627a and second hypothetical line 627 b may be in a range of 1° to 180°,100 to 175°, 200 to 180°, or 300 to 175°. The reference number 624 showsa maximal angle between the portions. In one example, the maximal angle624 may be 168 degrees.

FIG. 62 g illustrates an exemplary applicator 620 comprising firstportion 621, second portion 622 and movement structure 623. Thereference number 625 shows a minimal angle between the portions. In oneexample, the minimal angle 625 may be 38 degrees.

FIGS. 62 a and 62 g illustrates that the first portion 621 and/or secondportion 622 may comprise one or more at least partially circular orelliptical concavity in its surface 630. The curvature may have a radiusof curvature in a range of 20 cm to 150 cm, 30 cm to 100 cm, 30 cm to 70cm, or 40 to 60 cm. The curvature radius may correspond with a size ofthe patient's limb or flank. The protruding part 626 a positioned on afirst portion 621 may include the first temperature sensor, and theprotruding part 626 b positioned on a second portion 622 may include thesecond temperature sensor.

FIG. 63 illustrates an exploded view of applicator elements forming anexemplary applicator 620. The applicator may comprise a handle 631,first portion top cover 632, movement structure part 633 comprising hosewith holders, applicator control unit 634, blower 635, magnetic fieldgenerating device 900, frame 636, first portion RF electrode 101 a,first portion bottom cover 639, second portion top cover 640, secondportion RF electrode 101 b, second portion bottom cover 641, movementstructure cover 642 and screw covers 643.

The device may include a magnetic field generating device. An exemplarymagnetic field generating device may have a form of a magnetic coilcomprising two windings partially separated by at least one coil frame.In some aspects, one winding may form one layer of the magnetic coil. Insome aspects, two winding portions may be parts of one winding, whereinthe first and second winding portions are partially separated by thecoil frame. Partial separation should be understood such that thewindings may have two surfaces separated by the coil frame, but theportions of the windings may be connected through the one or more wiresor band leading through the coil frame. The one or more windings of theexemplary magnetic field generating device may comprise one or moreinsulated metal wires or metal bands. The two winding portions may beformed from the same set of conductive wires or bands. The magneticfield generating device may comprise a litz-wire with insulated wires.

FIGS. 64 and 65 illustrate an exemplary magnetic field generating device900 comprising a first winding 646 and a second winding 647 forming twolayers, separated by a coil frame 645. The first winding 646 may beconnected to the second winding 647. The first winding 646 and secondwinding 647 may have the common core, e.g. air core. The core may beformed using the coil frame 645. The coil frame 645 may define a corehaving a first part (shown on FIG. 66 a as 649 a) and a second part(shown on FIG. 66 b as 649 b) that may be concentric. The first winding646 may wind around the first part 649 a, and the second winding 647 maywind around the second part 649 b. The first part 649 a and the secondpart 649 b may be differently sized. The diameter 650 b of the secondpart 649 b may be larger than the diameter 650 a of the first part 649a. The first winding 646 may wind around the first part 649 a, and thesecond winding 647 may wind around the second part 649 b. As shown inFIG. 64 , the first winding 646 has a differently sized first part ofcore than the second part of core of the second winding 647. The secondpart of the core may be larger than the first part of the core. Theconnectors 644 and 648 may be used to connect the magnetic fieldgenerating device 900 to other electrical parts of the device, forexample to an energy storage device or to a switching device.

In one example, the larger second part 649 b of the core and the secondwinding 647 may be closer to the patient and/or body area than the firstwinding 646. In some aspects, the smaller first part 649 a of the coreand the first winding 646 may be closer to the patient and/or body areathan the second winding 647. In this way, an effective edge of theresulting magnetic field may be more blunt, such that it is morecomfortable for patient. Additionally, by using a more blunt magneticfield border, it may be easier to target the muscle or nerves-indeed,the resulting magnetic field may be configured to be wider, because themagnetic lines of the field flow through the wider core, which is closerto the body during treatment. Thus, the sharper part of the field willbe directed and point towards the opposite side of the patient's bodyand treated body area.

The first part 649 a of the core may have a diameter 650 a in a range of1 mm to 100 mm, or 10 mm to 45 mm. The second part 649 b of the core mayhave a diameter 650 b in a range of 3 mm to 150 mm, or 20 to 60 mm. Inone example, the diameter 650 a of the first part 649 a of the core is30 mm, and the diameter 650 b of the second part 649 b of the core is 50mm.

The ratio of diameters of the first part 649 a of the core and secondpart 649 b of the core may be in the range of 0.001 to 15, or 0.05 to 8,or 0.05 to 3, or 0.3 to 0.8. In some aspects, the ratio of diameters ofthe first part 649 a of the core and second part 649 b of the core maybe approximately 0.6.

FIG. 66 a illustrates a top view of the exemplary magnetic fieldgenerating device 900 showing the first winding 646, the first part 649a of the core and the diameter 650 a of the first part 649 a. The firstpart 649 a of the core is positioned within the coil frame 645.

FIG. 66 b illustrates a bottom view of the exemplary magnetic fieldgenerating device 900 showing the second winding 647, the second part649 b of the core and the diameter 650 b of the second part 649 b. Thesecond part 649 b of the core is positioned within the coil frame 645.As mentioned, the second part 649 b of the core may be larger than thefirst part 649 a of the core. The coil frame 645 may further comprisescrew holes 651 for connecting the magnetic field generating device 900to the inside of the applicator.

FIG. 66 c illustrates an isometrical view of the exemplary magneticfield generating device 900 showing the second part 649 b of the core.Also, the FIGS. 66 b and 66 c illustrate the connection 652 between thesecond winding 647 and the first winding 646 by a one or more conductivewires, which may be from the same set of conductive wires or bands asthe first winding 646 and the second winding 647. This connection 652,which may be positioned within the coil frame 645, first part 649 a,and/or second part 649 b, may ensure the transfer of electrical signalfrom the first winding 646 to the second winding 647. By this connection652, the first winding 646 and the second winding 647 are parts of theone common winding.

The diameter of the first winding 646 may be same or different than thediameter of the second winding 647.

The first winding 646 may be wound in one direction around the coilframe 645, and the second winding 647 may be wound in oppositedirection, as shown in FIG. 67 . The direction may be clockwise orcounterclockwise. Different directions of winding on both sides of themagnetic field generating device 900 may allow a combination (e.g.summation) of the first time-varying magnetic fields provided by thefirst winding 646 and the second time-varying magnetic fields providedby the second winding 647. The combination (e.g. summation) of the firsttime-varying magnetic field and the second time-varying magnetic fieldmay lead to a change of shape of the resulting time-varying magneticfield. The resulting time-varying magnetic field may be wider than atime-varying magnetic field provided by a magnetic coil with winding inonly one layer. The wider resulting time-varying magnetic field may beable to stimulate at least one muscle of the body area, where themuscles are not available for stimulation by coil with winding in onlyone layer.

Alternatively, the first winding 646 and the second winding 647 may bewound in the same direction.

The magnetic field generating device may be connected to at least oneenergy storage device, which may provide current pulses to the magneticfield generating device. During the operation of the exemplary magneticfield generating device 900, the current pulse may be provided byconnector 644 to the first winding 646. The current pulse flows throughthe wires of the first winding 646 wound in one direction and generatesan impulse of the first time-varying magnetic field. After that, thecurrent pulse flows through the one or more wires within the coil frameto the second winding 647. By flowing through the wires of the secondwinding 647 wound in opposite direction, the current pulse generates animpulse of the second time-varying magnetic field.

The first winding 646 wound around the first part 649 a of the coreprovides more focused time-varying magnetic field, while the secondwinding 647 wound around the second part 649 b of the core provides lessfocused time-varying magnetic field. By combination (e.g. summation) ofboth time-varying magnetic fields, the resulting time-varying magneticfield is more homogenous and wider than by using only one winding in onelayer. By this homogenization, the exemplary magnetic field generatingdevice 900 may provide more homogenous and intensive treatment.

In this configuration, the first and second time-varying magnetic fieldscombined into the resulting time-varying magnetic field are generated byone current impulse. The resulting time-varying magnetic field maycombine shape of time-varying magnetic field, shape of magnetic fieldlines, and/or magnetic flux density of the first time-varying magneticfield and the second time-varying magnetic field. When the treated bodyarea comprises area with less available muscles, nerves, orneuromuscular plates (e.g. area of flank), the resulting time-varyingmagnetic field still may be able to cause muscle contraction.

In some aspects, an applicator is configured for treatment of a curvedbody area comprising at least one of a flank, a hip or a shoulder of thepatient, the applicator may comprise: a first portion comprising: afirst magnetic field generating device; a second portion comprising: afirst radiofrequency electrode; a movement structure configured toprovide bending of the first and the second portion in relation to eachother; wherein the first magnetic field generating device is configuredto provide time-varying magnetic field to cause contractions to a musclewithin the curved body area; wherein the first radiofrequency electrodeis configured to provide heating to a tissue within the curved bodyregion; wherein the tissue may be an adipose tissue.

A magnetic field generating device may comprise: a plurality of layersof winding of conductive wires a coil frame separating at least twolayers of the plurality of layers of winding.

A magnetic field generating device may comprise: a plurality of layersof winding of conductive wires a coil frame separating at least twolayers of the plurality of layers of winding a connection between theplurality of layers of winding, wherein the connection comprises one ormore conductive wires; wherein the plurality of layers of winding areformed from the same set of conductive wires; wherein the one or moreconductive wieres of the connection are formed from the same set ofconductive wires.

All of the examples, parts of description and methods may be usedseparately or in any combination.

Novel systems and methods have been described. The disclosure should beinterpreted in the broadest sense, hence various changes andsubstitutions may be made without departing from the spirit and scope ofthe disclosure.

Following patent applications are incorporated herein by reference intheir entireties:

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List of abbreviations related to FIGS. 17, 18 and 18 a and others. The(A/B) means that respective element of the list may be shown withrespective letter. For example, ESD (A/B) means that ESD A and/or ESD Bare shown in at least one Figure.

-   -   PS power source    -   ESD (A/B) energy storage device    -   SW (A/B) switch    -   HIFEM (A/B) treatment cluster for magnetic treatment    -   MFGD (A/B) magnetic field generating device    -   CUM (A/B) control unit of magnetic circuit    -   APS RF auxiliary power source of RF circuit    -   PU power unit    -   SPSRF steady power source of RF circuit    -   PNFLT power network filter    -   PSRF power source for RF treatment    -   RF (A/B) treatment cluster for RF treatment    -   SYM (A/B) symmetrization element    -   AP (A/B) applicator    -   RFE (A/B) RF electrode    -   APS (A/B) auxiliary power source    -   PSM power source for magnetic treatment    -   BPS (A/B) board power source    -   SPSM steady power source of magnetic circuit    -   PN power network    -   PF pulse filter    -   SE safety element    -   PA power amplifier    -   CURF control unit of RF circuit

What is claimed is:
 1. An applicator for treating a patient, comprising:a connecting tube; a first portion comprising a magnetic fieldgenerating device, wherein the magnetic field generating device isconfigured to generate a magnetic field; a second portion comprising afirst radiofrequency electrode, wherein the first radiofrequencyelectrode is configured to generate a radiofrequency field; and amovement structure configured to provide movement of the first portionrelative to the second portion, wherein the movement structure isconfigured to provide movement of the first portion relative to thesecond portion, and wherein the movement structure is configured to holdthe position of the first portion relative to the second portion duringa treatment, wherein the applicator is configured to apply the magneticfield to the patient, and wherein the applicator is configured to applythe radiofrequency field to induce heating of a tissue of the patient.2. The applicator of claim 1, wherein the movement structure comprises alock configured to lock the first portion and the second portion in alocked position, wherein in the locked position the first portion is atangle in a range of 10° to 175° relative to the second portion.
 3. Theapplicator of claim 1, wherein the second portion comprises a secondradiofrequency electrode.
 4. The applicator of claim 1, wherein thefirst portion comprises a second radiofrequency electrode.
 5. Theapplicator of claim 4, wherein the second portion comprises a thirdradiofrequency electrode.
 6. The applicator of claim 1, wherein themovement structure comprises a joint.
 7. The applicator of claim 1,wherein the movement structure comprises a gear.
 8. The applicator ofclaim 1, wherein the applicator is configured to apply the magneticfield to the patient to induce a muscle contraction.
 9. An applicatorfor treating a patient, comprising: a first portion comprising amagnetic field generating device, wherein the magnetic field generatingdevice is configured to generate a magnetic field; a second portioncomprising a first radiofrequency electrode, wherein the firstradiofrequency electrode is configured to generate a radiofrequencyfield; and a movement structure configured to provide movement of thefirst portion relative to the second portion, wherein the first portionis configured to move between 1° and 180° relative to the secondportion, wherein the applicator is configured to apply the magneticfield to the patient, and wherein the applicator is configured to applythe radiofrequency field to induce heating of the tissue of the patient.10. The applicator of claim 9, wherein the movement structure comprisesa joint.
 11. The applicator of claim 9, wherein the applicator isconfigured to apply the magnetic field to the patient to induce a musclecontraction.
 12. The applicator of claim 9, wherein the movementstructure comprises a gear.
 13. The applicator of claim 9, wherein thesecond portion comprises a second radiofrequency electrode.
 14. Theapplicator of claim 9, further comprising a concavity in a surface ofthe first portion.
 15. The applicator of claim 9, further comprising aconcavity in a surface of the second portion.
 16. The applicator ofclaim 9, wherein the movement structure is configured to providerotational movement of the first portion relative to the second portion.17. A device for treating a patient, the device comprising: a firstapplicator comprising a magnetic field generating device, wherein themagnetic field generating device is configured to generate a magneticfield; a second applicator comprising a first radiofrequency electrode,wherein the first radiofrequency electrode is configured to generate aradiofrequency field; and a movement structure configured to be coupledto the first applicator and the second applicator, wherein the movementstructure is configured to hold the position of the first applicatorrelative to the second applicator during a treatment, wherein the firstapplicator is configured to apply the magnetic field to the patient, andwherein the second applicator is configured to apply radiofrequencyfield to induce heating of the tissue of the patient.
 18. The device ofclaim 17, wherein the first applicator comprises a second radiofrequencyelectrode.
 19. The device of claim 17, wherein the movement structurecomprises a lock configured to lock the first applicator and the secondapplicator in a locked position.
 20. The device of claim 17, wherein themovement structure comprises a gear.
 21. The device of claim 17, whereinthe movement structure comprises a joint.
 22. The device of claim 17,further comprising: a main unit; and a connecting tube coupled to themovement structure, wherein the connecting tube is configured to couplethe first applicator to the main unit.
 23. The device of claim 17,further comprising a pressure outlet.
 24. A device for treating apatient, the device comprising: a first applicator comprising a magneticfield generating device, wherein the magnetic field generating device isconfigured to generate a magnetic field; a second applicator comprisinga first radiofrequency electrode, wherein the first radiofrequencyelectrode is configured to generate a radiofrequency field; and amovement structure configured to be coupled to the first applicator andthe second applicator, the movement structure configured to providemovement of the first applicator relative to the second applicator,wherein the movement structure comprises two joints, wherein the firstapplicator is configured to apply the magnetic field to the patient, andwherein the second applicator is configured to apply the radiofrequencyfield to the patient.
 25. The device of claim 24, wherein the movementstructure provides movement of the first applicator in an angle betweenthe casing of the first applicator and the movement structure in a rangeof 1° to 180°.
 26. The device of claim 24, further comprising: a mainunit; and a connecting tube coupled to the movement structure, whereinthe connecting tube is configured to couple the second applicator to amain unit.
 27. The device of claim 24, wherein the movement structure isconfigured to provide rotational movement of the first applicatorrelative to the second applicator.
 28. The device of claim 24, whereinthe movement structure comprises a gear.
 29. The device of claim 24,further comprising a pressure outlet.
 30. The device of claim 24,wherein the movement structure comprises a lock configured to lock thefirst applicator and the second applicator in a particular lockedposition.